TWI382100B - 於一致速率下蒸發物質 - Google Patents
於一致速率下蒸發物質 Download PDFInfo
- Publication number
- TWI382100B TWI382100B TW095127216A TW95127216A TWI382100B TW I382100 B TWI382100 B TW I382100B TW 095127216 A TW095127216 A TW 095127216A TW 95127216 A TW95127216 A TW 95127216A TW I382100 B TWI382100 B TW I382100B
- Authority
- TW
- Taiwan
- Prior art keywords
- heating element
- rate
- column
- substance
- vaporization
- Prior art date
Links
- 239000000463 material Substances 0.000 title claims description 85
- 230000008016 vaporization Effects 0.000 title claims description 54
- 238000010438 heat treatment Methods 0.000 claims description 93
- 238000009834 vaporization Methods 0.000 claims description 51
- 238000000034 method Methods 0.000 claims description 30
- 239000000126 substance Substances 0.000 claims description 25
- 238000001816 cooling Methods 0.000 claims description 13
- 239000011368 organic material Substances 0.000 claims description 13
- 239000000758 substrate Substances 0.000 claims description 13
- 230000008859 change Effects 0.000 claims description 12
- 238000001704 evaporation Methods 0.000 claims description 10
- 230000004907 flux Effects 0.000 claims description 5
- 239000011364 vaporized material Substances 0.000 claims description 5
- 239000012044 organic layer Substances 0.000 claims 4
- 239000010410 layer Substances 0.000 claims 3
- 239000002245 particle Substances 0.000 claims 1
- 238000000151 deposition Methods 0.000 description 31
- 230000008021 deposition Effects 0.000 description 30
- 238000007740 vapor deposition Methods 0.000 description 16
- 239000007787 solid Substances 0.000 description 12
- 239000010408 film Substances 0.000 description 9
- 230000007246 mechanism Effects 0.000 description 9
- 238000004519 manufacturing process Methods 0.000 description 7
- 238000005240 physical vapour deposition Methods 0.000 description 5
- 238000007796 conventional method Methods 0.000 description 4
- 229920006395 saturated elastomer Polymers 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 230000008020 evaporation Effects 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 230000002457 bidirectional effect Effects 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000006731 degradation reaction Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000003993 interaction Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000013618 particulate matter Substances 0.000 description 2
- 230000004044 response Effects 0.000 description 2
- 239000011343 solid material Substances 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- 230000009471 action Effects 0.000 description 1
- 238000013019 agitation Methods 0.000 description 1
- 230000002238 attenuated effect Effects 0.000 description 1
- 230000006399 behavior Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000011217 control strategy Methods 0.000 description 1
- 230000000593 degrading effect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000005416 organic matter Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000000750 progressive effect Effects 0.000 description 1
- 150000003384 small molecules Chemical class 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 230000008542 thermal sensitivity Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000009827 uniform distribution Methods 0.000 description 1
- 239000006200 vaporizer Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/246—Replenishment of source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/548—Controlling the composition
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Electroluminescent Light Sources (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/190,653 US7989021B2 (en) | 2005-07-27 | 2005-07-27 | Vaporizing material at a uniform rate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200710240A TW200710240A (en) | 2007-03-16 |
| TWI382100B true TWI382100B (zh) | 2013-01-11 |
Family
ID=37432381
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW095127216A TWI382100B (zh) | 2005-07-27 | 2006-07-26 | 於一致速率下蒸發物質 |
Country Status (7)
| Country | Link |
|---|---|
| US (2) | US7989021B2 (enExample) |
| EP (1) | EP1924721B1 (enExample) |
| JP (1) | JP5139287B2 (enExample) |
| KR (1) | KR101218228B1 (enExample) |
| CN (1) | CN100575537C (enExample) |
| TW (1) | TWI382100B (enExample) |
| WO (1) | WO2007015948A1 (enExample) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8062427B2 (en) * | 2008-11-14 | 2011-11-22 | Global Oled Technology Llc | Particulate material metering and vaporization |
| US7972443B2 (en) * | 2008-11-14 | 2011-07-05 | Global Oled Technology Llc | Metering of particulate material and vaporization thereof |
| WO2011103170A1 (en) * | 2010-02-16 | 2011-08-25 | Nextteq, Llc | Containers for fluids with composite agile walls |
| JP2013104127A (ja) * | 2011-11-16 | 2013-05-30 | Mitsubishi Heavy Ind Ltd | 真空蒸着装置 |
| KR102073745B1 (ko) * | 2013-04-02 | 2020-02-05 | 주식회사 선익시스템 | 증발원 및 이를 구비한 증착장치 |
| CN106947941B (zh) * | 2017-04-13 | 2019-12-06 | 合肥鑫晟光电科技有限公司 | 蒸镀系统 |
| CN108060392B (zh) * | 2017-12-14 | 2023-07-18 | 深圳先进技术研究院 | 一种可控线性蒸发装置及镀膜方法 |
| KR20200076389A (ko) * | 2018-12-19 | 2020-06-29 | 주식회사 포스코 | Pvd 도금 공정에서의 도금층 제어 장치 및 방법 |
| DE102020123764A1 (de) * | 2020-09-11 | 2022-03-17 | Apeva Se | Verfahren zum Erzeugen eines zeitlich konstanten Dampfflusses sowie Verfahren zum Einstellen eines Arbeitspunktes einer Vorrichtung zum Erzeugen eines Dampfes |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20030008071A1 (en) * | 2001-07-03 | 2003-01-09 | Eastman Kodak Company | Method of handling organic material in making an organic light-emitting device |
| TW550304B (en) * | 2000-10-20 | 2003-09-01 | Ulvac Corp | Apparatus and method of forming protection coating for plasma display |
| TW552313B (en) * | 2001-08-13 | 2003-09-11 | Jusung Eng Co Ltd | Method of forming a MOCVD-TiN thin film |
| TW200304956A (en) * | 2002-04-01 | 2003-10-16 | Ans Inc | Vapor organic material deposition method and vapor organic material deposition apparatus using the same |
| US20040062856A1 (en) * | 2002-09-23 | 2004-04-01 | Eastman Kodak Company | Depositing layers in OLED devices using viscous flow |
| US20050072361A1 (en) * | 2003-10-03 | 2005-04-07 | Yimou Yang | Multi-layered radiant thermal evaporator and method of use |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2447789A (en) | 1945-03-23 | 1948-08-24 | Polaroid Corp | Evaporating crucible for coating apparatus |
| JPS59177365A (ja) * | 1983-03-24 | 1984-10-08 | Matsushita Electric Ind Co Ltd | 蒸発方法とその装置 |
| US4861989A (en) * | 1983-08-30 | 1989-08-29 | Research Corporation Technologies, Inc. | Ion vapor source for mass spectrometry of liquids |
| CN2122671U (zh) * | 1992-05-26 | 1992-11-25 | 王守成 | 螺旋管式旋转薄膜蒸发器 |
| EP0585848A1 (de) | 1992-09-02 | 1994-03-09 | Hoechst Aktiengesellschaft | Verfahren und Vorrichtung zur chemischen Gasphasenabscheidung dünner Schichten |
| US6296711B1 (en) | 1998-04-14 | 2001-10-02 | Cvd Systems, Inc. | Film processing system |
| US6358323B1 (en) * | 1998-07-21 | 2002-03-19 | Applied Materials, Inc. | Method and apparatus for improved control of process and purge material in a substrate processing system |
| JP2000068055A (ja) | 1998-08-26 | 2000-03-03 | Tdk Corp | 有機ｅｌ素子用蒸発源、この有機ｅｌ素子用蒸発源を用いた有機ｅｌ素子の製造装置および製造方法 |
| US6202591B1 (en) * | 1998-11-12 | 2001-03-20 | Flex Products, Inc. | Linear aperture deposition apparatus and coating process |
| US6237529B1 (en) * | 2000-03-03 | 2001-05-29 | Eastman Kodak Company | Source for thermal physical vapor deposition of organic electroluminescent layers |
| WO2002020864A2 (en) * | 2000-06-16 | 2002-03-14 | Applied Materials, Inc. | System and method for depositing high dielectric constant materials and compatible conductive materials |
| US6529686B2 (en) * | 2001-06-06 | 2003-03-04 | Fsi International, Inc. | Heating member for combination heating and chilling apparatus, and methods |
| JP2003293121A (ja) * | 2002-04-05 | 2003-10-15 | Cluster Ion Beam Technology Kk | 蒸着材料供給手段を備えた蒸着用坩堝 |
| US7232588B2 (en) * | 2004-02-23 | 2007-06-19 | Eastman Kodak Company | Device and method for vaporizing temperature sensitive materials |
| US7501151B2 (en) | 2004-09-21 | 2009-03-10 | Eastman Kodak Company | Delivering particulate material to a vaporization zone |
| US20060099344A1 (en) | 2004-11-09 | 2006-05-11 | Eastman Kodak Company | Controlling the vaporization of organic material |
| US7465475B2 (en) | 2004-11-09 | 2008-12-16 | Eastman Kodak Company | Method for controlling the deposition of vaporized organic material |
| US7794788B2 (en) * | 2007-03-28 | 2010-09-14 | Tokyo Electron Limited | Method for pre-conditioning a precursor vaporization system for a vapor deposition process |
| US8133362B2 (en) * | 2010-02-26 | 2012-03-13 | Fujifilm Corporation | Physical vapor deposition with multi-point clamp |
-
2005
- 2005-07-27 US US11/190,653 patent/US7989021B2/en active Active
-
2006
- 2006-07-20 WO PCT/US2006/028238 patent/WO2007015948A1/en not_active Ceased
- 2006-07-20 CN CN200680027360A patent/CN100575537C/zh active Active
- 2006-07-20 JP JP2008523981A patent/JP5139287B2/ja active Active
- 2006-07-20 EP EP06788017.9A patent/EP1924721B1/en active Active
- 2006-07-26 TW TW095127216A patent/TWI382100B/zh active
-
2008
- 2008-01-25 KR KR1020087002085A patent/KR101218228B1/ko active Active
-
2011
- 2011-06-21 US US13/165,677 patent/US20110247562A1/en not_active Abandoned
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW550304B (en) * | 2000-10-20 | 2003-09-01 | Ulvac Corp | Apparatus and method of forming protection coating for plasma display |
| US20030008071A1 (en) * | 2001-07-03 | 2003-01-09 | Eastman Kodak Company | Method of handling organic material in making an organic light-emitting device |
| TW552313B (en) * | 2001-08-13 | 2003-09-11 | Jusung Eng Co Ltd | Method of forming a MOCVD-TiN thin film |
| TW200304956A (en) * | 2002-04-01 | 2003-10-16 | Ans Inc | Vapor organic material deposition method and vapor organic material deposition apparatus using the same |
| US20040062856A1 (en) * | 2002-09-23 | 2004-04-01 | Eastman Kodak Company | Depositing layers in OLED devices using viscous flow |
| US20050072361A1 (en) * | 2003-10-03 | 2005-04-07 | Yimou Yang | Multi-layered radiant thermal evaporator and method of use |
Also Published As
| Publication number | Publication date |
|---|---|
| CN101248206A (zh) | 2008-08-20 |
| WO2007015948A1 (en) | 2007-02-08 |
| US20110247562A1 (en) | 2011-10-13 |
| JP2009503256A (ja) | 2009-01-29 |
| US7989021B2 (en) | 2011-08-02 |
| TW200710240A (en) | 2007-03-16 |
| JP5139287B2 (ja) | 2013-02-06 |
| KR20080031028A (ko) | 2008-04-07 |
| US20070026146A1 (en) | 2007-02-01 |
| KR101218228B1 (ko) | 2013-01-04 |
| CN100575537C (zh) | 2009-12-30 |
| EP1924721B1 (en) | 2014-07-02 |
| EP1924721A1 (en) | 2008-05-28 |
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