TWI475595B - Substrate transfer apparatus - Google Patents

Description

Substrate transport device

The present invention relates to a substrate transfer apparatus including a coating apparatus that applies a treatment liquid to a substrate to be processed on a floating platform.

In a photolithography process such as a flat panel display (FPD) process such as an LCD, a non-spin coating method is often used to apply light to a substrate to be processed (a glass substrate or the like) using a long slit nozzle including a slit-shaped outflow port. Blocking liquid.

As one form of such a non-rotation coating method, a floating manner is known to assemble a substrate floating mechanism on a platform for supporting a substrate, and the substrate is floated to the air in a horizontal direction on the floating platform (platform length) In the side direction, the photoresist is sprayed from one end to the other end of the substrate from a slit nozzle provided above the platform at a predetermined position during transport to the substrate through the substrate directly under the substrate.

In the non-rotation coating method of the related floating method, in order to uniformly form a photoresist coating film on the substrate in accordance with the set film thickness, it is required to provide a slit between the slit nozzle outflow port and the substrate, usually a small gap of about 100 μm. Precisely maintained at or near the set point.

In order to meet this requirement, the non-spin coating method of the floating coating method is not only disposed at a predetermined density in a substantially entire area of the floating platform, but also a plurality of high-pressure or positive-pressure gases, such as air outlets, and floats. The coating area set as the area immediately below the slit nozzle and the front and rear areas of the lifting platform is such that the suction port for taking in air by the negative pressure is mixed between the discharge ports. Further, in the coating region, the substrate is passed therethrough, and the vertical upward pressure applied from the discharge port is balanced with the vertical downward pressure applied from the suction port, and the floating pressure applied to the substrate is finely controlled to cause the substrate to be lifted. The floating height is in accordance with a set value (for example, 50 μm) (for example, Patent Document 1).

[Previous Technical Literature]

[Patent Literature]

[Patent Document 1] Japanese Special Opening 2007-190483

Although the above-described photoresist coating device operates in a clean room, even if the photoresist coating device is exposed to minute particles, it is often exposed to foreign matter such as relatively large dust or debris. These foreign objects drift in the air, or are carried out from the outside during maintenance, or during maintenance work, sometimes due to substrate cracking or film peeling.

In any case, in the photoresist coating apparatus of the non-rotation coating method using the floating method as described above, the suction port of the floating platform coating area sometimes inadvertently sucks foreign matter floating around it, thereby causing the suction port to be Blocked by foreign matter. Once the suction port is clogged, the suction port of the suction port cannot reach the substrate passing therethrough.

Typically, there are thousands or more suction ports in the application area of the floating platform. Although even if one or two of the pluggings have no effect on the overall suction force, if about several hundred suction ports are blocked, the overall suction force is significantly reduced. Even if the suction port is only about tens of, if it is concentrated in the narrow range, the balance between the buoyancy from the discharge port and the gravity from the suction port will collapse in the vicinity, and the substrate float height may sometimes be local. The ground is higher than the set value. In the coating region (especially in the vicinity of the slit nozzle), if the substrate floating height is locally higher than the set value, the film thickness of the photoresist coating film formed on the substrate may fluctuate, thereby reducing the accuracy of photolithography and Reliability.

In the past, in order to remove the clogging of the suction port in the above-mentioned floating platform, the method of cleaning the suction port by disassembling the floating platform is adopted, or the suction head of the external vacuum cleaner is pressed against the upper surface of the floating platform, and the suction is performed from above. A method of blocking foreign matter in the suction port to remove the foreign matter.

However, the dismantling and cleaning method is very troublesome, and the people who need it are very laborious, and the working time, that is, the long recovery time, is also disgusted. Moreover, the use of an external vacuum cleaner has the disadvantage that the lifting head is easily damaged by the suction head against the floating platform, or that the cleaning method is not disassembled, but still requires manual work.

In the past, there was no mechanism or function for checking whether the suction port of the floating platform was blocked. Therefore, when the thickness of the photoresist coating film is affected by the clogging of the suction port, it may take time to find out the cause. On the other hand, by disassembling or cleaning as described above When the department sweeps frequently and regularly performs regular maintenance in a short period of time, it will cause people's labor to be very expensive and reduce the device actuation rate.

In order to solve the problems of the above-mentioned prior art, the present invention provides a substrate transporting apparatus including a coating apparatus which can automatically and efficiently perform the operation of removing the clogging of the suction port in the floating platform at any time or in a timely manner in the apparatus.

In the substrate transfer device of the present invention, the coating device includes a floating platform having a first floating region in which a plurality of discharge ports and a plurality of suction ports are provided, and a first gas supply portion is a gas discharged from the discharge port. The pressure raises the substrate to be processed, and supplies a positive pressure gas to the discharge port; and sucks the exhaust portion to control the floating height of the substrate by the suction force of the suction gas through the suction port, and gives the suction port a negative pressure a transport mechanism that transports the substrate floating in the air on the floating platform and passes through the first floating region; and the processing liquid supply portion is disposed above the first floating region The nozzle supplies the processing liquid from the nozzle on the substrate passing through the first floating region; and the second air supply portion sweeps the suction port to supply the positive pressure gas to the suction port.

In the above configuration, the suction port provided in the first floating region of the floating platform may inadvertently suck in foreign matter floating around the floating platform during the suction operation (mainly during the coating process), thus causing The suction port is blocked by foreign matter. However, according to the present invention, when the coating process is stopped, or during the idle time of the coating process, the suction/exhaust portion is stopped and the second air supply portion is actuated, whereby the pumping can be automatically and efficiently removed without human intervention. The mouthpiece is blocked.

A substrate transfer apparatus comprising: a floating platform including a first floating region in which a plurality of discharge ports and a plurality of suction ports are provided; and a first gas supply portion is caused by gas pressure ejected from the discharge port Processing the substrate to rise, and supplying a positive pressure gas to the discharge port; Pumping the exhaust portion to control the floating height of the substrate by the suction force of the suction gas through the suction port, and giving the suction port a negative pressure; the transport mechanism is transported, and the raft will float on the floating platform to The substrate is held in the air and passed through the first floating region; the second air supply portion sweeps the suction port, and the positive pressure gas is supplied to the suction port; and the planar adsorption portion is During the period in which the second air supply unit is actuated, a part or all of the first floating region is coated thereon, and foreign matter in the gas ejected from the suction port is adsorbed; wherein the planar adsorption portion is raised The platform is transported by the transport mechanism in the same manner as the substrate, and is carried to the first floating region immediately before or after the start of the second air supply portion, and is actuated in the second air supply portion. After the end, it is carried out from the first floating area.

