TWI442494B - Probe device and detection method - Google Patents
Probe device and detection method Download PDFInfo
- Publication number
- TWI442494B TWI442494B TW097137038A TW97137038A TWI442494B TW I442494 B TWI442494 B TW I442494B TW 097137038 A TW097137038 A TW 097137038A TW 97137038 A TW97137038 A TW 97137038A TW I442494 B TWI442494 B TW I442494B
- Authority
- TW
- Taiwan
- Prior art keywords
- wafer
- imaging means
- probe
- photographing
- imaging
- Prior art date
Links
- 239000000523 sample Substances 0.000 title claims description 161
- 238000001514 detection method Methods 0.000 title claims description 11
- 235000012431 wafers Nutrition 0.000 claims description 498
- 238000003384 imaging method Methods 0.000 claims description 101
- 238000007689 inspection Methods 0.000 claims description 48
- 230000003287 optical effect Effects 0.000 claims description 39
- 238000000034 method Methods 0.000 claims description 11
- 239000013078 crystal Substances 0.000 claims description 10
- 238000004364 calculation method Methods 0.000 claims description 3
- 230000007246 mechanism Effects 0.000 description 32
- 238000012546 transfer Methods 0.000 description 28
- 239000000758 substrate Substances 0.000 description 12
- 238000012360 testing method Methods 0.000 description 8
- 230000009471 action Effects 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 238000005192 partition Methods 0.000 description 5
- 230000007723 transport mechanism Effects 0.000 description 4
- 238000013461 design Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 238000000926 separation method Methods 0.000 description 3
- 230000008901 benefit Effects 0.000 description 2
- 239000000969 carrier Substances 0.000 description 2
- 238000004590 computer program Methods 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 239000000470 constituent Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 230000003028 elevating effect Effects 0.000 description 1
- 238000013507 mapping Methods 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2851—Testing of integrated circuits [IC]
- G01R31/2886—Features relating to contacting the IC under test, e.g. probe heads; chucks
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
- G01R1/02—General constructional details
- G01R1/06—Measuring leads; Measuring probes
- G01R1/067—Measuring probes
- G01R1/073—Multiple probes
- G01R1/07307—Multiple probes with individual probe elements, e.g. needles, cantilever beams or bump contacts, fixed in relation to each other, e.g. bed of nails fixture or probe card
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2851—Testing of integrated circuits [IC]
- G01R31/2855—Environmental, reliability or burn-in testing
- G01R31/286—External aspects, e.g. related to chambers, contacting devices or handlers
- G01R31/2865—Holding devices, e.g. chucks; Handlers or transport devices
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Tests Of Electronic Circuits (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007256804 | 2007-09-28 | ||
| JP2008092934A JP5120027B2 (ja) | 2007-09-28 | 2008-03-31 | プローブ装置及びプロービング方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200931556A TW200931556A (en) | 2009-07-16 |
| TWI442494B true TWI442494B (zh) | 2014-06-21 |
Family
ID=40537857
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW097137038A TWI442494B (zh) | 2007-09-28 | 2008-09-26 | Probe device and detection method |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP5120027B2 (enExample) |
| KR (1) | KR101020396B1 (enExample) |
| CN (1) | CN101403785B (enExample) |
| TW (1) | TWI442494B (enExample) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4949454B2 (ja) * | 2009-11-17 | 2012-06-06 | 東京エレクトロン株式会社 | プローブ装置 |
| JP2013024829A (ja) * | 2011-07-26 | 2013-02-04 | Seiko Epson Corp | 電子部品搬送装置及び電子部品搬送方法 |
| JP2014135363A (ja) * | 2013-01-09 | 2014-07-24 | Tokyo Electron Ltd | プローブ装置及びウエハ搬送ユニット |
| JP6220596B2 (ja) * | 2013-08-01 | 2017-10-25 | 東京エレクトロン株式会社 | プローバ |
| JP6084140B2 (ja) * | 2013-09-06 | 2017-02-22 | ヤマハファインテック株式会社 | 電気検査装置 |
| US11159784B2 (en) * | 2014-10-23 | 2021-10-26 | Cognex Corporation | System and method for calibrating a vision system with respect to a touch probe |
| JP6999321B2 (ja) * | 2017-07-31 | 2022-01-18 | 東京エレクトロン株式会社 | 検査装置、検査方法及び記憶媒体 |
| TWI794324B (zh) * | 2017-11-24 | 2023-03-01 | 日商日本電產理德股份有限公司 | 基板檢查裝置、檢查位置補正方法、位置補正資訊產生方法、以及位置補正資訊產生系統 |
| CN112798933B (zh) * | 2021-01-28 | 2025-01-17 | 长春光华微电子设备工程中心有限公司 | 一种晶圆自动对针装置及方法 |
| JP7638723B2 (ja) * | 2021-02-18 | 2025-03-04 | 東京エレクトロン株式会社 | 検査装置のセットアップ方法及び検査装置 |
| CN114308709A (zh) * | 2021-12-28 | 2022-04-12 | 傲普(上海)新能源有限公司 | 一种电芯极片叠片对位检测方法 |
| TWI861896B (zh) * | 2023-05-24 | 2024-11-11 | 旺矽科技股份有限公司 | 探針座位置調整方法及使用該方法之可換探針座之測試機 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3306972B2 (ja) * | 1993-02-26 | 2002-07-24 | キヤノン株式会社 | 位置検出装置及びそれを用いた半導体素子の製造方法 |
| JPH0915302A (ja) * | 1995-06-30 | 1997-01-17 | Olympus Optical Co Ltd | 回路基板検査機の位置決め装置および位置決め方法 |
| JP3303968B2 (ja) * | 1998-02-19 | 2002-07-22 | 東京エレクトロン株式会社 | ウエハと接触子の位置合わせ装置 |
| JP4740405B2 (ja) | 2000-11-09 | 2011-08-03 | 東京エレクトロン株式会社 | 位置合わせ方法及びプログラム記録媒体 |
| JP2003152037A (ja) * | 2001-11-12 | 2003-05-23 | Moritex Corp | ウェハ検査方法、検査装置及び検査用赤外線撮像装置 |
| JP2004063877A (ja) | 2002-07-30 | 2004-02-26 | Tokyo Seimitsu Co Ltd | ウェハの位置決め修正方法 |
| JP2004140084A (ja) * | 2002-10-16 | 2004-05-13 | Sharp Corp | 半導体チップのピックアップ方法およびそのピックアップ装置 |
| KR20050024922A (ko) * | 2003-09-05 | 2005-03-11 | 김광렬 | 웨이퍼의 결함 검사장치 및 그 방법 |
| JP2005223251A (ja) * | 2004-02-09 | 2005-08-18 | Seiko Epson Corp | 半導体装置の検査方法及びその検査装置、並びにその検査装置の制御プログラム |
| JP4799880B2 (ja) | 2005-02-23 | 2011-10-26 | オー・エイチ・ティー株式会社 | 検査装置及び検査方法並びに位置決め方法 |
-
2008
- 2008-03-31 JP JP2008092934A patent/JP5120027B2/ja not_active Expired - Fee Related
- 2008-09-25 KR KR1020080094007A patent/KR101020396B1/ko active Active
- 2008-09-26 TW TW097137038A patent/TWI442494B/zh not_active IP Right Cessation
- 2008-09-28 CN CN2008101695407A patent/CN101403785B/zh not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP5120027B2 (ja) | 2013-01-16 |
| KR20090033036A (ko) | 2009-04-01 |
| KR101020396B1 (ko) | 2011-03-08 |
| TW200931556A (en) | 2009-07-16 |
| JP2009099937A (ja) | 2009-05-07 |
| CN101403785B (zh) | 2012-01-11 |
| CN101403785A (zh) | 2009-04-08 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |