CN101025565B - 灰色调掩模的缺陷修正方法与灰色调掩模 - Google Patents

灰色调掩模的缺陷修正方法与灰色调掩模 Download PDF

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Publication number
CN101025565B
CN101025565B CN200710006327XA CN200710006327A CN101025565B CN 101025565 B CN101025565 B CN 101025565B CN 200710006327X A CN200710006327X A CN 200710006327XA CN 200710006327 A CN200710006327 A CN 200710006327A CN 101025565 B CN101025565 B CN 101025565B
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CN101025565A (zh
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佐野道明
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Hoya Corp
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Hoya Corp
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/76—Patterning of masks by imaging

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
CN200710006327XA 2006-02-02 2007-02-02 灰色调掩模的缺陷修正方法与灰色调掩模 Active CN101025565B (zh)

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JP2006026126 2006-02-02
JP2006-26126 2006-02-02
JP200626126 2006-02-02

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CN101025565A CN101025565A (zh) 2007-08-29
CN101025565B true CN101025565B (zh) 2012-08-22

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KR (1) KR101052747B1 (ko)
CN (1) CN101025565B (ko)
TW (1) TWI388923B (ko)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103969945B (zh) * 2013-01-25 2018-08-24 上海微电子装备（集团）股份有限公司 刮伤掩模修补装置及方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1448783A (zh) * 2002-03-28 2003-10-15 保谷株式会社 灰调掩模中灰调部的缺陷修正方法
CN1534366A (zh) * 2003-04-01 2004-10-06 Hoya株式会社 灰色调掩模的缺陷校正方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3556591B2 (ja) * 2000-09-29 2004-08-18 Ｈｏｙａ株式会社 グレートーンマスクにおけるグレートーン部の欠陥修正方法
JP4001834B2 (ja) * 2003-04-01 2007-10-31 Ｈｏｙａ株式会社 グレートーンマスクの欠陥検査方法及びグレートーンマスクの製造方法
JP4294359B2 (ja) * 2003-04-08 2009-07-08 Ｈｏｙａ株式会社 グレートーンマスクの欠陥修正方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1448783A (zh) * 2002-03-28 2003-10-15 保谷株式会社 灰调掩模中灰调部的缺陷修正方法
CN1534366A (zh) * 2003-04-01 2004-10-06 Hoya株式会社 灰色调掩模的缺陷校正方法

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
JP特开2003-307501A1 2003.10.31

Also Published As

Publication number Publication date
KR101052747B1 (ko) 2011-08-01
TWI388923B (zh) 2013-03-11
TW200732830A (en) 2007-09-01
CN101025565A (zh) 2007-08-29
KR20070079559A (ko) 2007-08-07

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Address after: Japan Tokyo 160-8347 Shinjuku Shinjuku six chome 10 No. 1

Patentee after: Hoya Co., Ltd.

Address before: Tokyo, Japan, Japan

Patentee before: Hoya Co., Ltd.