.M341000 八、新型說明： 【新型所屬之技術領域】 本創作係有關於-種光罩盒，制是有關於―種具有支撐件之光罩盒。 【先前技術】 近代半導體科技發展錢，其中光學微影技術(〇ptical Lith〇graphy)扮演重要 -的角色，只要是關於圖形(pattern)定義，皆需仰賴光學微影技術。 光學微影技術在半導體的應用上，是將設計好的線路製作成具有特定形狀 -Γϋ^^^^(photo mask)〇 ^.J m, MlJ a ffl(silic〇n wafer)可曝光齡特定酸。由於任何_於光罩上的塵埃顆粒(如微粒、粉塵 或有機物)都會造成投侃像的品質劣化，用於產生圖_光罩必須保持絕對潔 淨，因此在-般的晶圓製程中，都提供無塵室(dean _)的環境崎免空氣中 的顆粒㈣。然而’目_無塵室也無法物麟無塵織。現代的半導體製 程皆糊抗㈣的光罩盒(rctide _)進行料的保存與運輸，以使光罩保持潔 淨。 有鑒於此’本創作提供-種具有支揮件之光罩盒，其中此支揮件具有簡化 ♦之結構，可大幅降低製造成本，以及製程之複雜度，且此具有支樓件之光罩盒 係採用高分子材料所構成，以-體成形之方式所製成，因此具有成型容易、; 格低廉収可形成透__點，且由於此支撐件伽高分子材料所形成，因 -此可避免因縣而產生微粒，減少污染源，乃針聽前技術加以改良者。 • 【新型内容】 〃為解決先前技術之問題，本創作提供一種具有支樓件之光罩盒。此光罩盒 係由上蓋體與下蓋體組合喊，形成—㈣空間可容納光罩，於光罩各之上= 體或下蓋體内之祕設有至少-鎌件，㈣續容納於光罩盒狀:罩，其 5 .M341000 中設於上蓋體之支撐件與設於下蓋體之支撐件的位置大致可對應。前述 大致呈塊狀’其結構之特徵包括-座體與—凹_持結構，此座體係以= 固接於光罩盒之上蓋體及下蓋勸，而此凹陷頂騎制具有—卿面血 制面，當光罩盒承載-光罩且蓋合時，其凹_持結構之頂持面可林^限 限制面則可定位之，且上蓋體支撐件之凹陷頂持結構與下蓋體支撐件之 持結構會有-容m用时載並定位光罩，以避免光罩概送過程 碰撞而損害光罩。 因此，本創作之主要目的在於提供一種光罩盒，具有簡化 可降低製造成本。 構 本創作之另-目的在於提供-種光罩盒，具㈣化的 製程的複雜度。 傅了降低 本創作之又-目的在於提供-種光罩盒，具有L㈣支雜配置於上蓋體 或下蓋體上，因此可增加支撑件之對稱性，降低製造過程情位的困難。 亡創作之再-目的在於提供-種光罩盒，具# L動支撐件配置於上蓋體 或下蓋體上，因此可增加支撐件之對稱性，降低對位的誤差。 本創作之再_目齡賴供-觀罩盒，其支撐件域分子倾， 因摩擦而產生微粒，減少污染源。 、、本創狀再-目的在於提供-種光罩盒，可藉由支撐件接繼固定光罩， 以避免光罩於運送過程中產生碰撞而損害光罩。 本創作之再-目的在於提供-種光罩盒，其侧邊具有至少—扣件與鎖件， 可扣合光罩盒之上蓋體與下蓋體。 【實施方式】 由於本創作係揭露-種具有支撐件之光罩盒結構，其中所彻到的一些光 罩或光罩盒之詳㈣造理過程’係财驗來賴，故在下述說明中， 並不作完整贿。而且下舶以之賦，亦並未依歡社_尺寸完整繪 6 M341000 製’其作用僅在表達與摘鱗徵相之示意圖。 蓋體盒之—較佳實施麻_，移盒η伽上蓋體與下 盍體11、、且5而成，形成一個可容納光罩之内部空間，且 設於上蓋體或下蓋體U之祕，肋支撐 ^ 蕞艚11且右i日鬥夕4士接m 、中先罩盒10之上盍體與下 盍體11、有相同之結構，因此設於上蓋體H之支撐件 體11之支撐件12的位置。其中，支禮件 #《大致對應叹於下盍 •型的方式所製成，且井里人1n你 、上盍體或下蓋體11係以-體成 L" Site 2 ## 12 ， 源。 頂ω因此可避免因雜而產生微粒，減少污染 根據上述，設於上蓋體或下蓋體u支 以與至少-第二支撐件12b，第一支樓件^第=至少一第一支撑件 11 ，、第一支撐件12b係以l狀分佈 做因此可增加支料12之對雛，降低製造過程中 有目或是降低對位的誤差，且由於光罩盒10之上蓋體與下蓋體11具 之、、，。構’因此設於上蓋體u之第一支撐12a件與第二支撐件12b將大致 對應狄於下蓋體11之第一支撑件12a與第二支撑件12b的位置。.M341000 VIII. New Description: [New Technical Fields] This creation is about a kind of reticle box, which is about a kind of reticle box with support. [Prior Art] Modern semiconductor technology develops money, and optical lithography (扮演ptical Lith〇graphy) plays an important role. As long as it is about the definition of graphics, it depends on optical lithography. In the application of semiconductors, optical lithography is to make the designed circuit into a specific shape - Γϋ^^^^(photo mask) 〇^.J m, MlJ a ffl(silic〇n wafer) acid. Since any dust particles (such as particles, dust or organic matter) on the mask will cause deterioration of the quality of the image, the mask used must be kept absolutely clean, so in the general wafer process, Providing a clean room (dean _) environment to avoid particles in the air (four). However, the 'mesh _ clean room can not be woven without dust. Modern semiconductor processes are resistant to (4) reticle boxes (rctide _) for material storage and transportation to keep the reticle clean. In view of the fact that the present invention provides a reticle box with a support member, wherein the splicing member has a simplified structure, which can greatly reduce the manufacturing cost and the complexity of the process, and the hood having the branch member The box is made of a polymer material and is formed by a body-forming method, so that the molding is easy, and the low-cost collection can form a transparent __ point, and since the support member is formed of a polymer material, It can avoid the generation of particles due to the county, reduce the source of pollution, and improve the technology before the hearing. • [New Content] In order to solve the problems of the prior art, the present invention provides a mask box with a branch member. The reticle box is combined with the upper cover body and the lower cover body to form a (four) space for accommodating the reticle, and at least the upper part of the reticle body or the lower cover body is provided with at least a 镰 piece, and (4) is continuously accommodated in The mask case shape: a cover, wherein the support member provided in the upper cover body of the M. M341000 substantially corresponds to the position of the support member provided on the lower cover body. The foregoing substantially block-shaped structure includes a structure of a seat and a concave-holding structure, and the seat system is fixed to the cover body and the lower cover of the photomask box, and the recessed top has a uniform surface. The blood-made surface, when the photomask box carries the photomask and is covered, the top surface of the concave-holding structure can be positioned, and the concave top holding structure and the lower cover of the upper cover support member The holding structure of the body support member may have a capacity to load and position the reticle to avoid collision of the reticle feeding process and damage the reticle. Therefore, the main purpose of the present invention is to provide a photomask case which is simplified and can reduce manufacturing costs. Another purpose of the creation is to provide a kind of reticle box with a (4) process complexity. Fu reduced this creation - the purpose is to provide a kind of reticle box with L (four) branching disposed on the upper cover or the lower cover, thus increasing the symmetry of the support and reducing the difficulty of the manufacturing process. The re-creation of the creation--the purpose is to provide a kind of reticle box with the #L moving support member disposed on the upper cover body or the lower cover body, thereby increasing the symmetry of the support member and reducing the alignment error. The _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ The purpose of the present invention is to provide a reticle box, which can be fixed by the support member to prevent the reticle from colliding during transportation to damage the reticle. A further object of the present invention is to provide a reticle housing having at least a fastening member and a locking member on the side thereof for engaging the upper cover body and the lower cover body of the reticle housing. [Embodiment] Since the present invention discloses a reticle box structure having a support member, the details of the reticle or the reticle box of the reticle or the reticle box are based on the financial test, so in the following description , not a complete bribe. Moreover, the ship was not given the same name as the Huansha _ size 6 M341000 system. Its function is only a schematic diagram of the expression and the scale. The cover box is preferably embossed, and the upper cover body and the lower body 11 and 5 are formed to form an inner space for accommodating