JPS6443435A - Paper skew detecting device - Google Patents

Paper skew detecting device

Info

Publication number
JPS6443435A
JPS6443435A JP62201323A JP20132387A JPS6443435A JP S6443435 A JPS6443435 A JP S6443435A JP 62201323 A JP62201323 A JP 62201323A JP 20132387 A JP20132387 A JP 20132387A JP S6443435 A JPS6443435 A JP S6443435A
Authority
JP
Japan
Prior art keywords
paper
turned
sensor
skew
copy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62201323A
Other languages
Japanese (ja)
Inventor
Yoshiaki Takano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Minolta Co Ltd
Original Assignee
Minolta Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minolta Co Ltd filed Critical Minolta Co Ltd
Priority to JP62201323A priority Critical patent/JPS6443435A/en
Publication of JPS6443435A publication Critical patent/JPS6443435A/en
Pending legal-status Critical Current

Links

Landscapes

  • Paper Feeding For Electrophotography (AREA)
  • Controlling Sheets Or Webs (AREA)

Abstract

PURPOSE:To quickly detect a paper jam and to prevent damage of elements by providing skew detecting means adapted to detect skew of paper according to the operation order of plural paper detecting means. CONSTITUTION:When copy paper is transported, first a paper sensor PS1 is turned on and then a paper sensor PS2 is turned on. When the copy paper is further transported, the paper sensor PS1 is turned off and then the paper sensor PS2 is turned off. Thus, it is detected that the copy paper is normally transported. When a skew occurs, first the paper sensor PS1 is turned on, and then the paper sensor PS2 is turned on. After that, when the copy paper skews in the direction of the arrow, the paper sensor PS2 is turned off before the paper sensor PS1 is turned off. The skew of a copy paper is detected from the difference in the operation order to detect a paper jam.
JP62201323A 1987-08-11 1987-08-11 Paper skew detecting device Pending JPS6443435A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62201323A JPS6443435A (en) 1987-08-11 1987-08-11 Paper skew detecting device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62201323A JPS6443435A (en) 1987-08-11 1987-08-11 Paper skew detecting device

Publications (1)

Publication Number Publication Date
JPS6443435A true JPS6443435A (en) 1989-02-15

Family

ID=16439105

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62201323A Pending JPS6443435A (en) 1987-08-11 1987-08-11 Paper skew detecting device

Country Status (1)

Country Link
JP (1) JPS6443435A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5021676A (en) * 1989-10-10 1991-06-04 Unisys Corp. Document-skew detection with photosensors
US11691833B2 (en) 2020-06-12 2023-07-04 Ricoh Company, Ltd. Sheet conveying device, image reading device incorporating the sheet conveying device, and image forming apparatus incorporating the sheet conveying device

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001264968A (en) * 2000-03-23 2001-09-28 Sumitomo Chem Co Ltd Positive type resist composition
JP2005097331A (en) * 2003-09-22 2005-04-14 Sumitomo Bakelite Co Ltd Production method of phenol resin for photoresist, and photoresist composition
JP2005107131A (en) * 2003-09-30 2005-04-21 Tokyo Ohka Kogyo Co Ltd Positive photoresist composition
JP2006072080A (en) * 2004-09-03 2006-03-16 Tokyo Ohka Kogyo Co Ltd Method for forming resist pattern and method for forming fine pattern using same and method for manufacturing liquid crystal display element
JP2006133585A (en) * 2004-11-08 2006-05-25 Nippon Zeon Co Ltd Radiation-sensitive resin composition and method of forming radiation-sensitive resin pattern
JP2006215538A (en) * 2005-02-03 2006-08-17 Samsung Electronics Co Ltd Photoresist composition, pattern forming method using the same and method for manufacturing thin film transistor display panel
JP2009031349A (en) * 2007-07-24 2009-02-12 Tokyo Ohka Kogyo Co Ltd Positive-type photoresist composition for manufacturing liquid crystal element and resist pattern-forming method
JP2009163174A (en) * 2008-01-10 2009-07-23 Sumitomo Chemical Co Ltd Non-chemically amplified positive resist composition
JP2014164303A (en) * 2013-02-22 2014-09-08 Chi Mei Corp Positive photosensitive resin composition and method for forming pattern by using the same

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001264968A (en) * 2000-03-23 2001-09-28 Sumitomo Chem Co Ltd Positive type resist composition
JP2005097331A (en) * 2003-09-22 2005-04-14 Sumitomo Bakelite Co Ltd Production method of phenol resin for photoresist, and photoresist composition
JP2005107131A (en) * 2003-09-30 2005-04-21 Tokyo Ohka Kogyo Co Ltd Positive photoresist composition
JP2006072080A (en) * 2004-09-03 2006-03-16 Tokyo Ohka Kogyo Co Ltd Method for forming resist pattern and method for forming fine pattern using same and method for manufacturing liquid crystal display element
JP2006133585A (en) * 2004-11-08 2006-05-25 Nippon Zeon Co Ltd Radiation-sensitive resin composition and method of forming radiation-sensitive resin pattern
JP2006215538A (en) * 2005-02-03 2006-08-17 Samsung Electronics Co Ltd Photoresist composition, pattern forming method using the same and method for manufacturing thin film transistor display panel
US20060188808A1 (en) * 2005-02-03 2006-08-24 Jeong-Min Park Photoresist composition, method for forming film pattern using the same, and method for manufacturing thin film transistor array panel using the same
JP2009031349A (en) * 2007-07-24 2009-02-12 Tokyo Ohka Kogyo Co Ltd Positive-type photoresist composition for manufacturing liquid crystal element and resist pattern-forming method
JP2009163174A (en) * 2008-01-10 2009-07-23 Sumitomo Chemical Co Ltd Non-chemically amplified positive resist composition
JP2014164303A (en) * 2013-02-22 2014-09-08 Chi Mei Corp Positive photosensitive resin composition and method for forming pattern by using the same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5021676A (en) * 1989-10-10 1991-06-04 Unisys Corp. Document-skew detection with photosensors
US11691833B2 (en) 2020-06-12 2023-07-04 Ricoh Company, Ltd. Sheet conveying device, image reading device incorporating the sheet conveying device, and image forming apparatus incorporating the sheet conveying device

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