TWI485171B - 嵌段共聚物及其相關方法 - Google Patents
嵌段共聚物及其相關方法 Download PDFInfo
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- TWI485171B TWI485171B TW102104342A TW102104342A TWI485171B TW I485171 B TWI485171 B TW I485171B TW 102104342 A TW102104342 A TW 102104342A TW 102104342 A TW102104342 A TW 102104342A TW I485171 B TWI485171 B TW I485171B
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Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F297/00—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer
- C08F297/02—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type
- C08F297/026—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type polymerising acrylic acid, methacrylic acid or derivatives thereof
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L53/00—Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/02—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F230/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal
- C08F230/04—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal
- C08F230/08—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal containing silicon
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
- C08L33/04—Homopolymers or copolymers of esters
- C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
- C08L33/10—Homopolymers or copolymers of methacrylic acid esters
- C08L33/12—Homopolymers or copolymers of methyl methacrylate
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L43/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing boron, silicon, phosphorus, selenium, tellurium or a metal; Compositions of derivatives of such polymers
- C08L43/04—Homopolymers or copolymers of monomers containing silicon
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- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
- C09D133/04—Homopolymers or copolymers of esters
- C09D133/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
- C09D133/10—Homopolymers or copolymers of methacrylic acid esters
- C09D133/12—Homopolymers or copolymers of methyl methacrylate
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
- B29K2995/00—Properties of moulding materials, reinforcements, fillers, preformed parts or moulds
- B29K2995/0018—Properties of moulding materials, reinforcements, fillers, preformed parts or moulds having particular optical properties, e.g. fluorescent or phosphorescent
- B29K2995/0026—Transparent
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29L—INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
- B29L2031/00—Other particular articles
- B29L2031/30—Vehicles, e.g. ships or aircraft, or body parts thereof
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- Manufacturing & Machinery (AREA)
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- Wood Science & Technology (AREA)
- Graft Or Block Polymers (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
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Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US13/370,588 US8697810B2 (en) | 2012-02-10 | 2012-02-10 | Block copolymer and methods relating thereto |
Publications (2)
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|---|---|
| TW201335205A TW201335205A (zh) | 2013-09-01 |
| TWI485171B true TWI485171B (zh) | 2015-05-21 |
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| TW102104342A TWI485171B (zh) | 2012-02-10 | 2013-02-05 | 嵌段共聚物及其相關方法 |
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| JP (1) | JP6120591B2 (enExample) |
