JP5314150B2 - 反応性ガス制御 - Google Patents
反応性ガス制御 Download PDFInfo
- Publication number
- JP5314150B2 JP5314150B2 JP2011527812A JP2011527812A JP5314150B2 JP 5314150 B2 JP5314150 B2 JP 5314150B2 JP 2011527812 A JP2011527812 A JP 2011527812A JP 2011527812 A JP2011527812 A JP 2011527812A JP 5314150 B2 JP5314150 B2 JP 5314150B2
- Authority
- JP
- Japan
- Prior art keywords
- liquid
- gas
- chamber
- edge
- guide surface
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/46—Removing components of defined structure
- B01D53/68—Halogens or halogen compounds
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D47/00—Separating dispersed particles from gases, air or vapours by liquid as separating agent
- B01D47/10—Venturi scrubbers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
- B01D53/77—Liquid phase processes
- B01D53/79—Injecting reactants
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K31/00—Actuating devices; Operating means; Releasing devices
- F16K31/12—Actuating devices; Operating means; Releasing devices actuated by fluid
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2258/00—Sources of waste gases
- B01D2258/02—Other waste gases
- B01D2258/0216—Other waste gases from CVD treatment or semi-conductor manufacturing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/0318—Processes
- Y10T137/0324—With control of flow by a condition or characteristic of a fluid
- Y10T137/0379—By fluid pressure
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/4456—With liquid valves or liquid trap seals
- Y10T137/4643—Liquid valves
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Environmental & Geological Engineering (AREA)
- Analytical Chemistry (AREA)
- Biomedical Technology (AREA)
- Health & Medical Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- General Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Gas Separation By Absorption (AREA)
- Treating Waste Gases (AREA)
- Incineration Of Waste (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US12/284,035 US7854792B2 (en) | 2008-09-17 | 2008-09-17 | Reactive gas control |
| US12/284,035 | 2008-09-17 | ||
| PCT/US2009/005159 WO2010033184A1 (en) | 2008-09-17 | 2009-09-15 | Reactive gas control |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2012502792A JP2012502792A (ja) | 2012-02-02 |
| JP2012502792A5 JP2012502792A5 (enExample) | 2012-11-01 |
| JP5314150B2 true JP5314150B2 (ja) | 2013-10-16 |
Family
ID=41460196
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011527812A Active JP5314150B2 (ja) | 2008-09-17 | 2009-09-15 | 反応性ガス制御 |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US7854792B2 (enExample) |
| EP (1) | EP2340101B1 (enExample) |
| JP (1) | JP5314150B2 (enExample) |
| KR (1) | KR101659432B1 (enExample) |
| TW (1) | TWI375767B (enExample) |
| WO (1) | WO2010033184A1 (enExample) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2945333B1 (fr) * | 2009-05-05 | 2015-08-07 | Air Liquide | Soupape a soufflet adaptee pour usage en cryogenie |
| WO2012075727A1 (zh) * | 2010-12-05 | 2012-06-14 | Wang Sen | 循环流化床锅炉气固分离器及含有该气固分离器的锅炉 |
| JP5851198B2 (ja) * | 2011-10-25 | 2016-02-03 | エヌ・ティ株式会社 | スクラバーのガスインレット部の構造 |
| US9023303B2 (en) * | 2013-04-15 | 2015-05-05 | Airgard, Inc. | Extended or multiple reaction zones in scrubbing apparatus |
| JP6659461B2 (ja) * | 2016-05-23 | 2020-03-04 | 株式会社荏原製作所 | 排ガス処理装置 |
| MY194516A (en) * | 2017-07-07 | 2022-11-30 | Siw Eng Pte Ltd | Device and system for decomposing and oxidizing gaseous pollutant |
| EP3991210A4 (en) * | 2019-06-06 | 2023-08-16 | Edwards Vacuum LLC | LIQUID FILTER APPARATUS FOR GAS/SOLID SEPARATION FOR PROCESSING SEMICONDUCTORS |
| CN110917773A (zh) * | 2019-12-09 | 2020-03-27 | 徐州中宜消防科技有限公司 | 一种具有环保功能的空气除尘设备 |
