TWI512387B - A microlenses for micro lens manufacturing, a microlens manufacturing method using the same, and an image pickup device - Google Patents
A microlenses for micro lens manufacturing, a microlens manufacturing method using the same, and an image pickup device Download PDFInfo
- Publication number
- TWI512387B TWI512387B TW100118724A TW100118724A TWI512387B TW I512387 B TWI512387 B TW I512387B TW 100118724 A TW100118724 A TW 100118724A TW 100118724 A TW100118724 A TW 100118724A TW I512387 B TWI512387 B TW I512387B
- Authority
- TW
- Taiwan
- Prior art keywords
- microlens
- light
- layout
- pattern
- manufacturing
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 37
- 239000000463 material Substances 0.000 claims description 91
- 239000000758 substrate Substances 0.000 claims description 36
- 229920002120 photoresistant polymer Polymers 0.000 claims description 34
- 238000010438 heat treatment Methods 0.000 claims description 10
- 238000000034 method Methods 0.000 claims description 9
- 239000011248 coating agent Substances 0.000 claims description 6
- 238000000576 coating method Methods 0.000 claims description 6
- 230000001678 irradiating effect Effects 0.000 claims description 5
- 238000005530 etching Methods 0.000 claims description 4
- 230000000052 comparative effect Effects 0.000 description 6
- 230000003287 optical effect Effects 0.000 description 5
- 239000004925 Acrylic resin Substances 0.000 description 3
- 229920000178 Acrylic resin Polymers 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 238000000926 separation method Methods 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 229910052769 Ytterbium Inorganic materials 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 239000005011 phenolic resin Substances 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- NAWDYIZEMPQZHO-UHFFFAOYSA-N ytterbium Chemical compound [Yb] NAWDYIZEMPQZHO-UHFFFAOYSA-N 0.000 description 2
- 206010034972 Photosensitivity reaction Diseases 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- IVRMZWNICZWHMI-UHFFFAOYSA-N azide group Chemical group [N-]=[N+]=[N-] IVRMZWNICZWHMI-UHFFFAOYSA-N 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 108091008695 photoreceptors Proteins 0.000 description 1
- 230000036211 photosensitivity Effects 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 230000001235 sensitizing effect Effects 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0006—Arrays
- G02B3/0012—Arrays characterised by the manufacturing method
- G02B3/0018—Reflow, i.e. characterized by the step of melting microstructures to form curved surfaces, e.g. manufacturing of moulds and surfaces for transfer etching
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F99/00—Subject matter not provided for in other groups of this subclass
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
- B29D11/00—Producing optical elements, e.g. lenses or prisms
- B29D11/00009—Production of simple or compound lenses
- B29D11/00365—Production of microlenses
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0006—Arrays
- G02B3/0037—Arrays characterized by the distribution or form of lenses
- G02B3/0056—Arrays characterized by the distribution or form of lenses arranged along two different directions in a plane, e.g. honeycomb arrangement of lenses
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Optics & Photonics (AREA)
- Mechanical Engineering (AREA)
- Ophthalmology & Optometry (AREA)
- Health & Medical Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Light Receiving Elements (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010138314A JP5565771B2 (ja) | 2010-06-17 | 2010-06-17 | マイクロレンズの製造方法および撮像素子 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201200962A TW201200962A (en) | 2012-01-01 |
| TWI512387B true TWI512387B (zh) | 2015-12-11 |
Family
ID=45328441
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW100118724A TWI512387B (zh) | 2010-06-17 | 2011-05-27 | A microlenses for micro lens manufacturing, a microlens manufacturing method using the same, and an image pickup device |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US8470501B2 (https=) |
| JP (1) | JP5565771B2 (https=) |
| KR (1) | KR20110137725A (https=) |
| TW (1) | TWI512387B (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105527825B (zh) * | 2014-09-28 | 2018-02-27 | 联想(北京)有限公司 | 电子设备和显示方法 |
| KR102938715B1 (ko) * | 2020-12-03 | 2026-03-13 | 삼성전자주식회사 | 렌즈 어셈블리 및 이를 포함하는 전자 장치 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1074927A (ja) * | 1996-05-16 | 1998-03-17 | Lg Semicon Co Ltd | マイクロレンズパターン用マスク |
| TW561278B (en) * | 2001-10-11 | 2003-11-11 | Nitto Denko Corp | Optical sheet and display device having the optical sheet |
| US20040263985A1 (en) * | 2003-06-26 | 2004-12-30 | Boettiger Ulrich C. | Micro-lenses and method for increasing area coverage and controlling shape of micro lenses |
| CN101105543A (zh) * | 2006-07-10 | 2008-01-16 | 台湾积体电路制造股份有限公司 | 微透镜装置及其制造方法 |
| TW200846703A (en) * | 2007-05-29 | 2008-12-01 | United Microelectronics Corp | Method for manufacturing micro-lenses of image sensor |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2945440B2 (ja) | 1990-05-02 | 1999-09-06 | シャープ株式会社 | 固体撮像装置の製造方法 |
| JP2002006472A (ja) * | 2000-06-21 | 2002-01-09 | Oki Electric Ind Co Ltd | レジストパターンの形成方法 |
| JP2002323747A (ja) * | 2001-04-24 | 2002-11-08 | Ricoh Co Ltd | フォトマスク、および該フォトマスクを用いたマイクロレンズ作成方法、ならびに該マイクロレンズ作成方法により作成したマイクロレンズ |
| JP3698144B2 (ja) * | 2003-02-07 | 2005-09-21 | ヤマハ株式会社 | マイクロレンズアレイの製法 |
| JP2009507669A (ja) * | 2005-08-31 | 2009-02-26 | コリア インスティチュート オブ インダストリアル テクノロジー | レンズ製造方法 |
-
2010
- 2010-06-17 JP JP2010138314A patent/JP5565771B2/ja not_active Expired - Fee Related
-
2011
- 2011-05-27 TW TW100118724A patent/TWI512387B/zh not_active IP Right Cessation
- 2011-05-27 KR KR1020110050807A patent/KR20110137725A/ko not_active Ceased
- 2011-06-17 US US13/163,262 patent/US8470501B2/en not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1074927A (ja) * | 1996-05-16 | 1998-03-17 | Lg Semicon Co Ltd | マイクロレンズパターン用マスク |
| TW561278B (en) * | 2001-10-11 | 2003-11-11 | Nitto Denko Corp | Optical sheet and display device having the optical sheet |
| US20040263985A1 (en) * | 2003-06-26 | 2004-12-30 | Boettiger Ulrich C. | Micro-lenses and method for increasing area coverage and controlling shape of micro lenses |
| CN101105543A (zh) * | 2006-07-10 | 2008-01-16 | 台湾积体电路制造股份有限公司 | 微透镜装置及其制造方法 |
| TW200846703A (en) * | 2007-05-29 | 2008-12-01 | United Microelectronics Corp | Method for manufacturing micro-lenses of image sensor |
Also Published As
| Publication number | Publication date |
|---|---|
| US20110310492A1 (en) | 2011-12-22 |
| TW201200962A (en) | 2012-01-01 |
| JP2012004365A (ja) | 2012-01-05 |
| US8470501B2 (en) | 2013-06-25 |
| JP5565771B2 (ja) | 2014-08-06 |
| KR20110137725A (ko) | 2011-12-23 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |