TWI388923B - 灰階光罩的缺陷修正方法以及灰階光罩 - Google Patents

灰階光罩的缺陷修正方法以及灰階光罩 Download PDF

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Publication number
TWI388923B
TWI388923B TW096102278A TW96102278A TWI388923B TW I388923 B TWI388923 B TW I388923B TW 096102278 A TW096102278 A TW 096102278A TW 96102278 A TW96102278 A TW 96102278A TW I388923 B TWI388923 B TW I388923B
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TW
Taiwan
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TW096102278A
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English (en)
Chinese (zh)
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TW200732830A (en
Inventor
Sano Michiaki
Original Assignee
Hoya Corp
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Publication of TW200732830A publication Critical patent/TW200732830A/zh
Application granted granted Critical
Publication of TWI388923B publication Critical patent/TWI388923B/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/76—Patterning of masks by imaging

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
TW096102278A 2006-02-02 2007-01-22 灰階光罩的缺陷修正方法以及灰階光罩 TWI388923B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006026126 2006-02-02

Publications (2)

Publication Number Publication Date
TW200732830A TW200732830A (en) 2007-09-01
TWI388923B true TWI388923B (zh) 2013-03-11

Family

ID=38600147

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096102278A TWI388923B (zh) 2006-02-02 2007-01-22 灰階光罩的缺陷修正方法以及灰階光罩

Country Status (3)

Country Link
KR (1) KR101052747B1 (ko)
CN (1) CN101025565B (ko)
TW (1) TWI388923B (ko)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103969945B (zh) * 2013-01-25 2018-08-24 上海微电子装备（集团）股份有限公司 刮伤掩模修补装置及方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3556591B2 (ja) * 2000-09-29 2004-08-18 Ｈｏｙａ株式会社 グレートーンマスクにおけるグレートーン部の欠陥修正方法
CN1258118C (zh) * 2002-03-28 2006-05-31 Hoya株式会社 灰调掩模以及灰调掩膜中灰调部的缺陷修正方法
JP3993125B2 (ja) * 2003-04-01 2007-10-17 Ｈｏｙａ株式会社 グレートーンマスクの欠陥修正方法
JP4001834B2 (ja) * 2003-04-01 2007-10-31 Ｈｏｙａ株式会社 グレートーンマスクの欠陥検査方法及びグレートーンマスクの製造方法
JP4294359B2 (ja) * 2003-04-08 2009-07-08 Ｈｏｙａ株式会社 グレートーンマスクの欠陥修正方法

Also Published As

Publication number Publication date
TW200732830A (en) 2007-09-01
CN101025565B (zh) 2012-08-22
KR101052747B1 (ko) 2011-08-01
KR20070079559A (ko) 2007-08-07
CN101025565A (zh) 2007-08-29

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