TWI349834B - Composition for positive type photoresist and positive type photoresist film manufactured thereby - Google Patents

Composition for positive type photoresist and positive type photoresist film manufactured thereby

Info

Publication number
TWI349834B
TWI349834B TW096112868A TW96112868A TWI349834B TW I349834 B TWI349834 B TW I349834B TW 096112868 A TW096112868 A TW 096112868A TW 96112868 A TW96112868 A TW 96112868A TW I349834 B TWI349834 B TW I349834B
Authority
TW
Taiwan
Prior art keywords
positive type
type photoresist
composition
film manufactured
photoresist film
Prior art date
Application number
TW096112868A
Other languages
English (en)
Other versions
TW200745763A (en
Inventor
Byoung-Kee Kim
Se-Hyung Park
Byeong-Il Lee
Jong-Min Park
Seog-Jeong Song
Original Assignee
Kolon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from KR1020060033618A external-priority patent/KR101040994B1/ko
Priority claimed from KR1020060033617A external-priority patent/KR100987784B1/ko
Priority claimed from KR1020060038642A external-priority patent/KR20070106130A/ko
Priority claimed from KR1020060038643A external-priority patent/KR100950433B1/ko
Application filed by Kolon Inc filed Critical Kolon Inc
Publication of TW200745763A publication Critical patent/TW200745763A/zh
Application granted granted Critical
Publication of TWI349834B publication Critical patent/TWI349834B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
    • Y10T428/264—Up to 3 mils
    • Y10T428/265—1 mil or less
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y10T428/266—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension of base or substrate

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Manufacturing Of Printed Wiring (AREA)
TW096112868A 2006-04-13 2007-04-12 Composition for positive type photoresist and positive type photoresist film manufactured thereby TWI349834B (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
KR1020060033618A KR101040994B1 (ko) 2006-04-13 2006-04-13 포지티브형 포토레지스트 필름
KR1020060033617A KR100987784B1 (ko) 2006-04-13 2006-04-13 포지티브형 포토레지스트용 조성물
KR1020060038642A KR20070106130A (ko) 2006-04-28 2006-04-28 포지티브형 포토레지스트용 조성물
KR1020060038643A KR100950433B1 (ko) 2006-04-28 2006-04-28 포지티브형 포토레지스트 필름

Publications (2)

Publication Number Publication Date
TW200745763A TW200745763A (en) 2007-12-16
TWI349834B true TWI349834B (en) 2011-10-01

Family

ID=38609685

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096112868A TWI349834B (en) 2006-04-13 2007-04-12 Composition for positive type photoresist and positive type photoresist film manufactured thereby

Country Status (5)

Country Link
US (1) US8197934B2 (zh)
EP (1) EP2016463A4 (zh)
JP (1) JP5048754B2 (zh)
TW (1) TWI349834B (zh)
WO (1) WO2007119949A1 (zh)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008241741A (ja) * 2007-03-23 2008-10-09 Jsr Corp ソルダーレジスト用ポジ型ドライフィルム及びその硬化物並びにそれを備える回路基板及び電子部品
KR101318517B1 (ko) * 2008-05-30 2013-10-16 코오롱인더스트리 주식회사 필름형 광분해성 전사재료
JP2010039214A (ja) * 2008-08-05 2010-02-18 Hitachi Chem Co Ltd 感光性樹脂組成物及びこれを用いた感光性エレメント
KR101597767B1 (ko) * 2009-01-22 2016-02-26 삼성디스플레이 주식회사 감광성 수지 조성물 및 이를 이용한 패턴의 형성 방법
TW201211685A (en) * 2010-06-23 2012-03-16 Jsr Corp Radiation-sensitive composition
JP6702251B2 (ja) * 2017-04-17 2020-05-27 信越化学工業株式会社 ポジ型レジストフィルム積層体及びパターン形成方法
WO2019124307A1 (ja) * 2017-12-20 2019-06-27 住友電気工業株式会社 プリント配線板の製造方法及び積層体

