TWI490360B - 鍍膜件及其製造方法 - Google Patents

鍍膜件及其製造方法 Download PDF

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TWI490360B
TWI490360B TW100121051A TW100121051A TWI490360B TW I490360 B TWI490360 B TW I490360B TW 100121051 A TW100121051 A TW 100121051A TW 100121051 A TW100121051 A TW 100121051A TW I490360 B TWI490360 B TW I490360B
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film layer
substrate
zinc
target
aluminum
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TW201250029A (en
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Huann Wu Chiang
Cheng Shi Chen
Ying-Ying Wang
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Hon Hai Prec Ind Co Ltd
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Description

鍍膜件及其製造方法
本發明涉及一種鍍膜件及其製造方法，尤其涉及一種具有骨瓷質感的鍍膜件及其製造方法。
現有技術，通常採用噴塗、陽極處理及PVD鍍膜等技術於電子產品(如手機、PDA等)的殼體表面形成裝飾性膜層，以使殼體呈現出彩色的外觀。然，上述殼體雖然呈現出彩色的外觀，卻不能呈現出如骨瓷般的潔白、細膩、通透、清潔等視覺或外觀效果。
傳統的骨瓷產品的製作方法係以動物骨灰(主要成分為Ca3(PO4)2)、優質高嶺土及石英為基本原料，經過高溫素燒和低溫釉燒兩次燒製而成，其製作工藝複雜、成品率低、價格十分昂貴，故難以實現大批量地工業生產。此外，傳統的骨瓷產品還具有輕脆易碎的缺點。
鑒於此，本發明提供一種具有骨瓷質感的鍍膜件。
另外，本發明還提供一種上述鍍膜件的製造方法。
一種鍍膜件，包括基體，該鍍膜件還包括藉由真空鍍膜的方式依次形成於基體上的白色的第一膜層及無色透明的第二膜層；該第一膜層由鋁、鋁合金、鋅及鋅合金中的一種組成，該第二膜層由 Zn、O及N三種元素組成，基體為不銹鋼、鋁、鋁合金、鎂及鎂合金中的一種。
一種鍍膜件的製造方法，其包括如下步驟：提供基體，基體為不銹鋼、鋁、鋁合金、鎂及鎂合金中的一種；採用真空鍍膜法，以鋅及鋅合金中的一種為靶材，於該基體的表面形成白色的第一膜層，該第一膜層由鋁、鋁合金、鋅及鋅合金中的一種組成；採用真空鍍膜法，以Zn為靶材，以氧氣及氮氣為反應氣體，於該第一膜層上形成無色透明的第二膜層，該第二膜層由Zn、O及N三種元素組成。
其中，所述基體的材質為金屬或非金屬，其中金屬為不銹鋼、鋁、鋁合金、鎂及鎂合金中的一種；非金屬為塑膠。
所述鍍膜件藉由於基體上結合濺射白色的第一膜層與無色透明的第二膜層，使該鍍膜件呈現出骨瓷質感的外觀。相較於傳統的骨瓷產品，該鍍膜件的製作方法簡單、良率較高且生產成本較低，可實現大批量地工業生產；如此，使具有骨瓷質感的所述鍍膜件可運用於3C電子產品殼體、建築裝飾件、汽車裝飾件及家居生活用品等產品中。
10‧‧‧鍍膜件
11‧‧‧基體
13‧‧‧第一膜層
15‧‧‧第二膜層
30‧‧‧真空鍍膜機
31‧‧‧真空室
32‧‧‧真空泵
33‧‧‧氣源通道
35‧‧‧轉架
36‧‧‧第一靶材
37‧‧‧第二靶材
39‧‧‧蒸發電源
圖1為本發明一較佳實施例鍍膜件的剖視圖。
圖2為本發明一較佳實施例鍍膜件的第二膜層表面掃描電鏡圖。
圖3為本發明一較佳實施例鍍膜件的製造方法中所用真空鍍膜機 的示意圖。
請參閱圖1，本發明一較佳實施例的鍍膜件10包括基體11、依次形成於基體11上的第一膜層13及第二膜層15。該鍍膜件10可以為電子裝置外殼，也可以為鐘錶外殼、金屬衛浴件及建築用件。
基體11的材質為金屬或非金屬，其中金屬可為不銹鋼、鋁、鋁合金、鎂及鎂合金中的一種，非金屬可為塑膠。
所述第一膜層13可由鋁、鋁合金、鋅及鋅合金中的一種組成。當第一膜層13由鋁合金或鋅合金時，其中鋁或鋅的質量百分含量為85%~90%。該第一膜層13的色度區域於CIE LAB表色系統的L*座標為88至93，呈白色，為鍍膜件10提供陶瓷的外觀顏色。第一膜層13可藉由磁控濺射、真空蒸鍍等真空鍍膜的方式形成。所述第一膜層13的厚度為0.7至1.3μm。
所述第二膜層15可藉由磁控濺射、真空蒸鍍及電弧離子鍍等真空鍍膜的方式形成。該第二膜層15由M、O及N三種元素組成，其中M為Al或Zn。該第二膜層15中M、O及N元素的原子個數比大致為0.9~1.1：0.9~1.1：0.9~1.1，較佳為1：1：1。請參閱圖2，該第二膜層15由平均粒徑為10~15nm的奈米顆粒組成，質地均勻緻密。第二膜層的粗糙度Ra為15~100nm。第二膜層15為無色透明層，具有較高的光澤度，其形成於第一膜層13上，為鍍膜件10提供仿釉的外觀效果。第二膜層15的厚度大約為20nm~300nm，較佳為20nm~100nm。第二膜層15的厚度大於300nm時，第二膜層15的透明度將明顯下降。
上述第一膜層13與第二膜層15的結合可使鍍膜件10呈現骨瓷質感的外觀。從該第二膜層15一側測試鍍膜件10表面的60°角光澤度為83~90；色度區域於CIE LAB表色系統的L*座標為85至90，a*座標為-0.5至0.5，b*座標為2.0至3.0。
下面以該第一膜層13、第二膜層15均以磁控濺射方式形成為例，對上述鍍膜件10的製造方法進行說明。該鍍膜件10的製造方法包括如下步驟：提供基體11，該基體11的材質為金屬或非金屬，其中金屬可為不銹鋼、鋁、鋁合金及鎂合金中的一種，非金屬可為塑膠。
將基體11進行預處理。該預處理包括用丙酮溶液對基體11進行超聲波清洗等步驟。
請參閱圖3，提供一真空鍍膜機30，本實施例的真空鍍膜機30為磁控濺射鍍膜機。真空鍍膜機30包括真空室31、用以對真空室31抽真空的真空泵32以及與真空室31相通的氣源通道33。該真空室31內設有轉架35、第一靶材36、第二靶材37及施加於所述第一靶材36、第二靶材37的蒸發電源39。其中，所述第一靶材36為鋁靶、鋁合金靶、鋅靶及鋅合金靶中的一種，所述第二靶材37為鋁靶或鋅靶。所述第一靶材36為鋁合金靶或鋅合金靶時，其中鋁或鋅的質量百分含量為85%~90%。所述蒸發電源39可採用中頻磁控電源。轉架35帶動基體11做圓周運行，且基體11於隨轉架35運行的同時也進行自轉。鍍膜時，濺射氣體與反應氣體經由氣源通道33進入真空室31。以下步驟均於該真空鍍膜機30中進行。
對基體11進行氬氣等離子體清洗，使基體11表面進一步清潔，以 提高後續鍍層的附著力。該等離子體清洗過程如下：將基體11放入真空鍍膜機30的真空室31內，將真空室31抽真空至3×10-5torr~6×10-5torr，以下步驟保持該真空度不變；然後向真空室31內通入流量為100~400sccm(標準狀態毫升/分鐘)的氬氣(純度為99.999%)，並施加-200~-500V的偏壓於基體11，對基體11表面進行氬氣等離子體清洗，清洗時間為3~20分鐘。
