JPS6443435A - Paper skew detecting device - Google Patents
Paper skew detecting deviceInfo
- Publication number
- JPS6443435A JPS6443435A JP62201323A JP20132387A JPS6443435A JP S6443435 A JPS6443435 A JP S6443435A JP 62201323 A JP62201323 A JP 62201323A JP 20132387 A JP20132387 A JP 20132387A JP S6443435 A JPS6443435 A JP S6443435A
- Authority
- JP
- Japan
- Prior art keywords
- paper
- turned
- sensor
- skew
- copy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Paper Feeding For Electrophotography (AREA)
- Controlling Sheets Or Webs (AREA)
Abstract
PURPOSE:To quickly detect a paper jam and to prevent damage of elements by providing skew detecting means adapted to detect skew of paper according to the operation order of plural paper detecting means. CONSTITUTION:When copy paper is transported, first a paper sensor PS1 is turned on and then a paper sensor PS2 is turned on. When the copy paper is further transported, the paper sensor PS1 is turned off and then the paper sensor PS2 is turned off. Thus, it is detected that the copy paper is normally transported. When a skew occurs, first the paper sensor PS1 is turned on, and then the paper sensor PS2 is turned on. After that, when the copy paper skews in the direction of the arrow, the paper sensor PS2 is turned off before the paper sensor PS1 is turned off. The skew of a copy paper is detected from the difference in the operation order to detect a paper jam.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62201323A JPS6443435A (en) | 1987-08-11 | 1987-08-11 | Paper skew detecting device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62201323A JPS6443435A (en) | 1987-08-11 | 1987-08-11 | Paper skew detecting device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6443435A true JPS6443435A (en) | 1989-02-15 |
Family
ID=16439105
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62201323A Pending JPS6443435A (en) | 1987-08-11 | 1987-08-11 | Paper skew detecting device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6443435A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5021676A (en) * | 1989-10-10 | 1991-06-04 | Unisys Corp. | Document-skew detection with photosensors |
US11691833B2 (en) | 2020-06-12 | 2023-07-04 | Ricoh Company, Ltd. | Sheet conveying device, image reading device incorporating the sheet conveying device, and image forming apparatus incorporating the sheet conveying device |
Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001264968A (en) * | 2000-03-23 | 2001-09-28 | Sumitomo Chem Co Ltd | Positive type resist composition |
JP2005097331A (en) * | 2003-09-22 | 2005-04-14 | Sumitomo Bakelite Co Ltd | Production method of phenol resin for photoresist, and photoresist composition |
JP2005107131A (en) * | 2003-09-30 | 2005-04-21 | Tokyo Ohka Kogyo Co Ltd | Positive photoresist composition |
JP2006072080A (en) * | 2004-09-03 | 2006-03-16 | Tokyo Ohka Kogyo Co Ltd | Method for forming resist pattern and method for forming fine pattern using same and method for manufacturing liquid crystal display element |
JP2006133585A (en) * | 2004-11-08 | 2006-05-25 | Nippon Zeon Co Ltd | Radiation-sensitive resin composition and method of forming radiation-sensitive resin pattern |
JP2006215538A (en) * | 2005-02-03 | 2006-08-17 | Samsung Electronics Co Ltd | Photoresist composition, pattern forming method using the same and method for manufacturing thin film transistor display panel |
JP2009031349A (en) * | 2007-07-24 | 2009-02-12 | Tokyo Ohka Kogyo Co Ltd | Positive-type photoresist composition for manufacturing liquid crystal element and resist pattern-forming method |
JP2009163174A (en) * | 2008-01-10 | 2009-07-23 | Sumitomo Chemical Co Ltd | Non-chemically amplified positive resist composition |
JP2014164303A (en) * | 2013-02-22 | 2014-09-08 | Chi Mei Corp | Positive photosensitive resin composition and method for forming pattern by using the same |
-
1987
- 1987-08-11 JP JP62201323A patent/JPS6443435A/en active Pending
Patent Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001264968A (en) * | 2000-03-23 | 2001-09-28 | Sumitomo Chem Co Ltd | Positive type resist composition |
JP2005097331A (en) * | 2003-09-22 | 2005-04-14 | Sumitomo Bakelite Co Ltd | Production method of phenol resin for photoresist, and photoresist composition |
JP2005107131A (en) * | 2003-09-30 | 2005-04-21 | Tokyo Ohka Kogyo Co Ltd | Positive photoresist composition |
JP2006072080A (en) * | 2004-09-03 | 2006-03-16 | Tokyo Ohka Kogyo Co Ltd | Method for forming resist pattern and method for forming fine pattern using same and method for manufacturing liquid crystal display element |
JP2006133585A (en) * | 2004-11-08 | 2006-05-25 | Nippon Zeon Co Ltd | Radiation-sensitive resin composition and method of forming radiation-sensitive resin pattern |
JP2006215538A (en) * | 2005-02-03 | 2006-08-17 | Samsung Electronics Co Ltd | Photoresist composition, pattern forming method using the same and method for manufacturing thin film transistor display panel |
US20060188808A1 (en) * | 2005-02-03 | 2006-08-24 | Jeong-Min Park | Photoresist composition, method for forming film pattern using the same, and method for manufacturing thin film transistor array panel using the same |
JP2009031349A (en) * | 2007-07-24 | 2009-02-12 | Tokyo Ohka Kogyo Co Ltd | Positive-type photoresist composition for manufacturing liquid crystal element and resist pattern-forming method |
JP2009163174A (en) * | 2008-01-10 | 2009-07-23 | Sumitomo Chemical Co Ltd | Non-chemically amplified positive resist composition |
JP2014164303A (en) * | 2013-02-22 | 2014-09-08 | Chi Mei Corp | Positive photosensitive resin composition and method for forming pattern by using the same |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5021676A (en) * | 1989-10-10 | 1991-06-04 | Unisys Corp. | Document-skew detection with photosensors |
US11691833B2 (en) | 2020-06-12 | 2023-07-04 | Ricoh Company, Ltd. | Sheet conveying device, image reading device incorporating the sheet conveying device, and image forming apparatus incorporating the sheet conveying device |
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