CN102373414A - 真空镀膜件及其制造方法 - Google Patents
真空镀膜件及其制造方法 Download PDFInfo
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- C—CHEMISTRY; METALLURGY
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
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- C—CHEMISTRY; METALLURGY
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Abstract
本发明提供一种真空镀膜件。该真空镀膜件包括基体及形成于基体上的颜色层。该颜色层为ZrCN层,该颜色层呈现的色度区域于CIE LAB表色系统的L*坐标值介于28至32之间,a*坐标值介于-1至1之间,b*坐标值介于-1至1之间。本发明还提供一种上述真空镀膜件的制造方法。
Description
技术领域
本发明涉及一种真空镀膜件及其制造方法。
背景技术
真空镀膜技术是一个环保的成膜技术。以真空镀膜的方式所形成的膜层具有高硬度、高耐磨性、良好的化学稳定性、与基体结合牢固以及亮丽的金属外观等优点,因此真空镀膜在装饰性表面处理领域的应用越来越广。但真空镀膜技术也具有一定的局限性,在制造纯黑色膜层过程中容易出现异色、黑中带蓝或黑中带红等现象,如此严重影响了黑色膜层的美观。目前已见报道的黑色膜层L值(即明度值)最佳只能达到35左右,为了得到更纯的黑色继续降低膜层的L值存在较大难度。因此,开发一种L值较低的黑色镀膜件实为必要。
发明内容
有鉴于此,提供一种明度值较低的黑色的真空镀膜件。
另外,还提供一种上述真空镀膜件的制造方法。
一种真空镀膜件,包括基体及形成于基体上的颜色层,该颜色层为碳氮化锆层,该颜色层呈现的色度区域于CIE LAB表色系统的L*坐标值介于28至32之间,a*坐标值介于-1至1之间,b*坐标值介于-1至1之间。
一种真空镀膜件的制造方法,包括以下步骤:
提供基体;
在该基体上以磁控溅射的方式形成颜色层,该颜色层为碳氮化锆层,溅射时以锆靶及碳靶为靶材,并以氮气为反应气体,氮气的流量设置为50~150sccm,沉积时间为10~60min,所述颜色层呈现的色度区域于CIE LAB表色系统L*坐标值介于28至32之间,a*坐标值介于-1至1之间,b*坐标值介于-1至1之间。
上述真空镀膜件的制造方法,采用锆靶与碳靶作为靶材,通过对碳靶的电源功率、反应气体氮气的流量的控制以分别控制C元素、N元素的沉积量,从而实现所需的颜色层中各成分的比例关系及各成分间的微观键合结构,而使该颜色层的L*坐标介于28至32之间,呈现出纯正的黑色。以该方法所制得的真空镀膜件可呈现出具吸引力的纯黑色的金属外观。
附图说明
图1为本发明较佳实施例的真空镀膜件的剖视示意图。
主要元件符号说明
真空镀膜件 10
基体 11
衬底层 13
颜色层 15
具体实施方式
本发明的真空镀膜件可以为电子装置外壳,也可以为眼镜边框、钟表外壳、金属卫浴件及建筑用件。
图1所示的为本发明较佳实施例的真空镀膜件10,其包括一基体11、一衬底层13及一颜色层15。衬底层13直接与基体11结合,颜色层15形成于衬底层13的表面。
基体11的材质可以为金属、玻璃、陶瓷或塑料。
衬底层13形成于基体11与颜色层15之间,以增强颜色层15于基体11上的附着力。衬底层13可为一锆层或其它可提供附着效果的涂层。衬底层13的厚度大约为0.01~0.1μm。衬底层13的颜色以不影响颜色层颜色的色调为佳,比如可为银色、白色及灰白色等浅色调。
颜色层15为一碳氮化锆(ZrCN)层。该颜色层15呈现的色度区域于CIE LAB表色系统的L*坐标介于28至32之间,a*坐标介于-1至1之间,b*坐标介于-1至1之间,呈现出黑色。该颜色层15的厚度大约为0.3~1μm。
上述真空镀膜件10的制造方法主要包括如下步骤:
提供一基体11,并将基体11放入盛装有乙醇及/或丙酮溶液的超声波清洗器中进行震动清洗,以除去基体11表面的杂质和油污。清洗完毕后烘干备用。所述基体11的材质可以为金属、玻璃、陶瓷或塑料。
再对基体11的表面进行氩气等离子清洗,进一步去除基体11表面的油污,以改善基体11表面与后续涂层的结合力。对基体11的表面进行氩气等离子清洗的方法包括如下步骤:将基体11放入一中频磁控溅射镀膜机的真空室内的工件架上,抽真空该真空室至真空度为8.0×10-3Pa,以300~600sccm(标准状态毫升/分钟)的流量向真空室内通入纯度为99.999%的氩气,于基体11施加-300~-800V的偏压,对基体11表面进行等离子清洗,清洗时间为5~10min。
采用磁控溅射的方式在基体11上形成一衬底层13。该衬底层13为一锆层。形成该衬底层13的具体操作方法及工艺参数为:在所述等离子清洗完成后,调节氩气(工作气体)流量至10~200sccm,加热该真空室至50~180℃(即溅射温度为50~180℃),并设置工件架的公转转速为1~4rpm,优选为3rpm;开启已置于中频磁控溅射镀膜机中的一锆靶的电源,设置锆靶的电源功率为5~11kw,并对基体11施加-50~-200V的偏压,沉积衬底层13。沉积该衬底层13的时间为3~10min。
