KR101483224B1 - Apparatus for detecting particles in porous parts - Google Patents

Apparatus for detecting particles in porous parts Download PDF

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Publication number
KR101483224B1
KR101483224B1 KR1020140164929A KR20140164929A KR101483224B1 KR 101483224 B1 KR101483224 B1 KR 101483224B1 KR 1020140164929 A KR1020140164929 A KR 1020140164929A KR 20140164929 A KR20140164929 A KR 20140164929A KR 101483224 B1 KR101483224 B1 KR 101483224B1
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South Korea
Prior art keywords
chamber
component
gas
particles
jig
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KR1020140164929A
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Korean (ko)
Inventor
김진호
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주식회사 올루
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Priority to KR1020140164929A priority Critical patent/KR101483224B1/en
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Publication of KR101483224B1 publication Critical patent/KR101483224B1/en
Priority to PCT/KR2015/012157 priority patent/WO2016085167A1/en

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume, or surface-area of porous materials
    • G01N15/02—Investigating particle size or size distribution
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume, or surface-area of porous materials
    • G01N15/10—Investigating individual particles

Abstract

The present invention relates to a device for detecting and inspecting particles adhered on a porous component in which multiple holes are formed, wherein the device comprises a housing constituting the outer appearance of the device; a fan filter unit formed at the top of the housing, absorbing air from the outside to be filtered, and supplying pure air into the device; a feeding pipe connected with the chamber, feeding the pure air in the device into a chamber to be cleaned, and equipped with a feeding valve formed in the middle thereof; a chamber formed at the bottom of the fan filter unit, having an inspection target component mounted on a jig at the top thereof, and feeding gas sprayed from a jet nozzle and passing through the pores of the component; a jet nozzle installed to be disposed at the top of the chamber, spraying a gas towards the component mounted on the jig, and separating particles adhered on the holes of the component; a particle counter installed at the bottom of the chamber, connected with the inside of the chamber by means of a feeding line, feeding the gas in the chamber, and detecting and counting particles included in the fed gas; a vacuum pump installed in a vacuum feeding pipe connected with the bottom of the chamber, generating vacuum absorptive power in the chamber to induce the gas passing through the holes of the component into the chamber, and feeding the induced gas to the particle counter; and a discharging fan installed in a discharging pipe connected with the bottom of the chamber and discharging the air in the chamber to the outside.

Description

[0001] APPARATUS FOR DETECTING PARTICLES IN POROUS PARTS [0002]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a particle inspection apparatus for a component, and more particularly, to an apparatus for detecting and inspecting particles attached to a porous forming component having a plurality of holes formed therein, .

Generally, semiconductor and display manufacturing processes are high-tech industries that include highly precise processes at the nano level. Even the minute environmental conditions at the site where the products are manufactured can greatly affect the quality of products, Component contamination of the manufacturing apparatus may be caused by polishing, etching, photoresist, dry etching, etc., from a chemical liquid, a raw material, a material, or from a robot, a structural component in a chamber, a component material, or the like.

In addition, pollutants causing parts contamination are classified into ionic contamination and non-ionic contamination, and ionic contamination is caused by alkali metal ions such as Na + , Li + , K + , and halogen anions such as F - and Cl - Non-ionic contamination is wax, oil, photoresist residue, heavy metal, organic pollution by precious metal, and inorganic pollution by carbon, oxide film, oxide.

As the miniaturization of the device progresses, the surface contamination directly affects the reliability of the device and the yield of mass production, and therefore, the removal of minute inorganic or organic particles becomes an important problem.

For example, semiconductor and display manufacturing apparatuses are composed of various components. When particles such as dust adhere to these components and remain, these particles form a film on a wafer, a glass substrate, a sapphire substrate, or the like, , The particles are adhered to the surface during the etching process of the film, resulting in fatal defects such as pattern defects.

 Therefore, it is required that the manufacturing process of the semiconductor and the display such as the gas supply path of the reaction furnace and the reaction chamber should be maintained and managed in a very clean state. In order to secure such cleanliness, After use, it is cleaned and mounted on the equipment.

The cleaning is performed by various methods such as a chemical agent, an ultrapure water, and a clean gas. The prior art relating to the particle inspection method before and after cleaning includes (1) (2) a method of inspecting with a surface particle counter such as Patent Document 1 for a surface particle counting method and apparatus, and the like.

However, in the case of (1), it is impossible to inspect water-soluble particles, and there arises an error problem in which bubbles generated during the process of immersing the components in water are counted as particles, and the consumption of ultrapure water .

In the case of (2), since the suction for counting the particles depends on the suction force by the suction of the air in the structure named as the scanner, the suction force of the pump includes a shower head, a cathode, , It is difficult to separate the particles existing in the holes where the fine pores are formed, and the particles in the holes are not well detected.

U.S. Patent No. 5,253,538 (registered on October 19, 1993)

The present invention has been made in order to solve all of the problems described above, and it is an object of the present invention to provide a porous forming device capable of detecting and counting particles remaining in a hole of a porous forming part and having excellent particle detection and counting efficiency, The particle zero environment is always maintained during the inspection, component contamination and particle count can be accurately inspected, and further, particles are prevented from adhering to parts due to the occurrence of product defects, thereby increasing the reliability and mass yield of the product The present invention has been made in view of the above problems.

According to an aspect of the present invention, there is provided an apparatus for detecting and inspecting particles attached to a porous forming component having a plurality of holes therein, the apparatus comprising: a housing constituting an outer periphery of the apparatus; A fan filter unit formed at an upper portion of the housing, for sucking air from the outside and then filtering the clean air to supply clean air into the apparatus; An inlet pipe connected to the chamber to clean the inside of the apparatus by flowing clean air into the chamber and having an inlet valve in the middle; A chamber formed on the lower side of the fan filter unit, in which a component to be inspected is mounted on an upper jig, a gas injected from the jet nozzle passes through the pores of the component and flows into the interior; A jet nozzle installed above the chamber for jetting a gas toward the component mounted on the jig to separate particles attached to the hole of the component; A particle counter installed on the lower side of the chamber and connected to the inside of the chamber by a suction line to detect particles included in the gas sucked after sucking the gas in the chamber and counting the particles; A vacuum suction pipe connected to a lower side of the chamber and generating a vacuum suction force in the chamber to guide the gas passing through the hole of the component into the chamber, Pump; And a discharge fan installed in a discharge pipe connected to the lower side of the chamber and discharging the air inside the chamber to the outside.

At this time, the housing is also provided with a main computer for controlling the operation of each component of the apparatus and a monitor for displaying a screen of the main computer.

In addition, the fan filter unit is characterized by including a prefilter installed on the upper part, a ULPA filter installed on the lower part, and a suction fan installed between the prefilter and the ULPA filter.

In addition, the chamber is also characterized in that a heating member for removing moisture on the surface of the component before and after the inspection is provided on the upper side or the lower side of the jig.

Further, the chamber is also characterized by having a closed door at the upper end thereof.

In addition, the chamber is also characterized in that the arc plasma apparatus is additionally provided so that particles can be separated by applying stress to the surface of the component mounted on the jig by arc plasma.

In addition, the chamber is also characterized in that a gas nozzle is provided at a lower portion thereof to remove particles of a component mounted on the jig.

The jet nozzle is also characterized in that an MFC for automatically controlling the supply amount of gas to the gas supply pipe is provided.

Furthermore, the particle counter is characterized in that the suction port provided at the upper end of the suction line is disposed inside the chamber, and the lower end of the suction line is disposed to pass through the inside of the vacuum suction pipe.

In addition, the vacuum suction pipe is provided with a vacuum pump valve and an MFM for measuring a flow rate, and the discharge pipe is provided with a discharge fan valve.

According to the present invention, it is possible to detect and count the particles remaining in the holes of the porous forming component, and to detect and count particles efficiently, and without causing any count error or error, The particle contamination and the particle count can be accurately checked, and further, the particles can be adhered to the parts to prevent the product from being defective, and the reliability of the product and the yield of mass production can be increased.

1 is a perspective view of a particle inspection apparatus of a porous forming part according to an embodiment of the present invention.
2 is a schematic diagram showing an internal configuration of a particle inspection apparatus for a porous forming part according to an embodiment of the present invention.
3 is an internal detail view of a particle inspection apparatus of a porous forming part according to an embodiment of the present invention.
4A to 4C are diagrams showing an upper part of a particle inspection apparatus of a porous forming part according to an embodiment of the present invention.
Figure 5 is a photograph of jet nozzles according to an embodiment of the present invention spraying onto a showerhead.
6A to 6D are views showing a method of inspecting a particle inspection apparatus of a porous forming part according to an embodiment of the present invention.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Reference will now be made in detail to the preferred embodiments of the present invention, examples of which are illustrated in the accompanying drawings, wherein like reference numerals refer to the like elements throughout.

A particle inspection apparatus (1) for a porous forming part according to the present invention relates to an apparatus for detecting and inspecting particles (P) attached to a porous formed part (D) having a plurality of holes (H) And includes a housing 100, a fan filter unit 200, an inlet pipe 300, a chamber 400, a jet nozzle 500, a particle counter 600, a vacuum pump 700, And is a device in which the injection of the chamber type jet nozzle 500 in which the particle counter 600 is connected to the chamber 400 and the vacuum suction of the vacuum pump 700 are combined.

Referring to FIG. 1, the housing 100 constitutes the outer periphery of the apparatus. The housing 100 has a rectangular parallelepiped shape with an installation space therein. The main computer 100 controls the operation of each component of the apparatus A keyboard 110 attached to one side of the housing 100 for inputting commands to the main computer and a monitor 120 for displaying a screen of the main computer. At this time, the keyboard 110 may be connected to the support base 111 so that the keyboard 110 can be moved or rotated, and a control display screen for controlling the nitrogen gas and measuring and displaying the flow rate of the MFC may be provided on one side of the monitor 120 Can be formed.

In addition, a USB, a LAN connection terminal, a spared tool, and a power connector for a computer interface may be installed on a lower side of the housing 100.

An upper door 130 is installed in the middle of the housing 100 and a see-through window 131 is provided in the upper door 130 so that the upper door 130 can be seen through the inside of the housing 100. A screen of a particle counter 600 installed at a lower portion of the housing 100, a compressed air regulator A, a nitrogen gas regulator N, etc. are installed in the lower door 140 A viewing window 141 may be included so that it can be viewed from the outside.

The fan filter unit 200 is formed on the upper portion of the housing 100 and filters air after sucking air from the outside to supply Class 1 clean air to the inside of the apparatus.

4A to 4C, the fan filter unit 200 is provided with a pre-filter 210 on the upper part thereof to primarily filter the air introduced from the outside, and a ULPA filter 220, Ultra-Low Penetration Air Filter) is installed to collect most of the fine particles and supply clean air to the inside of the device.

In addition, a suction fan 230 is installed between the pre-filter 210 and the ULPA filter 220 to allow the outside air to be sucked into the apparatus.

2 and 3, the inflow pipe 300 is connected to a side surface of the chamber 400 to introduce purified air supplied into the chamber 400 into the chamber 400, And an inflow valve 310 for cleaning and purifying the interior and for determining inflow and outflow of clean air in the middle.

In this way, clean air is introduced into the chamber 400 through the inflow pipe 300 to operate the apparatus, so that the particle zero environment is always maintained during inspection, and component contamination and particle count can be accurately inspected.

The chamber 400 is formed on the lower side of the fan filter unit 200 and is configured to trap the particles introduced by the gas injection of the jet nozzle 500 or the particles separated by the vacuum suction force of the vacuum pump 700 A jig 410 is formed at an upper portion of the jig 410 so that a component D to be inspected is fixedly mounted on the jig 410 and a gas injected from the jet nozzle 500 is supplied to a plurality of holes (H), and is then introduced into and accommodated in the chamber (400).

