TWI375767B - Reactive gas control - Google Patents
Reactive gas control Download PDFInfo
- Publication number
- TWI375767B TWI375767B TW98131373A TW98131373A TWI375767B TW I375767 B TWI375767 B TW I375767B TW 98131373 A TW98131373 A TW 98131373A TW 98131373 A TW98131373 A TW 98131373A TW I375767 B TWI375767 B TW I375767B
- Authority
- TW
- Taiwan
- Prior art keywords
- liquid
- gas
- chamber
- edge
- gas stream
- Prior art date
Links
- 239000007788 liquid Substances 0.000 claims description 218
- 239000000356 contaminant Substances 0.000 claims description 56
- 238000000034 method Methods 0.000 claims description 28
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 27
- 239000012528 membrane Substances 0.000 claims description 13
- 238000003860 storage Methods 0.000 claims description 10
- 238000005200 wet scrubbing Methods 0.000 claims description 5
- 238000005406 washing Methods 0.000 claims description 4
- 239000003344 environmental pollutant Substances 0.000 claims description 3
- 231100000719 pollutant Toxicity 0.000 claims description 3
- 238000012546 transfer Methods 0.000 claims description 2
- 238000004513 sizing Methods 0.000 claims 1
- 239000007789 gas Substances 0.000 description 158
- 238000006243 chemical reaction Methods 0.000 description 73
- 239000000463 material Substances 0.000 description 30
- 239000007795 chemical reaction product Substances 0.000 description 18
- 238000002485 combustion reaction Methods 0.000 description 14
- 239000007787 solid Substances 0.000 description 13
- 239000000126 substance Substances 0.000 description 10
- 239000012530 fluid Substances 0.000 description 9
- 238000004519 manufacturing process Methods 0.000 description 9
- 239000012071 phase Substances 0.000 description 8
- 238000000151 deposition Methods 0.000 description 6
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 5
- 238000004891 communication Methods 0.000 description 5
- 239000001301 oxygen Substances 0.000 description 5
- 229910052760 oxygen Inorganic materials 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- 238000010791 quenching Methods 0.000 description 5
- 241000894007 species Species 0.000 description 5
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 238000009792 diffusion process Methods 0.000 description 4
- 239000000446 fuel Substances 0.000 description 4
- 230000005484 gravity Effects 0.000 description 4
- 239000001307 helium Substances 0.000 description 4
- 229910052734 helium Inorganic materials 0.000 description 4
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 4
- 238000002347 injection Methods 0.000 description 4
- 239000007924 injection Substances 0.000 description 4
- 230000008021 deposition Effects 0.000 description 3
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 3
- 239000004810 polytetrafluoroethylene Substances 0.000 description 3
- 239000011343 solid material Substances 0.000 description 3
- 231100000331 toxic Toxicity 0.000 description 3
- 230000002588 toxic effect Effects 0.000 description 3
- 238000011144 upstream manufacturing Methods 0.000 description 3
- 238000010792 warming Methods 0.000 description 3
- -1 wf6 Chemical compound 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 229910003074 TiCl4 Inorganic materials 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 239000007791 liquid phase Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 229910000601 superalloy Inorganic materials 0.000 description 2
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 2
- 238000009423 ventilation Methods 0.000 description 2
- 241001674044 Blattodea Species 0.000 description 1
- QWOJMRHUQHTCJG-UHFFFAOYSA-N CC([CH2-])=O Chemical compound CC([CH2-])=O QWOJMRHUQHTCJG-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 101100328843 Dictyostelium discoideum cofB gene Proteins 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 229910004014 SiF4 Inorganic materials 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 241000700605 Viruses Species 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- LDDQLRUQCUTJBB-UHFFFAOYSA-N ammonium fluoride Chemical compound [NH4+].[F-] LDDQLRUQCUTJBB-UHFFFAOYSA-N 0.000 description 1
- RBFQJDQYXXHULB-UHFFFAOYSA-N arsane Chemical compound [AsH3] RBFQJDQYXXHULB-UHFFFAOYSA-N 0.000 description 1
- 229910000070 arsenic hydride Inorganic materials 0.000 description 1
- 210000003323 beak Anatomy 0.000 description 1
- IYRWEQXVUNLMAY-UHFFFAOYSA-N carbonyl fluoride Chemical compound FC(F)=O IYRWEQXVUNLMAY-UHFFFAOYSA-N 0.000 description 1
- 238000012993 chemical processing Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 238000010574 gas phase reaction Methods 0.000 description 1
- QUZPNFFHZPRKJD-UHFFFAOYSA-N germane Chemical compound [GeH4] QUZPNFFHZPRKJD-UHFFFAOYSA-N 0.000 description 1
- 229910052986 germanium hydride Inorganic materials 0.000 description 1
- 239000005431 greenhouse gas Substances 0.000 description 1
- 239000000383 hazardous chemical Substances 0.000 description 1
- 150000004678 hydrides Chemical class 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 229910001026 inconel Inorganic materials 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 239000012263 liquid product Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- NFFIWVVINABMKP-UHFFFAOYSA-N methylidynetantalum Chemical compound [Ta]#C NFFIWVVINABMKP-UHFFFAOYSA-N 0.000 description 1
- 244000005700 microbiome Species 0.000 description 1
- 239000008267 milk Substances 0.000 description 1
- 210000004080 milk Anatomy 0.000 description 1
- 235000013336 milk Nutrition 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000003345 natural gas Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 238000005504 petroleum refining Methods 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- ABTOQLMXBSRXSM-UHFFFAOYSA-N silicon tetrafluoride Chemical compound F[Si](F)(F)F ABTOQLMXBSRXSM-UHFFFAOYSA-N 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 229910003468 tantalcarbide Inorganic materials 0.000 description 1
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical compound [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- 239000012855 volatile organic compound Substances 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/46—Removing components of defined structure
- B01D53/68—Halogens or halogen compounds
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D47/00—Separating dispersed particles from gases, air or vapours by liquid as separating agent
- B01D47/10—Venturi scrubbers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
- B01D53/77—Liquid phase processes
- B01D53/79—Injecting reactants
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K31/00—Actuating devices; Operating means; Releasing devices
- F16K31/12—Actuating devices; Operating means; Releasing devices actuated by fluid
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2258/00—Sources of waste gases
- B01D2258/02—Other waste gases
- B01D2258/0216—Other waste gases from CVD treatment or semi-conductor manufacturing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/0318—Processes
- Y10T137/0324—With control of flow by a condition or characteristic of a fluid
- Y10T137/0379—By fluid pressure
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/4456—With liquid valves or liquid trap seals
- Y10T137/4643—Liquid valves
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Environmental & Geological Engineering (AREA)
- Analytical Chemistry (AREA)
- Biomedical Technology (AREA)
- Health & Medical Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- General Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Gas Separation By Absorption (AREA)
- Treating Waste Gases (AREA)
- Incineration Of Waste (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US12/284,035 US7854792B2 (en) | 2008-09-17 | 2008-09-17 | Reactive gas control |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201031848A TW201031848A (en) | 2010-09-01 |
| TWI375767B true TWI375767B (en) | 2012-11-01 |
Family
ID=41460196
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW98131373A TWI375767B (en) | 2008-09-17 | 2009-09-17 | Reactive gas control |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US7854792B2 (enExample) |
| EP (1) | EP2340101B1 (enExample) |
| JP (1) | JP5314150B2 (enExample) |
| KR (1) | KR101659432B1 (enExample) |
| TW (1) | TWI375767B (enExample) |
| WO (1) | WO2010033184A1 (enExample) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2945333B1 (fr) * | 2009-05-05 | 2015-08-07 | Air Liquide | Soupape a soufflet adaptee pour usage en cryogenie |
| WO2012075727A1 (zh) * | 2010-12-05 | 2012-06-14 | Wang Sen | 循环流化床锅炉气固分离器及含有该气固分离器的锅炉 |
| JP5851198B2 (ja) * | 2011-10-25 | 2016-02-03 | エヌ・ティ株式会社 | スクラバーのガスインレット部の構造 |
| US9023303B2 (en) * | 2013-04-15 | 2015-05-05 | Airgard, Inc. | Extended or multiple reaction zones in scrubbing apparatus |
| JP6659461B2 (ja) * | 2016-05-23 | 2020-03-04 | 株式会社荏原製作所 | 排ガス処理装置 |
| MY194516A (en) * | 2017-07-07 | 2022-11-30 | Siw Eng Pte Ltd | Device and system for decomposing and oxidizing gaseous pollutant |
| EP3991210A4 (en) * | 2019-06-06 | 2023-08-16 | Edwards Vacuum LLC | LIQUID FILTER APPARATUS FOR GAS/SOLID SEPARATION FOR PROCESSING SEMICONDUCTORS |
| CN110917773A (zh) * | 2019-12-09 | 2020-03-27 | 徐州中宜消防科技有限公司 | 一种具有环保功能的空气除尘设备 |
| KR20230006729A (ko) | 2021-07-02 | 2023-01-11 | 삼성전자주식회사 | 리액터 장치 |
| JP7435660B2 (ja) * | 2022-05-20 | 2024-02-21 | 栗田工業株式会社 | 排ガス処理設備の運転方法 |
| DE102022212009A1 (de) * | 2022-11-11 | 2024-05-16 | Ebara Precision Machinery Europe Gmbh | Vorrichtung und Verfahren zum Abreinigen eines mindestens ein Schadgas enthaltenden Prozessgases |
| WO2024219253A1 (ja) * | 2023-04-19 | 2024-10-24 | 株式会社荏原製作所 | 排ガス処理装置および排ガス処理方法 |
| US20250115994A1 (en) * | 2023-10-09 | 2025-04-10 | Highvac Corporation | Abatement System Having an Injector with a Liquid Membrane |
Family Cites Families (50)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2608695A (en) | 1949-03-24 | 1952-09-02 | George B Skibowski | Plunger for clearing waste pipes and drains |
| BE634523A (enExample) | 1963-07-03 | |||
| US3353803A (en) * | 1967-05-09 | 1967-11-21 | Chemical Construction Corp | Gas quencher |
| US3544086A (en) * | 1968-08-19 | 1970-12-01 | Chemical Construction Corp | Adjustable annular venturi scrubber |
| US3628311A (en) * | 1969-07-07 | 1971-12-21 | Nino S Inc | Air purification systems |
| DE2005010B2 (de) | 1970-02-04 | 1979-08-02 | Bayer Ag, 5090 Leverkusen | Vorrichtung zum Abkühlen und Naßabscheiden heißer metalloxidhaltiger Reaktionsgase |
| US3690044A (en) * | 1970-03-18 | 1972-09-12 | Chemical Construction Corp | Adjustable venturi gas scrubber |
| DE2045021A1 (en) | 1970-09-11 | 1972-03-16 | Metallgesellschaft Ag, 6000 Frankfurt | Washing sublimates from gas - with conical cooler preceding venturi washer |
| GB1328990A (en) | 1970-11-12 | 1973-09-05 | Chemical Construction Corp | Gas scrubber |
| US3841061A (en) * | 1972-11-24 | 1974-10-15 | Pollution Ind Inc | Gas cleaning apparatus |
| JPS5222137B2 (enExample) | 1973-04-04 | 1977-06-15 | ||
| US5019339A (en) | 1988-02-26 | 1991-05-28 | Pacific Engineering And Production Co. Of Nevada | Control system for odor eliminating apparatus |
| US4986838A (en) | 1989-06-14 | 1991-01-22 | Airgard, Inc. | Inlet system for gas scrubber |
