JP2013082055A - Method and system for monitoring glass plate polishing device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a method and system for monitoring a glass plate polishing device, reducing a rate of occurrence of breakage of glass plates.SOLUTION: In order to reduce the breakage of the glass plates G in a carrying-out section 36, in the embodiment, a glycerin control section 42 controls the amount of glycerin coated at a liquid coating section 14 so that the actual area calculated by an image processing section 34 is determined as a reference area. That is, the glycerin control section 42 controls the amount of glycerin coated so that portions to be adsorbed by the glycerin coated at the liquid coating section 14 become substantially equal to the reference area when separated by a separation section 22. For example, the glycerin control section 42 controls the amount of glycerin coated so that all the unpolished surfaces of the glass plates G are not adsorbed onto adsorption sheets 12, there are the portions to be adsorbed and portions not to be adsorbed, and the portions to be adsorbed are divided into predetermined areas.

Description

  The present invention relates to a monitoring method and a monitoring system for a glass plate polishing apparatus.

  A glass plate for FPD (Flat Panel Display) used for liquid crystal displays, plasma displays, etc. is formed by forming molten glass into a plate shape, and then cutting it into a glass plate of a predetermined rectangular size by a cutting device, followed by a chamfering device. The end face is chamfered by the chamfering grindstone. Thereafter, the glass plate is manufactured into a thin glass plate satisfying the flatness required for the FPD glass plate by removing fine irregularities and undulations on the surface with a polishing apparatus. As the size of the glass plate, those whose vertical and horizontal dimensions exceed 1000 mm are mainstream, and the thickness thereof is 0.7 mm or less.

  In the polishing apparatus disclosed in Patent Document 1, a plurality of polishing tools that rotate and revolve are arranged along the moving direction of the glass plate, and the polishing surface of the glass plate is polished while moving the glass plate. Polish continuously with tools. The glass plate is sucked and held by a suction sheet attached to the upper surface of the surface plate, and the surface plate is moved in the moving direction by a driving device.

  The surface plate moves on a loop-shaped conveyance path, and an adsorption part, a polishing part, a peeling part, and a cleaning part are sequentially provided on the loop-shaped conveyance path. The non-polished surface of the glass plate before polishing is held by suction on the suction sheet of the surface plate located in the suction portion, and then moved to the polishing portion by the movement of the surface plate so that the polishing surface of the glass plate is It is polished by a plurality of polishing tools. And the glass plate after grinding | polishing is moved to the said peeling part by a surface plate. In the peeling unit, a part of the glass plate is peeled from the adsorbing sheet by spraying a fluid mixture of air and water from the nozzle toward the boundary between the glass plate and the adsorbing sheet. Thereafter, the transfer machine is separated from the adsorption sheet so that the polished surface of the glass plate is adsorbed by the transfer machine and the entire glass plate is peeled off from the adsorption sheet. The glass plate peeled from the suction sheet is moved to the carry-out section by the transfer machine. The surface plate from which the glass plate has been peeled is prepared as a surface plate for moving the next glass plate by cleaning the adsorbing sheet while passing through the cleaning section.

  The adsorbing sheet is composed of a self-adsorbing porous member. In order to prevent drying of the non-polished surface of the glass plate adsorbed on the adsorbing sheet or to increase the self-adsorbing property of the adsorbing sheet. Further, the glass plate is adsorbed to the adsorbing sheet through the liquid. In the wafer polishing method disclosed in Patent Document 2, the liquid is adsorbed between the non-polished surface of the wafer and the plate by interposing a liquid such as glycerin between the non-polished surface of the wafer and the wafer mounting plate. Increases sex.

JP 2007-190657 A JP-A-6-61203

  However, the conventional polishing apparatus has a problem that breakage such as cracks and chipping occurs in the glass plate peeled from the adsorption sheet by the transfer machine, and the breakage occurrence rate is not necessarily low.

  This invention is made | formed in view of such a situation, and it aims at providing the monitoring method and monitoring system of the glass plate grinding | polishing apparatus which can reduce the breakage incidence rate of a glass plate.

  In order to achieve the above object, the present invention provides a liquid application step of applying a liquid to an adsorption sheet that adsorbs a glass plate, and an adsorption step of adsorbing the non-polished surface of the glass plate to the adsorption sheet applied with the liquid A polishing step of polishing the polishing surface of the glass plate adsorbed on the adsorption sheet; and a fluid is sprayed to a boundary portion between the glass plate and the adsorption sheet on which the polishing surface is polished; A separation step of peeling a part of the glass sheet from the suction sheet, an imaging step of imaging the glass plate partly peeled from the suction sheet, and image processing the image information of the captured glass plate An image processing step of calculating an area of the suction portion of the glass plate with respect to the suction sheet is provided.

  In order to achieve the above object, the present invention provides a liquid applying means for applying a liquid to an adsorbing sheet adsorbing a glass plate, and an adsorbing means for adsorbing a non-polished surface of the glass plate to the adsorbing sheet to which the liquid is applied. Polishing means for polishing the polishing surface of the glass plate adsorbed on the adsorption sheet; fluid ejecting means for ejecting fluid to a boundary portion between the glass plate and the adsorption sheet polished by the polishing means; Image pickup means for picking up an image of the glass plate partially peeled from the suction sheet, and the area of the suction portion of the glass plate with respect to the suction sheet by image processing the image information of the glass plate picked up by the image pickup means And a glass plate polishing apparatus monitoring system characterized by comprising: an image processing means for calculating

  As a result of earnestly examining the cause of breakage of the glass plate moved by the transfer machine, the present inventor has found the following cause.

  First, the first cause of breakage is that the glass plate is completely peeled from the adsorbing sheet due to an excessive amount of fluid ejected from the fluid ejecting means in the peeling step. That is, when the glass plate is completely peeled from the suction sheet, the liquid level between the glass plate and the suction sheet is reduced by the liquid between the glass plate and the suction sheet when the glass plate is moved from the position of the fluid ejecting means to the transfer machine. The glass plate slides over and the position of the glass plate shifts with respect to the suction sheet. Due to this misalignment, the glass plate collides with a device that is in the process of moving to the transfer machine, or the position of the glass plate with respect to the transfer machine deviates from a predetermined position, so the glass plate and the transfer machine collide. And found that the glass plate was broken. Next, the second cause of breakage is that the glass plate is firmly adsorbed to the adsorbing sheet due to an excessive ejection amount of the fluid ejected from the fluid ejecting means. It was ascertained that the glass plate was damaged by peeling the glass plate from the suction sheet by the transfer device in such a suction form.

  Therefore, in the embodiment, based on the first and second causes of breakage, the area for preventing the breakage of the glass plate G, that is, the adsorption portion of the glass plate with respect to the adsorption sheet after passing through the fluid ejecting means. An area (hereinafter referred to as an actual area) was calculated, and a reference area ratio was obtained by an experiment based on the actual area.

  The reference area ratio is a ratio of the actual area to the area of the non-polished surface of the glass plate so that the glass plate is moved without being damaged when moving from the position of the fluid ejecting means to the position of the transfer machine. It is the ratio of the actual area to the area of the non-polished surface of the glass plate for peeling the glass plate from the adsorbing sheet without damage by the transfer machine. In the present invention, the reference area ratio is defined as 5 to 12%.

  The image processing means acquires the area of the non-polished surface of the glass plate and the actual area after the fluid is ejected in the fluid ejecting step based on the image information from the imaging means, and An area ratio of the actual area to the area of the polished surface is calculated. Then, when the area ratio is within the range of the reference area ratio, the glass plate is peeled by a transfer machine, and when the area ratio is outside the range of the reference area ratio, the peeling is performed. Monitor to stop. Thereby, according to this invention, the breakage incidence rate of a glass plate can be reduced. Note that the comparison operation between the area ratio and the reference area ratio described above may be performed visually by an operator or may be performed by a control unit that performs overall control of the monitoring system.

  In the monitoring method of the glass plate polishing apparatus of the present invention, the liquid control step of controlling the liquid application amount in the liquid application step so that the area of the adsorption portion calculated in the image processing step becomes a predetermined area. It is preferable to have provided.

  The monitoring system for a glass plate polishing apparatus of the present invention is a liquid control unit that controls the amount of the liquid applied by the liquid application unit so that the area of the suction portion calculated by the image processing unit becomes a predetermined area. It is preferable to have provided.

