CN102337501A - 真空镀膜件及其制备方法 - Google Patents

真空镀膜件及其制备方法 Download PDF

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CN102337501A
CN102337501A CN2010102354286A CN201010235428A CN102337501A CN 102337501 A CN102337501 A CN 102337501A CN 2010102354286 A CN2010102354286 A CN 2010102354286A CN 201010235428 A CN201010235428 A CN 201010235428A CN 102337501 A CN102337501 A CN 102337501A
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vacuum plating
plating part
color layers
matrix
coordinate
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张新倍
陈文荣
蒋焕梧
陈正士
马闯
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Hongfujin Precision Industry Shenzhen Co Ltd
Hon Hai Precision Industry Co Ltd
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Hongfujin Precision Industry Shenzhen Co Ltd
Hon Hai Precision Industry Co Ltd
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Priority to US12/968,424 priority patent/US8431239B2/en
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    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
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    • C23C14/025—Metallic sublayers
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    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
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    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3435—Applying energy to the substrate during sputtering
    • C23C14/345—Applying energy to the substrate during sputtering using substrate bias
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    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3492—Variation of parameters during sputtering
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12535—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.] with additional, spatially distinct nonmetal component
    • Y10T428/12611—Oxide-containing component
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    • Y10T428/12—All metal or with adjacent metals
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    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
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    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12771—Transition metal-base component
    • Y10T428/12806—Refractory [Group IVB, VB, or VIB] metal-base component
    • Y10T428/12826—Group VIB metal-base component
    • Y10T428/12847—Cr-base component
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
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    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
    • Y10T428/264—Up to 3 mils
    • Y10T428/265—1 mil or less

Abstract

本发明提供一种真空镀膜件。该真空镀膜件包括一基体及一形成于基体上的颜色层。该颜色层为一氧化铬层，该颜色层呈现的色度区域于CIE LAB表色系统的L*坐标介于75至80之间，a*坐标介于-5至-10之间，b*坐标介于15至20之间。本发明还提供一种上述真空镀膜件的制备方法。本发明的真空镀膜件呈现出绿色。

