TWI396293B - 輻射接收器及其製造方法 - Google Patents
輻射接收器及其製造方法 Download PDFInfo
- Publication number
- TWI396293B TWI396293B TW098101515A TW98101515A TWI396293B TW I396293 B TWI396293 B TW I396293B TW 098101515 A TW098101515 A TW 098101515A TW 98101515 A TW98101515 A TW 98101515A TW I396293 B TWI396293 B TW I396293B
- Authority
- TW
- Taiwan
- Prior art keywords
- region
- active
- active region
- radiation receiver
- tunneling
- Prior art date
Links
- 230000005855 radiation Effects 0.000 title claims description 165
- 238000004519 manufacturing process Methods 0.000 title claims description 29
- 230000005641 tunneling Effects 0.000 claims description 114
- 239000004065 semiconductor Substances 0.000 claims description 93
- 230000004888 barrier function Effects 0.000 claims description 39
- 239000000463 material Substances 0.000 claims description 31
- 230000003595 spectral effect Effects 0.000 claims description 30
- 238000001514 detection method Methods 0.000 claims description 17
- 239000000758 substrate Substances 0.000 claims description 12
- 238000001228 spectrum Methods 0.000 claims description 8
- 230000008021 deposition Effects 0.000 claims description 7
- 238000003631 wet chemical etching Methods 0.000 claims description 5
- 239000010410 layer Substances 0.000 description 83
- 230000035945 sensitivity Effects 0.000 description 14
- 238000011156 evaluation Methods 0.000 description 11
- 229910052782 aluminium Inorganic materials 0.000 description 7
- 238000000151 deposition Methods 0.000 description 7
- 238000005530 etching Methods 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- 238000010521 absorption reaction Methods 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 239000002800 charge carrier Substances 0.000 description 4
- 239000002019 doping agent Substances 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 3
- 229910001092 metal group alloy Inorganic materials 0.000 description 3
- 238000000926 separation method Methods 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 230000006978 adaptation Effects 0.000 description 2
- 229910052785 arsenic Inorganic materials 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229910052733 gallium Inorganic materials 0.000 description 2
- 238000005286 illumination Methods 0.000 description 2
- 229910052738 indium Inorganic materials 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000002488 metal-organic chemical vapour deposition Methods 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 239000011241 protective layer Substances 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- RUDFQVOCFDJEEF-UHFFFAOYSA-N yttrium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[Y+3].[Y+3] RUDFQVOCFDJEEF-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000005670 electromagnetic radiation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical compound [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 238000007704 wet chemistry method Methods 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/10—Semiconductor bodies
- H10F77/14—Shape of semiconductor bodies; Shapes, relative sizes or dispositions of semiconductor regions within semiconductor bodies
- H10F77/148—Shapes of potential barriers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/813—Bodies having a plurality of light-emitting regions, e.g. multi-junction LEDs or light-emitting devices having photoluminescent regions within the bodies
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D8/00—Diodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F30/00—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors
- H10F30/20—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors
- H10F30/21—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation
- H10F30/22—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation the devices having only one potential barrier, e.g. photodiodes
- H10F30/223—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation the devices having only one potential barrier, e.g. photodiodes the potential barrier being a PIN barrier
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/10—Integrated devices
- H10F39/12—Image sensors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
- H10F71/127—The active layers comprising only Group III-V materials, e.g. GaAs or InP
- H10F71/1272—The active layers comprising only Group III-V materials, e.g. GaAs or InP comprising at least three elements, e.g. GaAlAs or InGaAsP
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/10—Semiconductor bodies
- H10F77/14—Shape of semiconductor bodies; Shapes, relative sizes or dispositions of semiconductor regions within semiconductor bodies
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/811—Bodies having quantum effect structures or superlattices, e.g. tunnel junctions
- H10H20/812—Bodies having quantum effect structures or superlattices, e.g. tunnel junctions within the light-emitting regions, e.g. having quantum confinement structures
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/30—Coatings
- H10F77/306—Coatings for devices having potential barriers
- H10F77/331—Coatings for devices having potential barriers for filtering or shielding light, e.g. multicolour filters for photodetectors
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/544—Solar cells from Group III-V materials
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Light Receiving Elements (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102008006987A DE102008006987A1 (de) | 2008-01-31 | 2008-01-31 | Strahlungsempfänger und Verfahren zur Herstellung eines Strahlungsempfängers |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200941751A TW200941751A (en) | 2009-10-01 |
| TWI396293B true TWI396293B (zh) | 2013-05-11 |
Family
ID=40719994
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW098101515A TWI396293B (zh) | 2008-01-31 | 2009-01-16 | 輻射接收器及其製造方法 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US8659107B2 (enExample) |
| EP (1) | EP2238624B1 (enExample) |
| JP (1) | JP2011511443A (enExample) |
| KR (1) | KR20100109563A (enExample) |
| CN (1) | CN101933142B (enExample) |
| DE (1) | DE102008006987A1 (enExample) |
| TW (1) | TWI396293B (enExample) |
| WO (1) | WO2009094966A2 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8659107B2 (en) | 2008-01-31 | 2014-02-25 | Osram Opto Semiconductors Gmbh | Radiation receiver and method of producing a radiation receiver |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8816461B2 (en) * | 2011-09-13 | 2014-08-26 | The Boeing Company | Dichromatic photodiodes |
| JP2013120880A (ja) * | 2011-12-08 | 2013-06-17 | Technical Research & Development Institute Ministry Of Defence | 光検知素子及び光検知素子の製造方法 |
| KR101456376B1 (ko) | 2013-04-24 | 2014-10-31 | 한국과학기술원 | 조립식 왕복 지지체를 가지는 진공 단열체의 구조 |
| CN103247638B (zh) * | 2013-04-27 | 2015-08-05 | 中国科学院苏州纳米技术与纳米仿生研究所 | 红外探测器及其制作方法 |
| US11158754B1 (en) * | 2013-08-09 | 2021-10-26 | Hrl Laboratories, Llc | Back-to-back dual band p-CB-n |
| WO2016069960A1 (en) * | 2014-10-29 | 2016-05-06 | Digital Direct Ir Inc. | Spherical detector arrays implemented using passive detector structures for thermal imaging applications |
| DE102015013514B4 (de) * | 2015-10-20 | 2024-04-18 | Azur Space Solar Power Gmbh | Optischer Empfängerbaustein |
| US10964862B2 (en) * | 2016-09-30 | 2021-03-30 | Sensor Electronic Technology, Inc. | Semiconductor heterostructure with multiple active regions |
| DE102018111319A1 (de) | 2018-05-11 | 2019-11-14 | Osram Opto Semiconductors Gmbh | Optoelektronisches Halbleiterbauelement und Verfahren zur Herstellung eines optoelektronischen Halbleiterbauelements |
| JP7243071B2 (ja) | 2018-08-01 | 2023-03-22 | 富士通株式会社 | 赤外線検出器及びこれを用いた赤外線撮像装置 |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58105569A (ja) * | 1981-12-16 | 1983-06-23 | Matsushita Electric Ind Co Ltd | 半導体受光装置 |
| US6822991B2 (en) * | 2002-09-30 | 2004-11-23 | Lumileds Lighting U.S., Llc | Light emitting devices including tunnel junctions |
| US20050067627A1 (en) * | 2003-09-17 | 2005-03-31 | Guangdi Shen | High efficiency multi-active layer tunnel regenerated white light emitting diode |
| US20060162768A1 (en) * | 2002-05-21 | 2006-07-27 | Wanlass Mark W | Low bandgap, monolithic, multi-bandgap, optoelectronic devices |
| US20070158659A1 (en) * | 2004-01-29 | 2007-07-12 | Rwe Space Solar Power Gmbh | Semiconductor Structure Comprising Active Zones |
| US7271405B2 (en) * | 2003-10-14 | 2007-09-18 | Stc.Unm | Intersubband detector with avalanche multiplier region |
Family Cites Families (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4496788A (en) * | 1982-12-29 | 1985-01-29 | Osaka Transformer Co., Ltd. | Photovoltaic device |
| US4677289A (en) | 1984-11-12 | 1987-06-30 | Kabushiki Kaisha Toshiba | Color sensor |
| DE3533146A1 (de) | 1985-09-17 | 1987-03-26 | Siemens Ag | Farbsensorelement, farbempfindliche sensoranordnung mit derartigen farbsensorelementen, eine anwendung des elements oder der anordnung und ein verfahren zur herstellung eines halbleitermaterials fuer das farbsensorelement |
| JPS6394125A (ja) * | 1986-10-08 | 1988-04-25 | Yamatake Honeywell Co Ltd | カラ−センサ |
| US4894526A (en) * | 1987-01-15 | 1990-01-16 | American Telephone And Telegraph Company, At&T Bell Laboratories | Infrared-radiation detector device |
| GB2228824A (en) | 1989-03-01 | 1990-09-05 | Gen Electric Co Plc | Radiation detectors |
| EP0400399A3 (de) * | 1989-05-31 | 1991-05-29 | Siemens Aktiengesellschaft | Monolithisch integrierte Photodiode-FET-Kombination |