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5084372A (en) * 1982-12-09 1992-01-28 Hoechst Celanese Corporation Process for preparing photographic elements utilizing light-sensitive layer containing cyclical acid amide thermo-crosslinking compound
EP0345305A4 (en) * 1987-12-10 1991-10-02 Macdermid Incorporated Image-reversible dry-film photoresists
JPH0658530B2 (ja) * 1988-04-22 1994-08-03 東京応化工業株式会社 ポジ型感光性組成物
JP2583600B2 (ja) * 1989-02-20 1997-02-19 東京応化工業株式会社 ネガ型電子線レジスト組成物
KR960015081A (ko) * 1993-07-15 1996-05-22 마쯔모또 에이이찌 화학증폭형 레지스트 조성물
JPH0798503A (ja) * 1993-09-29 1995-04-11 Tosoh Corp 熱硬化ポジ型感光性組成物
DE69501853T2 (de) * 1994-06-15 1998-10-22 Agfa Gevaert Nv Verfahren zur Herstellung eines wärmeempfindlichen geschützten Aufzeichnungsmaterials
JP3873263B2 (ja) * 1997-09-22 2007-01-24 Ｊｓｒ株式会社 感放射線性樹脂組成物、保護膜、層間絶縁膜およびこれらの膜の形成法
JPH11223939A (ja) * 1998-02-05 1999-08-17 Fuji Photo Film Co Ltd ポジ型フォトレジスト組成物
KR100745331B1 (ko) * 2000-07-27 2007-08-02 제이에스알 가부시끼가이샤 감방사선성 조성물, 절연막 및 유기 ｅｌ 표시 소자
JP2002116536A (ja) 2000-10-06 2002-04-19 Jsr Corp 感放射線性樹脂組成物、その硬化物および素子。
JP2002341521A (ja) * 2001-05-17 2002-11-27 Sumitomo Chem Co Ltd 感放射線性樹脂組成物
JP2003015287A (ja) * 2001-06-28 2003-01-15 Qimei Industry Co Ltd 感光性樹脂組成物
WO2003029898A1 (fr) * 2001-09-27 2003-04-10 Clariant International Ltd. Composition de resine photosensible
KR100809544B1 (ko) * 2001-10-24 2008-03-04 주식회사 동진쎄미켐 퀴논디아지드 술폰산 에스테르 화합물을 포함하는 감광성수지조성물
KR100783603B1 (ko) * 2002-01-05 2007-12-07 삼성전자주식회사 포토레지스트 조성물 및 이를 사용한 패턴의 형성방법
JP3812654B2 (ja) * 2002-01-23 2006-08-23 Ｊｓｒ株式会社 ポジ型感光性絶縁樹脂組成物およびその硬化物
EP1469346B1 (en) * 2002-01-23 2015-08-05 JSR Corporation Positive photosensitive insulating resin composition and cured object obtained therefrom
JP3843995B2 (ja) * 2002-05-27 2006-11-08 日本ゼオン株式会社 感放射線性樹脂組成物、パターン状樹脂膜を有する基板の製造方法、及び該樹脂組成物の利用
JP2004177683A (ja) * 2002-11-27 2004-06-24 Clariant (Japan) Kk 超高耐熱ポジ型感光性組成物を用いたパターン形成方法
JP3944734B2 (ja) * 2003-01-10 2007-07-18 信越化学工業株式会社 オルガノシロキサン系高分子化合物及び光硬化性樹脂組成物並びにパターン形成方法及び基板保護用皮膜
KR100906795B1 (ko) * 2003-03-12 2009-07-09 주식회사 동진쎄미켐 액정표시장치 회로용 포토레지스트 조성물
JP2005215137A (ja) * 2004-01-28 2005-08-11 Fuji Photo Film Co Ltd 感光性樹脂組成物、感光性転写材料、液晶配向制御用突起及びその製造方法、並びに液晶表示装置
KR101290041B1 (ko) * 2005-08-19 2013-07-30 제이에스알 가부시끼가이샤 포지티브형 감광성 절연 수지 조성물, 그 경화물 및 전자부품
JP4640037B2 (ja) * 2005-08-22 2011-03-02 Ｊｓｒ株式会社 ポジ型感光性絶縁樹脂組成物およびその硬化物
JP2007272138A (ja) * 2006-03-31 2007-10-18 Nippon Zeon Co Ltd レジストパターン形成方法及び感光性樹脂組成物

Also Published As

Publication number Publication date
EP2016463A4 (en) 2011-04-06
TW200745763A (en) 2007-12-16
US20090274900A1 (en) 2009-11-05
JP5048754B2 (ja) 2012-10-17
WO2007119949A1 (en) 2007-10-25
EP2016463A1 (en) 2009-01-21
JP2009533707A (ja) 2009-09-17
US8197934B2 (en) 2012-06-12

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