TWI332470B - Pellicle storage container - Google Patents
Pellicle storage container Download PDFInfo
- Publication number
- TWI332470B TWI332470B TW096140952A TW96140952A TWI332470B TW I332470 B TWI332470 B TW I332470B TW 096140952 A TW096140952 A TW 096140952A TW 96140952 A TW96140952 A TW 96140952A TW I332470 B TWI332470 B TW I332470B
- Authority
- TW
- Taiwan
- Prior art keywords
- protective film
- ribs
- cover
- container
- storage container
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Packaging Frangible Articles (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Closures For Containers (AREA)
- Details Of Rigid Or Semi-Rigid Containers (AREA)
- Packages (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006299460A JP4672636B2 (ja) | 2006-11-02 | 2006-11-02 | ペリクル収納容器 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200821233A TW200821233A (en) | 2008-05-16 |
TWI332470B true TWI332470B (en) | 2010-11-01 |
Family
ID=39422666
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW096140952A TWI332470B (en) | 2006-11-02 | 2007-10-31 | Pellicle storage container |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP4672636B2 (ja) |
KR (1) | KR101389867B1 (ja) |
CN (1) | CN101174083B (ja) |
HK (1) | HK1112293A1 (ja) |
TW (1) | TWI332470B (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5626850B2 (ja) * | 2010-05-10 | 2014-11-19 | 旭化成イーマテリアルズ株式会社 | ペリクル収納容器 |
CN114229229B (zh) * | 2021-10-29 | 2023-04-07 | 东莞市金恒晟新材料科技有限公司 | 一种防割裂保护膜 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04367434A (ja) * | 1991-06-05 | 1992-12-18 | Mamoru Kamo | 薄壁容器 |
JPH07223678A (ja) * | 1994-02-09 | 1995-08-22 | Hanshin Kasei Kogyo Kk | 食品用容器 |
JPH09315431A (ja) * | 1996-03-29 | 1997-12-09 | Sumitomo Chem Co Ltd | 合成樹脂製パレット |
JPH10114388A (ja) * | 1996-10-07 | 1998-05-06 | Nikon Corp | ペリクル容器 |
JP2000173887A (ja) * | 1998-12-02 | 2000-06-23 | Asahi Kasei Denshi Kk | ペリクル収納ケース |
JP4236535B2 (ja) * | 2003-07-31 | 2009-03-11 | 旭化成エレクトロニクス株式会社 | 大型ペリクル収納容器 |
JP4176138B2 (ja) | 2005-01-27 | 2008-11-05 | 旭化成エレクトロニクス株式会社 | 大型ペリクル収納容器 |
JP4391435B2 (ja) * | 2005-03-22 | 2009-12-24 | 信越化学工業株式会社 | ペリクル収納容器 |
-
2006
- 2006-11-02 JP JP2006299460A patent/JP4672636B2/ja active Active
-
2007
- 2007-10-01 KR KR1020070098643A patent/KR101389867B1/ko active IP Right Grant
- 2007-10-31 CN CN2007101680144A patent/CN101174083B/zh not_active Expired - Fee Related
- 2007-10-31 TW TW096140952A patent/TWI332470B/zh not_active IP Right Cessation
-
2008
- 2008-07-07 HK HK08107439.6A patent/HK1112293A1/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR20080040564A (ko) | 2008-05-08 |
CN101174083B (zh) | 2010-12-29 |
JP2008116667A (ja) | 2008-05-22 |
CN101174083A (zh) | 2008-05-07 |
TW200821233A (en) | 2008-05-16 |
JP4672636B2 (ja) | 2011-04-20 |
HK1112293A1 (en) | 2008-08-29 |
KR101389867B1 (ko) | 2014-04-29 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |