TWI379926B - Silica glass crucible having multilayered structure - Google Patents
Silica glass crucible having multilayered structure Download PDFInfo
- Publication number
- TWI379926B TWI379926B TW098101931A TW98101931A TWI379926B TW I379926 B TWI379926 B TW I379926B TW 098101931 A TW098101931 A TW 098101931A TW 98101931 A TW98101931 A TW 98101931A TW I379926 B TWI379926 B TW I379926B
- Authority
- TW
- Taiwan
- Prior art keywords
- layer
- quartz
- opaque
- single crystal
- transparent
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/10—Crucibles or containers for supporting the melt
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/09—Other methods of shaping glass by fusing powdered glass in a shaping mould
- C03B19/095—Other methods of shaping glass by fusing powdered glass in a shaping mould by centrifuging, e.g. arc discharge in rotating mould
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B13/00—Single-crystal growth by zone-melting; Refining by zone-melting
- C30B13/14—Crucibles or vessels
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/06—Silicon
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B35/00—Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure
- C30B35/002—Crucibles or containers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
- Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
- Y10T117/1032—Seed pulling
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Metallurgy (AREA)
- Manufacturing & Machinery (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Glass Melting And Manufacturing (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008281169A JP5069663B2 (ja) | 2008-10-31 | 2008-10-31 | 多層構造を有する石英ガラスルツボ |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201016901A TW201016901A (en) | 2010-05-01 |
TWI379926B true TWI379926B (en) | 2012-12-21 |
Family
ID=41016766
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW098101931A TWI379926B (en) | 2008-10-31 | 2009-01-19 | Silica glass crucible having multilayered structure |
Country Status (6)
Country | Link |
---|---|
US (1) | US20100107970A1 (ko) |
EP (1) | EP2182099B1 (ko) |
JP (1) | JP5069663B2 (ko) |
KR (1) | KR101081994B1 (ko) |
CN (1) | CN101724887B (ko) |
TW (1) | TWI379926B (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI732388B (zh) * | 2018-12-27 | 2021-07-01 | 日商Sumco股份有限公司 | 石英玻璃坩堝、及使用此之矽單結晶的製造方法、石英玻璃坩堝的紅外線透過率測定方法及其製造方法 |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5500684B2 (ja) | 2010-06-25 | 2014-05-21 | 株式会社Sumco | シリカガラスルツボ及びその製造方法、シリコンインゴットの製造方法 |
JP5618409B2 (ja) * | 2010-12-01 | 2014-11-05 | 株式会社Sumco | シリカガラスルツボ |
JP6457498B2 (ja) * | 2013-05-23 | 2019-01-23 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | 半導体処理チャンバ用の被覆されたライナーアセンブリ |
JP6253976B2 (ja) * | 2013-12-28 | 2017-12-27 | 株式会社Sumco | 石英ガラスルツボ及びその製造方法 |
CN106868583B (zh) * | 2015-12-10 | 2019-06-14 | 有研半导体材料有限公司 | 一种石英坩埚 |
CN113897669B (zh) * | 2016-09-13 | 2023-11-07 | 胜高股份有限公司 | 石英玻璃坩埚及其制造方法 |
JP7141844B2 (ja) | 2018-04-06 | 2022-09-26 | 信越石英株式会社 | 石英ガラスるつぼの製造方法 |
US11703452B2 (en) * | 2018-05-17 | 2023-07-18 | Sumco Corporation | Method and apparatus for measuring transmittance of quartz crucible |
JP7349779B2 (ja) * | 2018-08-09 | 2023-09-25 | 信越石英株式会社 | 石英ガラスるつぼ |
DE112019006492T5 (de) | 2018-12-27 | 2021-11-11 | Sumco Corporation | Quarzglastiegel |
CN110541192B (zh) * | 2019-10-10 | 2023-10-27 | 晶科能源股份有限公司 | 一种石英坩埚制备方法 |
