TWI388923B - 灰階光罩的缺陷修正方法以及灰階光罩 - Google Patents
灰階光罩的缺陷修正方法以及灰階光罩 Download PDFInfo
- Publication number
- TWI388923B TWI388923B TW096102278A TW96102278A TWI388923B TW I388923 B TWI388923 B TW I388923B TW 096102278 A TW096102278 A TW 096102278A TW 96102278 A TW96102278 A TW 96102278A TW I388923 B TWI388923 B TW I388923B
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- Taiwan
- Prior art keywords
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- film
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- Prior art date
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/76—Patterning of masks by imaging
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006026126 | 2006-02-02 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200732830A TW200732830A (en) | 2007-09-01 |
TWI388923B true TWI388923B (zh) | 2013-03-11 |
Family
ID=38600147
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW096102278A TWI388923B (zh) | 2006-02-02 | 2007-01-22 | 灰階光罩的缺陷修正方法以及灰階光罩 |
Country Status (3)
Country | Link |
---|---|
KR (1) | KR101052747B1 (ko) |
CN (1) | CN101025565B (ko) |
TW (1) | TWI388923B (ko) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103969945B (zh) * | 2013-01-25 | 2018-08-24 | 上海微电子装备(集团)股份有限公司 | 刮伤掩模修补装置及方法 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3556591B2 (ja) * | 2000-09-29 | 2004-08-18 | Hoya株式会社 | グレートーンマスクにおけるグレートーン部の欠陥修正方法 |
CN1258118C (zh) * | 2002-03-28 | 2006-05-31 | Hoya株式会社 | 灰调掩模以及灰调掩膜中灰调部的缺陷修正方法 |
JP3993125B2 (ja) * | 2003-04-01 | 2007-10-17 | Hoya株式会社 | グレートーンマスクの欠陥修正方法 |
JP4001834B2 (ja) * | 2003-04-01 | 2007-10-31 | Hoya株式会社 | グレートーンマスクの欠陥検査方法及びグレートーンマスクの製造方法 |
JP4294359B2 (ja) * | 2003-04-08 | 2009-07-08 | Hoya株式会社 | グレートーンマスクの欠陥修正方法 |
-
2007
- 2007-01-22 TW TW096102278A patent/TWI388923B/zh active
- 2007-01-30 KR KR1020070009259A patent/KR101052747B1/ko active IP Right Grant
- 2007-02-02 CN CN200710006327XA patent/CN101025565B/zh active Active
Also Published As
Publication number | Publication date |
---|---|
TW200732830A (en) | 2007-09-01 |
CN101025565B (zh) | 2012-08-22 |
KR101052747B1 (ko) | 2011-08-01 |
KR20070079559A (ko) | 2007-08-07 |
CN101025565A (zh) | 2007-08-29 |
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