| US5518934A (en) | 1994-07-21 | 1996-05-21 | Trustees Of Princeton University | Method of fabricating multiwavelength infrared focal plane array detector |
| US5552603A (en) * | 1994-09-15 | 1996-09-03 | Martin Marietta Corporation | Bias and readout for multicolor quantum well detectors |
| FR2756666B1 (fr) | 1996-12-04 | 1999-02-19 | Thomson Csf | Detecteur d'ondes electromagnetiques |
| JP3542965B2 (ja) * | 1997-10-16 | 2004-07-14 | カリフォルニア インスティチュート オブ テクノロジー | デュアルバンド量子井戸赤外線センシングアレイ |
| DE69939754D1 (de) * | 1998-05-28 | 2008-11-27 | Emcore Corp | Solarzelle mit einer integrierten monolithisch gewachsenen Bypassdiode |
| US7291858B2 (en) * | 1999-12-24 | 2007-11-06 | Bae Systems Information And Electronic Systems Integration Inc. | QWIP with tunable spectral response |
| WO2003073517A1 (en) * | 2002-02-27 | 2003-09-04 | Midwest Research Institute | Monolithic photovoltaic energy conversion device |
| US7831152B2 (en) * | 2002-06-04 | 2010-11-09 | Finisar Corporation | Optical transceiver |
| KR100542720B1 (ko) | 2003-06-03 | 2006-01-11 | 삼성전기주식회사 | GaN계 접합 구조 |
| DE102004037020B4 (de) | 2003-09-30 | 2021-10-21 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Strahlungsdetektor zur Detektion von Strahlung gemäß einer vorgegebenen spektralen Empfindlichkeitsverteilung |
| US8212285B2 (en) | 2004-03-31 | 2012-07-03 | Osram Opto Semiconductors Gmbh | Radiation detector |
| JP2006066456A (ja) | 2004-08-24 | 2006-03-09 | Fuji Photo Film Co Ltd | 固体撮像素子 |
| DE102005001280B4 (de) | 2004-09-30 | 2022-03-03 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Strahlungsdetektor |
| EP1643565B1 (de) * | 2004-09-30 | 2020-03-04 | OSRAM Opto Semiconductors GmbH | Strahlungsdetektor |
| DE102005013668B3 (de) | 2005-03-14 | 2006-11-16 | Universität Stuttgart | Solarzelle |
| DE102005043918B4 (de) * | 2005-05-30 | 2014-12-04 | Osram Opto Semiconductors Gmbh | Detektoranordnung und Verfahren zur Bestimmung spektraler Anteile in einer auf eine Detektoranordnung einfallenden Strahlung |
| DE102006015788A1 (de) | 2006-01-27 | 2007-09-13 | Osram Opto Semiconductors Gmbh | Optoelektronischer Halbleiterchip |
| DE102008006987A1 (de) | 2008-01-31 | 2009-08-06 | Osram Opto Semiconductors Gmbh | Strahlungsempfänger und Verfahren zur Herstellung eines Strahlungsempfängers |
| DE102008016100A1 (de) | 2008-03-28 | 2009-10-01 | Osram Opto Semiconductors Gmbh | Optoelektronischer Strahlungsdetektor und Verfahren zur Herstellung einer Mehrzahl von Detektorelementen |
| US7821807B2 (en) * | 2008-04-17 | 2010-10-26 | Epir Technologies, Inc. | Nonequilibrium photodetectors with single carrier species barriers |
-
2008
- 2008-01-31 DE DE102008006987A patent/DE102008006987A1/de not_active Withdrawn
- 2008-12-17 US US12/746,121 patent/US8659107B2/en not_active Expired - Fee Related
- 2008-12-17 JP JP2010544569A patent/JP2011511443A/ja active Pending
- 2008-12-17 WO PCT/DE2008/002126 patent/WO2009094966A2/de not_active Ceased
- 2008-12-17 KR KR1020107019154A patent/KR20100109563A/ko not_active Ceased
- 2008-12-17 CN CN2008801259321A patent/CN101933142B/zh not_active Expired - Fee Related
- 2008-12-17 EP EP08871711.1A patent/EP2238624B1/de not_active Not-in-force
-
2009
- 2009-01-16 TW TW098101515A patent/TWI396293B/zh not_active IP Right Cessation
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58105569A (ja) * | 1981-12-16 | 1983-06-23 | Matsushita Electric Ind Co Ltd | 半導体受光装置 |
| US20060162768A1 (en) * | 2002-05-21 | 2006-07-27 | Wanlass Mark W | Low bandgap, monolithic, multi-bandgap, optoelectronic devices |
| US6822991B2 (en) * | 2002-09-30 | 2004-11-23 | Lumileds Lighting U.S., Llc | Light emitting devices including tunnel junctions |
| US20050067627A1 (en) * | 2003-09-17 | 2005-03-31 | Guangdi Shen | High efficiency multi-active layer tunnel regenerated white light emitting diode |
| US7271405B2 (en) * | 2003-10-14 | 2007-09-18 | Stc.Unm | Intersubband detector with avalanche multiplier region |
| US20070158659A1 (en) * | 2004-01-29 | 2007-07-12 | Rwe Space Solar Power Gmbh | Semiconductor Structure Comprising Active Zones |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8659107B2 (en) | 2008-01-31 | 2014-02-25 | Osram Opto Semiconductors Gmbh | Radiation receiver and method of producing a radiation receiver |
Also Published As
| Publication number | Publication date |
|---|---|
| EP2238624A2 (de) | 2010-10-13 |
| CN101933142B (zh) | 2012-08-29 |
| JP2011511443A (ja) | 2011-04-07 |
| TW200941751A (en) | 2009-10-01 |
| KR20100109563A (ko) | 2010-10-08 |
| WO2009094966A3 (de) | 2009-10-08 |
| EP2238624B1 (de) | 2013-06-05 |
| DE102008006987A1 (de) | 2009-08-06 |
| US8659107B2 (en) | 2014-02-25 |
| US20100258892A1 (en) | 2010-10-14 |
| WO2009094966A2 (de) | 2009-08-06 |
| CN101933142A (zh) | 2010-12-29 |
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