| KR20230006729A (ko) | 2021-07-02 | 2023-01-11 | 삼성전자주식회사 | 리액터 장치 |
| JP7435660B2 (ja) * | 2022-05-20 | 2024-02-21 | 栗田工業株式会社 | 排ガス処理設備の運転方法 |
| DE102022212009A1 (de) * | 2022-11-11 | 2024-05-16 | Ebara Precision Machinery Europe Gmbh | Vorrichtung und Verfahren zum Abreinigen eines mindestens ein Schadgas enthaltenden Prozessgases |
| WO2024219253A1 (ja) * | 2023-04-19 | 2024-10-24 | 株式会社荏原製作所 | 排ガス処理装置および排ガス処理方法 |
| US20250115994A1 (en) * | 2023-10-09 | 2025-04-10 | Highvac Corporation | Abatement System Having an Injector with a Liquid Membrane |
Family Cites Families (50)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2608695A (en) | 1949-03-24 | 1952-09-02 | George B Skibowski | Plunger for clearing waste pipes and drains |
| BE634523A (enExample) | 1963-07-03 | |||
| US3353803A (en) * | 1967-05-09 | 1967-11-21 | Chemical Construction Corp | Gas quencher |
| US3544086A (en) * | 1968-08-19 | 1970-12-01 | Chemical Construction Corp | Adjustable annular venturi scrubber |
| US3628311A (en) * | 1969-07-07 | 1971-12-21 | Nino S Inc | Air purification systems |
| DE2005010B2 (de) | 1970-02-04 | 1979-08-02 | Bayer Ag, 5090 Leverkusen | Vorrichtung zum Abkühlen und Naßabscheiden heißer metalloxidhaltiger Reaktionsgase |
| US3690044A (en) * | 1970-03-18 | 1972-09-12 | Chemical Construction Corp | Adjustable venturi gas scrubber |
| DE2045021A1 (en) | 1970-09-11 | 1972-03-16 | Metallgesellschaft Ag, 6000 Frankfurt | Washing sublimates from gas - with conical cooler preceding venturi washer |
| GB1328990A (en) | 1970-11-12 | 1973-09-05 | Chemical Construction Corp | Gas scrubber |
| US3841061A (en) * | 1972-11-24 | 1974-10-15 | Pollution Ind Inc | Gas cleaning apparatus |
| JPS5222137B2 (enExample) | 1973-04-04 | 1977-06-15 | ||
| US5019339A (en) | 1988-02-26 | 1991-05-28 | Pacific Engineering And Production Co. Of Nevada | Control system for odor eliminating apparatus |
| US4986838A (en) | 1989-06-14 | 1991-01-22 | Airgard, Inc. | Inlet system for gas scrubber |
| DE3939057A1 (de) | 1989-11-25 | 1991-05-29 | Bayer Ag | Vorrichtung fuer den stoffaustausch zwischen einem heissen gasstrom und einer fluessigkeit |
| US5271908A (en) | 1992-04-07 | 1993-12-21 | Intel Corporation | Pyrophoric gas neutralization chamber |
| US5405590A (en) | 1993-02-05 | 1995-04-11 | Pedro Buarque de Macedo | Off-gas scrubber system |
| JP3268127B2 (ja) | 1994-07-11 | 2002-03-25 | 三菱重工業株式会社 | 亜硫酸塩の酸化制御方法 |
| TW301701B (enExample) | 1995-03-30 | 1997-04-01 | Mitsubishi Heavy Ind Ltd | |
| JP3358926B2 (ja) | 1995-12-19 | 2002-12-24 | 三菱重工業株式会社 | 排煙脱硫方法における亜硫酸塩の酸化制御方法 |
| JP3263586B2 (ja) | 1995-12-26 | 2002-03-04 | 享三 須山 | 排煙処理システム |
| KR0172185B1 (ko) | 1996-01-23 | 1999-02-18 | 김경균 | 폐가스 유해성분 처리장치와 방법 |
| US5817575A (en) | 1996-01-30 | 1998-10-06 | Advanced Micro Devices, Inc. | Prevention of clogging in CVD apparatus |
| US5927957A (en) | 1996-06-19 | 1999-07-27 | Kennedy; Craig A. | Plunger device and method of making and using the same thereof |
| JP3150615B2 (ja) | 1996-06-28 | 2001-03-26 | 三菱重工業株式会社 | 排煙脱硫処理における酸化制御方法 |
| US5935283A (en) | 1996-12-31 | 1999-08-10 | Atmi Ecosys Corporation | Clog-resistant entry structure for introducing a particulate solids-containing and/or solids-forming gas stream to a gas processing system |
| US5882366A (en) | 1997-06-06 | 1999-03-16 | Atmi Ecosys Corporation | Alternating wash/dry water scrubber entry |
| US6322756B1 (en) | 1996-12-31 | 2001-11-27 | Advanced Technology And Materials, Inc. | Effluent gas stream treatment system having utility for oxidation treatment of semiconductor manufacturing effluent gases |
| US5846275A (en) | 1996-12-31 | 1998-12-08 | Atmi Ecosys Corporation | Clog-resistant entry structure for introducing a particulate solids-containing and/or solids-forming gas stream to a gas processing system |
| US5955037A (en) | 1996-12-31 | 1999-09-21 | Atmi Ecosys Corporation | Effluent gas stream treatment system having utility for oxidation treatment of semiconductor manufacturing effluent gases |
| US6759018B1 (en) | 1997-05-16 | 2004-07-06 | Advanced Technology Materials, Inc. | Method for point-of-use treatment of effluent gas streams |
| US20040101460A1 (en) | 1997-05-16 | 2004-05-27 | Arno Jose I. | Apparatus and method for point-of-use treatment of effluent gas streams |
| US20010009652A1 (en) | 1998-05-28 | 2001-07-26 | Jose I. Arno | Apparatus and method for point-of-use abatement of fluorocompounds |
| US5878922A (en) | 1997-07-09 | 1999-03-09 | Sunoco Products Company | Self venting plunger |
| KR100253097B1 (ko) | 1997-12-08 | 2000-04-15 | 윤종용 | 반도체소자제조용폐가스정화시스템 |
| TW414722B (en) | 1998-12-14 | 2000-12-11 | Japan Pionics | Process and equipment for purifying waste gases |
| JP4252702B2 (ja) | 2000-02-14 | 2009-04-08 | 株式会社荏原製作所 | 反応副生成物の配管内付着防止装置及び付着防止方法 |
| US7550123B2 (en) | 2000-03-03 | 2009-06-23 | Steen Research, Llc | Method and apparatus for use of reacted hydrogen peroxide compounds in industrial process waters |
| GB0005231D0 (en) | 2000-03-03 | 2000-04-26 | Boc Group Plc | Abatement of semiconductor processing gases |
| JP2004162963A (ja) | 2002-11-12 | 2004-06-10 | Sumitomo Electric Ind Ltd | ガス加熱方法及び加熱装置 |
| JP4395315B2 (ja) | 2003-04-11 | 2010-01-06 | 三菱重工業株式会社 | 排ガス中の水銀除去方法およびそのシステム |
| US20040216610A1 (en) * | 2003-05-01 | 2004-11-04 | Glenn Tom | Gas processing system comprising a water curtain for preventing solids deposition of interior walls thereof |
| US20050031500A1 (en) | 2003-08-06 | 2005-02-10 | Feng Wu Niang | Semiconductor waste gas processing device with flame path |
| US7316721B1 (en) | 2004-02-09 | 2008-01-08 | Porvair, Plc | Ceramic foam insulator with thermal expansion joint |
| US7682574B2 (en) | 2004-11-18 | 2010-03-23 | Applied Materials, Inc. | Safety, monitoring and control features for thermal abatement reactor |
| JP2006150281A (ja) * | 2004-11-30 | 2006-06-15 | Kanken Techno Co Ltd | 半導体製造装置の排ガス除害装置 |
| KR100647997B1 (ko) * | 2004-12-13 | 2006-11-23 | 유니셈 주식회사 | 폐가스 처리 장치 |
| CN101300411B (zh) | 2005-10-31 | 2012-10-03 | 应用材料公司 | 制程减降反应器 |
| KR100822048B1 (ko) * | 2006-06-07 | 2008-04-15 | 주식회사 글로벌스탠다드테크놀로지 | 플라즈마 토치를 이용한 폐가스 처리장치 |
| JP4937886B2 (ja) * | 2006-12-05 | 2012-05-23 | 株式会社荏原製作所 | 燃焼式排ガス処理装置 |
| US7524473B2 (en) | 2007-03-23 | 2009-04-28 | Alstom Technology Ltd | Method of mercury removal in a wet flue gas desulfurization system |
-
2008
- 2008-09-17 US US12/284,035 patent/US7854792B2/en active Active
-
2009
- 2009-09-15 EP EP09789315.0A patent/EP2340101B1/en active Active
- 2009-09-15 JP JP2011527812A patent/JP5314150B2/ja active Active
- 2009-09-15 KR KR1020117008595A patent/KR101659432B1/ko active Active
- 2009-09-15 WO PCT/US2009/005159 patent/WO2010033184A1/en not_active Ceased
- 2009-09-17 TW TW98131373A patent/TWI375767B/zh active
-
2010
- 2010-12-01 US US12/958,357 patent/US8496741B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| KR20110074535A (ko) | 2011-06-30 |
| WO2010033184A1 (en) | 2010-03-25 |
| US7854792B2 (en) | 2010-12-21 |
| US20110076211A1 (en) | 2011-03-31 |
| TWI375767B (en) | 2012-11-01 |
| KR101659432B1 (ko) | 2016-09-23 |
| JP2012502792A (ja) | 2012-02-02 |
| TW201031848A (en) | 2010-09-01 |
| EP2340101A1 (en) | 2011-07-06 |
| US8496741B2 (en) | 2013-07-30 |
| EP2340101B1 (en) | 2018-05-09 |
| US20100064891A1 (en) | 2010-03-18 |
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