| KR (1) | KR101940011B1 (enExample) |
| CN (1) | CN103289285B (enExample) |
| TW (1) | TWI485171B (enExample) |
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| WO2014111292A1 (en) | 2013-01-18 | 2014-07-24 | Basf Se | Acrylic dispersion-based coating compositions |
| US9382444B2 (en) * | 2013-06-24 | 2016-07-05 | Dow Global Technologies Llc | Neutral layer polymers, methods of manufacture thereof and articles comprising the same |
| FR3010414B1 (fr) * | 2013-09-09 | 2015-09-25 | Arkema France | Procede d'obtention de films epais nano-structures obtenus a partir d'une composition de copolymeres a blocs |
| CN105916904B (zh) | 2013-12-06 | 2018-11-09 | 株式会社Lg化学 | 嵌段共聚物 |
| JP6432847B2 (ja) | 2013-12-06 | 2018-12-05 | エルジー・ケム・リミテッド | ブロック共重合体 |
| EP3078686B1 (en) * | 2013-12-06 | 2018-10-31 | LG Chem, Ltd. | Block copolymer |
| JP6402867B2 (ja) | 2013-12-06 | 2018-10-10 | エルジー・ケム・リミテッド | ブロック共重合体 |
| US10202480B2 (en) | 2013-12-06 | 2019-02-12 | Lg Chem, Ltd. | Block copolymer |
| WO2015084120A1 (ko) | 2013-12-06 | 2015-06-11 | 주식회사 엘지화학 | 단량체 및 블록 공중합체 |
| EP3078695B1 (en) | 2013-12-06 | 2020-11-04 | LG Chem, Ltd. | Block copolymer |
| WO2015084133A1 (ko) | 2013-12-06 | 2015-06-11 | 주식회사 엘지화학 | 블록 공중합체 |
| CN105899560B (zh) | 2013-12-06 | 2018-01-12 | 株式会社Lg化学 | 嵌段共聚物 |
| CN105934454B (zh) | 2013-12-06 | 2019-01-18 | 株式会社Lg化学 | 嵌段共聚物 |
| CN105934455B (zh) | 2013-12-06 | 2019-01-18 | 株式会社Lg化学 | 嵌段共聚物 |
| US10239980B2 (en) | 2013-12-06 | 2019-03-26 | Lg Chem, Ltd. | Block copolymer |
| JP6361893B2 (ja) | 2013-12-06 | 2018-07-25 | エルジー・ケム・リミテッド | ブロック共重合体 |
| EP3078685B1 (en) | 2013-12-06 | 2020-09-09 | LG Chem, Ltd. | Block copolymer |
| JP6702649B2 (ja) * | 2013-12-31 | 2020-06-03 | ローム アンド ハース エレクトロニック マテリアルズ エルエルシーＲｏｈｍ ａｎｄ Ｈａａｓ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ ＬＬＣ | ブロックコポリマーの性質を制御する方法及びブロックコポリマーから製造された物品 |
| JP6558894B2 (ja) | 2013-12-31 | 2019-08-14 | ローム アンド ハース エレクトロニック マテリアルズ エルエルシーＲｏｈｍ ａｎｄ Ｈａａｓ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ ＬＬＣ | コポリマーの設計、その製造方法およびそれを含む物品 |
| JP2015129261A (ja) * | 2013-12-31 | 2015-07-16 | ローム アンド ハース エレクトロニック マテリアルズ エルエルシーＲｏｈｍ ａｎｄ Ｈａａｓ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ ＬＬＣ | ブロックコポリマーのアニール方法およびブロックコポリマーから製造する物品 |
| FR3017395B1 (fr) * | 2014-02-11 | 2017-11-03 | Arkema France | Procede de controle de l'energie de surface d'un substrat |
| JP6394042B2 (ja) | 2014-02-13 | 2018-09-26 | Jsr株式会社 | パターン形成用組成物及びパターン形成方法 |
| CN107075051B (zh) | 2014-09-30 | 2019-09-03 | 株式会社Lg化学 | 嵌段共聚物 |
| WO2016053000A1 (ko) | 2014-09-30 | 2016-04-07 | 주식회사 엘지화학 | 블록 공중합체 |
| US10281820B2 (en) | 2014-09-30 | 2019-05-07 | Lg Chem, Ltd. | Block copolymer |
| WO2016053005A1 (ko) | 2014-09-30 | 2016-04-07 | 주식회사 엘지화학 | 블록 공중합체 |
| WO2016052994A1 (ko) | 2014-09-30 | 2016-04-07 | 주식회사 엘지화학 | 블록 공중합체 |
| WO2016053009A1 (ko) | 2014-09-30 | 2016-04-07 | 주식회사 엘지화학 | 블록 공중합체 |
| WO2016053001A1 (ko) | 2014-09-30 | 2016-04-07 | 주식회사 엘지화학 | 블록 공중합체 |
| WO2016053014A1 (ko) | 2014-09-30 | 2016-04-07 | 주식회사 엘지화학 | 패턴화 기판의 제조 방법 |
| EP3203497B1 (en) | 2014-09-30 | 2023-11-29 | LG Chem, Ltd. | Method for producing patterned substrate |
| US10377894B2 (en) | 2014-09-30 | 2019-08-13 | Lg Chem, Ltd. | Block copolymer |
| US9505945B2 (en) * | 2014-10-30 | 2016-11-29 | Az Electronic Materials (Luxembourg) S.A.R.L. | Silicon containing block copolymers for direct self-assembly application |
| WO2016133115A1 (ja) * | 2015-02-20 | 2016-08-25 | Jsr株式会社 | 自己組織化膜の形成方法、パターン形成方法及び自己組織化膜形成用組成物 |
| JP6413888B2 (ja) | 2015-03-30 | 2018-10-31 | Jsr株式会社 | パターン形成用組成物、パターン形成方法及びブロック共重合体 |
| TW201700595A (zh) | 2015-04-01 | 2017-01-01 | Jsr Corp | 圖案形成用組成物及圖案形成方法 |
| KR101910147B1 (ko) * | 2015-05-27 | 2018-10-19 | 주식회사 엘지화학 | 가교성 조성물 |
| CN105384952B (zh) * | 2015-09-15 | 2018-01-23 | 北京航空航天大学 | 一种利用机械剪切力对嵌段共聚物自组装取向的调控方法 |
| EP3275909A1 (en) | 2016-07-27 | 2018-01-31 | Clariant Plastics & Coatings Ltd | Novel polyacrylate-polysilane block copolymers |
| CN106478975B (zh) * | 2016-10-21 | 2019-10-25 | 苏州科技大学 | 双功能嵌段聚合物的制备方法及其改性聚偏氟乙烯微滤膜的方法 |
| KR102183698B1 (ko) * | 2016-11-30 | 2020-11-26 | 주식회사 엘지화학 | 고분자막의 제조 방법 |
| FR3089982A1 (fr) * | 2018-12-12 | 2020-06-19 | Arkema France | Procédé de fabrication d’un copolymère à blocs contenant du silicium |
| US11920023B2 (en) | 2022-04-28 | 2024-03-05 | Rohm And Haas Electronic Materials Llc. | Composite materials for dielectric applications |
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| US20050113475A1 (en) | 2002-02-19 | 2005-05-26 | Haruo Nishida | Preparation of copolymers by gas phase polymerization |
| JP2005008701A (ja) * | 2003-06-17 | 2005-01-13 | Ube Ind Ltd | 高分子膜及びその作製方法 |
| US20070254169A1 (en) | 2006-04-28 | 2007-11-01 | Kamins Theodore I | Structures including organic self-assembled monolayers and methods of making the structures |
| JP4673266B2 (ja) * | 2006-08-03 | 2011-04-20 | 日本電信電話株式会社 | パターン形成方法及びモールド |
| ES2483944T3 (es) * | 2007-12-28 | 2014-08-08 | Bridgestone Corporation | Interpolímeros que contienen unidades méricas de isobutileno y dieno |
| JP4654280B2 (ja) * | 2008-08-28 | 2011-03-16 | 株式会社日立製作所 | 微細構造体の製造方法 |
| US8247033B2 (en) | 2008-09-19 | 2012-08-21 | The University Of Massachusetts | Self-assembly of block copolymers on topographically patterned polymeric substrates |
| US7560141B1 (en) | 2008-11-11 | 2009-07-14 | International Business Machines Corporation | Method of positioning patterns from block copolymer self-assembly |
| US8349203B2 (en) | 2009-09-04 | 2013-01-08 | International Business Machines Corporation | Method of forming self-assembled patterns using block copolymers, and articles thereof |
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- 2012-02-10 US US13/370,588 patent/US8697810B2/en active Active
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2013
- 2013-02-05 JP JP2013020118A patent/JP6120591B2/ja active Active
- 2013-02-05 TW TW102104342A patent/TWI485171B/zh active
- 2013-02-08 KR KR1020130014258A patent/KR101940011B1/ko active Active
- 2013-02-08 CN CN201310209165.5A patent/CN103289285B/zh active Active
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| TW201116933A (en) * | 2009-11-10 | 2011-05-16 | Fujifilm Corp | Curable composition for imprints, patterning method and pattern |
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| Hiroshi Yoshida, et al,"Directed Self-assembly with Density Mmultiplication of Cage Silsesquioxane-containing Block Copolymer via Controlled Solvent Annealing"Journal of Photopolymer Science and Technology,page 577~580,May 20,2011 * |
Also Published As
| Publication number | Publication date |
|---|---|
| KR101940011B1 (ko) | 2019-01-18 |
| US20130209693A1 (en) | 2013-08-15 |
| KR20130092489A (ko) | 2013-08-20 |
| US8697810B2 (en) | 2014-04-15 |
| JP2013166932A (ja) | 2013-08-29 |
| CN103289285A (zh) | 2013-09-11 |
| JP6120591B2 (ja) | 2017-04-26 |
| TW201335205A (zh) | 2013-09-01 |
| CN103289285B (zh) | 2016-03-30 |
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