A substrate transporting apparatus comprising: a floating platform including a first floating region in which a plurality of discharge ports and a plurality of suction ports are provided; and a first air supply portion is caused by gas pressure ejected from the discharge port Processing the substrate to rise, supplying a positive pressure gas to the discharge port; and sucking the exhaust portion to control the floating height of the substrate by the suction force of the suction gas through the suction port, and giving the suction port a negative pressure; Carrying, transporting the substrate floating up to the air on the floating platform and passing it through the first floating region; the second air supply portion sweeping the suction port to the suction a positive pressure gas is supplied to the port; and the floating height control unit controls at least one of a gas pressure supplied from the first air supply unit to the discharge port and a vacuum pressure applied to the suction port from the suction and exhaust unit.浮 the floating height of the substrate in the first floating region is consistent with the floating height setting value; The floating height monitoring unit optically monitors the substrate by traversing the light beam on the floating platform at a predetermined height corresponding to the set value of the floating height in a horizontal direction orthogonal to the substrate transport direction. And a suction port clogging detecting unit, wherein the floating height monitoring unit detects that the floating height of the substrate periodically exceeds an allowable value when the beam crosses the transmission path, and determines that the beam is directly below or A portion of the suction port near it is blocked.

A substrate transfer device comprising: a floating platform including a first floating region in which a plurality of discharge ports and a plurality of suction ports are provided; and a first gas supply portion is caused by gas pressure ejected from the discharge port Processing the substrate to rise, supplying a positive pressure gas to the discharge port; and sucking the exhaust portion to control the floating height of the substrate by the suction force of the suction gas through the suction port, and giving the suction port a negative pressure; Carrying, transporting the substrate floating up to the air on the floating platform and passing it through the first floating region; the second air supply portion sweeping the suction port to the suction a positive pressure gas is supplied to the port; wherein when the suction port is swept, the second air supply unit is actuated to eject the gas from the suction port, and the first air supply unit is also actuated from the discharge port. The gas is ejected; and the pressure of the gas supplied to the suction port by the second air supply portion is higher than the pressure of the gas supplied to the discharge port by the first air supply portion.

4. The substrate transfer device according to any one of the items 1 to 3, further comprising a planar suction portion for covering a portion of the first floating region from above during operation of the second air supply portion or All, the foreign matter mixed in the gas ejected from the suction port is sucked.

5. The substrate transporting apparatus according to the first or second aspect, wherein the second air supply unit is actuated by the state in which the first air supply unit is stopped or stopped when the suction port is swept, and the pumping unit is actuated The suction port allows the gas to be ejected.

The substrate transfer device according to any one of the items 1 to 3, wherein the second air supply unit includes a positive pressure gas supply source common to the first air supply unit.

[7] The substrate transfer device according to Item 6, wherein the first gas supply unit includes a first gas supply line extending from the positive pressure gas supply source to the discharge port, and the suction and exhaust unit includes a negative pressure generation source. And an exhaust line extending from the negative pressure generating source to the suction port, the second air supply portion including a second air supply extending from a first node on the air supply line to a second node on the exhaust line Pipeline.

8. The substrate transfer device of item 7, wherein at least one of the first and second nodes is provided with a switching valve.

9. The substrate transport apparatus according to item 6, wherein the second air supply unit includes a second air supply line extending from the positive pressure gas supply source to a predetermined node on the exhaust line.

10. The substrate transport device of item 9, wherein the switching valve is provided at the node.

11. The substrate transfer device of item 7, wherein the opening and closing valve is provided on the second gas supply line.

[12] The substrate transfer device of item 11, wherein the second gas supply line has a compression groove for compressing a positive pressure gas from the positive pressure gas supply source, and intermittently and impactably supplies the suction port The positive pressure gas is compressed by the compression groove.

The substrate transfer device according to the first aspect, wherein the second air supply unit includes a positive pressure gas supply source different from the positive pressure gas supply source used by the first air supply unit.

[14] The substrate transfer device of the first aspect, wherein the suction port provided in the first floating region is divided into a plurality of arrays, and when the second air supply portion is actuated, time division is performed in units of groups. In order to sweep the suction port.

[15] The substrate transfer device of the first aspect, wherein the floating platform has a second floating region on the upstream side of the first floating region in the substrate transporting direction, and the second floating region is provided to float the substrate Most of the spouts.

16. The substrate transfer device according to item 15, wherein the second floating region is provided with a feeding portion for feeding the substrate.

17. The substrate transport apparatus according to Item 1, wherein the floating platform has a third floating region on a downstream side of the first floating region along a substrate transporting direction, and the third floating region is provided to float the substrate Most of the spouts.

18. The substrate transfer device according to item 17, wherein a delivery portion for feeding the substrate is provided in the third floating region.

According to the coating apparatus in the substrate transfer apparatus of the present invention, by the above-described configuration and action, the operation of removing the suction port clogging in the floating platform can be automatically and efficiently performed in the apparatus at any time or in a timely manner.

Hereinafter, preferred embodiments of the present invention will be described with reference to the accompanying drawings.

1 and 2 show the main components of a photoresist coating apparatus in a substrate transfer apparatus according to an embodiment of the present invention. Figure 1 is a schematic plan view, and Figure 2 is a front elevational view of the substrate transport direction.

The photoresist coating device adopts a non-spin coating method in a floating manner, as shown in FIG. 1 , and includes: a floating platform 10 that floats a substrate to be processed, such as a FPD glass substrate G, into the air by gas pressure; 12, transporting the substrate G floating up to the air on the floating platform 10 in the longitudinal direction of the floating platform (X direction); and the slit nozzle 14 for supplying light to the upper surface of the substrate G transported on the floating platform 10. Blocking liquid.

The upper surface of the floating platform 10 is divided into three regions along the substrate transport direction (X direction), that is, the feed region M _IN , the coating region M _{COT ,} and the delivery region M _OUT . Among them, in the feeding area M _IN and the feeding area M _OUT , only a plurality of discharge ports 16 are provided at a predetermined density, and a plurality of discharge ports 16 and suction ports 18 are provided in a predetermined density in the application region M _COT .

The feeding area M _{IN is} provided to be transported horizontally by a sorting mechanism (not shown) from the front external device, or is fed by a transfer robot (not shown). The substrate feeding portion 20 of the substrate G before processing (Fig. 5). The delivery area M _{OUT is} provided to be transported horizontally by a sorting mechanism (not shown) to the rear external device, or to be sent to the transport robot (not shown). The substrate feeding portion 22 of the substrate G (Fig. 5).

A slit nozzle 14 is provided above the coating area M _COT platform so as to be movable up and down, and is provided in the coating processing idle time to clear the slit nozzle 14 so as to be horizontally movable parallel to the substrate transport direction (X direction). The nozzle clearing portion 24 (Fig. 1, Fig. 4).

As shown in FIG. 1, the transport mechanism 12 includes: a pair of guide rails 26A, 26B extending in the X direction across the floating platform 10; a pair of sliders 28 movable along the guide rails 26A, 26B; and an adsorption pad The substrate holding member (not shown) is disposed on the slider 28, and the end portion of the substrate G is detachably held on the floating platform 10; the slide is moved by a straight moving mechanism (not shown) The member 28 is moved in the substrate transport direction (X direction), whereby the self-feeding region M _IN on the floating platform 10 floats the transport substrate G toward the delivery region M _OUT through the coating region M _COT .

The slit nozzle 14 straddles the floating platform 10 in the horizontal direction (Y direction) orthogonal to the substrate transport direction, and is strip-shaped from the upper surface (processed surface) of the substrate G directly below the slit-shaped flow outlet. The photoresist R flows out. And the slit nozzle 14 is mounted by, for example, a ball screw mechanism 32 or a guide member 34 which is installed in a stile 30 which is disposed in parallel with the slit nozzle 14 (in the Y direction) across the floating platform 10 (FIG. 2). The nozzle elevating mechanism 36 is movable (lifting) in the vertical direction (Z direction) integrally with the nozzle supporting member 38 that supports the nozzle 14. Further, the slit nozzle 14 is connected to the photoresist supply mechanism 40 (FIG. 5) constituted by a photoresist liquid container or a liquid transfer pump via the photoresist supply tube 42.

As shown in FIG. 2, the photoresist coating apparatus is an external power consuming apparatus that constitutes a substrate lifting mechanism of the floating platform 10, and includes a first air supply unit 44 for lifting and a suction/exhaust unit 46 for floating height control. And the second air supply portion 48 for suction port cleaning.

The floating first air supply unit 44 floats the substrate G by the air pressure (lifting force) ejected from the discharge port 16 of the floating platform 10, and supplies positive pressure air to the respective discharge ports 16 at a desired pressure. More specifically, the first air supply unit 44 includes: The positive pressure gas supply source 50 is extended from the positive pressure gas supply source 50 to the first manifold 52 in the floating platform 10 by using, for example, a compressed air source of a factory facility; a gas supply pipe or a first gas supply line 54; The opening and closing valve 56, the regulator 58, and the filter 60 are provided in the middle of the first air supply line 54.

When the opening and closing valve 56 is opened, the positive pressure gas, that is, the air, is sent from the positive pressure gas supply source 50 to the first manifold 52 through the gas supply line 54. From the first manifold 52, the region of the floating platform 10 is M _IN All of the discharge ports 16 in the M _COT and M _OUT distribute the supply air at a predetermined pressure.

The floating height control suction and exhaust portion 46 closely controls the floating height H _G (Fig. 4) of the substrate G in the coating region M _COT by the suction force of the suction air from the suction port 18, for each of the suction ports 18 Give moderate pressure. In more detail, the suction exhaust portion 46 includes, for example, an exhaust conduit 62 of a factory facility; an exhaust pipe or exhaust line 66 from which the second manifold 64 extends into the floating platform 10 And the opening and closing valve 68 and the fan 70 are disposed on the way of the exhaust line 66.

When the opening and closing valve 68 is opened, the fan 70 is rotationally driven, and the negative pressure generated on the feeding side of the fan 70 is transmitted to the suction port 18 in the coating area M _COT via the exhaust line 66 and the second manifold 64. Thereby, the suction port 18 sucks the air on the floating platform 10, and the sucked air is sent to the fan 70 through the second manifold 64 and the exhaust line 66, and is sent to the row through the exhaust line 66 from the sending side of the fan 70. Air duct 62.

The second air supply portion 48 for the suction port cleaning includes the second air supply line 76 from the first node 72 on the first air supply line 54 provided between the positive pressure gas supply source 50 and the opening and closing valve 56. The second node 74 extends to the exhaust line 66 provided between the fan 70 and the second manifold 64; and the opening and closing valve 78 and the regulator 80 are disposed in the middle of the second air supply line 76.

When the fan 70 of the suction and exhaust unit 46 is stopped, the opening and closing valve 78 of the second air supply unit 48 is opened, that is, the positive pressure gas supply source 50 is used to make the positive pressure gas, that is, the air in the first air supply line 54 → The first node 72 → the second air supply line 76 → the second node 74 → the exhaust line 66 flows into the second manifold 64, and all the suction in the region M _COT is applied from the second manifold 64 to the floating platform 10 Port 18 distributes the supplied air at a predetermined pressure.

The photoresist coating device is configured such that the floating height of the substrate G in the coating region M _COT of the floating platform 10 (the distance from the upper surface of the platform) H _{G is} consistent with the set value H _S , as shown in FIG. The support member 38 is mounted with an optical distance sensor 84 of the floating height measuring unit 82 (FIG. 5). Usually, a pair of optical distance sensors 84 are disposed on the left and right sides, and the floating height H _G (Fig. 2) of the left and right end portions of the substrate G is measured in the horizontal direction (Y direction) orthogonal to the substrate transport direction.

The optical distance sensor 84 optically measures the distance D _a from the immediately below object, that is, the floating platform 10 and the distance D _b from the substrate G from _a predetermined height position for the coating process. The floating height measuring unit 82 (FIG. 5) measures the distances D _a and D _b and the thickness _{G G} (predetermined value) of the substrate G from the calculation formula [H _G =D _a -(D _b +T _G )]. Take the measured value of the substrate floating height H _G .

The photoresist coating apparatus further includes a floating height monitoring unit 86 for monitoring whether or not the substrate G floating height H _G is higher than a predetermined value on the predetermined monitoring line immediately below the slit nozzle 14 ( FIG. 5 ). ).

As shown in FIG. 3, the floating height monitoring unit 86 sandwiches the floating platform 10 on the left and right sides thereof, and straddles the floating platform 10 in the Y direction at a predetermined height corresponding to the floating height setting value H _S . The light projecting unit 88 and the light receiving unit 90 are disposed opposite to each other on the monitor line. The floating height H _{G of the} coating area M _COT substrate G substantially coincides with the floating height setting value H _S , and the self-injection is shown in FIG. 3 regardless of where the substrate surface is flat on the monitoring line of the floating height monitoring unit 86. The light beam LB emitted by the light portion 88 barely passes through the substrate G and reaches the light receiving portion 90. However, when the substrate G floating height H _G exceeds the floating height setting value H _S at a certain position on the monitor line, the light beam LB is reflected on the side surface or the upper surface of the substrate G without reaching the light receiving portion 90, so the floating height monitoring portion 86 can detect Measure the situation.

