TWI481448B - 工件載具裝置 - Google Patents

工件載具裝置 Download PDF

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Publication number
TWI481448B
TWI481448B TW097138355A TW97138355A TWI481448B TW I481448 B TWI481448 B TW I481448B TW 097138355 A TW097138355 A TW 097138355A TW 97138355 A TW97138355 A TW 97138355A TW I481448 B TWI481448 B TW I481448B
Authority
TW
Taiwan
Prior art keywords
workpiece
workpiece carrier
drive
axis
carrier device
Prior art date
Application number
TW097138355A
Other languages
English (en)
Chinese (zh)
Other versions
TW200936249A (en
Inventor
史帝芬伊瑟
馬丁薩屈
Original Assignee
歐瑞康貿易特魯貝屈股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 歐瑞康貿易特魯貝屈股份有限公司 filed Critical 歐瑞康貿易特魯貝屈股份有限公司
Publication of TW200936249A publication Critical patent/TW200936249A/zh
Application granted granted Critical
Publication of TWI481448B publication Critical patent/TWI481448B/zh

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
    • B23Q1/00—Members which are comprised in the general build-up of a form of machine, particularly relatively large fixed members
    • B23Q1/25—Movable or adjustable work or tool supports
    • B23Q1/64—Movable or adjustable work or tool supports characterised by the purpose of the movement
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16H—GEARING
    • F16H21/00—Gearings comprising primarily only links or levers, with or without slides
    • F16H21/10—Gearings comprising primarily only links or levers, with or without slides all movement being in, or parallel to, a single plane
    • F16H21/12—Gearings comprising primarily only links or levers, with or without slides all movement being in, or parallel to, a single plane for conveying rotary motion
    • F16H21/14—Gearings comprising primarily only links or levers, with or without slides all movement being in, or parallel to, a single plane for conveying rotary motion by means of cranks, eccentrics, or like members fixed to one rotary member and guided along tracks on the other
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/30—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
    • H10P72/32—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations between different workstations
    • H10P72/3212—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations between different workstations the substrates to be conveyed not being semiconductor wafers or large planar substrates, e.g. chips or lead frames

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Retarders (AREA)
  • Gear Transmission (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
  • Grinding Of Cylindrical And Plane Surfaces (AREA)
  • Specific Conveyance Elements (AREA)
  • Physical Vapour Deposition (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Agricultural Machines (AREA)
  • Soil Working Implements (AREA)
TW097138355A 2007-10-08 2008-10-06 工件載具裝置 TWI481448B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP07405302A EP2048263B1 (de) 2007-10-08 2007-10-08 Werkstückträgereinrichtung

Publications (2)

Publication Number Publication Date
TW200936249A TW200936249A (en) 2009-09-01
TWI481448B true TWI481448B (zh) 2015-04-21

Family

ID=38982780

Family Applications (1)

Application Number Title Priority Date Filing Date
TW097138355A TWI481448B (zh) 2007-10-08 2008-10-06 工件載具裝置

Country Status (14)

Country Link
US (2) US8596626B2 (https=)
EP (2) EP2048263B1 (https=)
JP (1) JP5497647B2 (https=)
KR (1) KR20100071057A (https=)
CN (1) CN101827955B (https=)
AT (1) ATE503858T1 (https=)
BR (1) BRPI0818592A2 (https=)
DE (1) DE502007006849D1 (https=)
ES (1) ES2362016T3 (https=)
MX (1) MX2010003727A (https=)
PL (2) PL2336387T3 (https=)
RU (1) RU2485211C2 (https=)
TW (1) TWI481448B (https=)
WO (1) WO2009046928A1 (https=)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
PL2336387T3 (pl) * 2007-10-08 2014-01-31 Oerlikon Trading Ag Urządzenie nośne do przedmiotów obrabianych
DE102010001218A1 (de) 2010-01-26 2011-07-28 Esser, Stefan, Dr.-Ing., 52072 Substratteller und Beschichtungsanlage zum Beschichten von Substraten
SG10201601693VA (en) * 2011-03-17 2016-04-28 Sulzer Metco Ag Component manipulator for the dynamic positioning of a substrate, coating method, as well as use of a component manipulator
SG11201402975SA (en) * 2011-12-08 2014-10-30 Praxair Technology Inc Multifuntion tooling fixture assembly for use in a coating related operations
RU2625698C1 (ru) * 2016-08-29 2017-07-18 Федеральное государственное унитарное предприятие "Всероссийский научно-исследовательский институт авиационных материалов" (ФГУП "ВИАМ") Способ нанесения защитных покрытий и устройство для его осуществления
CN107740063B (zh) * 2017-11-16 2024-07-23 东莞市赢心科技有限公司 真空镀铝设备用工件承载结构
KR101869401B1 (ko) * 2018-01-04 2018-07-20 홍성신 초정밀 선반의 공작물 자동 교환장치
RU2688353C1 (ru) * 2018-08-09 2019-05-21 Российская Федерация, от имени которой выступает Государственная корпорация по атомной энергии "Росатом" (Госкорпорация "Росатом") Устройство перемещения и вращения подложкодержателя
DE102018126862A1 (de) * 2018-10-26 2020-04-30 Oerlikon Surface Solutions Ag, Pfäffikon Werkstückträgereinrichtung und Beschichtungsanordnung
DE102019110158A1 (de) * 2019-04-17 2020-10-22 Oerlikon Surface Solutions Ag, Pfäffikon Werkstückträgereinrichtung
EP3966854A1 (en) 2019-05-07 2022-03-16 Oerlikon Surface Solutions AG, Pfäffikon Movable work piece carrier device for holding work pieces to be treated
JP7756002B2 (ja) 2019-07-26 2025-10-17 エリコン サーフェス ソリューションズ アーゲー、 プフェフィコン Ｐｖｄプロセスで使用される円筒状の伸長基材用の固定具
CN114271649B (zh) * 2021-12-27 2022-11-25 西南民族大学 一种艺术作品展示设备

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6620254B2 (en) * 1998-12-15 2003-09-16 Unaxis Balzers Ag Planetary system workpiece support and method for surface treatment of workpieces
US20040016406A1 (en) * 2000-11-14 2004-01-29 Oleg Siniaguine Plasma processing comprising three rotational motions of an article being processed
US20070057138A1 (en) * 2005-08-29 2007-03-15 Stefan Esser Workpiece carrier device

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SU370279A1 (ru) * 1969-08-21 1973-02-15 УСТРОЙСТВО дл ТРАНСПОРТИРОВКИ и СМЕНЫ ПОДЛОЖЕК в ВАКУУМНЫХ УСТАНОВКАХ
JPH01288652A (ja) * 1988-05-17 1989-11-20 Komatsu Ltd 減速機
SU1828669A3 (ru) * 1990-11-13 1995-05-27 Владимир Васильевич Кульпинов Устройство для обработки изделий в вакууме
DE19803278C2 (de) 1998-01-29 2001-02-01 Bosch Gmbh Robert Werkstückträger und dessen Verwendung zur Behandlung und Beschichtung von Werkstücken
DE10308471B4 (de) 2003-02-20 2005-03-24 Hensoldt Ag Beschichtungsanlage zum Beschichten von Substraten für optische Komponenten
CN1865495A (zh) * 2005-05-20 2006-11-22 中国科学院半导体研究所 金属有机物化学气相淀积设备反应室中的公转自转机构
US7988787B2 (en) * 2007-08-27 2011-08-02 Caterpillar Inc. Workpiece support system and method
PL2336387T3 (pl) * 2007-10-08 2014-01-31 Oerlikon Trading Ag Urządzenie nośne do przedmiotów obrabianych

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6620254B2 (en) * 1998-12-15 2003-09-16 Unaxis Balzers Ag Planetary system workpiece support and method for surface treatment of workpieces
US20040016406A1 (en) * 2000-11-14 2004-01-29 Oleg Siniaguine Plasma processing comprising three rotational motions of an article being processed
US20070057138A1 (en) * 2005-08-29 2007-03-15 Stefan Esser Workpiece carrier device

Also Published As

Publication number Publication date
DE502007006849D1 (de) 2011-05-12
US20100270722A1 (en) 2010-10-28
US8783673B2 (en) 2014-07-22
EP2048263A1 (de) 2009-04-15
US8596626B2 (en) 2013-12-03
JP5497647B2 (ja) 2014-05-21
RU2485211C2 (ru) 2013-06-20
ES2362016T3 (es) 2011-06-27
CN101827955A (zh) 2010-09-08
CN101827955B (zh) 2012-11-07
EP2336387A1 (de) 2011-06-22
TW200936249A (en) 2009-09-01
BRPI0818592A2 (pt) 2017-06-13
PL2048263T3 (pl) 2011-09-30
WO2009046928A1 (en) 2009-04-16
EP2336387B1 (de) 2013-09-04
JP2011502211A (ja) 2011-01-20
MX2010003727A (es) 2010-04-21
ATE503858T1 (de) 2011-04-15
EP2048263B1 (de) 2011-03-30
RU2010113596A (ru) 2011-11-20
PL2336387T3 (pl) 2014-01-31
KR20100071057A (ko) 2010-06-28
US20140008857A1 (en) 2014-01-09

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