CN102161026A - Substrate conveying device - Google Patents

Substrate conveying device Download PDF

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Publication number
CN102161026A
CN102161026A CN2011100448870A CN201110044887A CN102161026A CN 102161026 A CN102161026 A CN 102161026A CN 2011100448870 A CN2011100448870 A CN 2011100448870A CN 201110044887 A CN201110044887 A CN 201110044887A CN 102161026 A CN102161026 A CN 102161026A
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CN
China
Prior art keywords
mentioned
come
gas supply
gas
delivery device
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Pending
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CN2011100448870A
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Chinese (zh)
Inventor
稻益寿史
小篠勲
高木贵生
吉富济
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Tokyo Electron Ltd
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Tokyo Electron Ltd
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Publication of CN102161026A publication Critical patent/CN102161026A/en
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67784—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations using air tracks
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G47/00—Article or material-handling devices associated with conveyors; Methods employing such devices
    • B65G47/74—Feeding, transfer, or discharging devices of particular kinds or types
    • B65G47/90—Devices for picking-up and depositing articles or materials
    • B65G47/91—Devices for picking-up and depositing articles or materials incorporating pneumatic, e.g. suction, grippers
    • B65G47/911—Devices for picking-up and depositing articles or materials incorporating pneumatic, e.g. suction, grippers with air blasts producing partial vacuum
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • B65G49/063—Transporting devices for sheet glass
    • B65G49/064—Transporting devices for sheet glass in a horizontal position
    • B65G49/065—Transporting devices for sheet glass in a horizontal position supported partially or completely on fluid cushions, e.g. a gas cushion
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G51/00—Conveying articles through pipes or tubes by fluid flow or pressure; Conveying articles over a flat surface, e.g. the base of a trough, by jets located in the surface
    • B65G51/02—Directly conveying the articles, e.g. slips, sheets, stockings, containers or workpieces, by flowing gases
    • B65G51/03—Directly conveying the articles, e.g. slips, sheets, stockings, containers or workpieces, by flowing gases over a flat surface or in troughs
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G2249/00—Aspects relating to conveying systems for the manufacture of fragile sheets
    • B65G2249/04—Arrangements of vacuum systems or suction cups
    • B65G2249/045—Details of suction cups suction cups

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Fluid Mechanics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Coating Apparatus (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Materials For Photolithography (AREA)

Abstract

The invention relates to a substrate conveying device, wherein a coating device can automatically and efficiently remove the blocking of the suction port of a floating worktable at any time or just in time. During the cleaning action of the suction port of the floating worktable, a controller coverts all the action related to the coating process into a stopped state so as to drive a second gas supply part to work. Therefore, the air from a positive pressure gas supply source (compressed air) is delivered to each of the suction ports (18) of the coating area via a first gas supply line and a second manifold (64). In the blocked suction port (18), foreign bodies (Q) in the gas path (18a) are discharged toward the upside in an extrusion manner by the air pressure from a second manifold (64). At this time, since the first gas supply part does not work, there is no worry that the discharged foreign bodies (Q) enter into the adjacent outlets (16).

Description

Base board delivery device
Technical field
The present invention relates to be used on the come-up workbench treatment fluid is coated to the coating unit on the processed substrate.
Background technology
In the photo-mask process in the manufacturing process of flat-panel monitors such as LCD (FPD), adopt the outlet with slit-shaped strip gap nozzle and be widely used at the cladding process that processed substrate (glass substrate etc.) is gone up the non-spin coating that applies liquid against corrosion.
A kind of form as the cladding process of so non-spin coating, known have following a kind of come-up mode: by being used on the workbench of supporting substrates float means on the assembling substrates, on this come-up workbench, substrate is floated aloft and along a direction (workbench length direction) conveying substrate of level, on the assigned position in carrying the way, utilization is arranged on the gap nozzle of workbench top and discharges liquid against corrosion towards be band shape by the substrate under the gap nozzle, thereby an end to the other end on substrate applies liquid against corrosion.
In the cladding process of non-spin coating of this come-up mode, will be on substrate be formed uniformly the coat film of liquid against corrosion with the thickness of setting, requirement will be located at that small gaps between the outlet of gap nozzle and the substrate, about common 100 μ m accurately are maintained setting value or near setting value.
In order to satisfy this requirement condition, adopt the liquid coating unit against corrosion of cladding process of the non-spin coating of come-up mode not only will be in the roughly whole zone of come-up workbench be provided with many and be used to spray the gas of high pressure or malleation, the ejiction openings of for example air with the density of regulation, and will be on the come-up workbench as gap nozzle just down or front and back regional and the attraction mouth that sucks air with negative pressure is mixed mutually with ejiction opening.In addition, in this coating zone, with respect to substrate by this coating zone, obtain the pressure vertically upward that applies by ejiction opening and by the balance between the pressure vertically downward that attracts mouth to be applied, thereby control is applied to the come-up pressure on the substrate subtly, makes the come-up height and setting value (for example 50 μ m) consistent (for example patent documentation 1) of substrate.
Patent documentation 1: TOHKEMY 2007-190483 communique.
Though liquid coating unit against corrosion as described above turns round,, also tend to be exposed to foreign matters such as bigger dust, fragment from needless to say being exposed to small grit in dust free room.These foreign matters have plenty of in atmosphere and to drift about and come, have plenty of when safeguarding, bring from the outside or in upkeep operation, produce, also peel off and produce owing to substrate breakage, film sometimes.
In a word, in the liquid coating unit against corrosion of the cladding process of the non-spin coating of adopting come-up mode as described above, the foreign matter around it of floating can inadvertently be drawn in the attraction mouth of coating zone of come-up workbench, and has piled up foreign matter in causing attracting mouthful.If attract mouth to stop up, then this attraction mouth can't apply attraction to the substrate by its top.
Usually in the coating zone of come-up workbench, be provided with quantity and be the attraction mouth more than 1000.Even one or two attraction mouth wherein stops up, to the also not influence basically of attraction of integral body, but if obstruction has taken place the attraction mouth about hundreds of, then whole attraction can significantly descend.In addition, even the attraction mouth that has stopped up has only about dozens of, but if concentrate in the narrow and small scope, then near this scope, from the showy power of ejiction opening and come the balance between the gravitation of self-gravitation mouth to destroy, tend to cause the substrate-levitating height to be higher than setting value partly.If be higher than setting value partly near coating zone (especially gap nozzle under) substrate-levitating height, the thickness that then is formed at the liquid coat film against corrosion on the substrate can change, thereby makes the precision and the reliability reduction of photoetching.
