TWI372948B - - Google Patents

Info

Publication number
TWI372948B
TWI372948B TW095100175A TW95100175A TWI372948B TW I372948 B TWI372948 B TW I372948B TW 095100175 A TW095100175 A TW 095100175A TW 95100175 A TW95100175 A TW 95100175A TW I372948 B TWI372948 B TW I372948B
Authority
TW
Taiwan
Application number
TW095100175A
Other versions
TW200643642A (en
Inventor
Kyohei Seki
Original Assignee
Ushio Electric Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ushio Electric Inc filed Critical Ushio Electric Inc
Publication of TW200643642A publication Critical patent/TW200643642A/zh
Application granted granted Critical
Publication of TWI372948B publication Critical patent/TWI372948B/zh

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K5/00—Irradiation devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • High Energy & Nuclear Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW095100175A 2005-04-28 2006-01-03 Extreme ultraviolet exposure device and extreme ultraviolet light-source device TW200643642A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005130925A JP4710406B2 (ja) 2005-04-28 2005-04-28 極端紫外光露光装置および極端紫外光光源装置

Publications (2)

Publication Number Publication Date
TW200643642A TW200643642A (en) 2006-12-16
TWI372948B true TWI372948B (zh) 2012-09-21

Family

ID=36424644

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095100175A TW200643642A (en) 2005-04-28 2006-01-03 Extreme ultraviolet exposure device and extreme ultraviolet light-source device

Country Status (5)

Country Link
US (1) US7535013B2 (zh)
EP (1) EP1717638B1 (zh)
JP (1) JP4710406B2 (zh)
KR (1) KR100930779B1 (zh)
TW (1) TW200643642A (zh)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080113108A1 (en) * 2006-11-09 2008-05-15 Stowell Michael W System and method for control of electromagnetic radiation in pecvd discharge processes
US7759663B1 (en) * 2006-12-06 2010-07-20 Asml Netherlands B.V. Self-shading electrodes for debris suppression in an EUV source
JP4867712B2 (ja) * 2007-02-27 2012-02-01 株式会社ニコン 露光装置、デバイス製造方法、及び露光方法
DE102008014832A1 (de) * 2007-04-19 2008-10-23 Carl Zeiss Smt Ag Projektionsbelichtungsanlage für die Mikrolithographie
US8115900B2 (en) * 2007-09-17 2012-02-14 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7719661B2 (en) * 2007-11-27 2010-05-18 Nikon Corporation Illumination optical apparatus, exposure apparatus, and method for producing device
JP5534647B2 (ja) * 2008-02-28 2014-07-02 ギガフォトン株式会社 極端紫外光源装置
US20090250637A1 (en) * 2008-04-02 2009-10-08 Cymer, Inc. System and methods for filtering out-of-band radiation in EUV exposure tools
CN102132213B (zh) * 2008-08-29 2014-04-16 Asml荷兰有限公司 光谱纯度滤光片、包括这样的光谱纯度滤光片的光刻设备以及器件制造方法
US20100158196A1 (en) * 2008-12-23 2010-06-24 Martin Born Radiation beam blocker with non-cylindrical through-hole causing reduced geometric unsharpness in radiographic image, and method for the preparation thereof
US8351022B2 (en) * 2009-06-15 2013-01-08 Asml Netherlands B.V. Radiation beam modification apparatus and method
NL2004816A (en) * 2009-07-07 2011-01-10 Asml Netherlands Bv Euv radiation generation apparatus.
WO2012100846A1 (en) * 2011-01-25 2012-08-02 Asml Netherlands B.V. Conduit for radiation, suitable for use in a lithographic apparatus
US20150097107A1 (en) * 2012-03-20 2015-04-09 Fst Inc. Apparatus for generating extreme ultraviolet light using plasma
US9148941B2 (en) * 2013-01-22 2015-09-29 Asml Netherlands B.V. Thermal monitor for an extreme ultraviolet light source
JP7180237B2 (ja) * 2018-09-25 2022-11-30 富士フイルムビジネスイノベーション株式会社 画像読取光学系および画像読み取り装置

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01225186A (ja) 1988-03-03 1989-09-08 Mitsubishi Electric Corp 狭帯域化レーザ
JP3175180B2 (ja) * 1990-03-09 2001-06-11 キヤノン株式会社 露光方法及び露光装置
JPH05283320A (ja) * 1992-03-31 1993-10-29 Toshiba Corp シンクロトロン放射装置
JP3339631B2 (ja) 1993-04-22 2002-10-28 株式会社ニコン 走査型露光装置、及び該装置を用いる素子製造方法
JP3167095B2 (ja) * 1995-07-04 2001-05-14 キヤノン株式会社 照明装置とこれを有する露光装置や顕微鏡装置、ならびにデバイス生産方法
NL1008352C2 (nl) 1998-02-19 1999-08-20 Stichting Tech Wetenschapp Inrichting, geschikt voor extreem ultraviolet lithografie, omvattende een stralingsbron en een verwerkingsorgaan voor het verwerken van de van de stralingsbron afkomstige straling, alsmede een filter voor het onderdrukken van ongewenste atomaire en microscopische deeltjes welke door een stralingsbron zijn uitgezonden.
US6469827B1 (en) * 1998-08-06 2002-10-22 Euv Llc Diffraction spectral filter for use in extreme-UV lithography condenser
JP2000098094A (ja) * 1998-09-21 2000-04-07 Nikon Corp Ｘ線発生装置
US7248667B2 (en) * 1999-05-04 2007-07-24 Carl Zeiss Smt Ag Illumination system with a grating element
JP2001057328A (ja) 1999-08-18 2001-02-27 Nikon Corp 反射マスク、露光装置および集積回路の製造方法
JP2002214400A (ja) * 2001-01-12 2002-07-31 Toyota Macs Inc レーザープラズマｅｕｖ光源装置及びそれに用いられるターゲット
DE10127449A1 (de) * 2001-06-07 2002-12-12 Zeiss Carl Beleuchtungssystem mit einer Vielzahl von Einzelgittern
JP3605053B2 (ja) 2001-07-27 2004-12-22 キヤノン株式会社 照明光学系、露光装置及びデバイス製造方法
DE10138284A1 (de) * 2001-08-10 2003-02-27 Zeiss Carl Beleuchtungssystem mit genesteten Kollektoren
JP3782736B2 (ja) * 2002-01-29 2006-06-07 キヤノン株式会社 露光装置及びその制御方法
JP3830036B2 (ja) 2002-02-22 2006-10-04 株式会社小松製作所 狭帯域化ガスレーザ装置
DE60312871T2 (de) * 2002-08-26 2007-12-20 Carl Zeiss Smt Ag Gitter basierter spektraler filter zur unterdrückung von strahlung ausserhalb des nutzbandes in einem extrem-ultraviolett lithographiesystem
JP2004128105A (ja) * 2002-10-01 2004-04-22 Nikon Corp Ｘ線発生装置及び露光装置
US6809327B2 (en) * 2002-10-29 2004-10-26 Intel Corporation EUV source box
JP2004247438A (ja) * 2003-02-13 2004-09-02 Canon Inc 冷却装置
JP2005032510A (ja) * 2003-07-10 2005-02-03 Nikon Corp Ｅｕｖ光源、露光装置及び露光方法
EP1517183A1 (en) * 2003-08-29 2005-03-23 ASML Netherlands B.V. Lithographic apparatus, device manufacturing method, and device manufactured thereby
JP4218475B2 (ja) * 2003-09-11 2009-02-04 株式会社ニコン 極端紫外線光学系及び露光装置

Also Published As

Publication number Publication date
JP4710406B2 (ja) 2011-06-29
EP1717638B1 (en) 2016-08-24
US20060243923A1 (en) 2006-11-02
EP1717638A3 (en) 2008-01-23
TW200643642A (en) 2006-12-16
JP2006310520A (ja) 2006-11-09
EP1717638A2 (en) 2006-11-02
KR100930779B1 (ko) 2009-12-09
US7535013B2 (en) 2009-05-19
KR20060113374A (ko) 2006-11-02

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