於基體11上濺射該第一膜層13。調節氬氣流量為100~300sccm。調節偏壓至-100~-300V，將基體11溫度控制在20~200℃。開啟第一靶材36，調節施加於第一靶材36的蒸發電源39功率為8~12kW，對基體11濺射10~30分鐘，以於基體11表面形成該第一膜層13。
於該第一膜層13上濺射第二膜層15。關閉第一靶材36，氬氣流量維持在100~300sccm，同時向真空室31通入氧氣和氮氣。氧氣流量為50~200sccm，氮氣流量為80~300sccm。維持基體11偏壓為-100~-300V，基體11溫度為20~200℃。開啟第二靶材37，調節施加於第二靶材37的蒸發電源39功率為8~12kW，於該第一膜層13上沉積該第二膜層15，由此獲得該具有骨瓷外觀質感的鍍膜件10。濺射該第二膜層15的時間為3~20分鐘。
鍍膜結束後，關閉負偏壓及蒸發電源，停止通入氣體，待冷卻後，取出鍍膜件10。
可以理解的，所述第一膜層13及第二膜層15還可藉由真空蒸鍍及電弧離子鍍等真空鍍膜的方式形成。
所述鍍膜件10藉由於基體11上濺射白色的第一膜層13與無色透明 的第二膜層15，該第一膜層13為鍍膜件10提供骨瓷的色彩，該第二膜層15具有較高的光亮度和透明度，覆蓋於該第一膜層13上後形成仿釉效果，第一膜層13與第二膜層15結合使該鍍膜件10呈現出瑩白如玉、色澤潤滑的骨瓷質感。相較於傳統的骨瓷產品，該鍍膜件10的製作方法簡單、良率較高且生產成本較低，可實現大批量地工業生產，因而可運用於3C電子產品殼體、建築裝飾件、汽車裝飾件及家居生活用品等諸多產品中。
此外，由於所述鍍膜件10的基體11的材質為不銹鋼、鋁或鋁合金、鎂合金等金屬或塑膠，強度高，因而相較於傳統的骨瓷製品，所述鍍膜件10還具有質地輕盈、不易碎的特點。
下面藉由實施例來對本發明進行具體說明。
實施例1
本實施例所使用的基體11的材質為不銹鋼，真空室保持真空度為3×10-5torr。
預處理：於丙酮溶液中進行超聲清洗5分鐘。
等離子體清洗：氬氣流量為100sccm，基體11的偏壓為-300V，等離子體清洗時間為10min。
濺鍍第一膜層13：第一靶材36為純鋁，施加於第一靶材36的蒸發電源功率為8kW，氬氣流量為150sccm，基體11的偏壓為-100V，基體11溫度為80℃，濺射時間為10分鐘。
濺鍍第二膜層15：第二靶材37為純鋁，施加於第二靶材37的蒸發電源功率為8kW，氬氣流量為150sccm，氧氣流量為50sccm，氮氣 流量為80sccm，基體11的偏壓為-100V，基體11的溫度為80℃，鍍膜時間為5min。
實施例2
本實施例所使用的基體11的材質為鋁合金，真空室保持真空度為3×10-5torr。
預處理：於丙酮溶液中超聲清洗20分鐘。
等離子體清洗：氬氣流量為120sccm，基體11的偏壓為-300V，等離子體清洗時間為8min。
濺鍍第一膜層13：第一靶材36為純鋁，施加於第一靶材36的蒸發電源功率為9kW，氬氣流量為180sccm，基體11的偏壓為-120V，基體11溫度為90℃，濺射時間為20分鐘。
濺鍍第二膜層15：第二靶材37為純鋅，施加於第二靶材37的蒸發電源的功率為9kW，氬氣流量為180sccm，氧氣流量為60sccm，氮氣流量為90sccm，基體11的偏壓為-120V，基體11的溫度為90℃，鍍膜時間為8min。
實施例3
本實施例所使用的基體11的材質為鋁合金，真空室保持真空度為3×10-5torr。
預處理：於丙酮溶液中超聲清洗30分鐘。
等離子體清洗：氬氣流量為150sccm，基體11的偏壓為-300V，等離子體清洗時間為5min。