In the past, for the obstruction of the attraction mouth on the come-up workbench as described above is removed, clean the method that attracts mouth and adopt the workbench that to float to decompose, the attraction head that perhaps makes outside sweeper connects with the upper surface of come-up workbench, thereby attracts from the top and removes the method that attracts the foreign matter in the mouth that piles up.
But, decompose cleaning method because operation bothers very much, need very big labour, activity duration, in other words repair time also very long, therefore, be reluctant at the scene to be used.In addition, adopt the mode of outside sweeper to have following problem: though easily owing to suction nozzle and come-up workbench are connected injure the come-up workbench to be required great effort so but need the people to come operation unlike decomposition cleaning mode.
In addition, be not used in the attraction mouth of checking the come-up workbench in the past whether method or the function stopped up had taken place.Therefore the thickness of liquid coat film against corrosion having been produced under the situation of influence, often need spended time until ascertaining the reason owing to the obstruction that attracts mouth.On the other hand, if in the short cycle, adopt decomposition cleaning as described above or outside cleaning method to carry out periodic maintenance continually, can cause spending huge labour and unit service factor and descend.
Summary of the invention
The present invention makes in view of the problem points of conventional art as described above, and purpose is to provide following a kind of coating unit: the obstruction that can remove the attraction mouth on the come-up workbench in device at any time or in time, automatically and efficiently.
Coating unit of the present invention comprises: the come-up workbench, and it has makes many ejiction openings and many attraction mouths that the 1st come-up zone that forms is set with mixing; The 1st gas supply part, it is in order to make processed substrate under by the effect of the pressure of the gas of above-mentioned ejiction opening ejection and float, and the gas of malleation is fed to above-mentioned ejiction opening; Attract exhaust portion, it is drawn into the come-up height that attraction in the above-mentioned attraction mouth is controlled aforesaid substrate in order to utilize with gas, applies negative pressure to above-mentioned attraction mouth; Conveying mechanism, it is used for, and aerial aforesaid substrate keeps also so that aforesaid substrate is carried aforesaid substrate by the mode in above-mentioned the 1st come-up zone to flying on above-mentioned come-up workbench; The treatment fluid supply unit, it has the nozzle of the top that is configured in above-mentioned the 1st come-up zone, from said nozzle to by above-mentioned the 1st come-up zone aforesaid substrate on supply with treatment fluid; The 2nd gas supply part, it is for to clearing away in the above-mentioned attraction mouth, and the gas of malleation is fed in the above-mentioned attraction mouth.
In above-mentioned structure, sometimes be located at the foreign matter that the attraction mouth of the 1st come-up in the zone (mainly being in the coating processing process) during attracting action of come-up workbench can inadvertently will float around the come-up workbench and suck, piling up in causing attracting mouthful has foreign matter.But, according to the present invention, by when coating processing stops or coating processing interruption chien shih attract exhaust portion to stop and making the 2nd gas supply part work, can not need the artificial obstruction that attracts mouthful of just removing automatically and expeditiously.
According to coating method of the present invention, utilize structure as described above and effect, can in device, remove the obstruction of the attraction mouth on the come-up workbench at any time or in time, automatically and efficiently.
Description of drawings
Fig. 1 is the roughly vertical view of the primary structure of the liquid coating unit against corrosion in the expression one embodiment of the present invention.
Fig. 2 is roughly front view primary structure, the substrate throughput direction of the above-mentioned liquid coating unit against corrosion of expression.
Fig. 3 is the installation constitution of optical distance sensor of the come-up height measurement section of expression in the above-mentioned liquid coating unit against corrosion and the roughly side view of effect.
Fig. 4 is the figure of the installation constitution of the structure of the nozzle reproducing unit in the above-mentioned liquid coating unit against corrosion and planar drawing section.
Fig. 5 is the block diagram of the structure of the control system in the above-mentioned liquid coating unit against corrosion.
Fig. 6 is illustrated in the above-mentioned liquid coating unit against corrosion the roughly cutaway view of almost piling up the state of the coating processing portion when foreign matter is not arranged in the attraction mouth of come-up workbench.
Fig. 7 is illustrated in the above-mentioned liquid coating unit against corrosion the roughly cutaway view of piling up the state of the coating processing portion when foreign matter is arranged in the attraction mouth of come-up workbench.
Fig. 8 is the roughly cutaway view that is illustrated in the effect when the 2nd gas supply part is worked in the above-mentioned liquid coating unit against corrosion.
Fig. 9 is the figure that adopts the effect under the situation of planar adsorption section in above-mentioned liquid coating unit against corrosion when the come-up workbench attracts mouthful cleaning.
Figure 10 is the figure of the variation of the 2nd gas supply part in the above-mentioned liquid coating unit against corrosion of expression.
Figure 11 is the pressure waveform figure that is used to illustrate the effect under the situation of the 2nd gas supply part employing compression box.
Figure 12 A is the figure in a stage of mode of the pressure that is used to clear away of the expression timesharing control attraction mouth that is applied to the come-up workbench by the 2nd gas supply part.
Figure 12 B is the figure in a stage of mode of the pressure that is used to clear away of the expression timesharing control attraction mouth that is applied to the come-up workbench by the 2nd gas supply part.
Figure 13 is the key diagram of the 2nd embodiment of the present invention.
Figure 14 is the key diagram of the 2nd gas supply part in the 6th embodiment of the present invention.
Figure 15 is the key diagram of the 2nd gas supply part in the 7th embodiment of the present invention.
The specific embodiment
Below, with reference to accompanying drawing preferred implementation of the present invention is described.
Fig. 1 and Fig. 2 represent the primary structure of the liquid coating unit against corrosion in the one embodiment of the present invention.Fig. 1 is a vertical view roughly, and Fig. 2 is the roughly front view of substrate throughput direction.
Liquid coating unit against corrosion of the present invention adopts the cladding process of the non-spin coating of come-up mode, as shown in Figure 1, comprising: come-up workbench 10, and it utilizes gas pressure that the substrate G of the glass that processed substrate, for example FPD use is floated aloft; Conveying mechanism 12, it is carried flying at aerial substrate G along come-up workbench length direction (directions X) on this come-up workbench 10; Gap nozzle 14, it is used for liquid against corrosion is fed to the upper surface of substrate conveying G on come-up workbench 10.
