TWI236576B - Positive resist composition - Google Patents
Positive resist composition Download PDFInfo
- Publication number
- TWI236576B TWI236576B TW090106462A TW90106462A TWI236576B TW I236576 B TWI236576 B TW I236576B TW 090106462 A TW090106462 A TW 090106462A TW 90106462 A TW90106462 A TW 90106462A TW I236576 B TWI236576 B TW I236576B
- Authority
- TW
- Taiwan
- Prior art keywords
- positive photoresist
- patent application
- photoresist composition
- alkali
- item
- Prior art date
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- 239000000203 mixture Substances 0.000 title claims abstract description 26
- 229920005989 resin Polymers 0.000 claims abstract description 8
- 239000011347 resin Substances 0.000 claims abstract description 8
- QVUWDZQIXPVISC-UHFFFAOYSA-N (2,5-dioxopyrrolidin-1-yl) octane-1-sulfonate Chemical compound CCCCCCCCS(=O)(=O)ON1C(=O)CCC1=O QVUWDZQIXPVISC-UHFFFAOYSA-N 0.000 claims abstract description 7
- 229920002120 photoresistant polymer Polymers 0.000 claims description 33
- 239000005011 phenolic resin Substances 0.000 claims description 21
- 229920001568 phenolic resin Polymers 0.000 claims description 19
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 claims description 17
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims description 16
- -1 phenol compound Chemical class 0.000 claims description 16
- 238000011049 filling Methods 0.000 claims description 12
- 239000002534 radiation-sensitizing agent Substances 0.000 claims description 10
- 150000001875 compounds Chemical class 0.000 claims description 7
- 238000005227 gel permeation chromatography Methods 0.000 claims description 7
- 150000002989 phenols Chemical class 0.000 claims description 5
- 239000007787 solid Substances 0.000 claims description 3
- 230000002079 cooperative effect Effects 0.000 claims description 2
- 239000003504 photosensitizing agent Substances 0.000 claims description 2
- RCHKEJKUUXXBSM-UHFFFAOYSA-N n-benzyl-2-(3-formylindol-1-yl)acetamide Chemical compound C12=CC=CC=C2C(C=O)=CN1CC(=O)NCC1=CC=CC=C1 RCHKEJKUUXXBSM-UHFFFAOYSA-N 0.000 claims 2
- 230000005540 biological transmission Effects 0.000 claims 1
- 230000035945 sensitivity Effects 0.000 abstract description 5
- WTQZSMDDRMKJRI-UHFFFAOYSA-N 4-diazoniophenolate Chemical compound [O-]C1=CC=C([N+]#N)C=C1 WTQZSMDDRMKJRI-UHFFFAOYSA-N 0.000 abstract description 4
- 230000005855 radiation Effects 0.000 abstract description 4
- 229920003986 novolac Polymers 0.000 abstract 1
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 9
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 9
- 230000000052 comparative effect Effects 0.000 description 9