| DE3939057A1 (de) | 1989-11-25 | 1991-05-29 | Bayer Ag | Vorrichtung fuer den stoffaustausch zwischen einem heissen gasstrom und einer fluessigkeit |
| US5271908A (en) | 1992-04-07 | 1993-12-21 | Intel Corporation | Pyrophoric gas neutralization chamber |
| US5405590A (en) | 1993-02-05 | 1995-04-11 | Pedro Buarque de Macedo | Off-gas scrubber system |
| JP3268127B2 (ja) | 1994-07-11 | 2002-03-25 | 三菱重工業株式会社 | 亜硫酸塩の酸化制御方法 |
| TW301701B (enExample) | 1995-03-30 | 1997-04-01 | Mitsubishi Heavy Ind Ltd | |
| JP3358926B2 (ja) | 1995-12-19 | 2002-12-24 | 三菱重工業株式会社 | 排煙脱硫方法における亜硫酸塩の酸化制御方法 |
| JP3263586B2 (ja) | 1995-12-26 | 2002-03-04 | 享三 須山 | 排煙処理システム |
| KR0172185B1 (ko) | 1996-01-23 | 1999-02-18 | 김경균 | 폐가스 유해성분 처리장치와 방법 |
| US5817575A (en) | 1996-01-30 | 1998-10-06 | Advanced Micro Devices, Inc. | Prevention of clogging in CVD apparatus |
| US5927957A (en) | 1996-06-19 | 1999-07-27 | Kennedy; Craig A. | Plunger device and method of making and using the same thereof |
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| US5935283A (en) | 1996-12-31 | 1999-08-10 | Atmi Ecosys Corporation | Clog-resistant entry structure for introducing a particulate solids-containing and/or solids-forming gas stream to a gas processing system |
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| US5878922A (en) | 1997-07-09 | 1999-03-09 | Sunoco Products Company | Self venting plunger |
| KR100253097B1 (ko) | 1997-12-08 | 2000-04-15 | 윤종용 | 반도체소자제조용폐가스정화시스템 |
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| US7550123B2 (en) | 2000-03-03 | 2009-06-23 | Steen Research, Llc | Method and apparatus for use of reacted hydrogen peroxide compounds in industrial process waters |
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| US20040216610A1 (en) * | 2003-05-01 | 2004-11-04 | Glenn Tom | Gas processing system comprising a water curtain for preventing solids deposition of interior walls thereof |
| US20050031500A1 (en) | 2003-08-06 | 2005-02-10 | Feng Wu Niang | Semiconductor waste gas processing device with flame path |
| US7316721B1 (en) | 2004-02-09 | 2008-01-08 | Porvair, Plc | Ceramic foam insulator with thermal expansion joint |
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| JP2006150281A (ja) * | 2004-11-30 | 2006-06-15 | Kanken Techno Co Ltd | 半導体製造装置の排ガス除害装置 |
| KR100647997B1 (ko) * | 2004-12-13 | 2006-11-23 | 유니셈 주식회사 | 폐가스 처리 장치 |
| CN101300411B (zh) | 2005-10-31 | 2012-10-03 | 应用材料公司 | 制程减降反应器 |
| KR100822048B1 (ko) * | 2006-06-07 | 2008-04-15 | 주식회사 글로벌스탠다드테크놀로지 | 플라즈마 토치를 이용한 폐가스 처리장치 |
| JP4937886B2 (ja) * | 2006-12-05 | 2012-05-23 | 株式会社荏原製作所 | 燃焼式排ガス処理装置 |
| US7524473B2 (en) | 2007-03-23 | 2009-04-28 | Alstom Technology Ltd | Method of mercury removal in a wet flue gas desulfurization system |
-
2008
- 2008-09-17 US US12/284,035 patent/US7854792B2/en active Active
-
2009
- 2009-09-15 EP EP09789315.0A patent/EP2340101B1/en active Active
- 2009-09-15 JP JP2011527812A patent/JP5314150B2/ja active Active
- 2009-09-15 KR KR1020117008595A patent/KR101659432B1/ko active Active
- 2009-09-15 WO PCT/US2009/005159 patent/WO2010033184A1/en not_active Ceased
- 2009-09-17 TW TW98131373A patent/TWI375767B/zh active
-
2010
- 2010-12-01 US US12/958,357 patent/US8496741B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| KR20110074535A (ko) | 2011-06-30 |
| WO2010033184A1 (en) | 2010-03-25 |
| US7854792B2 (en) | 2010-12-21 |
| US20110076211A1 (en) | 2011-03-31 |
| KR101659432B1 (ko) | 2016-09-23 |
| JP2012502792A (ja) | 2012-02-02 |
| TW201031848A (en) | 2010-09-01 |
| JP5314150B2 (ja) | 2013-10-16 |
| EP2340101A1 (en) | 2011-07-06 |
| US8496741B2 (en) | 2013-07-30 |
| EP2340101B1 (en) | 2018-05-09 |
| US20100064891A1 (en) | 2010-03-18 |
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