CN113510824B (zh) * | 2020-04-09 | 2022-07-05 | 隆基绿能科技股份有限公司 | 一种复合石英坩埚的制备方法及复合石英坩埚 |
KR20230081722A (ko) | 2020-12-18 | 2023-06-07 | 가부시키가이샤 사무코 | 석영 유리 도가니 및 그 제조 방법 및 실리콘 단결정의 제조 방법 |
CN113800919B (zh) * | 2021-10-26 | 2023-01-03 | 中材高新氮化物陶瓷有限公司 | 一种高精度氮化硅陶瓷微球及其制备方法和应用 |
JP2024011733A (ja) | 2022-07-15 | 2024-01-25 | 株式会社Subaru | 車両の配光制御装置 |
CN118186568B (zh) * | 2024-05-15 | 2024-07-19 | 浙江美晶新材料股份有限公司 | 一种石英坩埚及其制备方法与应用 |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4935046A (en) * | 1987-12-03 | 1990-06-19 | Shin-Etsu Handotai Company, Limited | Manufacture of a quartz glass vessel for the growth of single crystal semiconductor |
JPH01148718A (ja) | 1987-12-03 | 1989-06-12 | Shin Etsu Handotai Co Ltd | 石英るつぼの製造方法 |
JP2577587B2 (ja) | 1987-12-15 | 1997-02-05 | 東芝セラミックス株式会社 | 石英ガラスルツボ製造装置 |
JP2615292B2 (ja) | 1987-12-17 | 1997-05-28 | 東芝セラミックス株式会社 | 石英ガラスルツボの製造方法 |
US5306473A (en) * | 1992-01-31 | 1994-04-26 | Toshiba Ceramics Co., Ltd. | Quartz glass crucible for pulling a single crystal |
JPH06101986A (ja) | 1992-09-17 | 1994-04-12 | Mitsubishi Shindoh Co Ltd | 内面溝付伝熱管 |
JP2923720B2 (ja) | 1992-12-26 | 1999-07-26 | 三菱マテリアルクォーツ株式会社 | シリコン単結晶引上げ用石英ルツボ |
JP3215992B2 (ja) | 1993-05-24 | 2001-10-09 | 三菱マテリアルクォーツ株式会社 | シリコン単結晶引上げ用石英ルツボ |
JP2811290B2 (ja) | 1995-04-04 | 1998-10-15 | 信越石英株式会社 | シリコン単結晶引き上げ用石英ガラスルツボ |
JP2936392B2 (ja) | 1995-12-12 | 1999-08-23 | 三菱マテリアルクォーツ株式会社 | シリコン単結晶引上げ用石英ルツボ |
JP3533416B2 (ja) * | 1996-02-06 | 2004-05-31 | 三菱住友シリコン株式会社 | 単結晶引上装置 |
JP4285788B2 (ja) * | 1996-03-14 | 2009-06-24 | 信越石英株式会社 | 単結晶引き上げ用大口径石英るつぼの製造方法 |
JP3764776B2 (ja) * | 1996-03-18 | 2006-04-12 | 信越石英株式会社 | 単結晶引き上げ用石英ガラスるつぼ及びその製造方法 |
JP2000109391A (ja) | 1998-10-05 | 2000-04-18 | Sumitomo Metal Ind Ltd | 石英るつぼ |
JP2001122688A (ja) * | 1999-10-27 | 2001-05-08 | Nanwa Kuorutsu:Kk | 石英ガラスるつぼ |
DE19962449C2 (de) * | 1999-12-22 | 2003-09-25 | Heraeus Quarzglas | Quarzglastiegel und Verfahren für seine Herstellung |
JP4447738B2 (ja) | 2000-05-31 | 2010-04-07 | 信越石英株式会社 | 多層構造の石英ガラスルツボの製造方法 |
US20030024467A1 (en) * | 2001-08-02 | 2003-02-06 | Memc Electronic Materials, Inc. | Method of eliminating near-surface bubbles in quartz crucibles |
JP4358555B2 (ja) * | 2003-05-30 | 2009-11-04 | ジャパンスーパークォーツ株式会社 | シリコン単結晶引上用石英ガラスルツボとその引上方法 |
JP2005219997A (ja) * | 2004-02-09 | 2005-08-18 | Toshiba Ceramics Co Ltd | シリカガラスルツボ |
JP2008281169A (ja) | 2007-05-14 | 2008-11-20 | Ykk Corp | 保持具 |
-
2008
- 2008-10-31 JP JP2008281169A patent/JP5069663B2/ja active Active
-
2009
- 2009-01-08 KR KR1020090001412A patent/KR101081994B1/ko active IP Right Grant
- 2009-01-09 US US12/351,207 patent/US20100107970A1/en not_active Abandoned
- 2009-01-19 TW TW098101931A patent/TWI379926B/zh active
- 2009-01-20 EP EP09000723.8A patent/EP2182099B1/en active Active
- 2009-01-22 CN CN2009100033771A patent/CN101724887B/zh active Active
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI732388B (zh) * | 2018-12-27 | 2021-07-01 | 日商Sumco股份有限公司 | 石英玻璃坩堝、及使用此之矽單結晶的製造方法、石英玻璃坩堝的紅外線透過率測定方法及其製造方法 |
Also Published As
Publication number | Publication date |
---|---|
CN101724887B (zh) | 2012-07-18 |
CN101724887A (zh) | 2010-06-09 |
EP2182099A1 (en) | 2010-05-05 |
JP5069663B2 (ja) | 2012-11-07 |
KR20100048836A (ko) | 2010-05-11 |
US20100107970A1 (en) | 2010-05-06 |
JP2010105880A (ja) | 2010-05-13 |
EP2182099B1 (en) | 2016-08-17 |
TW201016901A (en) | 2010-05-01 |
KR101081994B1 (ko) | 2011-11-09 |
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