- 239000000243 solution Substances 0.000 description 9
- 239000004793 Polystyrene Substances 0.000 description 7
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 description 7
- 229920002223 polystyrene Polymers 0.000 description 7
- IWDCLRJOBJJRNH-UHFFFAOYSA-N p-cresol Chemical compound CC1=CC=C(O)C=C1 IWDCLRJOBJJRNH-UHFFFAOYSA-N 0.000 description 6
- 239000002253 acid Substances 0.000 description 5
- 239000000654 additive Substances 0.000 description 4
- 150000001299 aldehydes Chemical class 0.000 description 4
- CATSNJVOTSVZJV-UHFFFAOYSA-N heptan-2-one Chemical compound CCCCCC(C)=O CATSNJVOTSVZJV-UHFFFAOYSA-N 0.000 description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 4
- 238000003384 imaging method Methods 0.000 description 4
- KZNICNPSHKQLFF-UHFFFAOYSA-N succinimide Chemical compound O=C1CCC(=O)N1 KZNICNPSHKQLFF-UHFFFAOYSA-N 0.000 description 4
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 4
- RGHHSNMVTDWUBI-UHFFFAOYSA-N 4-hydroxybenzaldehyde Chemical compound OC1=CC=C(C=O)C=C1 RGHHSNMVTDWUBI-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 239000003377 acid catalyst Substances 0.000 description 3
- ZTQSAGDEMFDKMZ-UHFFFAOYSA-N butyric aldehyde Natural products CCCC=O ZTQSAGDEMFDKMZ-UHFFFAOYSA-N 0.000 description 3
- 150000002148 esters Chemical class 0.000 description 3
- 235000006408 oxalic acid Nutrition 0.000 description 3
- QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Natural products CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 3
- WOAHJDHKFWSLKE-UHFFFAOYSA-N 1,2-benzoquinone Chemical compound O=C1C=CC=CC1=O WOAHJDHKFWSLKE-UHFFFAOYSA-N 0.000 description 2
- IXQGCWUGDFDQMF-UHFFFAOYSA-N 2-Ethylphenol Chemical compound CCC1=CC=CC=C1O IXQGCWUGDFDQMF-UHFFFAOYSA-N 0.000 description 2
- QFYYAIBEHOEZKC-UHFFFAOYSA-N 2-Methoxyresorcinol Chemical compound COC1=C(O)C=CC=C1O QFYYAIBEHOEZKC-UHFFFAOYSA-N 0.000 description 2
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 2
- LPCJHUPMQKSPDC-UHFFFAOYSA-N 3,5-diethylphenol Chemical compound CCC1=CC(O)=CC(CC)=C1 LPCJHUPMQKSPDC-UHFFFAOYSA-N 0.000 description 2
- TUAMRELNJMMDMT-UHFFFAOYSA-N 3,5-xylenol Chemical compound CC1=CC(C)=CC(O)=C1 TUAMRELNJMMDMT-UHFFFAOYSA-N 0.000 description 2
- HMNKTRSOROOSPP-UHFFFAOYSA-N 3-Ethylphenol Chemical compound CCC1=CC=CC(O)=C1 HMNKTRSOROOSPP-UHFFFAOYSA-N 0.000 description 2
- IAVREABSGIHHMO-UHFFFAOYSA-N 3-hydroxybenzaldehyde Chemical compound OC1=CC=CC(C=O)=C1 IAVREABSGIHHMO-UHFFFAOYSA-N 0.000 description 2
- ASHGTJPOSUFTGB-UHFFFAOYSA-N 3-methoxyphenol Chemical compound COC1=CC=CC(O)=C1 ASHGTJPOSUFTGB-UHFFFAOYSA-N 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- HXDOZKJGKXYMEW-UHFFFAOYSA-N 4-ethylphenol Chemical compound CCC1=CC=C(O)C=C1 HXDOZKJGKXYMEW-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- AMIMRNSIRUDHCM-UHFFFAOYSA-N Isopropylaldehyde Chemical compound CC(C)C=O AMIMRNSIRUDHCM-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- NBBJYMSMWIIQGU-UHFFFAOYSA-N Propionic aldehyde Chemical compound CCC=O NBBJYMSMWIIQGU-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical compound O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N butyl acetate Chemical compound CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 229930003836 cresol Natural products 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 2
- HYBBIBNJHNGZAN-UHFFFAOYSA-N furfural Chemical compound O=CC1=CC=CO1 HYBBIBNJHNGZAN-UHFFFAOYSA-N 0.000 description 2
- 150000004820 halides Chemical class 0.000 description 2
- JARKCYVAAOWBJS-UHFFFAOYSA-N hexanal Chemical compound CCCCCC=O JARKCYVAAOWBJS-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 2
- ZRSNZINYAWTAHE-UHFFFAOYSA-N p-methoxybenzaldehyde Chemical compound COC1=CC=C(C=O)C=C1 ZRSNZINYAWTAHE-UHFFFAOYSA-N 0.000 description 2
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 2
- FXLOVSHXALFLKQ-UHFFFAOYSA-N p-tolualdehyde Chemical compound CC1=CC=C(C=O)C=C1 FXLOVSHXALFLKQ-UHFFFAOYSA-N 0.000 description 2
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 229960002317 succinimide Drugs 0.000 description 2
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 2
- DWWJUZDVYOQFEE-UHFFFAOYSA-N (2,5-dioxopyrrolidin-1-yl) dodecane-1-sulfonate Chemical compound CCCCCCCCCCCCS(=O)(=O)ON1C(=O)CCC1=O DWWJUZDVYOQFEE-UHFFFAOYSA-N 0.000 description 1
- LUPDFEBEDJKRKE-UHFFFAOYSA-N (2,5-dioxopyrrolidin-1-yl) hexane-1-sulfonate Chemical compound CCCCCCS(=O)(=O)ON1C(=O)CCC1=O LUPDFEBEDJKRKE-UHFFFAOYSA-N 0.000 description 1
- KJPRLNWUNMBNBZ-QPJJXVBHSA-N (E)-cinnamaldehyde Chemical compound O=C\C=C\C1=CC=CC=C1 KJPRLNWUNMBNBZ-QPJJXVBHSA-N 0.000 description 1
- PCNMALATRPXTKX-UHFFFAOYSA-N 1,4-dimethylcyclohexa-2,4-dien-1-ol Chemical compound CC1=CCC(C)(O)C=C1 PCNMALATRPXTKX-UHFFFAOYSA-N 0.000 description 1
- LIPRQQHINVWJCH-UHFFFAOYSA-N 1-ethoxypropan-2-yl acetate Chemical compound CCOCC(C)OC(C)=O LIPRQQHINVWJCH-UHFFFAOYSA-N 0.000 description 1
- ZCONCJFBSHTFFD-UHFFFAOYSA-N 2,3,5-triethylphenol Chemical compound CCC1=CC(O)=C(CC)C(CC)=C1 ZCONCJFBSHTFFD-UHFFFAOYSA-N 0.000 description 1
- PKZJLOCLABXVMC-UHFFFAOYSA-N 2-Methoxybenzaldehyde Chemical compound COC1=CC=CC=C1C=O PKZJLOCLABXVMC-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- KBGLIBWPBYLNNK-UHFFFAOYSA-N 2-ethoxypropyl acetate Chemical compound CCOC(C)COC(C)=O KBGLIBWPBYLNNK-UHFFFAOYSA-N 0.000 description 1
- KIZQNNOULOCVDM-UHFFFAOYSA-M 2-hydroxyethyl(trimethyl)azanium;hydroxide Chemical compound [OH-].C[N+](C)(C)CCO KIZQNNOULOCVDM-UHFFFAOYSA-M 0.000 description 1
- LHGVFZTZFXWLCP-WBJZHHNVSA-N 2-methoxyphenol Chemical compound CO[13C]1=[13CH][13CH]=[13CH][13CH]=[13C]1O LHGVFZTZFXWLCP-WBJZHHNVSA-N 0.000 description 1
- GPJJASIJVRXZFI-UHFFFAOYSA-N 2-methoxyresorcinol Natural products COC1=CC=C(O)C=C1O GPJJASIJVRXZFI-UHFFFAOYSA-N 0.000 description 1
- WJQOZHYUIDYNHM-UHFFFAOYSA-N 2-tert-Butylphenol Chemical compound CC(C)(C)C1=CC=CC=C1O WJQOZHYUIDYNHM-UHFFFAOYSA-N 0.000 description 1
- NBEFMISJJNGCIZ-UHFFFAOYSA-N 3,5-dimethylbenzaldehyde Chemical compound CC1=CC(C)=CC(C=O)=C1 NBEFMISJJNGCIZ-UHFFFAOYSA-N 0.000 description 1
- WMPDAIZRQDCGFH-UHFFFAOYSA-N 3-methoxybenzaldehyde Chemical compound COC1=CC=CC(C=O)=C1 WMPDAIZRQDCGFH-UHFFFAOYSA-N 0.000 description 1
- YGCZTXZTJXYWCO-UHFFFAOYSA-N 3-phenylpropanal Chemical compound O=CCCC1=CC=CC=C1 YGCZTXZTJXYWCO-UHFFFAOYSA-N 0.000 description 1
- CYEKUDPFXBLGHH-UHFFFAOYSA-N 3-tert-Butylphenol Chemical compound CC(C)(C)C1=CC=CC(O)=C1 CYEKUDPFXBLGHH-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- HXYZNXAJUVMACY-UHFFFAOYSA-N 4-(7-hydroxy-2,4,4-trimethyl-3h-chromen-2-yl)benzene-1,3-diol Chemical compound O1C2=CC(O)=CC=C2C(C)(C)CC1(C)C1=CC=C(O)C=C1O HXYZNXAJUVMACY-UHFFFAOYSA-N 0.000 description 1
- QHPQWRBYOIRBIT-UHFFFAOYSA-N 4-tert-butylphenol Chemical compound CC(C)(C)C1=CC=C(O)C=C1 QHPQWRBYOIRBIT-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- XXRCUYVCPSWGCC-UHFFFAOYSA-N Ethyl pyruvate Chemical compound CCOC(=O)C(C)=O XXRCUYVCPSWGCC-UHFFFAOYSA-N 0.000 description 1
- NQTADLQHYWFPDB-UHFFFAOYSA-N N-Hydroxysuccinimide Chemical compound ON1C(=O)CCC1=O NQTADLQHYWFPDB-UHFFFAOYSA-N 0.000 description 1
- ALVGSDOIXRPZFH-UHFFFAOYSA-N [(1-diazonioimino-3,4-dioxonaphthalen-2-ylidene)hydrazinylidene]azanide Chemical compound C1=CC=C2C(=N[N+]#N)C(=NN=[N-])C(=O)C(=O)C2=C1 ALVGSDOIXRPZFH-UHFFFAOYSA-N 0.000 description 1
- MPGOFFXRGUQRMW-UHFFFAOYSA-N [N-]=[N+]=[N-].[N-]=[N+]=[N-].O=C1C=CC=CC1=O Chemical compound [N-]=[N+]=[N-].[N-]=[N+]=[N-].O=C1C=CC=CC1=O MPGOFFXRGUQRMW-UHFFFAOYSA-N 0.000 description 1
- IKHGUXGNUITLKF-XPULMUKRSA-N acetaldehyde Chemical compound [14CH]([14CH3])=O IKHGUXGNUITLKF-XPULMUKRSA-N 0.000 description 1
- 235000011054 acetic acid Nutrition 0.000 description 1
- KVXNKFYSHAUJIA-UHFFFAOYSA-N acetic acid;ethoxyethane Chemical compound CC(O)=O.CCOCC KVXNKFYSHAUJIA-UHFFFAOYSA-N 0.000 description 1
- ZOIORXHNWRGPMV-UHFFFAOYSA-N acetic acid;zinc Chemical compound [Zn].CC(O)=O.CC(O)=O ZOIORXHNWRGPMV-UHFFFAOYSA-N 0.000 description 1
- HGINCPLSRVDWNT-UHFFFAOYSA-N acrylaldehyde Natural products C=CC=O HGINCPLSRVDWNT-UHFFFAOYSA-N 0.000 description 1
- 150000001334 alicyclic compounds Chemical class 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 229940072049 amyl acetate Drugs 0.000 description 1
- PGMYKACGEOXYJE-UHFFFAOYSA-N anhydrous amyl acetate Natural products CCCCCOC(C)=O PGMYKACGEOXYJE-UHFFFAOYSA-N 0.000 description 1
- 150000003934 aromatic aldehydes Chemical class 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- OEYIOHPDSNJKLS-UHFFFAOYSA-N choline Chemical compound C[N+](C)(C)CCO OEYIOHPDSNJKLS-UHFFFAOYSA-N 0.000 description 1
- 229960001231 choline Drugs 0.000 description 1
- KJPRLNWUNMBNBZ-UHFFFAOYSA-N cinnamic aldehyde Natural products O=CC=CC1=CC=CC=C1 KJPRLNWUNMBNBZ-UHFFFAOYSA-N 0.000 description 1
- 229940117916 cinnamic aldehyde Drugs 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- MLUCVPSAIODCQM-NSCUHMNNSA-N crotonaldehyde Chemical compound C\C=C\C=O MLUCVPSAIODCQM-NSCUHMNNSA-N 0.000 description 1
- MLUCVPSAIODCQM-UHFFFAOYSA-N crotonaldehyde Natural products CC=CC=O MLUCVPSAIODCQM-UHFFFAOYSA-N 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- KVFDZFBHBWTVID-UHFFFAOYSA-N cyclohexanecarbaldehyde Chemical compound O=CC1CCCCC1 KVFDZFBHBWTVID-UHFFFAOYSA-N 0.000 description 1
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical class OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 229940116333 ethyl lactate Drugs 0.000 description 1
- 229940117360 ethyl pyruvate Drugs 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- MNWFXJYAOYHMED-UHFFFAOYSA-M heptanoate Chemical compound CCCCCCC([O-])=O MNWFXJYAOYHMED-UHFFFAOYSA-M 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- OVWYEQOVUDKZNU-UHFFFAOYSA-N m-tolualdehyde Chemical compound CC1=CC=CC(C=O)=C1 OVWYEQOVUDKZNU-UHFFFAOYSA-N 0.000 description 1
- UEGPKNKPLBYCNK-UHFFFAOYSA-L magnesium acetate Chemical compound [Mg+2].CC([O-])=O.CC([O-])=O UEGPKNKPLBYCNK-UHFFFAOYSA-L 0.000 description 1
- 239000011654 magnesium acetate Substances 0.000 description 1
- 235000011285 magnesium acetate Nutrition 0.000 description 1
- 229940069446 magnesium acetate Drugs 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- BTFQKIATRPGRBS-UHFFFAOYSA-N o-tolualdehyde Chemical compound CC1=CC=CC=C1C=O BTFQKIATRPGRBS-UHFFFAOYSA-N 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- OIPPWFOQEKKFEE-UHFFFAOYSA-N orcinol Chemical compound CC1=CC(O)=CC(O)=C1 OIPPWFOQEKKFEE-UHFFFAOYSA-N 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- LHGVFZTZFXWLCP-UHFFFAOYSA-N pyrocatechol monomethyl ether Natural products COC1=CC=CC=C1O LHGVFZTZFXWLCP-UHFFFAOYSA-N 0.000 description 1
