TWI349834B - Composition for positive type photoresist and positive type photoresist film manufactured thereby - Google Patents
Composition for positive type photoresist and positive type photoresist film manufactured therebyInfo
- Publication number
- TWI349834B TWI349834B TW096112868A TW96112868A TWI349834B TW I349834 B TWI349834 B TW I349834B TW 096112868 A TW096112868 A TW 096112868A TW 96112868 A TW96112868 A TW 96112868A TW I349834 B TWI349834 B TW I349834B
- Authority
- TW
- Taiwan
- Prior art keywords
- positive type
- type photoresist
- composition
- film manufactured
- photoresist film
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
- Y10T428/264—Up to 3 mils
- Y10T428/265—1 mil or less
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/266—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension of base or substrate
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Materials For Photolithography (AREA)
- Manufacturing Of Printed Wiring (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020060033618A KR101040994B1 (ko) | 2006-04-13 | 2006-04-13 | 포지티브형 포토레지스트 필름 |
KR1020060033617A KR100987784B1 (ko) | 2006-04-13 | 2006-04-13 | 포지티브형 포토레지스트용 조성물 |
KR1020060038642A KR20070106130A (ko) | 2006-04-28 | 2006-04-28 | 포지티브형 포토레지스트용 조성물 |
KR1020060038643A KR100950433B1 (ko) | 2006-04-28 | 2006-04-28 | 포지티브형 포토레지스트 필름 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200745763A TW200745763A (en) | 2007-12-16 |
TWI349834B true TWI349834B (en) | 2011-10-01 |
Family
ID=38609685
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW096112868A TWI349834B (en) | 2006-04-13 | 2007-04-12 | Composition for positive type photoresist and positive type photoresist film manufactured thereby |
Country Status (5)
Country | Link |
---|---|
US (1) | US8197934B2 (zh) |
EP (1) | EP2016463A4 (zh) |
JP (1) | JP5048754B2 (zh) |
TW (1) | TWI349834B (zh) |
WO (1) | WO2007119949A1 (zh) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008241741A (ja) * | 2007-03-23 | 2008-10-09 | Jsr Corp | ソルダーレジスト用ポジ型ドライフィルム及びその硬化物並びにそれを備える回路基板及び電子部品 |
KR101318517B1 (ko) * | 2008-05-30 | 2013-10-16 | 코오롱인더스트리 주식회사 | 필름형 광분해성 전사재료 |
JP2010039214A (ja) * | 2008-08-05 | 2010-02-18 | Hitachi Chem Co Ltd | 感光性樹脂組成物及びこれを用いた感光性エレメント |
KR101597767B1 (ko) * | 2009-01-22 | 2016-02-26 | 삼성디스플레이 주식회사 | 감광성 수지 조성물 및 이를 이용한 패턴의 형성 방법 |
TW201211685A (en) * | 2010-06-23 | 2012-03-16 | Jsr Corp | Radiation-sensitive composition |
JP6702251B2 (ja) * | 2017-04-17 | 2020-05-27 | 信越化学工業株式会社 | ポジ型レジストフィルム積層体及びパターン形成方法 |
WO2019124307A1 (ja) * | 2017-12-20 | 2019-06-27 | 住友電気工業株式会社 | プリント配線板の製造方法及び積層体 |
Family Cites Families (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5084372A (en) * | 1982-12-09 | 1992-01-28 | Hoechst Celanese Corporation | Process for preparing photographic elements utilizing light-sensitive layer containing cyclical acid amide thermo-crosslinking compound |
EP0345305A4 (en) * | 1987-12-10 | 1991-10-02 | Macdermid Incorporated | Image-reversible dry-film photoresists |
JPH0658530B2 (ja) * | 1988-04-22 | 1994-08-03 | 東京応化工業株式会社 | ポジ型感光性組成物 |