  In the present invention, the liquid application amount is controlled by the liquid control means so that the portion adsorbed by the liquid in the liquid application step is in a good position.

  The monitoring method of the glass plate polishing apparatus of the present invention includes a fluid control step of controlling the ejection amount of the fluid in the peeling step so that the area of the suction portion calculated in the image processing step becomes a predetermined area. It is preferable to provide.

  The monitoring system for a glass plate polishing apparatus according to the present invention includes a fluid control unit that controls an ejection amount of the fluid by the fluid ejection unit so that an area of the suction portion calculated by the image processing unit becomes a predetermined area. It is preferable to have provided.

  In the present invention, a glass plate before polishing is imaged by an imaging unit, and image processing is performed by an image processing unit, thereby calculating the area ratio by calculating the actual area, and the area ratio is within a range of the reference area ratio. In order to enter, the fluid injection amount in the peeling step is controlled by the fluid control means.

  According to the monitoring method and monitoring system of the glass plate polishing apparatus according to the present invention, the occurrence rate of breakage of the glass plate can be reduced.

The top view which shows the whole structure of the grinding | polishing apparatus of the glass plate in which the monitoring system which concerns on embodiment was integrated The top view which showed the adsorption form of two glass plates with respect to an adsorption sheet The top view which showed the adsorption part with the standard area of the glass plate with respect to the adsorption sheet Structure diagram of the liquid application part that forms the suction pattern on the suction sheet

  Hereinafter, preferred embodiments of a monitoring method and a monitoring system for a glass plate polishing apparatus according to the present invention will be described in detail with reference to the accompanying drawings.

  FIG. 1 is a plan view showing an overall configuration of a glass plate polishing apparatus 10 in which a monitoring system according to an embodiment is incorporated.

  In the figure, a loop-shaped conveyance path of the suction sheet 12 that sucks and holds the non-polished surface of the glass plate G is indicated by an arrow A. The suction sheet 12 is attached to an upper surface of a surface plate (not shown) (a surface facing a polishing tool 30 described later) and is configured to have a size capable of sucking and holding two rectangular glass plates G. .

  In the transport path, from the upstream side to the downstream side of the transport path, a liquid application unit (liquid application process: liquid application unit) 14, an adsorption unit (adsorption process: adsorption unit) 16, a camera 18, and a polishing unit (polishing process) : Polishing means) 20, peeling part (peeling process: fluid ejecting means) 22, camera (imaging process: imaging means) 24, transfer machine 26, and cleaning part 28 are arranged in this order.

  In the polishing unit 20, the glass plate G is arranged in a zigzag alignment along the conveyance path while being moved along the conveyance path in a state where the non-polished surface of the glass plate G is adsorbed and held by the suction sheet 12. The plurality of polishing tools 30, 30... Are continuously polished. At the time of polishing, the polishing surface of the glass plate G is polished by polishing tools 30, 30... Rotating at least one of rotation and revolution while the polishing liquid is supplied to the polishing surface by a supply unit (not shown). And the glass plate G is manufactured to the glass plate G of the thin plate form (thickness 0.7 mm or less) which satisfied the flatness requested | required of the glass plate for FPD in the exit of the grinding | polishing part 20. FIG. In addition, the number of the polishing tools 30 arrange | positioned at the grinding | polishing part 20 is not limited, Moreover, the arrangement | positioning form of the polishing tool 30 is not limited to a staggered form. That is, the form of the polishing unit 20 may be one polishing tool corresponding to the size of the glass plate G.

  The polished glass plate G is unloaded from the polishing unit 20 and moved to the peeling unit 22 where air and water are supplied from the two nozzles 32 and 32 toward the boundary between the glass plate G and the suction sheet 12. And a mixed fluid (fluid). When the mixed fluid of the injected air and water enters the gap between the glass plate G and the suction sheet 12, a part of the glass plate G on the nozzle 32 side is peeled from the suction sheet 12. The fluid is not limited to the mixed fluid, and may be only air or water. However, in order to smoothly eliminate the adsorption force of the glass plate G to the adsorption sheet 12, the mixed fluid is preferable.

  The glass plate G from which the part has been peeled is imaged by the camera 24 arranged so as to face the conveyance path during the movement from the peeling unit 22 toward the transfer machine 26. The image of the glass plate G picked up by the camera 24 is subjected to black and white binarization processing by an image processing unit (image processing step: image processing means) 34, and the actual area of the suction portion of the glass plate G with respect to the suction sheet 12 ( The area ratio of the actual area to the area of the non-polished surface of the glass plate G is calculated. Here, the said real area is an actual area of the adsorption | suction part of the glass plate G with respect to the adsorption sheet 12 after passing the peeling part 22. FIG. Further, the area of the non-polished surface of the glass plate G can also be calculated by binarization processing by the image processing unit 34 in the same manner as the actual area.

  The glass plate G moved to the position of the transfer machine 26 is held on a suction pad (not shown) of the transfer machine 26, and then peeled off from the suction sheet 12 and moved to the carry-out unit 36.

  The suction sheet 12 from which the glass plate G has been peeled off by the transfer device 26 is cleaned by the cleaning liquid while passing through the cleaning unit 28, and is moved to the liquid application unit 14 to hold the next glass plate G by suction. . Here, the surface of the suction sheet 12 that holds the glass plate G by suction is coated with glycerin (liquid) from a plurality of nozzles (described later) of the liquid coating unit 14. The liquid application unit 14 will be described later.

  The reason why glycerin is applied to the adsorption sheet 12 will be described. Although the adsorption surface of the adsorption sheet 12 has self-adsorption property, when the adsorption surface is dried, the self-adsorption property becomes weak and the glass plate G may break during polishing of the glass plate G. Therefore, in order to prevent drying of the non-polished surface of the glass plate G that is adsorbed and fixed to the adsorption surface, or to increase the self-adsorption property of the adsorption surface, the glass plate G is adsorbed via a drying prevention liquid. This is because it needs to be fixed to the surface by adsorption.

  In addition, although glycerol is illustrated as a liquid, water may be sufficient and polyethyleneglycol may be sufficient. However, glycerin is preferred because it is more difficult to dry than water. Glycerin is also suitable as an antifouling liquid for the edge of the glass plate G by the polishing liquid.

  The adsorbing sheet 12 coated with glycerin is conveyed to the adsorbing unit 16 by a surface plate to which the adsorbing sheet 12 is attached. Here, the non-polished surfaces of the two glass plates G before polishing are adsorbed to the adsorbing sheet 12. Held. The two glass plates G are moved toward the entrance of the polishing unit 20 by the surface plate to which the suction sheet 12 is attached, and immediately before entering the entrance, the camera 18 disposed above the transport path. Imaged. The image of the glass plate G captured by the camera 18 is subjected to black and white binarization processing by the image processing unit 34, and the suction form of the glass plate G with respect to the suction sheet 12 is displayed on the monitor 38. Specifically, as in the adsorption form of the two glass plates G with respect to the adsorption sheet 12 shown in FIG. 2, an adsorption portion (first area A, first area A) where the glass plate G is adsorbed and held by the adsorption sheet 12. 2 and the third area C) are white, and the non-adsorption portions (the fourth area D and the fifth area E), which are portions where the glass plate G is not adsorbed and held by the adsorption sheet 12, are black, and the monitor 38 of FIG. Is displayed.

  As described above, the conveyance path is configured in a loop shape so that the suction sheet 12 passes through the liquid application unit 14, the suction unit 16, the polishing unit 20, the peeling unit 22, and the cleaning unit 28 in this order.

  Although a plurality of the suction sheets 12 of the embodiment are arranged on the conveyance path, the number of the adsorption sheets 12 arranged on the conveyance path is not limited. Further, the number of glass plates G sucked and held by one suction sheet 12 is not limited to two, and may be three even if the number is one according to the size of the glass plate G and the size of the suction sheet 12. It may be more than one.

  By the way, as a result of earnestly examining the cause of breakage of the glass plate G that has been moved to the carry-out section 36 by the transfer device 26 in the polishing apparatus 10 having the above-described configuration, the inventors have found the following causes.

  The first cause of breakage is that the glass plate G completely peels from the adsorbing sheet 12 due to an excessive injection amount of the mixed fluid sprayed from the nozzles 32, 32 in the peeling portion 22. That is, when the glass plate G completely peels from the suction sheet 12, when the glass plate G moves from the position of the nozzle 32 to the position of the transfer machine 26, the liquid between the glass plate G and the suction sheet 12 The glass plate G slides on the liquid level, and the glass plate G is displaced with respect to the suction sheet 12. Due to this misalignment, the glass plate G collides with an apparatus existing on the way to the transfer machine 26, or the position of the glass plate G with respect to the transfer machine 26 deviates from a predetermined position. It was ascertained that the mounting plate 26 collided and the glass plate G was damaged.

  The second cause of damage is that the glass plate G is firmly adsorbed to the adsorbing sheet 12 due to an excessive injection amount of the mixed fluid injected from the nozzles 32, 32. It was ascertained that the glass plate G was damaged by peeling the glass plate G from the suction sheet 12 by the transfer device 26 in such a suction form.

  Therefore, in the embodiment, based on the first and second causes of breakage, an actual area for preventing breakage of the glass sheet G is calculated, and based on this actual area, a reference area ratio is obtained by experiment. .

  The reference area ratio refers to an actual area with respect to the area of the non-polished surface of the glass plate G for moving the glass plate G without being damaged when moving from the position of the nozzle 32 to the position of the transfer machine 26 (FIG. 3, which is the ratio of the area F to the area of the non-polished surface of the glass plate G that is peeled off from the suction sheet 12 by the transfer device 26 without being damaged. 3 area F). In the embodiment, the reference area ratio is defined as 5 to 12%.

  FIG. 3 shows an area F that is an adsorption portion of the glass sheet G with respect to the adsorption sheet 12 that has passed through the peeling portion 22. FIG. 3 is an example, and the area F exists in a substantially central portion of the non-polished surface of the glass plate G and has a substantially oval shape. The area F is different depending on the size of the glass plate G. For this reason, when monitoring is performed, it may be determined only by the area F, but the area ratio of the actual area of the area F to the area of the non-polished surface of the glass plate G is calculated, and this area ratio is calculated as described above. It is preferable to judge by comparing with the reference area ratio.

  As shown in FIG. 1, the monitoring system of the embodiment includes a camera 24 and an image processing unit 34 in order to acquire the area and actual area of the non-polished surface of the glass plate G. That is, the mixed fluid is ejected from the nozzles 32 and 32 toward the boundary between the glass plate G and the suction sheet 12, and the glass plate G after being partially peeled from the suction sheet 12 is disposed above the conveyance path. The image is taken by the camera 24. The image information of the captured glass plate G is subjected to black and white binarization processing by the image processing unit 34. Further, the image processing unit 34 extracts the white image indicating the suction portion from all the images, and calculates the area of the white image, that is, the actual area by counting the number of pixels of the extracted white image. The image information binarized by the image processing unit 34, the area of the white image, and the reference area are displayed on a monitor 38.

  When the operator who monitors the polishing apparatus 10 prevents the glass plate G from being damaged, the operator compares the area ratio of the actual area displayed on the monitor 38 with the reference area ratio, and When the area ratio of the area is within the range of the reference area ratio, the glass plate G is peeled off by the transfer machine 26, and when the area ratio of the actual area is outside the range of the reference area ratio, the polishing apparatus 10 or the transfer machine 26 is stopped, and the removal of the glass plate G by the transfer machine 26 is stopped. Thereby, according to the monitoring system of the embodiment, the occurrence rate of breakage of the glass plate G can be reduced.

  On the other hand, a case where the comparison operation between the area ratio of the actual area and the reference area ratio is performed by the control unit 40 that performs overall control of the monitoring system will be described. The storage unit of the control unit 40 includes the reference area ratio. (5-12%). And the control part 40 compares the area ratio of the said real area with the memorize | stored reference | standard area ratio, and when the area ratio of an actual area is in the range of a reference | standard area ratio, the glass by the transfer machine 26 is used. When the plate G is taken out and the area ratio of the actual area is outside the range of the reference area ratio, the polishing apparatus 10 or the transfer machine 26 is stopped and the transfer of the glass plate G by the transfer machine 26 is stopped. Let Thereby, also by the control part 40, the breakage incidence rate of the glass plate G can be reduced.

  By the way, in order to further reduce the breakage of the glass plate G in the carry-out unit 36 without reducing the productivity of the glass plate G, the area ratio of the actual area calculated by the image processing unit 34 is the reference area ratio. It is preferable to control the application amount of glycerin in the liquid application unit 14 by the glycerin control unit (liquid control means) 42 so that it falls within the range of.

  That is, the amount of glycerin applied is controlled by the glycerin control unit 42 so that the adsorbed portion of glycerin applied in the liquid application unit 14 falls within the range of the reference area ratio when peeled off by the peeling unit 22. That is, it is preferable to control the injection amount of the mixed fluid injected from the nozzles 32 and 32 and the application amount of glycerin. Further, the injection amount of the mixed fluid is changed every time the line speed of the polishing apparatus 10 is changed.

  For example, not all of the non-polished surface of the glass plate G is adsorbed to the adsorbing sheet 12, but includes an adsorbing portion and a non-adsorbing portion, and the glycerin control unit 42 so as to divide the adsorbing portion into predetermined areas. Thus, the amount of glycerin applied to the suction sheet 12 is controlled.

  Specifically, as shown in FIG. 2, the first area A, the second area B inside the glass plate G from the opposite edge of the glass plate G, and the third of the central portion of the glass plate G. The adsorption part is divided into areas C, and the fourth area D between the first area A and the third area C and the fifth area E between the second area B and the third area C are defined as non-adsorption parts. To do.

  As a method for forming the non-adsorptive portion, there is a method in which glycerin is not applied to the fourth area D and the fifth area E, but the amount of glycerin applied to the fourth area D and the fifth area E is set to the first to third areas A to A. There is also a method of controlling the suction force of the fourth area D and the fifth area E to be lower than the suction force of the first to third areas A to C by controlling to be larger than the coating amount of C. This is because the adsorption force of the glass plate G by the adsorption sheet 12 increases as the glycerin application amount increases up to a predetermined application amount, but the adsorption force tends to decrease when the application amount exceeds the predetermined application amount.

  In the adsorbing forms of the first to third areas A to C, when the mixed fluid from the nozzles 32, 32 of the peeling unit 22 is sprayed to the boundary portion between the glass plate G and the adsorbing sheet 12, the fluid flows to the glass plate G. Enters the gap between the suction sheet 12 and the suction force of the first area A and the second area B is eliminated, that is, the portions corresponding to the first area A and the second area B of the glass plate G are the suction sheet 12. And the mixed fluid permeates to a part of the third area C through the fourth area D and the fifth area E, thereby eliminating the adsorption force of a part of the third area C.

  Thereby, the glass plate G which passed the peeling part 22 is adsorbed and hold | maintained at the adsorption sheet 12 only in the adsorption part of the real area which remained in the center part of the non-polishing surface of the glass plate G. FIG. Therefore, the transfer machine is moved from the position of the peeling portion 22 by controlling the application amount of glycerin so that the area ratio of the real area of the area F of the suction portion shown in FIG. 3 falls within the range of the reference area ratio. When the glass plate G is moved to the position 26, the glass plate G is not displaced, and the glass plate G can be prevented from being damaged due to the displacement.

  Further, since the glass plate G is adsorbed to the adsorption sheet 12 only in the area F within the range of the reference area ratio, even when the glass plate is exfoliated by the transfer machine 26, the glass plate G is smoothly exfoliated from the adsorption sheet 12. The Thereby, breakage of the glass plate G at the time of peeling by the transfer machine 26 can be prevented.

  In addition, the injection amount of the mixed fluid from the nozzles 32 and 32 is set to an optimal amount that does not damage the glass plate G by the mixed fluid. Further, the glass plate G adsorbed to the adsorbing sheet 12 through glycerin is imaged by the camera 18, and the image processing unit 34 binarizes the imaged image information, That is, the area of the suction portion is stored in the storage unit of the control unit 40. The control unit 40 stores the area change of the area F as data for each suction sheet 12 based on the area of the suction portion before polishing and the actual area of the area F that has passed through the peeling portion 22.

  Next, an example of a method for forming the first to fifth areas A to E by the liquid application unit 14 will be described.

  As shown in FIG. 4, the liquid application unit 14 includes 14 nozzles 44a, 44b, 44c, 44d, 44e, 44f, 44g, 44h, 44i, 44j, 44k, 44l, 44m, and 44n. These nozzles 44 a to 44 n are fixed to a gantry (not shown) in a direction orthogonal to the relative conveyance direction of the suction sheet 12 indicated by an arrow A, and are connected to a glycerin supply unit 48 via a glycerin supply pipe 46. ing. The glycerin supply unit 48 includes a filter 50, a flow meter 52, a pump 54, and a glycerin tank 56. The relative conveyance direction includes both the conveyance direction of the suction sheet 12 with respect to the fixed nozzles 44 a to 44 n and the movement direction of the nozzles 44 a to 44 n with respect to the stopped suction sheet 12.

  The nozzles 44a to 44n are connected to the glycerin supply pipe 46 through electromagnetic valves 58a to 58n, respectively. The opening and closing of these electromagnetic valves 58a to 58n and the opening / closing amounts are synchronized with the conveyance speed of the suction sheet 12. And controlled by the glycerin control unit 42.

  That is, the glycerin control unit 42 opens the electromagnetic valves 58a to 58n at the timing when the leading edge 12A of the suction sheet 12 passes below the nozzles 44a to 44n, and the electromagnetic valves 58a of the nozzles 44a and 44n located at both ends. , 58n (the degree of opening) is made larger than the openings of the other solenoid valves 58b, 58m. As a result, the first area A where the application amount of glycerin is optimum for adsorption is formed, and in the areas A ′ and A ′ on both sides of the first area A, non-adsorption portions with excessive glycerin amount are formed. Go.

  Next, at the timing when the first area A has passed below the nozzles 44a to 44n, the glycerin control unit 42 increases the opening of the electromagnetic valves 58b to 58m. Thereby, the 4th area D which is a non-adsorption part with excessive amount of glycerol is formed.

  Next, the glycerin control part 42 returns the opening degree of the solenoid valves 58b-58m to the opening degree at the time of formation of the 1st area A at the timing when the 4th area D finished passing under the nozzles 44a-44n. As a result, the third area C is formed, and in the areas C ′ and C ′ on both sides of the third area C, non-adsorbing portions having an excessive amount of glycerin are formed.

  Next, at the timing when the third area C has passed below the nozzles 44a to 44n, the glycerin control unit 42 increases the opening degree of the electromagnetic valves 58b to 58m. Thereby, the 5th area E which is a non-adsorption part with excessive amount of glycerin is formed.

  Then, at the timing when the fifth area E has passed below the nozzles 44a to 44n, the glycerin control unit 42 opens the opening of the electromagnetic valves 58b to 58m when the first and third areas A and C are formed. Return to degrees. As a result, the second area B is formed, and in the areas D ′ and D ′ on both sides of the second area B, non-adsorbing portions having an excessive amount of glycerin are formed.

  And the glycerin control part 42 closes the solenoid valves 58a-58n at the timing which the 2nd area B finished passing under the nozzles 44a-44n.

  By the above control operation, a coating pattern for realizing the desired suction form shown in FIG. 2 is formed on the suction sheet 12.

  In addition, the adsorption | suction pattern shown in FIG. 2 is an example, and is not limited to this adsorption | suction pattern. Moreover, the structure of the liquid application part 14 shown in FIG. 4 is an example, and is not limited to this structure. That is, the liquid application unit 14 may be configured to be able to form a suction pattern suitable for preventing the glass plate G from being damaged.

  On the other hand, in the monitoring system of the embodiment, the mixed fluid is ejected by the nozzles 32 and 32 so that the area ratio of the actual area of the suction portion calculated by the image processing unit 34 in FIG. 1 falls within the range of the reference area ratio. It is preferable to provide a mixed fluid control unit (fluid control means) 60 for controlling the amount.

  In this case, the glass plate G before polishing is imaged by the camera 18, and the image processing unit 34 performs image processing to calculate the actual area and calculate the area ratio. And when the glass plate G is moved to the peeling part 22 with the adsorption sheet 12, the mixing fluid control part 60 makes the injection amount of the nozzles 32 and 32 so that the said area ratio may fall in the range of a reference | standard area ratio. Control. In this case, the injection amount of the mixed fluid is preferably controlled by the air injection amount.