形成该衬底层13后,向真空室内通入50~150sccm的纯度为99.999%的氮气(反应气体),施加-50~-200V的偏压于基体11上;同时开启所述锆靶与一碳靶,对基体11继续镀膜,以在衬底层13上镀覆一颜色层15,该颜色层15为一ZrCN层。沉积该颜色层15的时间为10~60min。其中,所述锆靶的电源功率设置为5~11kw,所述碳靶的电源功率设置为8~11kw。
所述颜色层15呈现的色度区域于CIE LAB表色系统的L*坐标介于28至32之间,a*坐标介于-1至1之间,b*坐标介于-1至1之间,呈现出黑色。
上述真空镀膜件的制造方法,采用锆靶与碳靶作为靶材,通过对碳靶的电源功率、反应气体氮气的流量的控制以分别控制C元素、N元素的沉积量,从而实现所需的颜色层15中各成分的比例关系及各成分间的微观键合结构,而使该颜色层15的L*坐标介于28至32之间,呈现出纯正的黑色。同时,通过选择合适的偏压,控制锆原子、碳原子及氮原子的沉积速率,可增强颜色层15的致密性。另外,选择合适的偏压及氮气的流量,能够保证较高的沉积速率,从而可进一步提高该真空镀膜件10的生产效率。
Claims (10)
1.一种真空镀膜件,包括基体及形成于基体上的颜色层,其特征在于:该颜色层为碳氮化锆层,该颜色层呈现的色度区域于CIELAB表色系统的L*坐标值介于28至32之间,a*坐标值介于-1至1之间,b*坐标值介于-1至1之间。
2.如权利要求1所述的真空镀膜件,其特征在于:所述颜色层的厚度为0.3~1μm。
3.如权利要求1所述的真空镀膜件,其特征在于:该真空镀膜件还包括形成于基体与颜色层之间的衬底层,该衬底层为锆层。
4.如权利要求3所述的真空镀膜件,其特征在于:该衬底层的厚度为0.01~0.1μm。
5.如权利要求1所述的真空镀膜件,其特征在于:该基体的材质为金属、玻璃、陶瓷及塑料中的一种。
6.一种真空镀膜件的制造方法,包括以下步骤:
提供基体;
在该基体上以磁控溅射的方式形成颜色层,该颜色层为碳氮化锆层,溅射时以锆靶及碳靶为靶材,并以氮气为反应气体,氮气的流量设置为50~150sccm,沉积时间为10~60min,所述颜色层呈现的色度区域于CIE LAB表色系统L*坐标值介于28至32之间,a*坐标值介于-1至1之间,b*坐标值介于-1至1之间。
7.如权利要求6所述的真空镀膜件的制造方法,其特征在于:在形成该颜色层的过程中,对基体施加-50~-200V的偏压。
8.如权利要求7所述的真空镀膜件的制造方法,其特征在于:该颜色层的厚度为0.3~1μm。
9.如权利要求6所述的真空镀膜件的制造方法,其特征在于:该真空镀膜件的制造方法还包括在形成颜色层前在基体上镀覆锆衬底层的步骤。
10.如权利要求9所述的真空镀膜件的制造方法,其特征在于:形成该锆衬底层以锆靶为靶材,设置锆靶的电源功率为5~11kw,以氩气为工作气体,其流量为10~200sccm,溅射温度为50~180℃,公转转速为1~4rpm,对基体施加的偏压为-50~-200V,沉积时间为3~10min。
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CN114277351A (zh) * | 2022-03-03 | 2022-04-05 | 中南大学湘雅医院 | 一种涂层材料及其应用 |
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CN1268535A (zh) * | 1999-03-01 | 2000-10-04 | 莫恩股份有限公司 | 耐腐蚀和耐磨的装饰涂层 |
CN101516615A (zh) * | 2006-09-25 | 2009-08-26 | 西铁城控股株式会社 | 装饰部件及其制造方法 |
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US5759677A (en) * | 1996-06-11 | 1998-06-02 | Moec Incorporated | Article of manufacture having at least in part the surface appearance of brass with a ceramic barrier coating |
US8431188B2 (en) * | 2005-02-17 | 2013-04-30 | Suneeta Neogi | Abrasion resistant coatings with color component for gemstones and such |
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CN101516615A (zh) * | 2006-09-25 | 2009-08-26 | 西铁城控股株式会社 | 装饰部件及其制造方法 |
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