The upper surface of come-up workbench 10 is divided into 3 zones along substrate throughput direction (directions X), promptly moves into regional M IN, coating zone M COTAnd take out of regional M OUTWherein, moving into regional M INWith take out of regional M OUTIn with the regulation density only be provided with many ejiction openings 16, at coating zone M COTIn mix with the density of regulation and to be provided with many ejiction openings 16 and to attract mouthfuls 18.
Moving into regional M INIn be provided with substrate and move into portion 20 (Fig. 5), this substrate is moved into portion 20 and is used for utilizing sorting mechanism (not shown) in the mode of horizontal feed or be used to from the handing-over of conveying mechanical arm (not shown) and substrate G is moved into from the external device (ED) of previous stage the substrate G before the coating processing.Taking out of regional M OUTIn be provided with substrate and take out of portion 22 (Fig. 5), this substrate take out of portion 22 be used to utilize sorting mechanism (not shown) with the substrate G after the coating processing backward the external device (ED) of one-level in the mode of horizontal feed or be used to the handing-over of conveying mechanical arm (not shown) and substrate G is taken out of.
At coating zone M COTIn, above workbench, be provided with can lifting moving gap nozzle 14, and, being provided with the nozzle reproducing unit 24 (Fig. 1, Fig. 4) that can move horizontally abreast with substrate throughput direction (directions X), this nozzle reproducing unit 24 is used at coating processing intercourse regeneration gap nozzle 14.
As shown in Figure 1, conveying mechanism 12 comprises: the pair of guide rails 26A, the 26B that extend across come-up workbench 10 and along directions X; Can be along a pair of slide block 28 of above-mentioned guide rail 26A, 26B back and forth movement; And on come-up workbench 10 with detachable mode keep substrate G both side ends be located at substrate holding structures such as suction tray (not shown) on the slide block 28, by utilizing craspedodrome travel mechanism (not shown) that slide block 28 is moved along substrate throughput direction (directions X), move into regional M thereby on come-up workbench 10, substrate G is carried out oneself INVia coating zone M COTTake out of regional M and arrive OUTCome-up carry.
Gap nozzle 14 is along the top of crossing come-up workbench 10 with the horizontal direction (Y direction) of substrate throughput direction quadrature, and from the outlet of slit-shaped liquid against corrosion is discharged to upper surface (processed face) by the substrate G under the gap nozzle 14 with band shape.In addition, gap nozzle 14 constitutes: can utilize be installed on the shape frame 30, comprise for example nozzle elevating mechanism 36 of ball screw framework 32, guiding elements 34 etc. (Fig. 2), and move (lifting) along vertical direction (Z direction) integratedly with the nozzle supporting member 38 that is used to support this nozzle 14, this shape frame 30 with gap nozzle 14 abreast (along Y to) mode of crossing over come-up workbench 10 is provided with.In addition, gap nozzle 14 is connected with the liquid organization of supply 40 against corrosion (Fig. 5) that is made of liquid container against corrosion, liquid-feeding pump etc. via liquid supply pipe 42 against corrosion.
As shown in Figure 2, this liquid coating unit against corrosion has 1st gas supply part 44 of come-up usefulness, attraction exhaust portion 46 that come-up highly control usefulness and 2nd gas supply part 48 that attract mouth cleaning usefulness as shared device substrate-levitating mechanism, that install that is used to constitute come-up workbench 10 outward.
The 1st gas supply part 44 of come-up usefulness constitutes: float down in the effect of the air pressure (lift) of ejiction opening 16 ejection of the workbench 10 that floats certainly in order to make substrate G, supply the air of malleations with the pressure of expectation to each ejiction opening 16.More specifically, the 1st gas supply part 44 for example has: be used for utilizing the malleation air pressure source of supply 50 of the public compressed air source of factory, this barotropic gas source of supply 50 extends to the feed tube or the 1st gas supply line 54 of the 1st manifold 52 in the come-up workbench 10 and switch valve 56, adjuster 58 and the filter 60 that is located at the way of the 1st gas supply line 54 certainly.
If open switch valve 56, then make positive pressure air, be that air is fed in the 1st manifold 52 by gas supply line 54, thereby air is distributed each the regional M that is fed to come-up workbench 10 with the pressure of stipulating from the 1st manifold 52 from malleation air pressure source of supply 50 IN, M COT, M OUTInterior whole ejiction openings 16.
The attraction exhaust portion 46 that come-up is highly controlled usefulness constitutes: attract mouthfuls 18 attraction to control coating zone M closely in order to utilize to be used for air is drawn into COTThe come-up height H of interior substrate G G(Fig. 4), attract mouth 18 to apply the negative pressure of appropriateness to each.More specifically, attract exhaust portion 46 for example to have: the public discharge duct 62 of factory, this discharge duct 62 extends to the blast pipe or the exhaust line 66 of the 2nd manifold 64 in the come-up workbench 10 and is located at switch valve 68 and fan 70 in the way of this exhaust line 66 certainly.
If open switch valve 68 and drive fan 70 rotations, then the negative pressure that produces at the entrance side of fan 70 is delivered to coating zone M via exhaust line 66 and the 2nd manifold 64 COTIn the interior attraction mouth 18.Thus, the air of come-up on the workbench 10 is inhaled into and attracts in mouthfuls 18, and the air that is inhaled into is fed in the fan 70 by the 2nd manifold 64 and exhaust line 66, and is fed in the discharge duct 62 by exhaust line 66 from the outlet side of fan 70.
Attract mouthful the 2nd gas supply part 48 of cleaning usefulness to have: the 2nd gas supply line 76 and be located at switch valve 78 in the way of the 2nd gas supply line 76 and 1st node of adjuster 80, the 2 gas supply lines 76 on the 1st gas supply line 54 that is located between malleation air pressure source of supply 50 and the switch valve 56 extends to the 2nd node 74 on the exhaust line 66 that is located between fan 70 and the 2nd manifold 64.
If the switch valve 48 that stops to attract the fan 70 of exhaust portion 46 and open the 2nd gas supply part 48, then barotropic gas, be that air is flowed through the 1st gas supply line 54 → the 1st node 72 → the 2nd gas supply line 76 → the 2nd node 74 → exhaust line 66 by barotropic gas source of supply 50 and is fed in the 2nd manifold 64, thereby air is distributed the coating zone M that is fed to come-up workbench 10 from the 2nd manifold 64 with the pressure of regulation COTIn interior whole attraction mouths 18.
This liquid coating unit against corrosion makes the coating zone M of come-up workbench 10 in order to utilize FEEDBACK CONTROL COTIn come-up height (apart from the distance of the worktable upper surface) H of substrate G GWith setting value H SUnanimity is equipped with the highly optical distance sensor 84 of measurement section 82 (Fig. 5) of come-up as shown in Figure 3 on nozzle supporting member 38.Usually, going up the optical distance sensor 84 of configuration pair of right and left, so that measure the come-up height H of the end, the left and right sides of substrate G with the horizontal direction (Y direction) of substrate throughput direction quadrature G(Fig. 2).
This optical distance sensor 84 be used for optical method for measuring from the height and position of the regulation that coating processing is used and under object, i.e. float distance D between the workbench 10 aAnd and substrate G between distance D bCome-up height measurement section 82 (Fig. 5) is according to above-mentioned measuring distance D a, D bThickness T with substrate G G(set value) is by operational formula [H G=D a-(D b+ D G)] and obtain the substrate-levitating height H GMeasured value.
This liquid coating unit against corrosion also has come-up height monitoring unit 86 (Fig. 5), and this come-up height monitoring unit 86 is used for the come-up height H of supervision substrate G under the gap nozzle 14 near GOn the pilot wire of regulation, whether surpassed feasible value partly.
As shown in Figure 2, this come-up height monitoring unit 86 configuration light transmission department 88 and light receiver 90 relatively on pilot wire, this pilot wire is positioned at the left and right sides of come-up workbench 10 across come-up workbench 10 ground, with come-up height setting value H SThe come-up height of corresponding regulation is transverse on the come-up workbench 10 along the Y direction.At coating zone M COTIn, in the come-up height H of substrate G GWith come-up height setting value H SOn the pilot wire of roughly unanimity, and come-up height monitoring unit 86 any one all constitutes: when substrate surface is smooth, thereby the top that the light beam LB that projects from light projection unit 88 as shown in Figure 3 passes through substrate G in the mode of skimming over arrives light accepting part 90.But, the come-up height H of the somewhere substrate G on pilot wire GGreater than come-up height setting value H SThe time, light beam LB is by the reflection of the side of substrate G or upper surface and can't arrive light accepting part 90, and therefore, come-up height monitoring unit can detect this situation.
The function for monitoring of this come-up height monitoring unit 86 is used for judging whether the attraction mouth 18 of come-up workbench 10 situation about stopping up has taken place as described later near pilot wire.
Fig. 4 is used to represent the structure of nozzle reproducing unit 24.Be provided with simultaneously in 1 housing 92 in nozzle reproducing unit 24: the gap nozzle cleaning part 100 that makes a spot of liquid against corrosion be discharged in the gap nozzle 14 as preparing in advance of coating processing and be wound up into the startup filling handling part 96 that starts on the filling roller 94, the outlet of gap nozzle 14 remained on the nozzle slot 98 the atmosphere of solvent vapo(u)r from preventing dry purpose and be used to clean the outlet periphery of gap nozzle 14.
The gap nozzle 14 of having finished the primary coating processing at first utilizes gap nozzle cleaning part 100 to carry out cleaning treatment, follows standby in nozzle slot 98, is beginning to utilize startup filling handling part 96 to start the processing of annotating before the coating processing next time.
For each one (96 that gap nozzle 14 is arrived in the nozzle reproducing unit 24,98,100) and under the control of controller 110 (Fig. 5), the directions X moving part 102 (Fig. 1) that utilization is made of for example ball screw framework and make nozzle reproducing unit 24 integral body, be that housing 92 moves abreast with substrate throughput direction (directions X), and, utilize nozzle elevating mechanism 36 (Fig. 1, Fig. 5) and gap nozzle 14 go up to be moved in vertical direction (Z direction).
In this embodiment, on the lower surface of the housing 92 of nozzle reproducing unit 24, planar suction nozzle 102 is installed, and via blast pipe 106 suction nozzle 102 is connected and is used for starting the exhaust apparatus 104 that filling handling part 96 carries out exhaust.On blast pipe 106, be provided with switch valve 108.This suction nozzle 102 is used when the attraction mouth 18 of come-up workbench 10 is cleared away as described later.
Fig. 5 represents the primary structure of the control system in the liquid coating unit against corrosion of this embodiment.Controller 110 is made of microcomputer, receive measured value or pilot signal etc. from come-up height measurement section 82, come-up height monitoring unit 86 etc., thereby control conveying mechanism 12, substrate are moved into portion 20, substrate and are taken out of portion 22, nozzle reproducing unit 24, nozzle elevating mechanism 36, liquid organization of supply against corrosion the 40, the 1st gas supply part 44, attract action and whole action (in proper order) separately such as exhaust portion the 46, the 2nd gas supply part 48.In addition, controller 110 also is connected with master controller, other external device (ED)s (not shown).
At this, illustrate that the liquid against corrosion in this liquid coating unit against corrosion applies action.At first, by sorting mechanism or conveying mechanical arm substrate G is moved into the regional M that moves into of come-up workbench 10 from the substrate board treatment (not shown) of previous stage INIn, at slide block 28 maintenances and the reception substrate G of this wait.On come-up workbench 10, substrate G under the effect of the air pressure that ejects from squit hole 16 (lift) and showy aloft.
Like this, so that substrate G is the mode of flat-hand position along substrate throughput direction (directions X) come-up conveying substrate G, at the coating zone M by the workbench central portion COTThe time, gap nozzle 14 towards under substrate G be the banded liquid R against corrosion of discharge with the pressure or the flow of regulation, thereby as shown in Figure 3 from the coat film RM of the liquid against corrosion of the distolateral backward formation uniform film thickness of front of substrate G.
When the below of gap nozzle 14 is passed through in the rear end of substrate G, then on the one side of substrate, be formed with the coat film RM of liquid against corrosion.Then, also utilize slide block 28 after the substrate G and come-up is transported on the come-up workbench 10, thereby be set in the regional M that takes out of on the rear end of come-up workbench 10 certainly OUTBe sent in the unit (not shown) of back one-level by sorting mechanism or conveying mechanical arm.
Next, illustrate that with reference to Fig. 6～Fig. 9 the come-up workbench in the liquid coating unit against corrosion of present embodiment attracts a mouthful cleaning function.
As shown in Figure 6, at the coating zone M of workbench 10 that floats COTIn gap nozzle 14 under near, when whole or most attraction mouthfuls 18 takes place to stop up, in the coating processing, behind the back side of substrate G, promptly sucked to adjacent attraction mouth 18 from the air effect of each ejiction opening 16 ejection.
Controller 110 will apply the substrate-levitating height H of usefulness in the following way GMaintain setting value H SNear (for example 50 μ m): close switch valve 48 and block the 2nd gas supply part 48, the 1st gas supply part 44 move simultaneously with attracting exhaust portion 46, thereby substrate G passed through coating zone M COTIn part apply by from caused vertically upward the power of the air (compressed air) of ejiction opening 16 ejection the time, self-gravitation mouth 18 applies by the caused power vertically downward of negative pressure suction force, thus antagonism, two directions the each other equilibrium of forces of control.In this case, controller 110 can controlled adjuster 58 or fan 70, thus so that the come-up height measurements H that is drawn by come-up height measurement section 82 GWith setting value H SConsistent mode is carried out FEEDBACK CONTROL.
But, as shown in Figure 7, at the coating zone M of come-up workbench 10 COTIn gap nozzle 14 under near, in a considerable amount of attractions mouthfuls 18 because interior narrow gas passage 18a has deeply sandwiched foreign matter Q when stopping up, in coating processing, although attract the fan 70 of exhaust portion 46 to be rotated (attraction exhaust) action, but produced the attraction mouth 18 that stops up and to have produced attraction, therefore attracting near mouthfuls 18, from the showy power of ejiction opening 16 and come the balance between the gravitation of self-gravitation mouth 18 destroyed, causing the substrate-levitating height H GBe higher than setting value H partly S
In this case, even come-up pressure feedback controlling organization as described above (controller 110, come-up height measurement section the 82, the 1st gas supply part 44, attraction exhaust portion 46) normally plays a role, also tend to over sight (OS) substrate-levitating height H GUnusual (the heaving) of locality.
But, the come-up height H of the somewhere substrate G on pilot wire GStably (substrate G passing through during) surpasses come-up height setting value H SThe time, as shown in Figure 7, light beam LB is blocked (can't arrive light accepting part 90) by substrate G, so come-up height monitoring unit 86 can detect these abnormal conditions and circular is given controller 110.In addition, though also can be blocked by this foreign matter with light beam LB in the foreign matter at the upper surface of substrate G, this is temporary, this foreign matter by after will be disengaged unusually, cause and can easily distinguish above-mentioned two kinds of different situations.
Controller 110 can be judged when come-up height monitoring unit 86 certainly receives the pilot signal of such unusual circular about the substrate-levitating height: at the coating zone M of come-up workbench 10 COTIn, obstruction has taken place near a considerable amount of attractions under the gap nozzle 14 mouthfuls 18 at least.
In addition, judging that (detections) goes out under the situation of the obstruction that attracts mouth 18 as described above, controller 110 is reported to the police by display (not shown), perhaps on the basis of having obtained the resume situation that attracts mouth 18, be in due course, for example finished after the batch processing that needs, controlled and carry out come-up workbench attraction mouthful cleaning action.
Attract in mouthful cleaning action at this come-up workbench, controller 110 will be relevant with coating processing action (substrate-levitating action, substrate are carried action, liquid supply against corrosion action) temporarily all be made as halted state, open switch valve 78 then and make 48 work of the 2nd gas supply part.And, open switch valve 56 and the 1st gas supply part 44 also worked.In addition, switch valve 68 cuts out.
Because the 1st gas supply part 44 is connected with barotropic gas source of supply 50 side by side with the 2nd gas supply part 48 and is respectively equipped with adjuster 58,80, therefore, can set or adjust the air pressure of utilizing the 1st gas supply part 44 to be fed to ejiction opening 16 and utilize the 2nd gas supply part 48 to be fed to attract mouthfuls 18 air pressure independently.Usually, attract in mouthful cleaning action at the come-up workbench, preferably will utilize the 2nd gas supply part 48 to be fed to the air pressure that attracts mouth 18 and be adjusted into the sufficiently high value that is suitable for to be piled up in the foreign matter discharge that attracts in the mouth 18, and the air pressure that will utilize the 1st gas supply part 44 to be fed to ejiction opening 16 is adjusted into the lower value of the unapproachable such degree of dust.
By making 48 work of the 2nd gas supply part, make air (compressed air) be fed to coating zone M via the 1st gas supply line 54 → exhaust line 66 → the 2nd manifolds 64 as described above from barotropic gas source of supply 50 COTInterior each attracts mouth 18.
As shown in Figure 8, in the attraction mouth 18 that stops up has taken place, be used to air pressure from the 2nd manifold 64 sides, with sandwich in the 18a of gas passage foreign matter Q with the mode extruded towards above discharge.At this moment, because the 1st gas supply part 44 is also worked, needn't worry that therefore the foreign matter Q that self-gravitation mouth 18 is discharged enters near ejiction opening 16.
On the other hand, controller 110 is after making gap nozzle 14 rise to the position higher than nozzle reproducing unit 24, nozzle reproducing unit 24 is slided move to gap nozzle 14 under the position, thereby will be installed in the coating zone M that planar suction nozzle 102 on the lower surface of housing 92 of nozzle reproducing unit 24 covers come-up workbench 10 as shown in Figure 8 COTOn.Then, open switch valve 108 and make exhaust apparatus 104 work (Fig. 4).
Thus, the foreign matter Q that self-gravitation mouth 18 is discharged is inhaled into suction nozzle 102 apace with air, transmits to exhaust apparatus 104 by blast pipe 106.
Utilizing the 2nd gas supply part 48 to catch another preferred embodiment of the foreign matter Q of self-gravitation mouth 18 discharges as being used to, also can be that the emulation substrate 114 that as shown in Figure 9 lower surface is pasted with adhesive sheet 112 covers coating zone M COTOn mode.In this case, the foreign matter Q that self-gravitation mouth 18 is discharged is attracted on the adhesive sheet 112, therefore can not go up volume or once more attached on the come-up workbench 10.
In addition, when emulation substrate 114 attracts mouthful cleaning action beginning at the come-up workbench, moved into the regional M that moves into of come-up workbench 10 in the same manner with processed substrate G INIn, and the mode of being carried with come-up by conveying mechanism 12 is transferred to coating zone M COTThen, after the come-up workbench that is through with attracts mouthful cleaning action, by conveying mechanism 12 to taking out of regional M OUTTransfer, thereby take out of regional M certainly OUTOutside come-up workbench 10, take out of.
Like this, in this liquid coating unit against corrosion, with ejiction opening 16 be arranged on with mixing the come-up workbench 10 coating zone M COTIn attraction mouth 18 attract action during (mainly being in the coating processing process) can inadvertently suck the foreign matter that floats around come-up workbench 10, thereby cause attracting piling up in mouthfuls 18 foreign matter is arranged.But according to this embodiment, by when coating processing is suspended or chien shih interval of coating processing attract exhaust portion 44 to stop and making 48 work of the 2nd gas supply part, can not spend artificial just the removal automatically and expeditiously and attract mouthfuls 18 obstruction.
In addition, be located at gap nozzle 14 under near, the come-up height H of somewhere substrate G on the pilot wire that extends along the Y direction GStably (substrate G passing through during) surpasses come-up height setting value H SThe time, can utilize come-up height monitoring unit 86 to detect this abnormal conditions.In addition, when controller 110 receives the pilot signal of such unusual circular about the substrate-levitating height in come-up height monitoring unit 86 certainly, obstruction has taken place near can judge under the gap nozzle 14 a considerable amount of attractions mouthfuls 18, thereby finds that being used to carry out the come-up workbench attracts mouthful optimal opportunity of cleaning action.
More than, illustrated preferred embodiment of the present inventionly, but the present invention is not limited to above-mentioned embodiment, can carry out various distortion or change in the scope of its technical conceive.
For example, as shown in figure 10, also can be the 2nd gas supply line 76 that makes the 2nd gas supply part 48 from the 1st gas supply line 54 branches and the bypass mode that connects to exhaust line 66.In this case, on node between the 1st gas supply line 54 and the 2nd gas supply line 76 and the node between the 2nd gas supply line 76 and the exhaust line 66, be respectively equipped with transfer valve, for example triple valve 116,118.
In addition, in the way of the 2nd gas supply line 76, be provided with compression box 120, from the barotropic gas of barotropic gas source of supply 50, and open with making the interrupted and pulse feature of switch valve 78 by compression in compression box 120, can be as shown in Figure 11 with than former pressure P sEspecially high pressure P UpThe interrupted and impact ground of air be fed in the attraction mouth 18 of come-up workbench 10, be deposited in the foreign matter Q that attracts in the mouth 18 thereby remove efficiently.
In addition, in the configuration example of Figure 10, when triple valve 116 is switched to the 2nd gas supply line 76, can not be supplied to from the barotropic gas of barotropic gas source of supply 50 in the ejiction opening 16 of come-up workbench 10.Thus, when carrying out come-up workbench attraction mouth cleaning action, the 1st gas supply part 44 is stopped fully.But, can certainly omit triple valve 116, also work with the 2nd gas supply part 48 simultaneously, thereby attract in mouthful cleaning action at the come-up workbench by making the 1st gas supply part 44, certainly air not only is fed to and attracts also to be fed to together in the ejiction opening 16 in the mouth 18.
Though omitted diagram, in the 2nd gas supply part 48, also can adopt different with factory public barotropic gas source of supply 50, barotropic gas source of supply independently.In addition, also can constitute the fan 70 that attracts exhaust portion 46, and be used for the barotropic gas source of supply of the 2nd gas supply part 76 usefulness in reversible mode.In this case, can directly exhaust line 66 be used as the 2nd gas supply line 76.
In addition, for the cleaning that will utilize the 2nd gas supply part 48 to put on the attraction mouth 18 of come-up workbench 10 improves one-level to several grades with pressure, therefore, can be shown in Figure 12 A and Figure 12 B such suitable employing will be located at the coating zone M of come-up workbench 10 COTIn whole attraction mouths 18 be divided into a plurality of groups and be unit and with the group by switch valve 122 (1), 122 (2), 122 (3), 122 (4) ... and the structure that is connected with the 2nd gas supply line 76.
When making 48 work of the 2nd gas supply part, in other words when carrying out come-up workbench cleaning action, utilize controller 110, be that unit and timesharing ground are with switch valve 122 (1), 122 (2), 122 (3), 122 (4) with the group ... open, the concentrated area is fed to each with the air of high pressure and attracts in mouthfuls 18.
In addition, at the coating zone M of workbench 10 that floats COTIn to make ejiction opening 16 be arbitrarily with attracting mouthful 18 patterns that dispose with mixing, be not defined as illustrated Pareto diagram.
In addition, also can regularly implement come-up workbench as described above independently and attract a mouthful cleaning action from the function of come-up height monitoring unit 86.
Next, the 2nd embodiment of the present invention is described.In addition, omit explanation for the part identical with aforementioned embodiments.In the 2nd embodiment, with this point as feature: replace emulation substrate 114 illustrated in fig. 9, and adopt adsorption roller shown in Figure 13 151.The surface of adsorption roller 151 has viscosity, while by adsorption roller 151 being contacted with the surface of come-up workbench 10 and rotating and move, foreign matter Q can be adhered on the surface of adsorption roller 151.People also can and clean in the rotation on making adsorption roller 151 contact come-up workbench 10.Perhaps, also can be provided for making the adsorption roller elevating mechanism 152 of adsorption roller 151 liftings and be used to adsorption roller horizontal mobile mechanism 153 that adsorption roller 151 is moved horizontally, adsorption roller 151 automatically be moved clean by utilizing controller 110 to control adsorption roller elevating mechanism 152 and adsorption roller horizontal mobile mechanism 153.In addition, can on adhesive sheet, roll by making adsorption roller 151, thereby and remove foreign matter Q and utilize adsorption roller 151 again.Perhaps can be by cleaning adsorption roller 151 with cleaning fluid, thus and remove foreign matter Q and utilize adsorption roller 151 again.
Then, the 3rd embodiment of the present invention is described.In addition, omit explanation for the part identical with aforesaid embodiment.In the 3rd embodiment, with this point as feature: suction nozzle 102 illustrated in fig. 4 has and coating zone M COTRoughly the same width.By being provided with like this, the foreign matter Q that can in the shorter time self-gravitation mouth 18 be blown out removes.In addition, be located at a plurality of attractions hole 154 on the lower surface of suction nozzle 102 preferably to be provided with the corresponding mode in position that attracts mouthfuls 18.By being provided with like this, constriction attracts mouthful as much as possible, and the traffic attraction that can not increase exhaust apparatus 104 is just removed foreign matter Q expeditiously.
In addition, suction nozzle 102 attracts foreign matter Q with the state that the workbench 10 that floats certainly leaves upward, but suction nozzle 102 is contacted with come-up workbench 10, thereby can remove foreign matter Q more expeditiously.About this point, emulation substrate 114 illustrated in fig. 9 is so same, also can stop the come-up of emulation substrate 114, and emulation substrate 114 is contacted with come-up workbench 10.
In addition, for suction nozzle illustrated in fig. 8 102, because the length of its directions X is less than coating zone M COTLength, therefore, when removing foreign matter Q, suction nozzle 102 is scanned along directions X.Therefore, such as described above, shown in Figure 12 A and Figure 12 B, will be located at the coating zone M of come-up workbench 10 COTIn whole attraction mouths 18 be divided into a plurality of groups, and be unit and with the group ... and be connected with the 2nd gas supply line 76 by switch valve 122 (1), 122 (2), 122 (3), 122 (4).In addition, also can be that unit attracts a mouthful cleaning action with the group, if move the position of group, then make suction nozzle 102 along directions X scanning accordingly, thereby can remove foreign matter Q more expeditiously.
Next, the 4th embodiment of the present invention is described.In addition, omit explanation for the part identical with aforementioned embodiments.In the 4th embodiment, also can from the 2nd gas supply part 48 before attracting mouthful 18 supply air and attracting mouthful cleaning action, will as the solvent of liquid against corrosion, diluent spreads on the come-up workbench 10, and supply air at the appointed time and attract to blow out in mouthfuls 18 and with foreign matter Q self-gravitation mouth 18.In addition, also can scatter diluent, and the back utilizes attraction exhaust portion 46 to make air entry 18 attract action at the appointed time, thereby attract to remove diluent and foreign matter Q.Also can replace diluent and adopt pure water or ethanol.In addition, adopting like this under the situation of liquid (diluent, pure water, ethanol etc.), after in supplying air to air entry 18 and with foreign matter Q self-gravitation mouth 18, blowing out, through the stipulated time, self-gravitation mouth 18 blow out air can carry out drying to the liquid that enters into air entry 18.In addition, air entry 18 is attracted move attracting to remove under the situation of liquid and foreign matter Q, by after stipulated time in proceed to attract to move, also can carry out drying to the liquid that enters into air entry 18.
Next, the 5th embodiment of the present invention is described.In addition, omit explanation for the part identical with aforementioned embodiments.In the 5th embodiment, when utilizing controller 110 to control the adjuster 58 among Figure 10 and carrying out come-up workbench attraction mouth cleaning action, be set at the pressure that is higher than when common by controlled adjuster 58 and with the supply pressure of air, can remove foreign matter Q more expeditiously.
Next, the 6th embodiment of the present invention is described.In addition, omit explanation for the part identical with aforementioned embodiments.In the 6th embodiment, as shown in figure 14, be feature: constitute the 2nd gas supply part 48 with fan 155 with this point.By making fan 155 work, air can be supplied to the 2nd manifold 64.Fan 155 utilizes gas supply line 156 and is connected with exhaust line 66, on the connecting portion of gas supply line 156 and exhaust line 66, be provided with triple valve 157, by switch three-way valve 157, air entry 18 is connected with fan 70, perhaps make to attract mouthfuls 18 to be connected with fan 155.In addition, fan 155 and triple valve 157 are by controller 110 controls.By being set as such structure, can making the pipe arrangement of air feed, exhaust simple, thereby improve the reliability of device.
Next, the 7th embodiment of the present invention is described.In addition, omit explanation for the part identical with aforementioned embodiments.The 7th embodiment is the variation of the 6th embodiment.As shown in figure 15, in the way of exhaust line 66, be provided with fan 70.Between discharge duct 62 and fan 70, be provided with triple valve 158, between fan 70 and the 2nd manifold 64, be provided with triple valve 159.Be provided with the pipeline 160 that is used to connect triple valve 158 and triple valve 159 in addition.In addition, on the exhaust line 66 between fan 70 and the triple valve 159, be connected with atmosphere suction line 161.In addition, in the way of atmosphere suction line 161, be provided with switch valve 162.The switching of triple valve 158, triple valve 159, switch valve 162 is by controller 110 controls.
In the 7th embodiment, when self-gravitation mouth 18 attracts, switch valve 162 cuts out, so that the mode that the 2nd manifold 64 is connected with fan 70 is come switch three-way valve 159, so that the mode that fan 70 is connected with discharge duct 62 is come switch three-way valve 158.Thus, foreign matter self-gravitation mouth 18 is attracted.Then, when implementing to attract the cleaning action of mouth 18, switch valve 162 is opened, so that the mode that fan 70 is connected with pipeline 160 is switched logical square valve 158, so that pipeline 160 comes switch three-way valve 159 with the mode that the 2nd manifold 64 is connected.Thus, the air that the top of arrogant aspiration skirt line 161 is attracted is fed in the 2nd manifold 64, thereby implements to attract mouthfuls 18 cleaning action.Utilize such structure and action, 1 fan 70 only is set just can switches, thereby can reduce number of fans the attraction action and the cleaning action that attract mouth 18.
As the treatment fluid among the present invention, except that liquid against corrosion, can be the coating liquid of interlayer dielectic, dielectric substance, wiring material etc. for example, also can be various soups and developer solution, flushing liquor (rinse) etc.Processed substrate among the present invention is not limited to the LCD substrate, and the flat-panel monitor that also can be other is with substrate, semiconductor crystal wafer, CD substrate, photomask, printed circuit board (PCB) etc.
In addition, in the present embodiment, adopt liquid coating unit against corrosion that the present invention is described, but the present invention is not limited to liquid coating unit against corrosion, also can use the come-up workbench of come-ups such as FPD substrate, semiconductor crystal wafer or FPD substrate, semiconductor crystal wafer etc. testing fixture, be used to carry the attraction maintaining part etc. of the manipulator of FPD substrate, semiconductor crystal wafer etc., be included in the interest field certainly.

Claims (20)

1. base board delivery device, wherein,
Comprise:
The come-up workbench, it has makes many ejiction openings and many attraction mouths that the 1st come-up zone that forms is set with mixing;
The 1st gas supply part, it is in order to make processed substrate under the effect of the pressure of the gas of above-mentioned ejiction opening ejection and float, and the gas of malleation is fed to above-mentioned ejiction opening;
Attract exhaust portion, it is drawn into the come-up height that attraction in the above-mentioned attraction mouth is controlled above-mentioned processed substrate in order to utilize with gas, applies negative pressure to above-mentioned attraction mouth;
Conveying mechanism, it is used to remain on and flies at aerial above-mentioned processed substrate on the above-mentioned come-up workbench and so that above-mentioned processed substrate is carried above-mentioned processed substrate by the mode in above-mentioned the 1st come-up zone;
The 2nd gas supply part, it is for to clearing away in the above-mentioned attraction mouth, and the gas of malleation is fed to above-mentioned attraction mouth.
2. base board delivery device according to claim 1, wherein,
Have planar drawing section, make above-mentioned the 2nd gas supply part duration of work, this planar drawing section is used for covering from the top part or all of above-mentioned the 1st come-up zone, and draws the foreign matter that is mixed in by in the gas of above-mentioned attraction mouth ejection.
3. base board delivery device according to claim 1, wherein,
Have planar adsorption section, make above-mentioned the 2nd gas supply part duration of work, this planar adsorption section is used for covering from the top part or all of above-mentioned the 1st upper area, and absorption is mixed in by the foreign matter in the gas of above-mentioned attraction mouth ejection.
4. base board delivery device according to claim 3, wherein,
On above-mentioned come-up workbench, can utilize above-mentioned conveying mechanism to carry above-mentioned planar adsorption section in the same manner with above-mentioned processed substrate, before the work of the 2nd gas supply part begins or after just having begun, above-mentioned planar adsorption section is taken on the 1st come-up zone, after the end-of-job of above-mentioned the 2nd gas supply part, above-mentioned planar adsorption section is taken away from above-mentioned the 1st come-up zone.
5. base board delivery device according to claim 1, wherein,
Comprise:
Come-up height control part, it is used for controlling at least one side who is fed to the gas pressure of above-mentioned ejiction opening and is put on the vacuum pressure of above-mentioned attraction mouth by above-mentioned exhaust portion by above-mentioned the 1st gas supply part, so that the come-up height of the above-mentioned processed substrate in above-mentioned the 1st come-up zone is consistent with come-up height setting value;
Come-up height monitoring unit, its adopt with the horizontal direction of the throughput direction quadrature of above-mentioned processed substrate on the light beam that can on above-mentioned come-up workbench, cross with height with the corresponding regulation of above-mentioned come-up height setting value monitor the come-up height of above-mentioned processed substrate with optical means;
Attract a mouthful obstruction test section, it is being detected when the come-up of crossing the above-mentioned processed substrate in somewhere on the transfer path of above-mentioned light beam has surpassed feasible value highly stablely by above-mentioned come-up height monitoring unit, judge under the above-mentioned light beam or above-mentioned light beam near the above-mentioned attraction mouth of a part blocked.
6. base board delivery device according to claim 1 or 5, wherein,
When in to above-mentioned attraction mouth, clearing away, thereby when making above-mentioned the 2nd gas supply part work make gas, gas is sprayed by above-mentioned ejiction opening thereby above-mentioned the 1st gas supply part is also worked by above-mentioned attraction mouth ejection.
7. base board delivery device according to claim 1 or 5, wherein,
When above-mentioned attraction mouth is cleared away, above-mentioned the 1st barotropic gas supply department is under the state that stops or suspending, make above-mentioned the 2nd gas supply part work and gas is sprayed by above-mentioned attraction mouth.
8. base board delivery device according to claim 1 or 5, wherein,
Above-mentioned the 2nd gas supply part comprises the barotropic gas source of supply shared with above-mentioned the 1st gas supply part.
9. base board delivery device according to claim 8, wherein,
Above-mentioned the 1st gas supply part has the 1st gas supply line that extends to above-mentioned ejiction opening from above-mentioned barotropic gas source of supply;
Above-mentioned exhaust portion has source of negative pressure and extends to the exhaust line of above-mentioned attraction mouth from above-mentioned source of negative pressure;
Above-mentioned the 2nd gas supply part has the 2nd gas supply line, and the 2nd gas supply line extends to the 2nd node on the above-mentioned exhaust line from the 1st node on the above-mentioned gas supply line.
10. base board delivery device according to claim 9, wherein,
At least one of the above-mentioned the 1st and the 2nd node is provided with transfer valve.
11. base board delivery device according to claim 8, wherein,
Above-mentioned the 2nd gas supply part has the 2nd gas supply line, and the 2nd gas supply line extends to the node of the regulation on the above-mentioned exhaust line from above-mentioned barotropic gas source of supply.
12. base board delivery device according to claim 11, wherein,
Above-mentioned node is provided with transfer valve.
13. base board delivery device according to claim 9, wherein,
Above-mentioned the 2nd gas supply line is provided with switch valve.
14. base board delivery device according to claim 13, wherein,
On above-mentioned the 2nd gas supply line, have the compression box that is used to compress from the barotropic gas of above-mentioned barotropic gas source of supply, and will be by the barotropic gas of above-mentioned compression box compression interrupted and impact be fed to above-mentioned attraction mouth.
15. base board delivery device according to claim 1, wherein,
Above-mentioned the 2nd gas supply part comprises and the barotropic gas source of supply barotropic gas source of supply independent of each other that has adopted above-mentioned the 1st gas supply part.
16. base board delivery device according to claim 1, wherein,
Being divided into a plurality of groups will being located at the above-mentioned attraction mouth of above-mentioned the 1st come-up in the zone, when making above-mentioned the 2nd gas supply part work, is unit and timesharing ground switches with the group, thereby to clearing away in the above-mentioned attraction mouth.
17. base board delivery device according to claim 1, wherein,
The upstream side in the above-mentioned 1st come-up zone of above-mentioned come-up workbench on the substrate throughput direction has the 2nd come-up zone, and the 2nd come-up zone is provided with and is used to many ejiction openings that above-mentioned processed substrate is floated.
18. base board delivery device according to claim 17, wherein,
In above-mentioned the 2nd come-up zone, be provided with the portion that moves into that is used to move into above-mentioned processed substrate.
19. base board delivery device according to claim 1 is characterized in that,
The downstream in the above-mentioned 1st come-up zone of above-mentioned come-up workbench on the substrate throughput direction has the 3rd come-up zone, and the 3rd come-up zone is provided with and is used to many ejiction openings that above-mentioned processed substrate is floated.
20. base board delivery device according to claim 19, wherein,
In above-mentioned the 3rd come-up zone, be provided with the portion that takes out of that is used to take out of above-mentioned processed substrate.
CN2011100448870A 2010-02-24 2011-02-24 Substrate conveying device Pending CN102161026A (en)

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Application publication date: 20110824