TWI447779B - 具有轉向之真空導管的近接頭相關之系統、設備及方法 - Google Patents

具有轉向之真空導管的近接頭相關之系統、設備及方法 Download PDF

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Publication number
TWI447779B
TWI447779B TW097111301A TW97111301A TWI447779B TW I447779 B TWI447779 B TW I447779B TW 097111301 A TW097111301 A TW 097111301A TW 97111301 A TW97111301 A TW 97111301A TW I447779 B TWI447779 B TW I447779B
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TW
Taiwan
Prior art keywords
flat region
proximal joint
conduits
head
flat
Prior art date
Application number
TW097111301A
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English (en)
Chinese (zh)
Other versions
TW200903573A (en
Inventor
瑞夫肯 麥可
德賴瑞厄斯 約翰Ｍ
瑞德克 佛瑞德Ｃ
克羅立克 密克海爾
弗利爾 艾瑞克Ｍ
Original Assignee
蘭姆研究公司
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Application filed by 蘭姆研究公司 filed Critical 蘭姆研究公司
Publication of TW200903573A publication Critical patent/TW200903573A/zh
Application granted granted Critical
Publication of TWI447779B publication Critical patent/TWI447779B/zh

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Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H10P72/0411—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H10P72/0414—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles

Landscapes

  • Cleaning Or Drying Semiconductors (AREA)
  • Drying Of Solid Materials (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Physical Vapour Deposition (AREA)
TW097111301A 2007-03-30 2008-03-28 具有轉向之真空導管的近接頭相關之系統、設備及方法 TWI447779B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/731,532 US7975708B2 (en) 2007-03-30 2007-03-30 Proximity head with angled vacuum conduit system, apparatus and method

Publications (2)

Publication Number Publication Date
TW200903573A TW200903573A (en) 2009-01-16
TWI447779B true TWI447779B (zh) 2014-08-01

Family

ID=39808575

Family Applications (1)

Application Number Title Priority Date Filing Date
TW097111301A TWI447779B (zh) 2007-03-30 2008-03-28 具有轉向之真空導管的近接頭相關之系統、設備及方法

Country Status (8)

Country Link
US (1) US7975708B2 (https=)
EP (1) EP2132767A4 (https=)
JP (1) JP5103517B2 (https=)
KR (1) KR20100015359A (https=)
CN (1) CN101652831B (https=)
SG (1) SG176462A1 (https=)
TW (1) TWI447779B (https=)
WO (1) WO2008121190A1 (https=)

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US8813764B2 (en) * 2009-05-29 2014-08-26 Lam Research Corporation Method and apparatus for physical confinement of a liquid meniscus over a semiconductor wafer
US8141566B2 (en) * 2007-06-19 2012-03-27 Lam Research Corporation System, method and apparatus for maintaining separation of liquids in a controlled meniscus
US20120260517A1 (en) * 2011-04-18 2012-10-18 Lam Research Corporation Apparatus and Method for Reducing Substrate Pattern Collapse During Drying Operations
JP2013033925A (ja) * 2011-07-01 2013-02-14 Tokyo Electron Ltd 洗浄方法、プログラム、コンピュータ記憶媒体、洗浄装置及び剥離システム
US11251047B2 (en) * 2017-11-13 2022-02-15 Applied Materials, Inc. Clog detection in a multi-port fluid delivery system

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Also Published As

Publication number Publication date
SG176462A1 (en) 2011-12-29
CN101652831A (zh) 2010-02-17
US7975708B2 (en) 2011-07-12
WO2008121190A1 (en) 2008-10-09
TW200903573A (en) 2009-01-16
EP2132767A4 (en) 2012-10-03
CN101652831B (zh) 2012-08-15
JP2010524204A (ja) 2010-07-15
JP5103517B2 (ja) 2012-12-19
EP2132767A1 (en) 2009-12-16
US20090145464A1 (en) 2009-06-11
KR20100015359A (ko) 2010-02-12

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