TWI335842B - Method of applying adhesive to inside surface of pellicle frame - Google Patents

Method of applying adhesive to inside surface of pellicle frame Download PDF

Info

Publication number
TWI335842B
TWI335842B TW97101600A TW97101600A TWI335842B TW I335842 B TWI335842 B TW I335842B TW 97101600 A TW97101600 A TW 97101600A TW 97101600 A TW97101600 A TW 97101600A TW I335842 B TWI335842 B TW I335842B
Authority
TW
Taiwan
Prior art keywords
coating
frame
protective film
application
adhesive
Prior art date
Application number
TW97101600A
Other languages
English (en)
Chinese (zh)
Other versions
TW200831196A (en
Inventor
Kazutoshi Sekihara
Yuichi Hamada
Original Assignee
Shinetsu Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shinetsu Chemical Co filed Critical Shinetsu Chemical Co
Publication of TW200831196A publication Critical patent/TW200831196A/zh
Application granted granted Critical
Publication of TWI335842B publication Critical patent/TWI335842B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
TW97101600A 2007-01-16 2008-01-16 Method of applying adhesive to inside surface of pellicle frame TWI335842B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007006903A JP4889510B2 (ja) 2007-01-16 2007-01-16 ペリクルフレーム内面への粘着剤の塗布方法

Publications (2)

Publication Number Publication Date
TW200831196A TW200831196A (en) 2008-08-01
TWI335842B true TWI335842B (en) 2011-01-11

Family

ID=39702969

Family Applications (1)

Application Number Title Priority Date Filing Date
TW97101600A TWI335842B (en) 2007-01-16 2008-01-16 Method of applying adhesive to inside surface of pellicle frame

Country Status (4)

Country Link
JP (1) JP4889510B2 (ja)
KR (1) KR101339746B1 (ja)
CN (1) CN101224456A (ja)
TW (1) TWI335842B (ja)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011034020A (ja) * 2009-08-06 2011-02-17 Shin-Etsu Chemical Co Ltd ペリクル収納容器
JP5411666B2 (ja) * 2009-11-19 2014-02-12 信越化学工業株式会社 リソグラフィ用ペリクル
JP5314631B2 (ja) * 2010-04-20 2013-10-16 信越化学工業株式会社 ペリクルフレームの通気孔内壁に粘着剤を塗布する方法
JP5743450B2 (ja) * 2010-07-28 2015-07-01 株式会社東芝 レチクルチャッククリーナー
JP5432855B2 (ja) * 2010-08-04 2014-03-05 信越化学工業株式会社 ペリクルの製造方法および装置
JP5455871B2 (ja) * 2010-11-17 2014-03-26 信越化学工業株式会社 ペリクルの製造方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61137948U (ja) * 1985-02-19 1986-08-27
JP2642637B2 (ja) * 1987-08-18 1997-08-20 三井石油化学工業 株式会社 防塵膜
JP3415683B2 (ja) * 1994-09-05 2003-06-09 三井化学株式会社 マスク保護装置のペリクル枠への保護膜の塗布方法
JPH08173891A (ja) * 1994-12-26 1996-07-09 Toray Ind Inc 塗膜の製造方法
JPH09239976A (ja) * 1996-03-05 1997-09-16 Ricoh Co Ltd インクジェットヘッドの接着剤塗布装置
JP3115236B2 (ja) * 1996-09-02 2000-12-04 ホーヤ株式会社 マスク保護部材の装着方法及びマスク保護部材付きマスク部材
TW337002B (en) * 1996-11-19 1998-07-21 Mitsui Kagaku Kk Pellicle
JP2001222100A (ja) * 1999-12-03 2001-08-17 Mitsui Chemicals Inc ペリクル
JP4195550B2 (ja) * 2000-12-27 2008-12-10 三井化学株式会社 ペリクル

Also Published As

Publication number Publication date
JP2008175874A (ja) 2008-07-31
KR101339746B1 (ko) 2013-12-11
CN101224456A (zh) 2008-07-23
KR20080067564A (ko) 2008-07-21
TW200831196A (en) 2008-08-01
JP4889510B2 (ja) 2012-03-07

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Legal Events

Date Code Title Description
GD4A Issue of patent certificate for granted invention patent
MM4A Annulment or lapse of patent due to non-payment of fees