The monitoring function of the floating height monitoring unit 86 can be used to determine whether or not the suction port 18 of the floating platform 10 is blocked in the vicinity of the monitoring line as will be described later.

FIG. 4 shows the configuration of the nozzle reclosing portion 24. The nozzle reclosing portion 24 is disposed in the one-seat housing 92 and is provided with: The precoating treatment portion 96 prepares the slit nozzle 14 as a pre-coating treatment to eject a small amount of photoresist liquid to wind the photoresist liquid to the precoat roller 94. The nozzle groove 98 holds the slit nozzle 14 for the purpose of preventing drying. The outlet is outletd in the atmosphere of the solvent vapor; and the slit nozzle cleaning unit 100 is for cleaning the peripheral portion of the outlet of the slit nozzle 14.

The slit nozzle 14 whose coating process is completed once is first subjected to the cleaning process by the slit nozzle cleaning unit 100, and then stands by in the nozzle groove 98, and is subjected to the precoating process by the precoating processing unit 96 immediately before the start of the next coating process. .

In order to allow the slit nozzles 14 to reach the respective portions (96, 98, 100) in the nozzle refining portion 24, under the control of the controller 110 (Fig. 5), the X-direction moving portion 201 constituted by, for example, a ball screw mechanism (Fig. 5) 1) The entire nozzle clearing portion 24, that is, the casing 92 is moved in parallel with the substrate conveying direction (X direction), and the slit nozzle 14 is vertically oriented by the nozzle lifting mechanism 36 (Figs. 1 and 5). Direction) move.

In this embodiment, a surface pick-up head 102 is attached to the lower surface of the casing 92 of the nozzle refining portion 24, and the exhaust unit 104 for exhausting the pre-coating portion 96 is connected to the suction head 102 via the exhaust pipe 106. An opening and closing valve 108 is provided in the exhaust pipe 106. This suction head 102 can be used to sweep the suction port 18 of the floating platform 10 as will be described later.

Fig. 5 shows the main configuration of a control system for a photoresist coating device in the substrate transfer device of this embodiment. The controller 110 is configured by a microcomputer, and receives measurement values, monitoring signals, and the like from the floating height measuring unit 82, the floating height monitoring unit 86, and the like, and controls the transport mechanism 12, the substrate feeding unit 20, the substrate sending unit 22, and the nozzle to clear the nozzle. Each operation and overall operation (program) of the portion 24, the nozzle elevating mechanism 36, the photoresist supply mechanism 40, the first air supply portion 44, the suction and exhaust portion 46, and the second air supply portion 48. And the controller 110 is also connected to a main controller or other external device (not shown).

Here, the photoresist coating operation in the photoresist coating apparatus will be described. First, the substrate G is fed from the preceding substrate processing apparatus (not shown) to the feeding area M _{IN of the} floating platform 10 via the sorting mechanism or the transport robot, where the standby slider 28 holds and receives the substrate G. On the floating platform 10, the substrate G is floated into the air by the air pressure (lifting force) ejected from the ejection holes 16.

When the substrate G is lifted and transported in the horizontal direction in the substrate transport direction (X direction) and passed through the center portion coating region M _COT , the slit nozzle 14 flows out of the substrate G at a predetermined pressure or flow rate toward the substrate G immediately below. R, thereby forming a photoresist film RM having a uniform film thickness from the front end side toward the rear end side of the substrate G as shown in FIG.

Once the rear end of the substrate G passes through the slit nozzle 14, the photoresist coating film RM is formed on the entire surface of the substrate. Then, the substrate G is lifted and transported on the floating platform 10 by the slider 28, and the substrate is sent to the rear unit through the sorting mechanism or the transport robot arm from the delivery area M _OUT set at the rear end of the floating platform 10. As shown).

Next, the floating platform suction port sweeping function of the photoresist coating device in the substrate transfer device of this embodiment will be described with reference to Figs. 6 to 9 .

As shown in FIG. 6, when all or almost all of the suction ports 18 are not blocked near the lower side of the application section M _COT slit nozzle 14 of the floating platform 10, the air ejected from each of the ejection ports 16 in the coating process is opposite to the back surface of the substrate G. The action is then quickly inhaled by the adjacent suction port 18.

The controller 110 closes the opening and closing valve 78 and stops the second air supply unit 48, and simultaneously operates the first air supply unit 44 and the suction and exhaust unit 46, and passes through the portion of the application region M _COT for the substrate G by self-spraying. The air (compressed air) ejected from the outlet 16 applies a vertical upward force, and a vertical downward force is applied from the suction port 18 by a negative suction force to control the balance of the mutual resistance against the two-way force, thereby maintaining the substrate for coating. The float height H _{G is} near the set value H _S (for example, 50 μm). At this time, the controller 110 can control the regulator 58 or the fan 70 to perform feedback control, and the floating height measurement value H _G obtained from the floating height measuring unit 82 coincides with the set value H _S .

However, as shown in Fig. 7, in the vicinity of the slit nozzle 14 in the coating region M _COT of the floating platform 10, a considerable number of suction ports 18 are sandwiched by the foreign matter Q in the relatively narrow gas passage 18a at the inner side. When the clogging occurs, the fan 70 that sucks the exhaust unit 46 during the coating process performs a rotation (suction and exhaust) operation, but the suction port 18 that is clogged does not generate a suction force, so that the suction port is in the vicinity thereof. The balance between the buoyancy of 16 and the gravitational force from the suction port 18 collapses, and the substrate float height H _{G is} locally higher than the set value H _S .

At this time, the above-described floating pressure feedback control means (the controller 110, the floating height measuring unit 82, the first air supply unit 44, and the suction and exhaust unit 46) may not be noticed even if they function normally. The substrate float height H _{G is} locally abnormal (bump).

However, the height of the buoyant line monitoring portion 86 for monitoring the height somewhere substrate G H _G buoyant periodically (during substrate by the G) exceeds a set value or floating height H _S, shown in Figure 7, the light beam LB by the substrate G It is shielded (does not reach the light receiving unit 90), so the abnormality state can be detected and the controller 110 can be notified. Further, when the foreign matter adheres to the upper surface of the substrate G, the foreign matter beam LB is shielded. However, if the foreign matter is released by the abnormality, it can be easily distinguished.

When the controller 110 receives the monitoring signal regarding the abnormality notification of the substrate floating height degree from the floating height monitoring unit 86, it is determined that the pumping area 10 _COT is at least a _certain amount near the slit nozzle 14 in the coating stage 10 _COT . The suction port 18 is clogged.

Moreover, when the controller 110 determines (detects) that the suction port 18 is clogged as described above, it issues an alarm through a display (not shown), or records the passing condition, at an appropriate timing, for example, in a desired batch. After the secondary treatment is completed, the suction port lifting operation of the floating platform is controlled.

During the lifting operation of the lifting platform suction port, the controller 110 temporarily turns off all the operations of the coating process (substrate floating operation, substrate transporting operation, photoresist supply operation, etc.), and then opens the opening and closing valve 78. The second air supply unit 48 is actuated. At the same time, the opening and closing valve 56 is opened, and the first air supply portion 48 is also actuated. Also, the opening and closing valve 68 is closed.

The first air supply unit 44 and the second air supply unit 48 are connected to the positive pressure gas supply source 50 in parallel, and the regulators 58 and 80 are provided, so that the discharge port 16 can be independently supplied or adjusted by the first air supply unit 44. The air pressure and the air pressure supplied to the suction port 18 by the second air supply unit 48. Generally, in the suction operation of the suction platform suction port, it is preferable to adjust the air pressure supplied to the suction port 18 by the second air supply portion 48 to be a value suitable for discharging the foreign matter blocked therein, and the adjustment is performed by the first The air pressure supplied to the discharge port 16 by the air supply unit 44 is such that the dust does not substantially intrude and is relatively low.

When the second air supply unit 48 is actuated, the air (compressed air) from the positive pressure gas supply source 50 is sent to the coating area M _COT via the first air supply line 54 → the exhaust line 66 → the second manifold 64 as described above. Each suction port 18 is inside.

As shown in FIG. 8, in the suction port 18 where the clogging occurs, the foreign matter Q trapped in the gas passage 18a is pushed out and released upward by the air pressure from the side of the second manifold 64. At this time, since the first air supply unit 44 is also actuated, the foreign matter Q discharged from the suction port 18 does not enter the vicinity of the discharge port 16 in the vicinity.

On the other hand, after the controller 110 raises the slit nozzle 14 to a position higher than the nozzle clearing portion 24, the nozzle clearing portion 24 is slidably moved to a position directly below the slit nozzle 14, as shown in FIG. The surface suction head 102 of the clear portion 24 mounted on the lower surface of the casing 92 is coated on the coating area M _COT of the floating platform 10. Further, the opening and closing valve 108 is opened to actuate the exhaust unit 104 (Fig. 4).

Thereby, the foreign matter Q discharged from the suction port 18 is quickly taken up by the suction head 102 together with the air, and sent to the exhaust device 104 through the exhaust pipe 106.

As another suitable embodiment for collecting the foreign matter Q discharged from the suction port 18 by the second air supply portion 48, as shown in FIG. 9, a dummy substrate 114 to which the adhesive sheet 112 is attached to the lower surface may be used. The manner of coating on the coating area M _COT . At this time, the foreign matter Q discharged from the suction port 18 is adsorbed by the adhesive sheet 112, so that it is not scraped or reattached on the floating platform 10.

Further, the dummy substrate 114 is sent to the floating platform 10 to the region M _{IN in the} same manner as the substrate G to be processed before the start of the lifting operation of the suction platform suction port, and is transported by the transport mechanism 12 in a floating manner. Displaced to the coating area M _COT . Further, after the floating platform suction port sweeping operation is completed, the transport mechanism 12 is moved to the delivery area M _OUT , and the self-delivery region M _{OUT is} sent out to the floating platform 10 .

As described above, in the photoresist coating apparatus, the suction port 18 which is provided in the floating region 10 in the application region M _COT and which is mixed with the discharge port 16 may not coincide during the suction operation (mainly in the coating process). The foreign matter floating around the floating platform 10 is intentionally sucked, thereby causing the suction port 18 to be blocked by foreign matter. However, according to this embodiment, when the coating process is stopped or during the idle time of the coating process, the suction/exhaust portion 46 is stopped and the second air supply portion 48 is actuated, whereby the automatic and high-efficiency removal can be performed without human intervention. The suction port 18 is blocked.

Further, when it is set near the slit nozzle 14, the floating height H _{G of the} substrate G at a certain position on the monitoring line extending in the Y direction is periodically (the period during which the substrate G passes) exceeds the floating height set value H _S , The floating height monitoring unit 86 accurately detects its abnormal state. Further, when the controller 110 receives the monitoring signal regarding the abnormality notification of the substrate floating height from the floating height monitoring unit 86, it can be determined that a considerable number of suction ports 18 are clogging near the slit nozzle 14 and it is found that the floating is performed. The best time to lift the platform suction port.

The present invention has been described with reference to the preferred embodiments of the present invention. However, the present invention is not limited to the embodiments described above, and various modifications and changes can be made without departing from the scope of the invention.

For example, as shown in FIG. 10, a bypass mode in which the second air supply line 76 of the second air supply unit 48 is branched from the first air supply line 54 and the exhaust line 66 is connected may be employed. At this time, switching valves, for example, three-way valves 116 and 118, are provided at the nodes of the first gas supply line 54 and the second gas supply line 76 and the nodes of the second gas supply line 76 and the exhaust line 66, respectively.

A compression groove 120 is provided in the middle of the second gas supply line 76, and the positive pressure gas from the positive pressure gas supply source 50 is compressed in the compression groove 120, and the opening and closing valve 78 is intermittently and intermittently turned on as shown in FIG. The air which is supplied to the suction port 18 of the floating platform 10 intermittently and impactfully at a pressure substantially higher than the pressure P _UP of the original pressure P _S can effectively remove the foreign matter Q blocked in the suction port 18.

Moreover, in the configuration example of FIG. 10, when the three-way valve 116 to the second air supply line 76 are switched, the positive pressure gas from the positive pressure gas supply source 50 cannot be supplied to the discharge port 16 of the floating platform 10. In this manner, when the floating platform suction port sweeping operation is performed, the first air supply portion 44 can be completely stopped. In fact, the three-way valve 116 can of course be omitted, and the first air supply unit 44 can be actuated simultaneously with the second air supply unit 48, thereby simultaneously spraying the suction port 18 in the suction port suction operation of the floating platform. The outlet 16 supplies air.

Although not shown in the drawings, a positive pressure gas supply source that is independent of the positive pressure gas supply source 50 of the factory facility may be used in the second air supply unit 48. Further, the fan 70 that sucks the exhaust unit 46 may be reversely configured to be used as a positive pressure gas supply source for the second air supply unit 48. At this time, the exhaust line 66 can be directly used as the second air supply line 76.

Further, the cleaning pressure applied to the suction port 18 of the floating platform 10 by the second air supply portion 48 is considerably or greatly increased. As shown in FIGS. 12A and 12B, the coating of the floating platform 10 can be suitably employed. All the suction ports 18 provided in the area M _COT are divided into multiple arrays, and the second gas supply line is connected in units of groups via the opening and closing valves 122(1), 122(2), 122(3), 122(4).. The composition of 76.

When the second air supply unit 48 is actuated, that is, when the floating platform suction port sweeping operation is performed, the controller 110 turns on the opening and closing valves 122(1), 122(2), 122 in groups by time. 3), 122(4)..., high-pressure air is concentratedly supplied to each of the suction ports 18.

Further, the pattern in which the discharge port 16 and the suction port 18 are mixed in the application region M _COT of the floating platform 10 is arbitrary, and is not limited by the arrangement pattern shown in the drawing.

Further, it is also possible to independently perform the function of the floating height monitoring unit 86, and periodically perform the above-described floating platform suction port cleaning operation.

Next, a second embodiment of the present invention will be described. In addition, the description of the same portions as those of the above embodiment will be omitted. In the second embodiment, the dummy substrate 114 described in Fig. 9 is not used, and the adsorption roller 151 shown in Fig. 13 is replaced. The surface of the adsorption roller 151 is adhered to the surface of the floating platform 10, and the foreign matter Q is adhered to the surface of the adsorption roller 151 by contacting, rotating, and simultaneously moving the adsorption roller 151. The absorbing roller 151 can also be contacted, rotated, and simultaneously moved by a person on the floating platform 10 to clean it. Alternatively, an adsorption roller lifting mechanism 152 for lifting and lowering the adsorption roller 151 and an adsorption roller horizontal moving mechanism 153 for moving the adsorption roller 151 horizontally may be provided, and the adsorption roller lifting mechanism 152 and the adsorption roller are controlled by the controller 110. The sub-horizontal moving mechanism 153 thereby automatically moves the adsorption roller 151 for cleaning. Further, the adsorption roller 151 can be rolled on the adhesive sheet to remove the foreign matter Q for reuse. Or the cleaning liquid washes the adsorption roller 151 to thereby remove the foreign matter Q for reuse.

Next, a third embodiment of the present invention will be described. In addition, the description of the same portions as those of the above embodiment will be omitted. In the third embodiment, the suction head 102 described in Fig. 4 has substantially the same width as the application region M _COT . Thereby, the foreign matter Q discharged from the suction port 18 can be removed in a shorter time. The plurality of suction holes 154 provided on the lower surface of the suction head 102 are preferably disposed to correspond to the positions of the suction ports 18. Thereby, the suction port can be made as narrow as possible, and the amount of suction of the exhaust device 104 is not increased, and the foreign matter Q is efficiently removed.

Further, although the suction head 102 sucks the foreign matter Q in a state of being separated from the floating platform 10 upward, the suction head 102 can also contact the floating platform 10, and the foreign matter can be removed more efficiently. Q. However, even if the dummy substrate 114 illustrated in FIG. 9 is used, the floating of the dummy substrate 114 can be similarly stopped, and the dummy substrate 114 is brought into contact with the floating platform 10.

Further, the length of the suction head 102X described in FIG. 8 is shorter than the application area M _COT . Therefore, when the foreign matter Q is removed, the suction head 102 needs to be scanned in the X direction. Here, as shown in the aforementioned FIGS. 12A and 12B, all the suction ports 18 provided in the coating area M _COT of the floating platform 10 are divided into a plurality of arrays, and the opening and closing valve 122 (1) is provided in units of groups. 122 (2), 122 (3), 122 (4): The second gas supply line 76 is connected. Further, the suction port sweeping operation may be performed in units of units, so that the suction head 102 scans in the X direction to move the position corresponding to the position, and the foreign matter Q can be removed with higher efficiency.

Next, a fourth embodiment of the present invention will be described. In addition, the description of the same portions as those of the above embodiment will be omitted. In the fourth embodiment, the air may be supplied to the suction port 18 from the second air supply unit 48, and the thin film of the photoresist liquid may be dispersed on the floating platform 10 before the suction port cleaning operation. Thereafter, air is supplied to the intake port 18, and the foreign matter Q is discharged from the suction port 18. Further, the diluent may be dispersed, and after a predetermined period of time, the suction port 18 is suctioned by the suction and exhaust portion 46 to remove the diluent and the foreign matter Q by suction. Further, instead of using a diluent, pure water or an alcohol may be used instead. When a liquid (diluent, pure water, alcohol, or the like) is used as described above, air can be supplied to the intake port 18, and the foreign matter Q is discharged from the suction port 18, and the air is discharged from the suction port 18 for a predetermined period of time, thereby invading. The liquid of the suction port 18 is dry. Further, when the suction port 18 is suctioned, and the liquid and the foreign matter Q are sucked and removed, the liquid that has entered the intake port 18 can be dried by continuing the suction operation for a predetermined period of time thereafter.

Next, a fifth embodiment of the present invention will be described. In addition, the description of the same portions as those of the above embodiment will be omitted. In the fifth embodiment, when the regulator unit 58 of the controller 10 is controlled by the controller 110 to perform the floating platform suction port sweeping operation, the regulator 58 is controlled to set the air supply pressure to be higher than usual, thereby being higher. Efficiency removes foreign matter Q.

Next, a sixth embodiment of the present invention will be described. In addition, the description of the same portions as those of the above embodiment will be omitted. In the sixth embodiment, as shown in FIG. 14, the fan 155 constitutes the second air supply portion 48. By operating the fan 155, air can be supplied to the second manifold 64. The fan 155 is connected to the exhaust line 66 by the air supply line 156, and has a three-way valve 157 at the connecting portion thereof. By switching the three-way valve 157, the air inlet 18 can be connected. The fan 70 is connected or the suction port 18 is connected to the fan 155. Further, the fan 155 and the three-way valve 157 are controlled by the controller 110. According to this configuration, the piping for the air supply and the exhaust can be made simple, and the reliability of the device can be improved.

Next, a seventh embodiment of the present invention will be described. In addition, the description of the same portions as those of the above embodiment will be omitted. The seventh embodiment is a modification of the sixth embodiment. As shown in FIG. 15, a fan 70 is provided in the middle of the exhaust line 66. A three-way valve 158 is provided between the exhaust duct 62 and the fan 70, and a three-way valve 159 is provided between the fan 70 and the second manifold 64. A line 160 connecting the three-way valve 158 and the three-way valve 159 is provided. And an exhaust line 66 between the fan 70 and the three-way valve 159 is connected to the atmospheric suction line 161. An opening and closing valve 162 is provided in the middle of the atmospheric suction line 161. Further, the controller 110 controls the switching of the three-way valve 158, the three-way valve 159, and the opening and closing valve 162.

In the seventh embodiment, when the suction port 18 is sucked, the opening and closing valve 162 is closed, the three-way valve 159 is switched, the second manifold 64 and the fan 70 are connected, and the three-way valve 158 is connected to the fan 70 and the exhaust duct. 62. Thereby, it can be sucked from the suction port 18. Next, when the cleaning operation of the suction port 18 is performed, the opening and closing valve 162 is opened, the three-way valve 158 is switched, the fan 70 and the wire 160 are connected, and the three-way valve 159 is connected to the wire 160 and the second manifold 64. Thereby, the air sucked from the tip end of the atmospheric suction line 161 is supplied to the second manifold 64, and the cleaning operation of the suction port 18 is performed. With such a configuration and operation, only by providing one fan 70, the suction operation and the cleaning operation of the suction port 18 can be switched, and the number of fans can be reduced.

The treatment liquid in the present invention may be, for example, a coating liquid such as an interlayer insulating material, a dielectric material or a wiring material, or may be a chemical liquid, a developing solution or a rinsing liquid, in addition to the photoresist. The substrate to be processed in the present invention is not limited to an LCD substrate, and may be another substrate for a flat panel display, a semiconductor wafer, a CD substrate, a photomask, a printed substrate, or the like.

Further, in the present embodiment, the present invention has been described using a substrate transfer device including a photoresist coating device. However, the present invention is not limited to a substrate transfer device including a photoresist coating device, and may be used for an FPD substrate or a semiconductor wafer. a floating platform, or an inspection device such as an FPD substrate or a semiconductor wafer, or used to transport an FPD substrate The suction holding portion of the palm of the robot arm such as a semiconductor wafer or the like is of course included in the scope of the right.

D _a , D _b ‧‧‧Determination distance

G‧‧‧glass substrate (substrate)

H _G ‧‧‧Floating height

H _S ‧‧‧Setting value

LB‧‧‧beam

M _COT ‧‧‧ Coating area

M _IN ‧‧‧Send area

M _OUT ‧‧‧Send area

P _S ‧‧‧ original pressure

P _UP ‧‧‧ pressure

Q‧‧‧ Foreign objects

RM‧‧‧Photoresist coating film

R‧‧‧ photoresist

TG‧‧‧ thickness

10‧‧‧Floating platform

12‧‧‧Transportation agencies

14‧‧‧Slit nozzle

16‧‧‧Spray outlet

18a‧‧‧ gas path

18‧‧ ‧ suction port

20‧‧‧Substrate feeding department

22‧‧‧Substrate delivery department

24‧‧‧Nozzle Clearing Department

26A, 26B‧‧‧ rails

28‧‧‧Sliding parts

30‧‧‧Door frame

32‧‧‧Rolling screw mechanism

34‧‧‧Guiding components

36‧‧‧Nozzle lifting mechanism

38‧‧‧Nozzle support member

40‧‧‧Light resistance supply agency

42‧‧‧Light resistance supply tube

44‧‧‧1st gas supply department

46‧‧‧Sucking exhaust

48‧‧‧2nd gas supply department

50‧‧‧ Positive pressure gas supply

52‧‧‧1st manifold

54‧‧‧1st gas supply line

56‧‧‧Opening valve

58‧‧‧Regulator

60‧‧‧Filter

62‧‧‧Exhaust duct

64‧‧‧2nd manifold

66‧‧‧Exhaust line

68‧‧‧Opening valve

70‧‧‧fan

72‧‧‧1st node

74‧‧‧2nd node

76‧‧‧2nd gas supply line

78‧‧‧Open valve

80‧‧‧Regulator

82‧‧‧Floating height measurement department

84‧‧‧Optical distance sensor

86‧‧‧Floating height monitoring department

88‧‧‧Projecting Department

90‧‧‧Receiving Department

92‧‧‧Shell

94‧‧‧Pre-coated roller

96‧‧‧Pre-coating treatment department

98‧‧‧Nozzle slot

100‧‧‧Slit nozzle cleaning department

102‧‧‧Sucking head

104‧‧‧Exhaust device

106‧‧‧Exhaust pipe

108‧‧‧Opening valve

110‧‧‧ Controller

112‧‧‧Adhesive film

122 (1), 122 (2), 122 (3), 122 (4) ‧ ‧ open valve

114‧‧‧Virtual substrate

116, 118‧‧‧3 valve

120‧‧‧Compression groove

151‧‧‧Adsorption roller

152‧‧‧Adsorption roller lifting mechanism

153‧‧‧Adsorption roller horizontal moving mechanism

154‧‧‧ suction hole

155‧‧‧fan

156‧‧‧ gas supply pipeline

157~159‧‧‧Three-way valve

160‧‧‧ line

161‧‧‧Atmospheric suction line

162‧‧‧Open valve

201‧‧‧X direction moving department

Fig. 1 is a schematic plan view showing a main configuration of a photoresist coating apparatus in a substrate transfer device according to an embodiment of the present invention.

Fig. 2 is a front elevational view showing the substrate transporting direction of the main constituent of the above-described photoresist coating apparatus.

Fig. 3 is a side elevational view showing the mounting structure and operation of the optical distance sensor of the floating height measuring unit in the above-described photoresist coating device.

Fig. 4 is a view showing a structure of a nozzle refining portion and a mounting structure of a planar suction portion in the above-described photoresist coating device.

Fig. 5 is a block diagram showing the configuration of a control system in the above photoresist coating apparatus.

Fig. 6 is a schematic cross-sectional view showing a state of a coating treatment portion when foreign matter substantially does not block the suction port of the floating platform in the above-described photoresist coating device.

Fig. 7 is a schematic cross-sectional view showing the state of the coating treatment portion when foreign matter blocks the suction port of the floating platform in the above-described photoresist coating device.

Fig. 8 is a schematic cross-sectional view showing the action of the second air supply unit in the above-described photoresist coating apparatus.

Fig. 9 is a view showing the action of the above-described photoresist coating apparatus in which the surface adsorption portion is used to sweep out the suction port of the floating platform.

Fig. 10 is a view showing a modification of the second air supply portion in the above-described photoresist coating device.

Fig. 11 is a view showing a pressure waveform of the action of the compression groove in the second air supply portion.