  In the glass plate polishing apparatus according to the embodiment, measures are taken to prevent the glass plate G from being cracked in advance based on image information from the camera 18. That is, when a foreign material such as cullet entering between the glass plate G and the suction sheet 12 is detected based on the image, the polishing apparatus is stopped to prevent the glass plate G from cracking in advance. . Also, based on the image, specifically, the distance between a plurality of adjacent glass plates G in the image is measured, and the glass plate G is adsorbed in a bent posture on the adsorption sheet 12. In addition, when it is detected that the adjacent glass plates G and G are adsorbed in an overlapping state, the polishing apparatus is stopped and / or an alarm is sounded to prevent the glass plate G from cracking in advance. . In addition, the cause of contamination of foreign matters such as the cullet is because the cullet or the like is attached to the glass plate G before being put into the glass plate polishing apparatus, or the cullet or the like is attached to the suction sheet cleaned in the cleaning unit. It is.

  DESCRIPTION OF SYMBOLS 10 ... Polishing apparatus, 12 ... Adsorption sheet, 14 ... Liquid application part, 16 ... Adsorption part, 18 ... Camera, 20 ... Polishing part, 22 ... Stripping part, 24 ... Camera, 26 ... Transfer machine, 28 ... Cleaning part, DESCRIPTION OF SYMBOLS 30 ... Polishing tool, 32 ... Nozzle, 34 ... Image processing part, 36 ... Unloading part, 38 ... Monitor, 40 ... Control part, 42 ... Glycerin control part, 44a-44n ... Nozzle, 46 ... Glycerin supply pipe, 48 ... Glycerin Supply unit, 50 ... filter, 52 ... flow meter, 54 ... pump, 56 ... glycerin tank, 58a to 58n ... solenoid valve, 60 ... mixed fluid control unit

Claims (6)

A liquid application step of applying a liquid to an adsorption sheet that adsorbs a glass plate;
An adsorption step of adsorbing the non-polished surface of the glass plate to the adsorption sheet coated with the liquid;
A polishing step of polishing the polishing surface of the glass plate adsorbed on the adsorption sheet;
A peeling step of spraying a fluid to a boundary portion between the glass plate and the adsorbing sheet on which the polished surface is polished, and exfoliating a part of the glass plate from the adsorbing sheet;
An imaging step of imaging the glass plate partially peeled from the suction sheet;
An image processing step of performing image processing on image information of the imaged glass plate and calculating an area of the suction portion of the glass plate with respect to the suction sheet;
A method for monitoring a glass plate polishing apparatus, comprising:   The glass plate polishing according to claim 1, further comprising a liquid control step of controlling an amount of the liquid applied in the liquid application step so that an area of the suction portion calculated in the image processing step becomes a predetermined area. Device monitoring method.   3. The glass according to claim 1, further comprising a fluid control step of controlling an ejection amount of the fluid in the peeling step so that an area of the suction portion calculated in the image processing step becomes a predetermined area. Monitoring method for plate polishing equipment. A liquid application means for applying a liquid to an adsorption sheet for adsorbing a glass plate;
Adsorbing means for adsorbing the non-polished surface of the glass plate to the adsorbing sheet coated with the liquid;
Polishing means for polishing the polishing surface of the glass plate adsorbed on the adsorption sheet;
Fluid ejecting means for ejecting fluid to a boundary portion between the glass plate and the adsorbing sheet polished by the polishing means;
Imaging means for imaging the glass plate partially peeled from the suction sheet;
Image processing means for performing image processing on image information of the glass plate imaged by the imaging means and calculating an area of the suction portion of the glass plate with respect to the suction sheet;
A monitoring system for a glass plate polishing apparatus, comprising:   The glass plate polishing according to claim 4, further comprising a liquid control unit that controls an amount of the liquid applied by the liquid application unit so that an area of the suction portion calculated by the image processing unit becomes a predetermined area. Equipment monitoring system.   The fluid control unit according to claim 4, further comprising: a fluid control unit configured to control an ejection amount of the fluid by the fluid ejection unit so that an area of the suction portion calculated by the image processing unit becomes a predetermined area. Monitoring system for glass plate polishing equipment.

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