CN100575537C - 以均匀速率蒸发材料的方法 - Google Patents

以均匀速率蒸发材料的方法 Download PDF

Info

Publication number
CN100575537C
CN100575537C CN200680027360A CN200680027360A CN100575537C CN 100575537 C CN100575537 C CN 100575537C CN 200680027360 A CN200680027360 A CN 200680027360A CN 200680027360 A CN200680027360 A CN 200680027360A CN 100575537 C CN100575537 C CN 100575537C
Authority
CN
China
Prior art keywords
heating unit
vaporizable material
constant
post
heating element
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN200680027360A
Other languages
English (en)
Chinese (zh)
Other versions
CN101248206A (zh
Inventor
M·龙
B·E·寇佩
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Global OLED Technology LLC
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Publication of CN101248206A publication Critical patent/CN101248206A/zh
Application granted granted Critical
Publication of CN100575537C publication Critical patent/CN100575537C/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/246—Replenishment of source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/548—Controlling the composition

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)
CN200680027360A 2005-07-27 2006-07-20 以均匀速率蒸发材料的方法 Active CN100575537C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/190,653 2005-07-27
US11/190,653 US7989021B2 (en) 2005-07-27 2005-07-27 Vaporizing material at a uniform rate

Publications (2)

Publication Number Publication Date
CN101248206A CN101248206A (zh) 2008-08-20
CN100575537C true CN100575537C (zh) 2009-12-30

Family

ID=37432381

Family Applications (1)

Application Number Title Priority Date Filing Date
CN200680027360A Active CN100575537C (zh) 2005-07-27 2006-07-20 以均匀速率蒸发材料的方法

Country Status (7)

Country Link
US (2) US7989021B2 (enExample)
EP (1) EP1924721B1 (enExample)
JP (1) JP5139287B2 (enExample)
KR (1) KR101218228B1 (enExample)
CN (1) CN100575537C (enExample)
TW (1) TWI382100B (enExample)
WO (1) WO2007015948A1 (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8062427B2 (en) * 2008-11-14 2011-11-22 Global Oled Technology Llc Particulate material metering and vaporization
US7972443B2 (en) * 2008-11-14 2011-07-05 Global Oled Technology Llc Metering of particulate material and vaporization thereof
WO2011103170A1 (en) * 2010-02-16 2011-08-25 Nextteq, Llc Containers for fluids with composite agile walls
JP2013104127A (ja) * 2011-11-16 2013-05-30 Mitsubishi Heavy Ind Ltd 真空蒸着装置
KR102073745B1 (ko) * 2013-04-02 2020-02-05 주식회사 선익시스템 증발원 및 이를 구비한 증착장치
CN106947941B (zh) * 2017-04-13 2019-12-06 合肥鑫晟光电科技有限公司 蒸镀系统
CN108060392B (zh) * 2017-12-14 2023-07-18 深圳先进技术研究院 一种可控线性蒸发装置及镀膜方法
KR20200076389A (ko) * 2018-12-19 2020-06-29 주식회사 포스코 Pvd 도금 공정에서의 도금층 제어 장치 및 방법
DE102020123764A1 (de) * 2020-09-11 2022-03-17 Apeva Se Verfahren zum Erzeugen eines zeitlich konstanten Dampfflusses sowie Verfahren zum Einstellen eines Arbeitspunktes einer Vorrichtung zum Erzeugen eines Dampfes

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN2122671U (zh) * 1992-05-26 1992-11-25 王守成 螺旋管式旋转薄膜蒸发器
CN1317056A (zh) * 1998-07-21 2001-10-10 应用材料有限公司 Cvd装置

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2447789A (en) 1945-03-23 1948-08-24 Polaroid Corp Evaporating crucible for coating apparatus
JPS59177365A (ja) * 1983-03-24 1984-10-08 Matsushita Electric Ind Co Ltd 蒸発方法とその装置
US4861989A (en) * 1983-08-30 1989-08-29 Research Corporation Technologies, Inc. Ion vapor source for mass spectrometry of liquids
EP0585848A1 (de) 1992-09-02 1994-03-09 Hoechst Aktiengesellschaft Verfahren und Vorrichtung zur chemischen Gasphasenabscheidung dünner Schichten
US6296711B1 (en) 1998-04-14 2001-10-02 Cvd Systems, Inc. Film processing system
JP2000068055A (ja) 1998-08-26 2000-03-03 Tdk Corp 有機ｅｌ素子用蒸発源、この有機ｅｌ素子用蒸発源を用いた有機ｅｌ素子の製造装置および製造方法
US6202591B1 (en) * 1998-11-12 2001-03-20 Flex Products, Inc. Linear aperture deposition apparatus and coating process
US6237529B1 (en) * 2000-03-03 2001-05-29 Eastman Kodak Company Source for thermal physical vapor deposition of organic electroluminescent layers
WO2002020864A2 (en) * 2000-06-16 2002-03-14 Applied Materials, Inc. System and method for depositing high dielectric constant materials and compatible conductive materials
JP4570232B2 (ja) * 2000-10-20 2010-10-27 株式会社アルバック プラズマディスプレイ保護膜形成装置および保護膜形成方法
US6529686B2 (en) * 2001-06-06 2003-03-04 Fsi International, Inc. Heating member for combination heating and chilling apparatus, and methods
US6797314B2 (en) * 2001-07-03 2004-09-28 Eastman Kodak Company Method of handling organic material in making an organic light-emitting device
TW552313B (en) * 2001-08-13 2003-09-11 Jusung Eng Co Ltd Method of forming a MOCVD-TiN thin film
AU2003217530A1 (en) * 2002-04-01 2003-10-13 Ans Inc Apparatus and method for depositing organic matter of vapor phase
JP2003293121A (ja) * 2002-04-05 2003-10-15 Cluster Ion Beam Technology Kk 蒸着材料供給手段を備えた蒸着用坩堝
US7067170B2 (en) * 2002-09-23 2006-06-27 Eastman Kodak Company Depositing layers in OLED devices using viscous flow
US7339139B2 (en) * 2003-10-03 2008-03-04 Darly Custom Technology, Inc. Multi-layered radiant thermal evaporator and method of use
US7232588B2 (en) * 2004-02-23 2007-06-19 Eastman Kodak Company Device and method for vaporizing temperature sensitive materials
US7501151B2 (en) 2004-09-21 2009-03-10 Eastman Kodak Company Delivering particulate material to a vaporization zone
US20060099344A1 (en) 2004-11-09 2006-05-11 Eastman Kodak Company Controlling the vaporization of organic material
US7465475B2 (en) 2004-11-09 2008-12-16 Eastman Kodak Company Method for controlling the deposition of vaporized organic material
US7794788B2 (en) * 2007-03-28 2010-09-14 Tokyo Electron Limited Method for pre-conditioning a precursor vaporization system for a vapor deposition process
US8133362B2 (en) * 2010-02-26 2012-03-13 Fujifilm Corporation Physical vapor deposition with multi-point clamp

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN2122671U (zh) * 1992-05-26 1992-11-25 王守成 螺旋管式旋转薄膜蒸发器
CN1317056A (zh) * 1998-07-21 2001-10-10 应用材料有限公司 Cvd装置

Also Published As

Publication number Publication date
CN101248206A (zh) 2008-08-20
WO2007015948A1 (en) 2007-02-08
US20110247562A1 (en) 2011-10-13
JP2009503256A (ja) 2009-01-29
US7989021B2 (en) 2011-08-02
TW200710240A (en) 2007-03-16
JP5139287B2 (ja) 2013-02-06
KR20080031028A (ko) 2008-04-07
US20070026146A1 (en) 2007-02-01
KR101218228B1 (ko) 2013-01-04
EP1924721B1 (en) 2014-07-02
TWI382100B (zh) 2013-01-11
EP1924721A1 (en) 2008-05-28

Similar Documents

Publication Publication Date Title
US20110247562A1 (en) Vaporizing Material at a Uniform Rate
JP5551336B2 (ja) Ｏｌｅｄの製造における有機材料の制御可能な供給
JP6584067B2 (ja) 真空蒸着装置
US8012537B2 (en) Controlling the vaporization of organic material
JP5013591B2 (ja) 真空蒸着装置
US7625602B2 (en) Controllably feeding powdered or granular material
US20120052189A1 (en) Vapor deposition system
TWI382098B (zh) 汽化有機材料應用之控制
JP2007126303A (ja) 薄膜堆積用分子線源とその分子線量制御方法
CN102482761A (zh) 蒸发器、由蒸发器组成的机构和覆层设备
JP2006225759A (ja) 真空蒸着装置
JP2008540831A (ja) 素早い気化を促進するための材料の計量供給

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
ASS Succession or assignment of patent right

Owner name: GLOBAL OLED TECHNOLOGY CO., LTD.

Free format text: FORMER OWNER: EASTMAN KODAK COMPANY

Effective date: 20100421

C41 Transfer of patent application or patent right or utility model
COR Change of bibliographic data

Free format text: CORRECT: ADDRESS; FROM: NEW YORK, U.S.A. TO: DELAWARE, U.S.A.

TR01 Transfer of patent right

Effective date of registration: 20100421

Address after: Delaware, USA

Patentee after: Global OLED Technology LLC

Address before: American New York

Patentee before: Eastman Kodak Co.