In addition, the chamber 400 may be provided with a heating member (not shown) for removing moisture on the surface of the component D before and after the inspection on the upper side or the lower side of the jig 410.

In addition, a sealing door (not shown) may be installed on the upper portion of the chamber 400 so that the chamber 400 can be closed.

The chamber 400 is further provided with an arc plasma apparatus (not shown) to apply stress to the surface of the component D mounted on the jig 410 by the arc plasma, It is possible to separate the attached particles P to increase the separation efficiency.

In addition, the chamber 400 is provided with a gas nozzle (not shown) at a lower portion thereof to inject gas toward the component D mounted on the jig 410 to form particles P attached to the pores of the component D, Or more efficiently.

5, the jet nozzle 500 is installed on the upper side of the chamber 400 and injects gas toward the component D mounted on the jig 410 as shown in FIG. 5 (c) So that the particles P attached to the holes H of the component D are separated and introduced into the chamber 400.

At this time, the gas injected from the jet nozzle 500 is preferably a compressed nitrogen gas (N 2 ). As shown in FIG. 5 (b), when the gas is jetted from the jet nozzle 500 toward the component D The portion other than the hole H collides and is discharged to the outside, and the portion of the hole H desorbs the particles P adhering to the hole H while passing through the gas.

A support rod 510 is installed on one side of the upper part of the chamber 400 and a rotation rod 520 is rotatably mounted on the support rod 510. Between the support rod 510 and the rotation rod 520, A nozzle moving speed control valve 530 for determining the moving speed of the jet nozzle 500 is provided and a nozzle pipe 540 having the jet nozzle 500 formed at one end thereof penetrates the side surface of the rotating bar 520, And a gas supply pipe 550 is connected to the other end of the nozzle pipe 540.

In addition, an MFC (Mass Flow Controller) 560 is installed at the other end of the nozzle pipe 540 to automatically adjust the supply amount of the gas.

The particle counter 600 is installed on the lower side of the chamber 400 and is connected to the inside of the chamber 400 by a suction line 610. The particle counter 600 sucks gas in the chamber 400, And the particles P contained therein are detected and counted.

The particle counter 600 is provided with a suction port 620 at an upper end of the suction line 610 and the suction port 620 is disposed inside the chamber 400, And the lower end thereof is connected to the particle counter 600 on the lower side through the inside of the vacuum suction pipe 710.

The particles P separated from the hole H of the component D by the gas jet of the jet nozzle 500 are guided to the suction port 611 of the suction line 610 provided in the chamber 400 And the particles contained in the gas are detected and counted by the particle counter 600.

The vacuum pump 700 is installed in a vacuum suction pipe 710 connected to a lower side of the chamber 400 and generates a vacuum suction force in the chamber 400 to pass through a hole H of the component D And directs the introduced gas to be sucked into the particle counter 600 through the inlet port 620. [0042]

The vacuum suction pipe 710 is provided with a vacuum pump valve 720 for opening and closing the vacuum suction pipe 710 to determine whether a vacuum suction force is generated in the chamber 400, And an MFM (Mass Flow Meter) for measuring the gas flow rate to the pump 700 is installed.

The exhaust fan 800 is installed in a discharge pipe 810 connected to a lower side of the chamber 400 and discharges the air inside the chamber to the outside where the discharge pipe 810 is passed through a discharge pipe 810 And a valve 820 for an exhaust fan for determining whether or not air or gas to be introduced into or discharged from the engine is installed.

Accordingly, when the discharge fan valve 820 is opened and the discharge fan 800 is operated, the clean air introduced from the inlet pipe 300 flows into the chamber 400, passes through the discharge pipe 810 So that the inside of the chamber 400 can be cleaned.

Hereinafter, the operation of the particle inspection apparatus 1 of the porous forming part according to the present invention will be described in detail with reference to the drawings, with reference to the drawings.

6A, the clean air filtered by the fan filter unit 200 is introduced into the chamber 400 through the inlet pipe 300, and then the vacuum And is discharged to the outside through the suction pipe 710 and the discharge pipe 810 to clean and clean the inside of the chamber 400.

At this time, the vacuum pump 700 is operated to suck the air in the initial chamber 400, the discharge fan 800 is also operated, and the gas jet 200 is injected into the chamber 400 by the jet nozzle 500 Lt; / RTI >

In addition, air is sucked through the suction port 620 of the suction line 610, and the particle counter 600 detects and counts particles, thereby confirming whether the overall cleaned state inside the chamber 400 is close to zero, The overall particle state of the filter unit 200, the inflow pipe 300, the chamber 400, the jet nozzle 500, and the like can be confirmed.

Next, as shown in FIG. 6B, the inside of the chamber 400 is cleaned while the component D to be inspected is fixedly mounted on the jig 410.

That is, clean air filtered by the fan filter unit 200 is introduced into the chamber 400 through the inflow pipe 300 while the component D is mounted on the jig 410, and then the vacuum suction pipe 710 And the discharge pipe 810 to clean the inside of the chamber 400 and clean it.

This is done by controlling the main computer to purge the clean air with the main computer in order to remove background particles which are floating particles in the air inside the chamber 400 in the process of mounting the component D or in the previous test will be.

At this time, the jet nozzle 500 is rotated so as to face the outside of the chamber, and the compressed air is injected to discharge the nitrogen stagnated to the nozzle pipe 540, the gas supply pipe 550 and the like to the outside.

When all the valves are shut off, the air inside the chamber is sucked through the suction port 620 of the suction line 610, and the particle counter 600 counts the number of particles contained in the sucked air.

Next, as shown in FIG. 6C, the jet nozzle 500 provided at the tip of the nozzle tube 540 is rotationally moved to face the component D mounted on the jig 410 to spray the gas. The operation of the vacuum pump 700 and the discharge fan 800 is determined by checking the sensitivity of the recipe setting in consideration of the type of the component D and the size of the hole H. [

Here, sampling of the particles may be performed by air jet sampling by a jet nozzle 500, vacuum pump sampling alone or in combination.

Air jet sampling is a method in which clean nitrogen gas or compressed air supplied from a jet nozzle 500 passes through a hole H of a component D and drops particles P adhered to the inside of the hole H, To the inlet (620) of the suction line (610) inside the chamber (400) together with the gas or compressed air.

Vacuum suction sampling is carried out by the vacuum pump 700. The vacuum suction force generated by the vacuum pump 700 causes the air passing through the hole H of the component D to drop particles P attached to the interior of the hole H, 400 and the introduced air is guided to the suction port 620 of the suction line 610 inside the chamber 400.

The combined sampling is to sample the above-described air jet sampling and vacuum suction sampling simultaneously or sequentially, and the setting relating to the sampling of such particles can be specified through the recipe setting in the main computer of the apparatus.

6D, the gas spray time of the jet nozzle 500 is controlled so that the particles P separated from the holes H of the injected gas and the component D collide with the inner wall surface of the chamber 400, The gas injection of the jet nozzle 500 is immediately terminated and the particle counter 600 sucks gas or air in the chamber 400 to detect and count particles P included therein.

In this way, when all the valves are blocked and the component D is mounted on the jig 410 at the upper end of the chamber 400, a predetermined pressure is formed inside the chamber 400, When the gas is injected toward the part D from the upper side, the particles P separated from the hole H of the part D are floated in the chamber 400 by the pressure formed inside the chamber 400 And then the gas injection of the jet nozzle 500 is immediately terminated before the particle P separated from the part D collides against the inner wall surface of the chamber 400 and is reattached, The gas is sucked by the pump 700 to detect and count the particles P contained in the gas.

