TWI343842B - - Google Patents
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- Publication number
- TWI343842B TWI343842B TW97107861A TW97107861A TWI343842B TW I343842 B TWI343842 B TW I343842B TW 97107861 A TW97107861 A TW 97107861A TW 97107861 A TW97107861 A TW 97107861A TW I343842 B TWI343842 B TW I343842B
- Authority
- TW
- Taiwan
- Prior art keywords
- liquid
- substrate
- treatment
- processing apparatus
- processing
- Prior art date
Links
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Liquid Crystal (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007064317A JP2008227195A (ja) | 2007-03-14 | 2007-03-14 | 液処理装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200843868A TW200843868A (en) | 2008-11-16 |
TWI343842B true TWI343842B (ko) | 2011-06-21 |
Family
ID=39845453
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW97107861A TW200843868A (en) | 2007-03-14 | 2008-03-06 | Liquid treatment device |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP2008227195A (ko) |
CN (1) | CN101266414A (ko) |
TW (1) | TW200843868A (ko) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010103131A (ja) * | 2008-10-21 | 2010-05-06 | Tokyo Electron Ltd | 液処理装置及び液処理方法 |
KR20180128928A (ko) * | 2016-03-25 | 2018-12-04 | 도레이 카부시키가이샤 | 현상 장치 및 회로 기판의 제조 방법 |
JP7042051B2 (ja) * | 2017-09-21 | 2022-03-25 | 旭化成株式会社 | 現像装置及び現像方法 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3437702B2 (ja) * | 1996-02-01 | 2003-08-18 | 大日本スクリーン製造株式会社 | 基板処理装置 |
JP2000114221A (ja) * | 1998-10-02 | 2000-04-21 | Dainippon Screen Mfg Co Ltd | 基板処理装置 |
JP2001255668A (ja) * | 2000-03-10 | 2001-09-21 | Matsushita Electric Ind Co Ltd | 湿式処理方法及び装置 |
JP2002252200A (ja) * | 2001-02-22 | 2002-09-06 | Hitachi Electronics Eng Co Ltd | 基板処理装置及び処理方法 |
-
2007
- 2007-03-14 JP JP2007064317A patent/JP2008227195A/ja active Pending
-
2008
- 2008-03-06 TW TW97107861A patent/TW200843868A/zh not_active IP Right Cessation
- 2008-03-14 CN CNA2008100853757A patent/CN101266414A/zh active Pending
Also Published As
Publication number | Publication date |
---|---|
JP2008227195A (ja) | 2008-09-25 |
TW200843868A (en) | 2008-11-16 |
CN101266414A (zh) | 2008-09-17 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |