TWI356211B - Photo mask, diffuse reflection sheet, color filter - Google Patents

Photo mask, diffuse reflection sheet, color filter Download PDF

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Publication number
TWI356211B
TWI356211B TW093106579A TW93106579A TWI356211B TW I356211 B TWI356211 B TW I356211B TW 093106579 A TW093106579 A TW 093106579A TW 93106579 A TW93106579 A TW 93106579A TW I356211 B TWI356211 B TW I356211B
Authority
TW
Taiwan
Prior art keywords
triangle
area
center point
unit area
delaunay
Prior art date
Application number
TW093106579A
Other languages
English (en)
Chinese (zh)
Other versions
TW200424598A (en
Inventor
Yukio Fujii
Koichi Rokuhara
Original Assignee
Sumitomo Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co filed Critical Sumitomo Chemical Co
Publication of TW200424598A publication Critical patent/TW200424598A/zh
Application granted granted Critical
Publication of TWI356211B publication Critical patent/TWI356211B/zh

Links

Classifications

    • A—HUMAN NECESSITIES
    • A43—FOOTWEAR
    • A43B—CHARACTERISTIC FEATURES OF FOOTWEAR; PARTS OF FOOTWEAR
    • A43B17/00—Insoles for insertion, e.g. footbeds or inlays, for attachment to the shoe after the upper has been joined
    • A43B17/14—Insoles for insertion, e.g. footbeds or inlays, for attachment to the shoe after the upper has been joined made of sponge, rubber, or plastic materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C44/00—Shaping by internal pressure generated in the material, e.g. swelling or foaming ; Producing porous or cellular expanded plastics articles
    • B29C44/02—Shaping by internal pressure generated in the material, e.g. swelling or foaming ; Producing porous or cellular expanded plastics articles for articles of definite length, i.e. discrete articles

Landscapes

  • Liquid Crystal (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
TW093106579A 2003-03-12 2004-03-12 Photo mask, diffuse reflection sheet, color filter TWI356211B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003067029A JP4223840B2 (ja) 2003-03-12 2003-03-12 フォトマスク及び拡散反射板

Publications (2)

Publication Number Publication Date
TW200424598A TW200424598A (en) 2004-11-16
TWI356211B true TWI356211B (en) 2012-01-11

Family

ID=33284763

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093106579A TWI356211B (en) 2003-03-12 2004-03-12 Photo mask, diffuse reflection sheet, color filter

Country Status (4)

Country Link
JP (1) JP4223840B2 (ko)
KR (1) KR101008860B1 (ko)
CN (1) CN1530743B (ko)
TW (1) TWI356211B (ko)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200818981A (en) 2006-08-30 2008-04-16 Sumitomo Chemical Co Organic electroluminescence device
JP4907456B2 (ja) * 2006-08-30 2012-03-28 住友化学株式会社 有機エレクトロルミネッセンス素子
US8151236B2 (en) * 2008-01-19 2012-04-03 Synopsys, Inc. Steiner tree based approach for polygon fracturing
TWI444674B (zh) 2008-05-28 2014-07-11 Toppan Printing Co Ltd 彩色濾光片之製法、附圖案之基板之製法及小型光罩
EP2284134B1 (en) * 2008-06-13 2012-11-28 LG Chem, Ltd. Heating element and manufacturing method thereof
KR20090129927A (ko) * 2008-06-13 2009-12-17 주식회사 엘지화학 발열체 및 이의 제조방법
JP5196352B2 (ja) * 2009-06-09 2013-05-15 住友化学株式会社 防眩フィルムの製造方法、防眩フィルムおよび金型の製造方法
WO2013095078A1 (ko) * 2011-12-23 2013-06-27 주식회사 엘지화학 전도성 기판 및 이를 포함하는 전자소자
CN106502044B (zh) * 2017-01-10 2020-01-24 昆山国显光电有限公司 掩膜板及其制造方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100208441B1 (ko) * 1995-06-15 1999-07-15 김영환 포토마스크의 패턴 구조
TW354392B (en) * 1996-07-03 1999-03-11 Du Pont Photomask blanks
CN1375077A (zh) * 1999-10-20 2002-10-16 株式会社进映社 具有膜面保护层的光掩模原版、其制造方法及光掩模原版用的保护层形成液
JP4149676B2 (ja) * 2001-02-05 2008-09-10 株式会社東芝 フォトマスクの修正方法
KR100640203B1 (ko) 2004-12-29 2006-10-31 동부일렉트로닉스 주식회사 산란 방지 패턴을 갖는 웨이퍼 노광용 마스크
KR20080102655A (ko) * 2007-05-21 2008-11-26 주식회사 하이닉스반도체 듀얼 콘택홀 형성 방법 및 이에 사용된 포토마스크
KR20090044534A (ko) * 2007-10-31 2009-05-07 주식회사 하이닉스반도체 노광 마스크, 노광 마스크 제조 방법 및 이를 이용한반도체 소자의 제조 방법

Also Published As

Publication number Publication date
KR20040081351A (ko) 2004-09-21
TW200424598A (en) 2004-11-16
JP4223840B2 (ja) 2009-02-12
KR101008860B1 (ko) 2011-01-19
CN1530743A (zh) 2004-09-22
JP2004279473A (ja) 2004-10-07
CN1530743B (zh) 2013-03-06

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MM4A Annulment or lapse of patent due to non-payment of fees