Fig. 12A is a view showing a stage in which the time-divisional control is applied to the cleaning pressure of the suction port of the floating platform by the second air supply portion.

Fig. 12B is a view showing a stage in which the time-divisional control is applied to the cleaning pressure of the suction port of the floating platform by the second air supply portion.

Figure 13 is an explanatory view showing a second embodiment of the present invention.

Fig. 14 is an explanatory view showing a second air supply unit in the sixth embodiment of the present invention.

Fig. 15 is an explanatory view showing a second air supply unit in the seventh embodiment of the present invention.

12. . . Shipping agency

14. . . Slit nozzle

20. . . Substrate feed section

twenty two. . . Substrate delivery unit

twenty four. . . Nozzle re-clearing department

36. . . Nozzle lifting mechanism

40. . . Photoresist supply mechanism

44. . . First gas supply department

46. . . Suction and exhaust

48. . . 2nd gas supply department

82. . . Floating height measurement unit

86. . . Floating height monitoring unit

110. . . Controller

Claims (18)

A substrate transporting apparatus comprising: a floating platform including a first floating region in which a plurality of discharge ports and a plurality of suction ports are provided; and a first air supply portion is a substrate to be processed by a gas pressure ejected from the ejection port Floating up, supplying a positive pressure gas to the discharge port; sucking the exhaust portion to control the floating height of the substrate by the suction force of the suction gas by the suction port, and giving the suction port a negative pressure; Carrying, the substrate that is floated up to the air on the floating platform is held and passed through the first floating region; and the second air supply portion sweeps the suction port to supply the suction port a positive pressure gas; and a planar adsorption portion that is coated with a part or all of the first floating region from above during the operation of the second gas supply portion, and is adsorbed and mixed in the gas ejected from the suction port a foreign matter; wherein the planar adsorption portion is transported by the transport mechanism on the floating platform in the same manner as the substrate, and is carried to the first float immediately before or after the start of the second air supply portion In the rising area, after the second air supply unit is finished, 1 taken out of the buoyant region. A substrate transporting apparatus comprising: a floating platform including a first floating region in which a plurality of discharge ports and a plurality of suction ports are provided; and a first air supply portion is a substrate to be processed by a gas pressure ejected from the ejection port Floating up, supplying a positive pressure gas to the discharge port; sucking the exhaust portion to control the floating height of the substrate by the suction force of the suction gas by the suction port, and giving the suction port a negative pressure; Carrying, the substrate that is floated up to the air on the floating platform is held and passed through the first floating region; and the second air supply portion sweeps the suction port to supply the suction port Positive pressure gas The floating height control unit controls at least one of a gas pressure supplied from the first air supply unit to the discharge port and a vacuum pressure applied to the suction port from the suction and exhaust unit, and the first floating rise The floating height of the substrate in the region coincides with the set value of the floating height; the floating height monitoring unit uses a predetermined height that can be set in accordance with the horizontal direction orthogonal to the substrate transport direction at a set value corresponding to the floating height. a light beam that illuminates the light beam on the platform to optically monitor the floating height of the substrate; and a suction port blocking detecting portion, wherein the floating height monitoring portion detects the light across the transmission path When the substrate float height periodically exceeds the allowable value, it is determined that a part of the suction port is blocked immediately below or near the light beam. A substrate transporting apparatus comprising: a floating platform including a first floating region in which a plurality of discharge ports and a plurality of suction ports are provided; and a first air supply portion is a substrate to be processed by a gas pressure ejected from the ejection port Floating up, supplying a positive pressure gas to the discharge port; sucking the exhaust portion to control the floating height of the substrate by the suction force of the suction gas by the suction port, and giving the suction port a negative pressure; Carrying, the substrate that is floated up to the air on the floating platform is held and passed through the first floating region; and the second air supply portion sweeps the suction port to supply the suction port a positive pressure gas; wherein when the suction port is swept, the second air supply unit is actuated, the gas is ejected from the suction port, and the first air supply unit is also actuated, and the gas is supplied from the discharge port The pressure of the gas supplied to the suction port by the second air supply portion is higher than the pressure of the gas supplied to the discharge port by the first air supply portion. The substrate transfer device according to any one of claims 1 to 3, further comprising a planar suction portion for covering a portion of the first floating region from above during operation of the second air supply portion Or all, pick up foreign matter mixed in the gas ejected from the suction port. The substrate transfer device according to claim 1 or 2, wherein when the suction port is swept, the second air supply unit is activated in a state in which the first air supply unit is stopped or stopped. The suction port allows the gas to be ejected. The substrate transfer device according to any one of claims 1 to 3, wherein the second air supply unit includes a positive pressure gas supply source common to the first air supply unit. The substrate transport device of claim 6, wherein the first air supply portion includes a first air supply line extending from the positive pressure gas supply source to the discharge port, the suction and exhaust portion including a negative pressure generating source And an exhaust line extending from the negative pressure generating source to the suction port, the second air supply portion including a second node extending from a first node on the air supply line to a second node on the exhaust line Gas pipeline. The substrate transfer device of claim 7, wherein at least one of the first and second nodes is provided with a switching valve. The substrate transfer device of claim 6, wherein the second air supply unit includes a second air supply line extending from the positive pressure gas supply source to a predetermined node on the exhaust line. The substrate transport device of claim 9, wherein the switching valve is provided at the node. The substrate transfer device of claim 7, wherein the opening and closing valve is provided on the second gas supply line. The substrate transport device of claim 11, wherein the second gas supply line has a compression groove for compressing a positive pressure gas from the positive pressure gas supply source, and intermittently and impactably A positive pressure gas compressed by the compression tank is supplied. The substrate transfer device of claim 1, wherein the second air supply unit includes a positive pressure gas supply source different from the positive pressure gas supply source used by the first air supply unit. The substrate transfer device according to claim 1, wherein the suction port provided in the first floating region is divided into a plurality of arrays, and when the second gas supply portion is actuated, time division is performed in units of groups Switching to sweep the suction port. The substrate transfer device of claim 1, wherein the floating platform has a second floating region on the upstream side of the first floating region along the substrate transporting direction, and the second floating region is provided to float the substrate Most of the spray outlets. The substrate transfer device of claim 15, wherein the second floating region is provided with a feeding portion for feeding the substrate. The substrate transfer device of claim 1, wherein the floating platform has a third floating region on a downstream side of the first floating region along a substrate transporting direction, and the third floating region is provided to float the substrate Most of the spray outlets. The substrate transfer device of claim 17, wherein the third floating region is provided with a delivery portion for feeding the substrate.