Description

真空镀膜件及其制备方法
技术领域
本发明涉及一种真空镀膜件及其制备方法，尤其涉及一种呈现绿色的真空镀膜件及其制备方法。
背景技术
真空镀膜技术是一个非常环保的成膜技术。以真空镀膜的方式所形成的膜层具有高硬度、高耐磨性、良好的化学稳定性、与基体结合牢固以及亮丽的金属外观等优点，因此真空镀膜在装饰性表面处理领域的应用越来越广。
在装饰性真空镀膜领域中，对所镀膜层的颜色的设计与控制是一个非常关键的技术指标。目前采用真空镀膜技术能够稳定地生产的颜色仅限于金色、银色、黑色、玫瑰红等少数色系，与烤漆、阳极处理等成膜工艺相比，真空镀膜在装饰性表面处理领域的竞争力不强。
发明内容
有鉴于此，本发明提供一种呈现绿色的真空镀膜件。
另外，还提供一种上述真空镀膜件的制备方法。
一种真空镀膜件，包括一基体及一形成于基体上的颜色层，该颜色层为一氧化铬层，该颜色层呈现的色度区域于CIE LAB表色系统的L*坐标介于75至80之间，a*坐标介于-5至-10之间，b*坐标介于15至20之间。
一种真空镀膜件的制备方法，包括以下步骤：
提供一基体；
使用一铬靶，以5～100sccm的流量向真空室内通入纯度为99.99％的氧气，通过磁控溅射镀膜方法在基体上形成一颜色层，该颜色层为一氧化铬层，其厚度为0.5～3μm，呈现的色度区域于CIELAB表色系统L*坐标介于75至80之间，a*坐标介于-5至-10之间，b*坐标介于15至20之间。
相较于现有技术，上述真空镀膜件的制备方法，通过对反应气体氧气的流量控制来改变颜色层的成分，即改变颜色层中氧原子与铬原子的比例，从而达到使颜色层呈现出绿色的目的。以该方法所制得的真空镀膜件可呈现出具吸引力的绿色的金属外观，丰富了真空镀膜层的颜色，极大地提高了产品的外观竞争力。
附图说明
图1为本发明较佳实施例的真空镀膜件的剖视示意图。
主要元件符号说明
真空镀膜件    10
基体          11
衬底层        13
颜色层        15
具体实施方式
本发明的真空镀膜件可以为电子装置外壳，也可以为眼镜边框、钟表外壳、金属卫浴件及建筑用件。
请参阅图1，本发明较佳实施例的真空镀膜件10包括一基体11、一衬底层13及一颜色层15。衬底层13直接与基体11结合，颜色层15形成于衬底层13的表面。
基体11的材质可以为金属、玻璃、陶瓷或塑料。
衬底层13形成于基体11与颜色层15之间，以增强颜色层15于基体11上的附着力。衬底层13可为一铬层或其它可提供附着效果的涂层。衬底层13的厚度大约为0.01～0.1μm，优选厚度为0.05μm。衬底层13的颜色以不影响颜色层颜色的色调为佳，比如可为银色、白色及灰白色等浅色调。
颜色层15为一氧化铬层。该颜色层15呈现的色度区域于CIELAB表色系统的L*坐标介于78至83之间，a*坐标介于-5至-10之间，b*坐标介于15至20之间，表现为绿色。颜色层15的厚度大约为0.5～3μm，优选厚度为2μm。
上述真空镀膜件10的制备方法主要包括如下步骤：
提供一基体11，并将基体11放入盛装有乙醇及/或丙酮溶液的超声波清洗器中进行震动清洗，以除去基体11表面的杂质和油污。清洗完毕后烘干备用。所述基体11的材质可以为金属、玻璃、陶瓷或塑料。
再对基体11的表面进行氩气等离子清洗，进一步去除基体11表面的油污，以改善基体11表面与后续涂层的结合力。对基体11的表面进行氩气等离子清洗的方法包括如下步骤：将基体11放入一磁控溅射镀膜机的真空室内的工件架上，抽真空至真空度为8.0×10-3Pa，以300～600sccm(标准状态毫升/分钟)的流量向真空室内通入纯度为99.999％的氩气，调节偏压至-300～-800V，对基体11表面进行等离子清洗，清洗时间为5～10min。
采用磁控溅射的方式在基体11上形成一衬底层13。该衬底层13为一铬层。形成该衬底层13的具体操作方法及工艺参数为：在所述等离子清洗完成后，调节氩气流量至100～500sccm，加热该真空室至120～180，并设置工件架的公转转速为2.0～3.0rpm；开启已置于磁控溅射镀膜机中的铬靶的电源，调节偏压至-100～-500V，沉积衬底层13。沉积该衬底层13的时间为5～15min。
形成该衬底层13后，以5～100sccm的流量向真空室内通入纯度为99.99％的氧气，调节偏压至-100～-300V，对基体11继续镀膜，以在衬底层13上镀覆一颜色层15，该颜色层15为一氧化铬层。沉积该颜色层15的时间为20～60min。
所述颜色层15呈现的色度区域于CIE LAB表色系统的L*坐标介于78至83之间，a*坐标介于-5至-10之间，b*坐标介于15至20之间。
上述真空镀膜件的制备方法，通过对反应气体氧气的流量控制来改变颜色层15的成分，即改变颜色层15中氧原子与铬原子的比例，从而达到使颜色层呈现出绿色的目的。同时，通过选择合适的偏压，控制氧原子及铬原子的沉积速率，可增强颜色层15的致密性。另外，选择合适的氧气流量与偏压，能够保证较高的沉积速率，从而可进一步提高该真空镀膜件10的生产效率。

Claims (10)

1.一种真空镀膜件，包括一基体及一形成于基体上的颜色层，其特征在于：该颜色层为一氧化铬层，该颜色层呈现的色度区域于CIE LAB表色系统的L*坐标介于75至80之间，a*坐标介于-5至-10之间，b*坐标介于15至20之间。
2.如权利要求1所述的真空镀膜件，其特征在于：所述颜色层的厚度为0.5～3μm。
3.如权利要求1所述的真空镀膜件，其特征在于：该真空镀膜件还包括一形成于基体与颜色层之间的衬底层，该衬底层为一铬层。
4.如权利要求3所述的真空镀膜件，其特征在于：该衬底层的厚度为0.01～0.1μm。
5.如权利要求1所述的真空镀膜件，其特征在于：该基体的材质为金属、玻璃、陶瓷及塑料中的一种。
6.一种真空镀膜件的制备方法，包括以下步骤：
提供一基体；
使用一铬靶，以5～100sccm的流量通入纯度为99.99％的氧气，通过磁控溅射镀膜方法在基体上形成一颜色层，该颜色层为一氧化铬层，其厚度为0.5～3μm，呈现的色度区域于CIE LAB表色系统L*坐标介于75至80之间，a*坐标介于-5至-10之间，b*坐标介于15至20之间。
7.如权利要求6所述的真空镀膜件的制备方法，其特征在于：形成该颜色层时，偏压设为-100～-300V。
8.如权利要求7所述的真空镀膜件的制备方法，其特征在于：该颜色层的沉积时间为20～60min。
9.如权利要求6所述的真空镀膜件的制备方法，其特征在于：该真空镀膜件的制备方法还包括在形成颜色层前在基体上磁控溅射一铬衬底层的步骤。
10.如权利要求9所述的真空镀膜件的制备方法，其特征在于：形成该铬衬底层的工艺参数为：氩气流量为100～500sccm，温度为120～180℃，公转转速为2.0～3.0rpm，偏压为-100～-500V，沉积时间为5～15min。
CN2010102354286A 2010-07-23 2010-07-23 真空镀膜件及其制备方法 Pending CN102337501A (zh)

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103302916A (zh) * 2012-03-16 2013-09-18 深圳富泰宏精密工业有限公司 镀膜件及其制备方法
CN104178737A (zh) * 2014-09-01 2014-12-03 苏州安洁科技股份有限公司 在金属表面通过改变气体达到改变颜色的膜层堆积的方法
CN104694878A (zh) * 2015-03-04 2015-06-10 温州大学 一种高分子材料制品的真空装饰镀膜工艺

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9012964B2 (en) 2013-08-09 2015-04-21 Taiwan Semiconductor Manufacturing Company, Ltd. Modulating germanium percentage in MOS devices
US10378876B2 (en) * 2015-06-19 2019-08-13 Wisconsin Alumni Research Foundation Piezoresistive strain sensors comprising electrically conducting networks in polymeric phase change materials

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101628492A (zh) * 2008-07-15 2010-01-20 比亚迪股份有限公司 一种镀膜材料及其制备方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3351485B2 (ja) * 1993-12-10 2002-11-25 富士通株式会社 位相シフトマスクの製造方法
EP1288174A4 (en) * 2000-04-28 2005-06-08 Asahi Glass Co Ltd GLASS COATED GLASS AND METHOD OF MANUFACTURING THEREOF WITH A HEAT-FINISHING, COLORED FILM
US6939475B2 (en) * 2001-08-31 2005-09-06 Daishinku Corporation Etching method, etched product formed by the same, and piezoelectric vibration device, method for producing the same
US7081301B2 (en) * 2003-10-14 2006-07-25 Guardian Industries Corp. Coated article with and oxide of silicon zirconium or zirconium yttrium oxide in overcoat, and/or niobium nitrude in ir reflecting layer
JP4729883B2 (ja) * 2003-10-31 2011-07-20 セイコーエプソン株式会社 基板の加工方法、マイクロレンズシートの製造方法、透過型スクリーン、プロジェクタ、表示装置並びに基板の加工装置
JP4881633B2 (ja) * 2006-03-10 2012-02-22 凸版印刷株式会社 クロムレス位相シフトマスク用フォトマスクブランク、クロムレス位相シフトマスク、及びクロムレス位相シフトマスクの製造方法
TW200745630A (en) * 2006-04-24 2007-12-16 Asahi Glass Co Ltd Blank, black matrix, and color filter
DE102008022792A1 (de) * 2008-05-08 2009-11-26 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Elektrostatisches Halteelement mit Antireflexbeschichtung, Vermessungsverfahren und Verwendung des Halteelementes

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101628492A (zh) * 2008-07-15 2010-01-20 比亚迪股份有限公司 一种镀膜材料及其制备方法

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
V.TEIXEIRA, ET AL.: "Chromium-based thin sputtered composite coatings for solar thermal collectors", 《VACUUM》 *
向远博等: "多弧离子镀Cr/Cr2O3薄膜红外及可见光谱特性", 《宇航材料工艺》 *
纪爱玲等: "电弧离子镀氧化铬涂层的组织结构及硬度", 《金属学报》 *

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103302916A (zh) * 2012-03-16 2013-09-18 深圳富泰宏精密工业有限公司 镀膜件及其制备方法
CN103302916B (zh) * 2012-03-16 2016-08-17 深圳富泰宏精密工业有限公司 镀膜件及其制备方法
CN104178737A (zh) * 2014-09-01 2014-12-03 苏州安洁科技股份有限公司 在金属表面通过改变气体达到改变颜色的膜层堆积的方法
CN104178737B (zh) * 2014-09-01 2017-12-01 苏州安洁科技股份有限公司 在金属表面通过改变气体达到改变颜色的膜层堆积的方法
CN104694878A (zh) * 2015-03-04 2015-06-10 温州大学 一种高分子材料制品的真空装饰镀膜工艺

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