濺鍍第一膜層13：第一靶材36為純鋅，施加於第一靶材36的蒸發電源功率為10kW，氬氣流量為200sccm，基體11的偏壓為-150V，基體11溫度為100℃，濺射時間為30分鐘。
濺鍍第二膜層15：第二靶材37為純鋁，施加於第二靶材37的蒸發電源功率為10kW，氬氣流量為200sccm，氧氣流量為100sccm，氮氣流量為150sccm，基體11的偏壓為-150V，基體11的溫度為100℃，鍍膜時間為10min。
由實施例1-3均可獲得類似的具有骨瓷質感的鍍膜件。
10‧‧‧鍍膜件
11‧‧‧基體
13‧‧‧第一膜層
15‧‧‧第二膜層

Claims (13)

  1. 一種鍍膜件，包括基體，其改良在於：該鍍膜件還包括藉由真空鍍膜的方式依次形成於基體上的白色的第一膜層及無色透明的第二膜層；該第一膜層由鋅及鋅合金中的一種組成，該第二膜層由Zn、O及N三種元素組成，基體為不銹鋼、鋁、鋁合金、鎂及鎂合金中的一種。
  2. 如申請專利範圍第1項所述之鍍膜件，其中所述第二膜層中Zn、O及N元素的原子個數比為0.9~1.1：0.9~1.1：0.9~1.1。
  3. 如申請專利範圍第2項所述之鍍膜件，其中所述第二膜層中Zn、O及N元素的原子個數比為1：1：1。
  4. 如申請專利範圍第1項所述之鍍膜件，其中所述鋅合金中，鋁或鋅的質量百分含量為85%~90%。
  5. 如申請專利範圍第1項所述之鍍膜件，其中所述第一膜層的色度區域於CIE LAB表色系統的L*座標為88至93。
  6. 如申請專利範圍第1項所述之鍍膜件，其中所述第二膜層由平均粒徑為10~15nm的奈米顆粒組成，第二膜層的粗糙度Ra為15~100nm。
  7. 如申請專利範圍第1項所述之鍍膜件，其中所述鍍膜件於該第二膜層表面的60°角光澤度為83~90，色度區域於CIE LAB表色系統的L*座標為85至90，a*座標為-0.5至0.5，b*座標為2.0至3.0。
  8. 如申請專利範圍第1項所述之鍍膜件，其中所述第一膜層的厚度為0.7~1.3μm，該第二膜層的厚度為20nm~300nm。
  9. 一種鍍膜件的製造方法，其包括如下步驟：提供基體，基體為不銹鋼、鋁、鋁合金、鎂及鎂合金中的一種；採用真空鍍膜法，以鋅及鋅合金中的一種為靶材，於該基體的表面形成 白色的第一膜層，該第一膜層由鋅及鋅合金中的一種組成；採用真空鍍膜法，以Zn為靶材，以氧氣及氮氣為反應氣體，於該第一膜層上形成無色透明的第二膜層，該第二膜層由Zn、O及N三種元素組成。
  10. 如申請專利範圍第9項所述之鍍膜件的製造方法，其中所述鋁合金或鋅合金中，鋁或鋅的質量百分含量為85%~90%。
  11. 如申請專利範圍第9項所述之鍍膜件的製造方法，其中形成所述第一膜層係採用磁控濺射方式，對靶材施加中頻磁控電源，電源功率為8~12kW，以氬氣為濺射氣體，氬氣的流量為100~300sccm，施加於基體的偏壓為-100~-300V，鍍膜溫度為20~200℃，鍍膜時間為10~30min。
  12. 如申請專利範圍第9項所述之鍍膜件的製造方法，其中形成所述第二膜層係採用磁控濺射方式，對靶材施加中頻磁控電源，電源功率為8~12kW，氧氣的流量為50~200sccm、氮氣的流量為80~300sccm，以氬氣為濺射氣體，氬氣的流量為100~300sccm，施加於基體的偏壓為-100~-300V，鍍膜溫度為20~200℃，鍍膜時間為3~20min。
  13. 如申請專利範圍第9項所述之鍍膜件的製造方法，其中所述第二膜層中Zn、O及N元素的原子個數比為0.9~1.1：0.9~1.1：0.9~1.1。
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