- SMQUZDBALVYZAC-UHFFFAOYSA-N salicylaldehyde Chemical compound OC1=CC=CC=C1C=O SMQUZDBALVYZAC-UHFFFAOYSA-N 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- YNJBWRMUSHSURL-UHFFFAOYSA-N trichloroacetic acid Chemical compound OC(=O)C(Cl)(Cl)Cl YNJBWRMUSHSURL-UHFFFAOYSA-N 0.000 description 1
- MWOOGOJBHIARFG-UHFFFAOYSA-N vanillin Chemical compound COC1=CC(C=O)=CC=C1O MWOOGOJBHIARFG-UHFFFAOYSA-N 0.000 description 1
- 235000012141 vanillin Nutrition 0.000 description 1
- FGQOOHJZONJGDT-UHFFFAOYSA-N vanillin Natural products COC1=CC(O)=CC(C=O)=C1 FGQOOHJZONJGDT-UHFFFAOYSA-N 0.000 description 1
- 150000003739 xylenols Chemical class 0.000 description 1
- 239000004246 zinc acetate Substances 0.000 description 1
- 235000013904 zinc acetate Nutrition 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
- G03F7/0397—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having an alicyclic moiety in a side chain
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Description
1236576 A7 A7 B7 五、發明説明(^ 發明之範圍 本發明關於一種正型光阻組成物,其係用於提供光阻 成形,透過射線例如紫外線之照射接著鹼性顯影,以及用 於製造半導體積體電路及此類之物。 在含酚醛樹脂當作鹼溶性成分及醌二疊氮化合物當作 對輻射敏感成分之正型光阻劑中,醌二疊氮化合物受到射 線之照射而分解產生羧基而本質上則由鹼不溶性轉成鹼溶 性。這個現象係有用於提供正型圖案,藉由射線透過光罩 照射(所謂的成像曝光),接著在鹼性介質中鹼性顯影。 上述含酚醛樹脂/醌二疊氮之正型光阻劑通常係優於解析 度,而且係廣泛用於積體電路之製造。 近幾年,積體電路隨著集成度增加已經變成微米化而 且需要次微米圖案之形成。結果,正型光阻劑必須具有高 解析度及優良的成像能力(成形)。當電路圖案變細上表 面傾向變圓或頂端及底部之間的傾斜變得引人注目。結果 ,更難於明確地反映出光阻圖案上在成像曝光期間形成的 光罩圖案。因此,需要正型光阻組成物其解決那些問題並 且獲得良好的成形。 本發明之發明者進行了深入的硏究以發展出正型光阻 組成物其獲致良好成形者。結果,發明者發現一種正型光 阻劑,含有酸產生劑,例如N -羥基丁二醯亞胺之磺酸鹽 ,其在鹼性顯影劑中分解得到酸得到優良的成形,並且揭 示彼(JP — A— 1〇一2139〇5 ,SPIE 第 3333 卷,1280P -1287P,1998) 〇 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) III"„------I — I — (請先閱讀背面之注意事項再填寫本頁) 訂 經濟部智慧財產局員工消費合作社印製 -4- 1236576 A7 B7 五、發明説明(2) 進行進一步硏究之後,發明者發現在N -羥基丁二醯 亞胺之磺酸鹽當中含有指定組成物,亦即N -(正辛基磺 醯氧基)丁二醯亞胺,之正型光阻組成物將獲致尤其優良 的成形。由此,本發明得以完成。 發明總結 本發明提供一種正型光阻組成物,其包含鹼溶性酚醛 樹脂、醌二疊氮型對輻射感光劑及N -(正辛基磺醯氧基 )丁二醯亞胺。 適合體系之詳細說明 通常用作習知正型光阻劑鹼溶性成分之鹼溶性酚醛樹 脂也可以用作本發明中使用之鹼溶性酚醛樹脂。用於本發 明之鹼溶性酚醛樹脂通常可以藉著使酚化合物及醛在酸觸 媒存在之下反應製成。酚化合物之實施例包括苯酚、鄰-、間一或對一甲酚、2 ,3 —、2 ,5 —、3 ,4 —或 3 ,5 —二甲酚、2 ,3 ,5 —三甲酚、2 —、3 —或 4 — 叔丁酚、2 —叔丁基一 4 —或5 —甲酚、2 —、4 一或5 一甲基間苯二酚、2 —、3 —或4 —甲氧基苯酚、2 ,3 一、2 ,5 —或3 ,5 —二甲氧基苯酣、2 —甲氧基間苯 二酚、4 —叔丁基苯磷二酚、2 -、3 —或4 —乙基苯酚 、2,5_或3,5—二乙基苯酚、2,3,5—三乙基 苯酚、2 -萘酣、1 ,3 —、1,5 —或1 ,7 —二經基 萘及二甲酚及羥基苯甲醛之聚羥基三苯基甲烷型化合物。 本紙張尺度適用中國國家標準(CNS ) Α4規格(210Χ297公釐) I----^-----. I 裝-- (請先閱讀背面之注意事項再填寫本頁)
、1T 線 經濟部智慧財產局員工消費合作社印製 -5- 經濟部智慧財產局員工消費合作社印製 1236576 A7 B7 五、發明説明(3) 這些苯酚合成物可以單獨或合倂兩種或多種使用。 醛之實施例包括脂肪族醛類例如甲醛、乙醯醛、丙醯 醛、正丁醛、異丁醛、戊醯、正己醛、丙烯醛-及巴豆醛 ;脂環族化合物例如環己醛、環戊醛、糠醛及夫喃基丙烯 醛;芳香族醛類例如苯甲醛、鄰-、間-或對甲基苯甲醛 、對一乙基苯甲醛、2 ,4 一、2 ,5 —、3 ,4 —或3 ,5 —二甲基苯甲醛、鄰一、間一或對一羥基苯甲醛、鄰 -、間-或對-茴香醛及香草醛;以及芳香脂肪族醛類例 如苯基乙醯醛,及肉桂醛。這些醛類也可以單獨或合倂兩 種或多種使用。在彼當中,甲醛係適宜的因爲工業中容易 取得。 可用於縮合酚化合物及醛之酸觸媒之實施例包括無機 酸類例如氫氯酸、硫酸、過氯酸及磷酸;有機酸類例如甲 酸、乙酸、草酸、三氯醋酸及對-甲苯磺酸;二價金屬鹽 類例如醋酸鋅、氯化鋅及醋酸鎂。那些酸觸媒可以單獨或 合倂兩種或多種使用。縮合反應可以普通方式進行,舉例 來說,在6 0至1 2 0 °C時2至3 0小時。 縮合得到的酚醛樹脂宜進行分餾以增加高分子量成分 。以凝膠滲透層析法(G P C )圖形表示時,各成分之圖 案面積以分子量不高於1 〇 〇 〇者低於2 5%爲宜,更佳 的低於2 0 %,其係以未反應之酚化合物以外之總圖案面 積爲基準。在此,凝膠滲透層析法圖案使用2 5 4奈米紫 外線檢知器測量,而分子量則是以聚苯乙烯之分子量爲關 聯。 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) (請先閱讀背面之注意事項再填寫本頁)
-6 - 1236576 A7 B7 五、發明説明(4) 有用的是將低分子量鹼溶性苯酚合成物,舉例來說分 子量低於1 ’ 0 0 0,添加至酚醛樹脂其中高分子量成分 係增加者。這種鹼溶性低分子量苯酚合成、物宜含有兩個以 上酚羥基,如JP — A — 2 — 275955 (美國專利案 號5,456,995及美國專利案號 5 ,456 ,996)及 JP — A — 2 — 2560 中揭示 的。有時候會使用分子量低於1 ,〇 0 0之鹼溶性苯酚合 成物,希望以酚醛樹脂及鹼溶性苯酚合成物之總量爲基準 ’該化合物佔有3至4 0個重量百分比。 通常用於正型光阻劑方面之醌二疊氮型對輻射感光劑 可以用作本發明中使用之醌二疊氮型對輻射感光劑。通常 ,可以使用含一個或多個酚羥基之化合物的鄰一醌二氮磺 酸酯。適宜的係含有三個以上酚羥基之多羥基化合物之1 ,2 -萘醌二氮一 5 -或4 —磺酸酯或1 ,2 —苯醌二氮 - 4 -磺酸酯。這樣的酯類可以藉著使含有前述羥基與鄰 醌二氮磺酸鹵化物在鹼例如三乙胺存在時反應製成。在鄰 醌二氮磺酸鹵化物當中,1 ,2 -萘醌二氮一 5 —磺酸氯 尤其適合。這樣的偶氮型對輻射感光劑可以單獨或合倂兩 種或多種使用。適宜的是對輻射感光劑存在1 0至1 0 0 個重量百分比,更佳者1 0至5 0個重量百分比,其係以 酚醛樹脂及視需求使用之前述低分子量鹼溶性苯酚合成物 之總量爲基準。 本發明之正型光阻組成物除了上述的鹼溶性酚醛樹脂 及醌二氮型對輻射感光劑以外,還包含N -(正辛基磺醯 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) ^-- (請先閱讀背面之注意事項再填寫本頁) 、言 經濟部智慧財產局員工消費合作社印製
1236576 A7 A7 B7 五、發明説明(5) 氧基)丁二醯亞胺。這種化合物可以藉由N -羥基丁二醯 亞胺與正辛基硫醯氯在鹼性介質之下縮合製備。 N -(正辛基磺醯氧基)丁二醯亞胺之含量通常係 〇· 01至25個重量百分比,宜爲0 . 1至10個重量 百分比,其係以組成中總固體含量爲基準。 本發明之正型光阻組成物通常在基材例如矽晶圓上用 作光阻溶液。也就是說,上述各種成分係溶於溶劑中製成 光阻溶液而應用這個溶液。任何溶液都可以使用其將溶解 各種成分,具有適當的乾燥速率並且獲致均勻的及平滑的 塗覆。可以使用業界通常使用的溶劑。彼之實施例包括二 醇醚酯類例如醋酸乙基乙二醇乙醚酯、醋酸甲基乙二醇乙 醚酯、醋酸丙二醇一甲醚酯及醋酸丙二醇一乙醚酯;酯類 例如乳酸乙酯、醋酸丁酯、醋酸戊酯及丙酮酸乙酯;酮類 例如2 -庚酮及環己酮;以及環酯類例如γ —丁內酯。那些 溶劑可以單獨或合倂兩種或多種使用。還有,這種光阻溶 液可能包含小量添加物例如酚醛樹脂以外的樹脂及業界中 使用的染料。 用於基材上並且乾燥形成光阻膜之光阻溶液係透過光 罩用於成像曝光。這個成像曝光通常藉由短波長之可見光 至近紫外線例如波長爲4 3 6奈米之g射線及波長3 6 5 奈米之i射線來引發。接著成像曝光之後在鹼性顯影劑中 顯影。至於鹼性顯影劑,可以使用許多業界使用之鹼性溶 液。通常氫氧化四甲基銨及氫氧化(2-羥乙基)三甲基 銨(通常叫做膽鹼)係以水溶液形式使用。 本紙張尺度適用中國國家標準(CNS ) Α4規格(210Χ297公釐) --:-----. I 裝-- (請先閱讀背面之注意事項再填寫本頁) 、?τ 線 經濟部智慧財產局員工消費合作社印製 -8 - 1236576 經濟部智慧財產局員工消費合作社印製 A7 _____B7_ 五、發明説明(6) 現在本發明將藉由實施例更明確地加以說明,其不得 解釋爲本發明範圍之極限。在實施例中,份數意指重量百 分比。 以下的材料係用於實施例中:
(a )酚醛樹脂A 該樹脂以此方法製備:間一甲酚、對一甲酚及甲醛以 6 0/4 0/8 0之莫耳比以普通方法在草酸觸媒存在時 迴流反應。然後,反應產物進行分餾。由此獲得之酚醛樹 脂具有分子量以聚苯乙烯爲準大約8 0 0 0。在凝膠滲透 層析圖案中,以聚苯乙烯爲準分子量低於6 0 0 0成分面 積對未反應甲酚之圖案面積以外之總圖案面積之面積比係 3 4%而且以聚苯乙烯爲準分子量低於1 0 0 0成分面積 之面積比係1 5 %。
(b )酚醛樹脂B 該樹脂以此方法製備:間-甲酚、對一甲酚及甲醛以 4 0/6 0/8 0之莫耳比以普通方法在草酸觸媒存在時 迴流反應。然後,反應產物進行分餾。由此獲得之酚醛樹 脂具有分子量以聚苯乙烯爲準大約8 0 0 0。在凝膠滲透 層析圖案中,以聚苯乙烯爲準分子量低於6 0 0 0成分面 積對未反應甲酚之圖案面積以外之總圖案面積之面積比係 3 4%而且以聚苯乙烯爲準分子量低於1 〇 〇 〇成分面積 之面積比係1 5 %。 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) (請先閱讀背面之注意事項再填寫本頁)
-9 - 1236576 A7 B7五、發明説明(7) (C )醌二氮型感光劑
ChU
經濟部智慧財產局員工消費合作社印製 含展示於上結構式之縮合物係使用,其係藉著使2, 4,4 —三甲基一2’,4’,7 —三羥黃烷及1,2 —奈醒 二疊氮一5-磺酸氯以1:2·6之莫耳比反應製備。 (d )添加物 以下之化合物係使用: Cl : N -(正辛基磺醯氧基)丁二醯亞胺 C2 : N —(正己基磺醯氧基)丁二醯亞胺 C 3 : N —( 1 0 —樟腦磺醯氧基)丁二醯亞胺 C4:N-(十二烷基磺醯氧基)丁二醯亞胺 C5:4 —〔l,,2,,3,,4’,4,a,9,a—六 氫一6’一烴螺(環己烷—1 ,9,一氧雜蒽)一 4’a — i 1〕間苯二酚 那些添加物具有以下之結構式: (請先閲讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準(CNS > A4規格(210X 297公釐) -10- 1236576 A7 B7 五、發明説明(8)
N_〇wS〇2_C8Hl7
(C1) N-0 - 8〇2"·〇6Ηΐ3 〇 (C2) 0
Μ - OS〇2-CH2
〇 〇 (C3) 〇
^^0^5〇2-012Η25 Ο (C4)
OH
經濟部智慧財產局員工消費合作社印製 實施例1至3及比較實施例1至4 1 0份上述樹脂,酚醛樹脂Α及Β之比率表示於表1 中’ 3份上述之感光劑及添加物組成,彼之種類及用量表 示於表1中,與4 6份2 -庚酮混合。等混合物完全溶解 以後,溶液以0 · 2微米氟樹脂過濾器過濾製成光阻溶液 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) ---------—^------1T------0 (請先閱讀背面之注意事項再填寫本頁) -11 - 1236576 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明説明(9) 表1 編號 樹脂 添加物 實施例1 A/B = 85/15 Cl=0.1 份 C5 = 3.9 份 實施例2 A/B=85/15 Cl=0.2 份 C5 = 3.8 份 實施例3 A/B = 90/10 Cl=0.2 份 C5 = 3.8 份 比較實施例1 A/B = 85/15 C5二4.0 份 比較實施例2 A/B=85/15 C 1 = 0 · 2 份 C5 = 3.8 份 比較實施例3 A/B=85/15 Cl=0.2 份 C5 = 3.8 份 比較實施例4 A/B=85/15 C 1 = 0.2 份 C5 = 3.8 份 由此獲得之各種光阻溶液係旋轉塗佈於六甲塞二矽院 (Η M D S )處理過的矽晶圓上以致乾燥後之膜厚係 1 · 0 6 5微米。預烘烤在直接加熱板上在9 〇 °C時進行 6〇秒。由此形成含光阻膜之晶圓,藉著使用Nikon製造之 i 射線分節器” N S R — 2 0 0 5 i 9 C ”( N A = 〇· 57,σ=〇 · 60)改變逐步曝光量,以不同大小尺 寸之線條及空白圖案暴露於光線下。然後曝光後烘烤在 1 1 0°C下進行6 0秒,接著在重量2 · 3 8%氫氧化四 甲基銨之水溶液中攪打顯影6 0秒。評等結果展示於表2 中〇 有效靈敏度:以曝光量表示,其在丨· 0微米線條及 空白圖案中獲致截面積爲1:1。 本紙張尺度適财關家標準(〔叫八4規格(2跑297公釐)" (請先閲讀背面之注意事項再填寫本頁)
-12- 1236576 A7 五、發明説明(j 解析度··以有效靈敏度曝光量分割之線條及空白圖案 之最小線寬表示。 ( τ X B ) ••以1 · 0微米線條及空白圖案之頂 端(T )對底部(B )之大小尺寸的比率表示。較大的τ / B表示成形較好。 表2 編號 —--- 有效靈敏度 解析度(微米) T/B —秒) 實施例1 __55 0.50 0.75 實施例2 __65 0.475 0.89 實施例3 __55 0.50 0.78 比較實施例1 50 0.50 0.67 比較實施例2 55 0.50 0.71 比較實施例3 50 0.50 0.72 比較實施例4 75 0.475 0.71
It — -------丨裝II (請先閱讀背面之注意事項再填寫本頁)
、1T 經濟部智慧財產局員工消費合作社印製 根據本發明,可以改良成形而不需降低其他性質例如 靈敏度及解析度就。 本紙張尺度適用中國國家標準(CNS ) Α4規格(210Χ297公釐) -13-
Claims (1)
- A8 B8 C8 D8 1236576 ' ;· V 乂. v I V口乂. 六、申請毒利範圍 第90106462號專利申請案 中文申請專利範圍修正本 (請先閲讀背面之注意事項再填寫本頁) 民國93年8月19曰修正 1 · 一種正型光阻組成物,其包含鹼溶性酚醛樹脂、 醌二疊氮型對輻射感光劑及N -(正辛基磺醯氧基)丁二 醯亞胺。 2 ·如申請專利範圍第1項之正型光阻組成物,其中 N -(正辛基磺醯氧基)丁二醯亞胺之含量佔組成物總固 體含量之0 · 0 1至2 5重量百分比。 3 ·如申請專利範圍第1項之正型光阻組成物,其中 N -(正辛基磺醯氧基)丁二醯亞胺之含量佔組成物總固 體含量之0 . 1至10重量百分比。 4 ·如申請專利範圍第1項之正型光阻組成物,其中 以凝膠滲透層析(G P C )圖形表示時,分子量低於 1 0 0 0之鹼溶性酚醛樹脂各成分之圖案面積以未反應酚 醛化合物以外之鹼溶性酚醛樹脂之總圖案面積爲基準低於 經濟部智慧財產局員工消費合作社印製 2 5%。 5 ·如申請專利範圍第4項之正型光阻組成物,其還 含有3至4 0個重量百分比之分子量低於1 ,0 0 0之低 分子量鹼溶性苯酚化合物,其係以酚醛樹脂及低分子量鹼 溶性苯酚化合物之總量爲基準。 6 .如申請專利範圍第1項之正型光阻組成物,其中 對輻射感光劑存在1 0至1 0 0個重量百分比,其係以酚 衣紙張尺度適用中國國家標準(CNS ) A4規格(210 X 297公釐) 1236576 A8 B8 C8 D8 六、申請專利範圍 醛樹脂之用量爲基準。 7 ·如申5R專利範圍第5項之正型光阻組成物,其中 對輻射感光劑存在1 0至1 〇 〇個重量百分比,其係以酌 醛樹脂及低分子量鹼溶性苯酚化合物之總量爲基準。 8 ·如申請專利範圍第1項之正型光阻組成物,其中 對輸射感光劑存在1 0至5 0個重量百分比,其係以_酉荃 樹脂之用量爲基準。 9 ·如申請專利範圍第5項之正型光阻組成物,其中 對輻射感光劑存在1 0至5 0個重量百分比,其係以酣酵 樹脂及低分子量鹼溶性苯酣化合物之總量爲基準。 ^------ (請先閲讀背面之注意事項再填寫本頁) 訂 b.. 經濟部智慧財產局員工消費合作社印製 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) -2 -
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