In general, if air is blown into the holes of the component, the separated particles will soon be blown to the periphery, adhere to the wall surface, can not be counted by the particle counter, and the detection and counting efficiency of the particles will be reduced. In addition, there is a problem that when the injection pressure of the air is lowered, the particles are not easily separated from the holes.

However, in the case of using the particle inspection apparatus 1 of the porous forming part according to the present invention, particles P separated from the hole H of the component D are blown off or attached to the inner wall surface of the chamber 400 The gas is prevented from remaining in the chamber 400 and the detection efficiency of the particles is excellent and the gas introduced into the chamber 400 collides against the inner wall of the chamber 400, It is possible to float the other particles attached to the inside of the chamber 400 and prevent the problem of being counted by the particle counter.

In addition, since the purification process is performed before sampling, it is possible to prevent a count error or an error from occurring due to mixing with other particles attached to the inner surface of the chamber.

As a result, the particle inspection apparatus (1) of the porous forming part according to the present invention can detect and count particles remaining in the holes of the porous forming part, and is excellent in particle detection and counting efficiency, It is possible to maintain the zero particle environment at all times during inspection and to precisely inspect the component contamination and particle count and to prevent the particles from adhering to the component due to the occurrence of product defects and to improve the reliability of the product and the mass production yield I can increase it.

The present invention is not limited to the above-described embodiments. Anything having substantially the same constitution as the technical idea described in the claims of the present invention and achieving the same operational effect is included in the technical scope of the present invention.

1. Particle Inspection System for Porous-forming Parts
100. Housing 110. Keyboard
111. Support 120. Monitor
130. Upper door 131. Viewing window
140. Lower door 141. Viewing window
200. Fan filter unit 210. Pre filter
220. ULPA Filter (Ultra-Low Penetration Air filter)
230. Suction fan 300. Inflow pipe
310. Intake valve 400. Chamber
410. Jig 500. Jet nozzle
510. support rod 520. rotation bar
530. Nozzle moving speed control valve 540. Nozzle tube
550. Gas supply pipe 560. Mass flow controller (MFC)
600. Particle counter 610. Suction line
620. Suction port 700. Vacuum pump
710. Vacuum suction pipe 720. Vacuum pump valve
730. MFM (Mass Flow Meter) 800. Discharge fan
810. Discharge tube 820. Discharge fan valve
A. Compressed Air Conditioner D. Parts
H. Hall N. Nitrogen gas regulator
P. particles

Claims (10)

An apparatus for detecting and inspecting particles attached to a porous forming component having a plurality of holes therein,
A housing constituting an outer periphery of the apparatus;
A fan filter unit formed at an upper portion of the housing, for sucking air from the outside and then filtering the clean air to supply clean air into the apparatus;
An inlet pipe connected to the chamber to clean the inside of the apparatus by flowing clean air into the chamber and having an inlet valve in the middle;
A chamber formed on the lower side of the fan filter unit, in which a component to be inspected is mounted on an upper jig, a gas injected from the jet nozzle passes through the pores of the component and flows into the interior;
A jet nozzle installed above the chamber for jetting a gas toward the component mounted on the jig to separate particles attached to the hole of the component;
A particle counter installed on the lower side of the chamber and connected to the inside of the chamber by a suction line to detect particles included in the gas sucked after sucking the gas in the chamber and counting the particles;
A vacuum suction pipe connected to a lower side of the chamber and generating a vacuum suction force in the chamber to guide the gas passing through the hole of the component into the chamber, Pump; And
And a discharge fan installed in a discharge pipe connected to a lower side of the chamber and discharging the air inside the chamber to the outside.
The method according to claim 1,
Wherein the housing is provided with a main computer for controlling the operation of each component of the apparatus and a monitor for displaying a screen of the main computer.
The method according to claim 1,
Wherein the fan filter unit includes a prefilter installed on the upper part, a ULPA filter installed on the lower part, and a suction fan installed between the prefilter and the ULPA filter.
The method according to claim 1,
Wherein the chamber is provided with a heating member for removing water on the surface of the component before and after the inspection on the upper side or the lower side of the jig.
The method according to claim 1,
Wherein the chamber is provided with a closed door at an upper end thereof.
The method according to claim 1,
Wherein the chamber is further provided with an arc plasma apparatus and is capable of separating particles by applying stress to the surface of the component mounted on the jig by arc plasma.
The method according to claim 1,
Wherein the chamber is provided with a gas nozzle at a lower portion thereof to remove particles of the component mounted on the jig.
The method according to claim 1,
Wherein the jet nozzle is provided so as to be rotatable and provided with an MFC for automatically controlling the supply amount of the gas.
The method according to claim 1,
Wherein the particle counter is disposed such that the suction port provided at the upper end of the suction line is disposed inside the chamber and the lower end of the suction line passes through the inside of the vacuum suction pipe. .
The method according to claim 1,
Wherein the vacuum suction pipe is provided with a vacuum pump valve and an MFM for measuring a flow rate,
Wherein the discharge pipe is provided with a discharge fan valve.

KR1020140164929A 2014-11-25 2014-11-25 Apparatus for detecting particles in porous parts KR101483224B1 (en)

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KR1020140164929A KR101483224B1 (en) 2014-11-25 2014-11-25 Apparatus for detecting particles in porous parts
PCT/KR2015/012157 WO2016085167A1 (en) 2014-11-25 2015-11-12 Particle inspection apparatus for porous formation part

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Cited By (3)

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Publication number Priority date Publication date Assignee Title
KR20200059033A (en) 2018-11-20 2020-05-28 (주)코미코 Apparatus for measuring paricles and measuring method for using the same
KR102472500B1 (en) * 2022-05-17 2022-12-01 주식회사 에어콕 Particulate matter measuring device using pump
CN115656012A (en) * 2022-12-08 2023-01-31 山东恒智一建净化工程有限公司 Environmental comprehensive index detection device

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JPH085542A (en) * 1994-06-20 1996-01-12 Hitachi Ltd Method and apparatus for fabricating semiconductor device
JPH11217670A (en) * 1997-11-25 1999-08-10 Japan Steel Works Ltd:The Single-wafer load locking device and substrate cleaning method
KR100976987B1 (en) * 2010-01-07 2010-08-19 주식회사 올루 Instrument for testing particulate contamination of cleanroom supplies
KR20110010735A (en) * 2008-04-24 2011-02-07 알까뗄 루슨트 Station and method for measuring the contamination of an enclosure used for transporting semiconductor substrates

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KR100963814B1 (en) * 2005-10-07 2010-06-16 주식회사 코미코 Method of removing particles on an object, apparatus for performing the removing method, method of measuring particles on an object and apparatus for performing the measuring method

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Publication number Priority date Publication date Assignee Title
JPH085542A (en) * 1994-06-20 1996-01-12 Hitachi Ltd Method and apparatus for fabricating semiconductor device
JPH11217670A (en) * 1997-11-25 1999-08-10 Japan Steel Works Ltd:The Single-wafer load locking device and substrate cleaning method
KR20110010735A (en) * 2008-04-24 2011-02-07 알까뗄 루슨트 Station and method for measuring the contamination of an enclosure used for transporting semiconductor substrates
KR100976987B1 (en) * 2010-01-07 2010-08-19 주식회사 올루 Instrument for testing particulate contamination of cleanroom supplies

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20200059033A (en) 2018-11-20 2020-05-28 (주)코미코 Apparatus for measuring paricles and measuring method for using the same
KR102590033B1 (en) * 2018-11-20 2023-10-16 (주)코미코 Apparatus for measuring paricles and measuring method for using the same
KR102472500B1 (en) * 2022-05-17 2022-12-01 주식회사 에어콕 Particulate matter measuring device using pump
CN115656012A (en) * 2022-12-08 2023-01-31 山东恒智一建净化工程有限公司 Environmental comprehensive index detection device
CN115656012B (en) * 2022-12-08 2023-03-14 山东恒智一建净化工程有限公司 Environment comprehensive index detection device

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