the reticle, and is disposed on the upper cover or the lower cover U. Secret, rib support ^ 蕞艚 11 and right i day 夕 4 4 接 m m, the middle hood box 10 upper body and lower 11 body 11, have the same structure, so the support body 11 provided in the upper cover H The position of the support member 12. Among them, the gift piece #" roughly corresponds to the way of sighing the squat type, and the wells 1n you, the upper body or the lower body 11 are made into - L" Site 2 ## 12 , source . The top ω can thus avoid the generation of particles due to impurities, and reduce the pollution. According to the above, the upper cover or the lower cover body u is supported with at least the second support member 12b, and the first branch member is at least one first support member. 11 . The first support member 12b is distributed in an l shape, so that the pair of the support material 12 can be increased, and the error in the manufacturing process is reduced or the alignment is lowered, and the cover and the lower cover of the photomask case 10 are provided. Body 11 has, ,,. Therefore, the first support 12a and the second support 12b provided on the upper cover u will substantially correspond to the positions of the first support 12a and the second support 12b of the lower cover 11.
之-d ’上述之光罩盒⑴另包含至少—扣件14與—鎖件13，設於光罩盒10 =-側邊上，當上蓋體與下蓋體u蓋合時，扣件14可卡於鎖件Η上，用以扣 :上盘體及下舰11，其巾，扣件14與鎖件13可同設於光罩盒1G之—侧邊上， 二4第圖所不’將扣件Μ設於光罩盒10之一侧邊上，而鎖件13則設於相 罢二14之光罩盒1G另—側邊上，藉此扣件14與鎖件13為成對使用，且光 罩益10之上蓋體與下蓋體11可具有相同的結構。 έ士第二圖係本創作支撐件之一較佳實施例示意圖，支撲件I2大致呈塊狀，其 結構之特徵包括有·"座體121與—凹陷頂持結構122。座體121係以至少-個支 揮點固接於光罩盒1G之上蓋體及下蓋體11内各角落之位置，凹_持結構122 則具有-頂持面1221與―限制面1222，當光罩盒⑺承載一光罩且蓋合時，其 7 M341000 下蓋體212具有相同之結構，因此設於上蓋體2ιι之第—支擇 件爾大致對應設於下蓋體加之第一支撐件公與第二牙—、第-支撐 此外，上述之光罩盒20另包含至少 —支牙件22b的位置。 於光罩盒20之-側邊上，其中、^件24與一轉軸25，設 第四圖所示，扣件24設於光罩盒2〇之一側=二=與一扣_，如 之光罩盒另-侧邊上，當上蓋體叫與下蓋體212 2人3=設於相對扣件24 扣槽231中，並將滑扣说推至扣件μ插 畊24可插入 盥下蓋體212，蕤^ ^位置，用以扣合上蓋體211 J盍體212精此使扣件24與鎖件幻為 24與鎖件23亦可同設於光罩各 力卜光罩JO之扣件 於上蓋體2Π與下蓋體光罩盒2〇之轉軸25則係設 係以轉轴25結;I不對稱之相對位置上，且上蓋體叫與下蓋體- 第五A圖係本創作支撐件之另一較佳實施例示， =====一;= 請内各角落之位置，其中座/====== 2212,且接人麵加目士 ^主夕_面2211與-接合機構 w、一丁說σ 4 、有至少一第一接合部2213，而頂持結構222則具有至 夕、面222/與-第二接合部2223，且此頂持面222ι大致呈一圓形。 徵勺;te古一圖係本創作支撐件之又一較佳實施例示意圖，支撑件22其結構之特 二成一 ΐ:221與一頂持結構222 ’且座體221與頂持結構222可為不同材 二=成。座體221係以至少一個支撐點固接於光罩盒如之上蓋體2ιι及下蓋 落之位置，其中座體221具有至少_限制面2211與—接合機構 小一’接5機構如2具有至少一第一接合部⑵3，而頂持結構222則具有至 =頂持面2221與-第二接合部2223，且此頂持面2221大致呈一方形，其中 、、。構222另具有一卡設槽2222，且卡設槽2222可卡設於限制面2211上。 根據第iLA圖與第五3圖之實施方式，其頂持結構η2係以第二接合部助 叹於接合機構2212之第—接合部2213上’用以將頂持結構⑵固設於座體 9 r M341000 221上，其中當第一接合部2213具有一孔洞，第二接合部2213具有一凸部時， 可將凸部套設於孔_，或是當第—接合部2213具有—凸部，第二接合部2213 具有一孔洞時，可將凸部套設於孔洞内。當光罩盒2〇承載一光罩且蓋合時，其 頂持結構222之頂持面2221可承載光罩，限制面2211則可定位之，且上蓋體 211支撐件22之頂持結構222與下蓋體212支撐件22之頂持結構瓜會有一容 置空間，用以承載並定位光罩，以避免光罩於運送過程中產生碰撞而損害光罩。 、以上所述僅為本創作之較佳實施例而已，並非用以限定本創作之申請專利 •權利；同時以上的描述，對於熟知本技術領域之專門人士應可日膽及實施，因 鲁此其他未脫離本創作所揭示之精神下所完成的等效改變或修飾，均靡包含在下 述之申請專利範圍中。 〜 【圖式簡單說明】 第一圖係本創作光罩盒之一實施例示意圖。 第二圖係本創作支撐件之一實施例示意圖。 第二八®至帛以目縣齡支撐狀凹陷爾結構 例示意圖。 两犬用之一貫轭 φ 第四圖係本創作光罩盒之一實施例示意圖。 第五A圖與第五b圖係本創作支撐件之一實施例示意圖。 【主要元件符號說明】 10 光罩盒 11 上蓋體/下蓋體 12 支撐件 12a 第一支撐件 12b 卓一支撐件 121 座體 M341000The above-mentioned photomask case (1) further comprises at least a fastener 14 and a lock member 13 disposed on the side of the photomask case 10, and when the upper cover body and the lower cover body u are closed, the fastener 14 The card can be buckled on the lock member for fastening: the upper disc body and the lower ship 11, the towel, the fastener member 14 and the lock member 13 can be disposed on the side of the photomask box 1G, and the second and fourth figures are not 'The fastener is disposed on one side of the photomask case 10, and the lock member 13 is disposed on the other side of the photomask case 1G of the phase two, whereby the fastener 14 and the lock member 13 are formed. For use, and the cover 10 and the lower cover 11 may have the same structure. The second figure of the gentleman is a schematic diagram of a preferred embodiment of the present invention. The support member I2 is substantially block-shaped, and the structure features include a body 121 and a recessed holding structure 122. The seat body 121 is fixed at at least one of the support points on the upper surface of the cover body and the lower cover body 11 of the photomask case 1G, and the concave-holding structure 122 has a top surface 1221 and a "restriction surface 1222". When the photomask case (7) carries a light cover and is covered, the 7 M341000 lower cover body 212 has the same structure, so the first cover member disposed on the upper cover body 2 ι is substantially corresponding to the lower cover body and the first support. The male and the second teeth - the first support. In addition, the photomask case 20 described above further includes at least the position of the dental element 22b. On the side of the mask case 20, wherein the member 24 and a shaft 25 are provided in the fourth figure, the fastener 24 is disposed on one side of the mask case 2 = two = and a button _, such as The reticle box is on the other side, when the upper cover body is called the lower cover body 212 2 people 3 = is set in the opposite fastener 24 buckle groove 231, and the slide buckle is pushed to the fastener μ ploughing 24 can be inserted 盥The lower cover body 212, 蕤 ^ ^ position, for fastening the upper cover body 211 J body 212, so that the fastener 24 and the lock member imaginary 24 and the lock member 23 can also be set in the hood of each force visor mask JO The fasteners are attached to the upper cover body 2 Π and the lower cover body hood 2, and the rotation shaft 25 is tied with the shaft 25; the opposite position of the A-symmetry, and the upper cover is called the lower cover - FIG. Another preferred embodiment of the present creative support is shown, ===== one; = the position of each corner, where the seat /====== 2212, and the person to join the face + the main eve _ The face 2211 and the engagement mechanism w, the σ 4 , have at least one first joint portion 2213, and the top structure 222 has an eve, face 222 / and - second joint portion 2223, and the top surface 222 ι It is roughly round. The present invention is a schematic diagram of another preferred embodiment of the present invention. The structure of the support member 22 is two-in-one: 221 and a top holding structure 222', and the seat body 221 and the top holding structure 222 can be Different materials two = into. The seat body 221 is fixed to the photomask case such as the upper cover body 2 ι and the lower cover by at least one support point, wherein the seat body 221 has at least a _ restriction surface 2211 and a small engagement mechanism of the engagement mechanism. At least one first joint portion (2) 3, and the top holding structure 222 has a top surface 2221 and a second joint portion 2223, and the top surface 2221 is substantially square, wherein. The structure 222 has a latching slot 2222, and the latching slot 2222 can be latched on the limiting surface 2211. According to the embodiment of the i-LA and FIG. 3, the holding structure η2 is assisted by the second engaging portion on the first engaging portion 2213 of the engaging mechanism 2212 for fixing the holding structure (2) to the seat. 9 r M341000 221, wherein when the first engaging portion 2213 has a hole, the second engaging portion 2213 has a convex portion, the convex portion can be sleeved in the hole _, or when the first engaging portion 2213 has a convex portion When the second joint portion 2213 has a hole, the protrusion portion can be sleeved in the hole. When the photomask case 2 is loaded with a light cover and is covered, the top surface 2221 of the top holding structure 222 can carry the light cover, the limiting surface 2211 can be positioned, and the top structure 222 of the upper cover 211 support 22 The receiving structure of the support member 22 of the lower cover 212 has an accommodating space for carrying and positioning the reticle to prevent the reticle from colliding during transportation and damaging the reticle. The above description is only the preferred embodiment of the present invention, and is not intended to limit the patent application rights of the present invention; at the same time, the above description should be daring and implemented for those skilled in the art. Other equivalent changes or modifications made without departing from the spirit of the present invention are included in the scope of the following claims. ~ [Simple description of the drawings] The first figure is a schematic diagram of one embodiment of the present photomask case. The second figure is a schematic diagram of one embodiment of the present creation support. A schematic diagram of the structure of the second eight-to-mesh-supported depression structure. The consistent yoke for the two dogs φ The fourth figure is a schematic diagram of one embodiment of the present photomask case. Figures 5A and 5b are schematic views of one embodiment of the present creation support. [Main component symbol description] 10 Photomask case 11 Upper cover/lower cover 12 Support member 12a First support member 12b One support member 121 Seat M341000
122 1221 1222 13 14 20 211 212 22 22a 22b 221 2211 2212 2213 222 222a 2221 2222 2223 23 231 232 24 25 凹陷頂持結構 頂持面 限制面 鎖件 扣件 光罩盒 上蓋體 下蓋體 支撐件 第一支撐件 第二支撐件 座體 限制面 接合機構 第一接合部 頂持結構 上平面 頂持面 卡設槽 第二接合部 鎖件 扣槽 滑扣 扣件 轉軸122 1221 1222 13 14 20 211 212 22 22a 22b 221 2211 2212 2213 222 222a 2221 2222 2223 23 231 232 24 25 Recessed top holding structure top surface limit surface lock fasteners reticle box upper cover lower cover body support first Support member second support member seat body restriction surface engagement mechanism first joint portion holding structure upper surface top surface holding surface engaging groove second joint portion lock member buckle groove buckle fastener shaft