JP2583600B2 (ja) * | 1989-02-20 | 1997-02-19 | 東京応化工業株式会社 | ネガ型電子線レジスト組成物 |
KR960015081A (ko) * | 1993-07-15 | 1996-05-22 | 마쯔모또 에이이찌 | 화학증폭형 레지스트 조성물 |
JPH0798503A (ja) * | 1993-09-29 | 1995-04-11 | Tosoh Corp | 熱硬化ポジ型感光性組成物 |
DE69501853T2 (de) * | 1994-06-15 | 1998-10-22 | Agfa Gevaert Nv | Verfahren zur Herstellung eines wärmeempfindlichen geschützten Aufzeichnungsmaterials |
JP3873263B2 (ja) * | 1997-09-22 | 2007-01-24 | Jsr株式会社 | 感放射線性樹脂組成物、保護膜、層間絶縁膜およびこれらの膜の形成法 |
JPH11223939A (ja) * | 1998-02-05 | 1999-08-17 | Fuji Photo Film Co Ltd | ポジ型フォトレジスト組成物 |
KR100745331B1 (ko) * | 2000-07-27 | 2007-08-02 | 제이에스알 가부시끼가이샤 | 감방사선성 조성물, 절연막 및 유기 el 표시 소자 |
JP2002116536A (ja) | 2000-10-06 | 2002-04-19 | Jsr Corp | 感放射線性樹脂組成物、その硬化物および素子。 |
JP2002341521A (ja) * | 2001-05-17 | 2002-11-27 | Sumitomo Chem Co Ltd | 感放射線性樹脂組成物 |
JP2003015287A (ja) * | 2001-06-28 | 2003-01-15 | Qimei Industry Co Ltd | 感光性樹脂組成物 |
WO2003029898A1 (fr) * | 2001-09-27 | 2003-04-10 | Clariant International Ltd. | Composition de resine photosensible |
KR100809544B1 (ko) * | 2001-10-24 | 2008-03-04 | 주식회사 동진쎄미켐 | 퀴논디아지드 술폰산 에스테르 화합물을 포함하는 감광성수지조성물 |
KR100783603B1 (ko) * | 2002-01-05 | 2007-12-07 | 삼성전자주식회사 | 포토레지스트 조성물 및 이를 사용한 패턴의 형성방법 |
JP3812654B2 (ja) * | 2002-01-23 | 2006-08-23 | Jsr株式会社 | ポジ型感光性絶縁樹脂組成物およびその硬化物 |
EP1469346B1 (en) * | 2002-01-23 | 2015-08-05 | JSR Corporation | Positive photosensitive insulating resin composition and cured object obtained therefrom |
JP3843995B2 (ja) * | 2002-05-27 | 2006-11-08 | 日本ゼオン株式会社 | 感放射線性樹脂組成物、パターン状樹脂膜を有する基板の製造方法、及び該樹脂組成物の利用 |
JP2004177683A (ja) * | 2002-11-27 | 2004-06-24 | Clariant (Japan) Kk | 超高耐熱ポジ型感光性組成物を用いたパターン形成方法 |
JP3944734B2 (ja) * | 2003-01-10 | 2007-07-18 | 信越化学工業株式会社 | オルガノシロキサン系高分子化合物及び光硬化性樹脂組成物並びにパターン形成方法及び基板保護用皮膜 |
KR100906795B1 (ko) * | 2003-03-12 | 2009-07-09 | 주식회사 동진쎄미켐 | 액정표시장치 회로용 포토레지스트 조성물 |
JP2005215137A (ja) * | 2004-01-28 | 2005-08-11 | Fuji Photo Film Co Ltd | 感光性樹脂組成物、感光性転写材料、液晶配向制御用突起及びその製造方法、並びに液晶表示装置 |
KR101290041B1 (ko) * | 2005-08-19 | 2013-07-30 | 제이에스알 가부시끼가이샤 | 포지티브형 감광성 절연 수지 조성물, 그 경화물 및 전자부품 |
JP4640037B2 (ja) * | 2005-08-22 | 2011-03-02 | Jsr株式会社 | ポジ型感光性絶縁樹脂組成物およびその硬化物 |
JP2007272138A (ja) * | 2006-03-31 | 2007-10-18 | Nippon Zeon Co Ltd | レジストパターン形成方法及び感光性樹脂組成物 |
-
2007
- 2007-04-06 WO PCT/KR2007/001703 patent/WO2007119949A1/en active Application Filing
- 2007-04-06 EP EP07745866A patent/EP2016463A4/en not_active Withdrawn
- 2007-04-06 JP JP2009505290A patent/JP5048754B2/ja not_active Expired - Fee Related
- 2007-04-06 US US12/296,744 patent/US8197934B2/en not_active Expired - Fee Related
- 2007-04-12 TW TW096112868A patent/TWI349834B/zh active
Also Published As
Publication number | Publication date |
---|---|
EP2016463A4 (en) | 2011-04-06 |
TW200745763A (en) | 2007-12-16 |
US20090274900A1 (en) | 2009-11-05 |
JP5048754B2 (ja) | 2012-10-17 |
WO2007119949A1 (en) | 2007-10-25 |
EP2016463A1 (en) | 2009-01-21 |
JP2009533707A (ja) | 2009-09-17 |
US8197934B2 (en) | 2012-06-12 |
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