TWI250663B - Group-III nitride semiconductor device, production method thereof and light-emitting diode - Google Patents

Group-III nitride semiconductor device, production method thereof and light-emitting diode Download PDF

Info

Publication number
TWI250663B
TWI250663B TW92129083A TW92129083A TWI250663B TW I250663 B TWI250663 B TW I250663B TW 92129083 A TW92129083 A TW 92129083A TW 92129083 A TW92129083 A TW 92129083A TW I250663 B TWI250663 B TW I250663B
Authority
TW
Taiwan
Prior art keywords
layer
nitride semiconductor
crystal
type
crystal layer
Prior art date
Application number
TW92129083A
Other languages
English (en)
Chinese (zh)
Other versions
TW200414569A (en
Inventor
Takashi Udagawa
Original Assignee
Showa Denko Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Denko Kk filed Critical Showa Denko Kk
Publication of TW200414569A publication Critical patent/TW200414569A/zh
Application granted granted Critical
Publication of TWI250663B publication Critical patent/TWI250663B/zh

Links

Landscapes

  • Led Devices (AREA)
  • Electrodes Of Semiconductors (AREA)
TW92129083A 2002-10-22 2003-10-21 Group-III nitride semiconductor device, production method thereof and light-emitting diode TWI250663B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002306722A JP3779255B2 (ja) 2002-10-22 2002-10-22 Iii族窒化物半導体素子、その製造方法および発光ダイオード

Publications (2)

Publication Number Publication Date
TW200414569A TW200414569A (en) 2004-08-01
TWI250663B true TWI250663B (en) 2006-03-01

Family

ID=32453396

Family Applications (1)

Application Number Title Priority Date Filing Date
TW92129083A TWI250663B (en) 2002-10-22 2003-10-21 Group-III nitride semiconductor device, production method thereof and light-emitting diode

Country Status (2)

Country Link
JP (1) JP3779255B2 (ja)
TW (1) TWI250663B (ja)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7238970B2 (en) 2003-10-30 2007-07-03 Matsushita Electric Industrial Co., Ltd. Semiconductor device and method for fabricating the same
JP5005900B2 (ja) * 2005-09-16 2012-08-22 昭和電工株式会社 半導体素子
JP2007073732A (ja) * 2005-09-07 2007-03-22 Showa Denko Kk 化合物半導体素子
JP5005902B2 (ja) * 2005-09-26 2012-08-22 昭和電工株式会社 化合物半導体素子
US8084781B2 (en) 2005-09-07 2011-12-27 Showa Denko K.K. Compound semiconductor device
JP2007081084A (ja) * 2005-09-14 2007-03-29 Showa Denko Kk 半導体発光素子
DE112006002403T5 (de) 2005-09-07 2008-07-10 Showa Denko K.K. Verbindungshalbleiter-Bauelement
WO2007029865A1 (en) * 2005-09-07 2007-03-15 Showa Denko K.K. Compound semiconductor device
JP4700464B2 (ja) * 2005-09-30 2011-06-15 昭和電工株式会社 化合物半導体素子
JP2007073872A (ja) * 2005-09-09 2007-03-22 Showa Denko Kk 半導体素子
JP5005905B2 (ja) * 2005-10-27 2012-08-22 昭和電工株式会社 化合物半導体素子および化合物半導体素子製造方法
JP6151135B2 (ja) 2013-09-03 2017-06-21 株式会社東芝 半導体装置及びその製造方法

Also Published As

Publication number Publication date
TW200414569A (en) 2004-08-01
JP3779255B2 (ja) 2006-05-24
JP2004146424A (ja) 2004-05-20

Similar Documents

Publication Publication Date Title
JP4652888B2 (ja) 窒化ガリウム系半導体積層構造体の製造方法
TW200814369A (en) III nitride compound semiconductor laminated structure
JP3752810B2 (ja) エピタキシャルウェハおよびその製造方法並びに半導体素子
TWI250663B (en) Group-III nitride semiconductor device, production method thereof and light-emitting diode
JP2006173590A (ja) 窒化ガリウム系半導体積層構造体、その製造方法、窒化ガリウム系半導体素子及びランプ
US7034330B2 (en) Group-III nitride semiconductor device, production method thereof and light-emitting diode
JP4754711B2 (ja) Iii族窒化物半導体発光ダイオード、発光ダイオードランプ、光源、iii族窒化物半導体発光ダイオード用電極およびその製造方法
TW541709B (en) III group nitride semiconductor luminescent element with the product method
TW200541115A (en) Group Ⅲ nitride semiconductor light-emitting device
US10763395B2 (en) Light emitting diode element and method for manufacturing same
JP4100493B2 (ja) リン化硼素半導体層を含む半導体素子、その製造方法、発光ダイオードおよびリン化硼素半導体層
JP2007073732A (ja) 化合物半導体素子
US7759149B2 (en) Gallium nitride-based semiconductor stacked structure
JP3659174B2 (ja) Iii族窒化物半導体発光素子およびその製造方法
JP2006024903A (ja) 窒化ガリウム系半導体積層構造体
JP3700664B2 (ja) リン化硼素系半導体層、その製造方法、半導体素子
JP4174910B2 (ja) Iii族窒化物半導体素子
TW502461B (en) Group III nitrides luminescence element for semiconductor and process of preparing the same
TWI272732B (en) Gallium nitride based semiconductor laminate structure
JP2001015803A (ja) AlGaInP発光ダイオード
JP3895266B2 (ja) リン化硼素系化合物半導体素子、及びその製造方法、並びに発光ダイオード
JP2000012896A (ja) Iii族窒化物半導体素子
KR20050092365A (ko) 인화붕소 기재 화합물 반도체 소자, 이의 제조 방법 및발광 다이오드
JP3939257B2 (ja) 半導体装置の製造方法
JP2000004046A (ja) Iii族窒化物半導体素子

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees