TWI225109B - Halogen resistant copper corrosion inhibitors - Google Patents
Halogen resistant copper corrosion inhibitors Download PDFInfo
- Publication number
- TWI225109B TWI225109B TW089106747A TW89106747A TWI225109B TW I225109 B TWI225109 B TW I225109B TW 089106747 A TW089106747 A TW 089106747A TW 89106747 A TW89106747 A TW 89106747A TW I225109 B TWI225109 B TW I225109B
- Authority
- TW
- Taiwan
- Prior art keywords
- aqueous system
- benzotriazole
- ppm
- halogen
- corrosion
- Prior art date
Links
- 230000007797 corrosion Effects 0.000 title claims abstract description 46
- 238000005260 corrosion Methods 0.000 title claims abstract description 46
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title claims abstract description 31
- 239000010949 copper Substances 0.000 title claims abstract description 29
- 229910052802 copper Inorganic materials 0.000 title claims abstract description 27
- 239000003112 inhibitor Substances 0.000 title claims abstract description 22
- 229910052736 halogen Inorganic materials 0.000 title claims abstract description 19
- 150000002367 halogens Chemical class 0.000 title claims abstract description 16
- 230000003115 biocidal effect Effects 0.000 claims abstract description 3
- 239000003139 biocide Substances 0.000 claims abstract 3
- 239000012964 benzotriazole Substances 0.000 claims description 17
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 13
- 238000000034 method Methods 0.000 claims description 11
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 10
- 239000000460 chlorine Substances 0.000 claims description 10
- 229910052801 chlorine Inorganic materials 0.000 claims description 10
- 238000011282 treatment Methods 0.000 claims description 9
- 230000001590 oxidative effect Effects 0.000 claims description 4
- BAXOFTOLAUCFNW-UHFFFAOYSA-N 1H-indazole Chemical class C1=CC=C2C=NNC2=C1 BAXOFTOLAUCFNW-UHFFFAOYSA-N 0.000 claims description 2
- BVNWQSXXRMNYKH-UHFFFAOYSA-N 4-phenyl-2h-benzotriazole Chemical compound C1=CC=CC=C1C1=CC=CC2=C1NN=N2 BVNWQSXXRMNYKH-UHFFFAOYSA-N 0.000 claims description 2
- MVPKIPGHRNIOPT-UHFFFAOYSA-N 5,6-dimethyl-2h-benzotriazole Chemical compound C1=C(C)C(C)=CC2=NNN=C21 MVPKIPGHRNIOPT-UHFFFAOYSA-N 0.000 claims description 2
- YBTQBKBKYFBJQE-UHFFFAOYSA-N 5,6-diphenyl-2h-benzotriazole Chemical compound C1=CC=CC=C1C1=CC2=NNN=C2C=C1C1=CC=CC=C1 YBTQBKBKYFBJQE-UHFFFAOYSA-N 0.000 claims description 2
- WAUXOAXWCWZMSV-UHFFFAOYSA-N C(C1=CC=CC=C1)=C1C=C2C(=NN=N2)C=C1 Chemical compound C(C1=CC=CC=C1)=C1C=C2C(=NN=N2)C=C1 WAUXOAXWCWZMSV-UHFFFAOYSA-N 0.000 claims description 2
- 241000238631 Hexapoda Species 0.000 claims 1
- BJFLSHMHTPAZHO-UHFFFAOYSA-N benzotriazole Chemical compound [CH]1C=CC=C2N=NN=C21 BJFLSHMHTPAZHO-UHFFFAOYSA-N 0.000 claims 1
- 230000001747 exhibiting effect Effects 0.000 claims 1
- CMGDVUCDZOBDNL-UHFFFAOYSA-N 4-methyl-2h-benzotriazole Chemical compound CC1=CC=CC2=NNN=C12 CMGDVUCDZOBDNL-UHFFFAOYSA-N 0.000 abstract description 13
- 230000005764 inhibitory process Effects 0.000 abstract description 6
- 239000000463 material Substances 0.000 abstract description 6
- 150000001491 aromatic compounds Chemical class 0.000 abstract 1
- 230000001627 detrimental effect Effects 0.000 abstract 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 abstract 1
- 238000012360 testing method Methods 0.000 description 19
- -1 Triazole compounds Chemical class 0.000 description 18
- 239000007789 gas Substances 0.000 description 15
- 239000000126 substance Substances 0.000 description 13
- 239000000523 sample Substances 0.000 description 10
- KAESVJOAVNADME-UHFFFAOYSA-N 1H-pyrrole Natural products C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 8
- 229910000831 Steel Inorganic materials 0.000 description 6
- 230000002079 cooperative effect Effects 0.000 description 6
- 239000010408 film Substances 0.000 description 6
- 239000010959 steel Substances 0.000 description 6
- 229910001209 Low-carbon steel Inorganic materials 0.000 description 5
- 150000003851 azoles Chemical class 0.000 description 5
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 5
- 238000005660 chlorination reaction Methods 0.000 description 5
- 230000001681 protective effect Effects 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 description 4
- 150000001565 benzotriazoles Chemical class 0.000 description 4
- 229910001431 copper ion Inorganic materials 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000007844 bleaching agent Substances 0.000 description 3
- 210000004268 dentin Anatomy 0.000 description 3
- WQYVRQLZKVEZGA-UHFFFAOYSA-N hypochlorite Chemical compound Cl[O-] WQYVRQLZKVEZGA-UHFFFAOYSA-N 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 2
- HIXDQWDOVZUNNA-UHFFFAOYSA-N 2-(3,4-dimethoxyphenyl)-5-hydroxy-7-methoxychromen-4-one Chemical compound C=1C(OC)=CC(O)=C(C(C=2)=O)C=1OC=2C1=CC=C(OC)C(OC)=C1 HIXDQWDOVZUNNA-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- MVBFGVVZJTXZGS-UHFFFAOYSA-N 4,7-dimethyl-2h-benzotriazole Chemical compound CC1=CC=C(C)C2=NNN=C12 MVBFGVVZJTXZGS-UHFFFAOYSA-N 0.000 description 2
- ONSDAFNHEQAJES-UHFFFAOYSA-N 5-benzyl-2h-benzotriazole Chemical compound C1=CC2=NNN=C2C=C1CC1=CC=CC=C1 ONSDAFNHEQAJES-UHFFFAOYSA-N 0.000 description 2
- WXSBVEKBZGNSDY-UHFFFAOYSA-N 5-phenyl-2h-benzotriazole Chemical compound C1=CC=CC=C1C1=CC2=NNN=C2C=C1 WXSBVEKBZGNSDY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229910000881 Cu alloy Inorganic materials 0.000 description 2
- 229910000640 Fe alloy Inorganic materials 0.000 description 2
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- UHOVQNZJYSORNB-UHFFFAOYSA-N benzene Substances C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 239000000498 cooling water Substances 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- 230000002401 inhibitory effect Effects 0.000 description 2
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 230000001629 suppression Effects 0.000 description 2
- 238000010998 test method Methods 0.000 description 2
- 239000012085 test solution Substances 0.000 description 2
- 150000003852 triazoles Chemical class 0.000 description 2
- BCMCBBGGLRIHSE-UHFFFAOYSA-N 1,3-benzoxazole Chemical class C1=CC=C2OC=NC2=C1 BCMCBBGGLRIHSE-UHFFFAOYSA-N 0.000 description 1
- HYZJCKYKOHLVJF-UHFFFAOYSA-N 1H-benzimidazole Chemical class C1=CC=C2NC=NC2=C1 HYZJCKYKOHLVJF-UHFFFAOYSA-N 0.000 description 1
- CJRPBMIZIBLPDX-UHFFFAOYSA-N 1h-imidazole;1h-indazole Chemical compound C1=CNC=N1.C1=CC=C2C=NNC2=C1 CJRPBMIZIBLPDX-UHFFFAOYSA-N 0.000 description 1
- NGCHZYDKACGPOL-UHFFFAOYSA-N 2-butyl-5,6-dichloro-1h-benzimidazole Chemical compound ClC1=C(Cl)C=C2NC(CCCC)=NC2=C1 NGCHZYDKACGPOL-UHFFFAOYSA-N 0.000 description 1
- JIQLFCSJXKTQKP-UHFFFAOYSA-N 2-butyl-5,6-dimethyl-1h-benzimidazole Chemical compound CC1=C(C)C=C2NC(CCCC)=NC2=C1 JIQLFCSJXKTQKP-UHFFFAOYSA-N 0.000 description 1
- GUOVBFFLXKJFEE-UHFFFAOYSA-N 2h-benzotriazole-5-carboxylic acid Chemical compound C1=C(C(=O)O)C=CC2=NNN=C21 GUOVBFFLXKJFEE-UHFFFAOYSA-N 0.000 description 1
- KCFBHIDNNPREJW-UHFFFAOYSA-N 4,5,6,7-tetramethyl-2h-benzotriazole Chemical compound CC1=C(C)C(C)=C2NN=NC2=C1C KCFBHIDNNPREJW-UHFFFAOYSA-N 0.000 description 1
- LUEYUHCBBXWTQT-UHFFFAOYSA-N 4-phenyl-2h-triazole Chemical compound C1=NNN=C1C1=CC=CC=C1 LUEYUHCBBXWTQT-UHFFFAOYSA-N 0.000 description 1
- JDTHZFVETHQPLL-UHFFFAOYSA-N 5-(2-methylphenyl)-2H-benzotriazole Chemical compound CC1=C(C=CC=C1)C1=CC2=C(NN=N2)C=C1 JDTHZFVETHQPLL-UHFFFAOYSA-N 0.000 description 1
- YZTYEGCWRPJWEE-UHFFFAOYSA-N 5-(benzotriazol-2-yl)pentan-1-amine Chemical compound C1=CC=CC2=NN(CCCCCN)N=C21 YZTYEGCWRPJWEE-UHFFFAOYSA-N 0.000 description 1
- AOCDQWRMYHJTMY-UHFFFAOYSA-N 5-nitro-2h-benzotriazole Chemical compound C1=C([N+](=O)[O-])C=CC2=NNN=C21 AOCDQWRMYHJTMY-UHFFFAOYSA-N 0.000 description 1
- NSHXHFHCNCMMLJ-UHFFFAOYSA-N 6-methyl-5h-[1,3]dioxolo[4,5-f]benzimidazole Chemical compound C1=C2NC(C)=NC2=CC2=C1OCO2 NSHXHFHCNCMMLJ-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 206010021703 Indifference Diseases 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical group [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- JVTAAEKCZFNVCJ-UHFFFAOYSA-M Lactate Chemical compound CC(O)C([O-])=O JVTAAEKCZFNVCJ-UHFFFAOYSA-M 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- GJGAAOVWYXERBS-UHFFFAOYSA-N N1N=NC2=C1C=CC=C2.C2(=CC=CC=C2)S Chemical compound N1N=NC2=C1C=CC=C2.C2(=CC=CC=C2)S GJGAAOVWYXERBS-UHFFFAOYSA-N 0.000 description 1
- 229910019093 NaOCl Inorganic materials 0.000 description 1
- 229920005372 Plexiglas® Polymers 0.000 description 1
- 229910052778 Plutonium Inorganic materials 0.000 description 1
- 229920000388 Polyphosphate Polymers 0.000 description 1
- 239000013543 active substance Substances 0.000 description 1
- 125000000746 allylic group Chemical group 0.000 description 1
- PMLUEBXXHBVGNR-UHFFFAOYSA-N benzene 2H-benzotriazole Chemical compound C1=CC=CC=C1.N1N=NC2=C1C=CC=C2 PMLUEBXXHBVGNR-UHFFFAOYSA-N 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- 238000004061 bleaching Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000003776 cleavage reaction Methods 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 230000002939 deleterious effect Effects 0.000 description 1
- 208000002925 dental caries Diseases 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 238000006056 electrooxidation reaction Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000002309 gasification Methods 0.000 description 1
- 239000003630 growth substance Substances 0.000 description 1
- 230000026030 halogenation Effects 0.000 description 1
- 238000005658 halogenation reaction Methods 0.000 description 1
- 229910000856 hastalloy Inorganic materials 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000001183 hydrocarbyl group Chemical group 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 150000002466 imines Chemical class 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000005272 metallurgy Methods 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 230000000813 microbial effect Effects 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 239000008267 milk Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 150000002927 oxygen compounds Chemical class 0.000 description 1
- 239000003002 pH adjusting agent Substances 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- OYEHPCDNVJXUIW-UHFFFAOYSA-N plutonium atom Chemical compound [Pu] OYEHPCDNVJXUIW-UHFFFAOYSA-N 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000001205 polyphosphate Substances 0.000 description 1
- 235000011176 polyphosphates Nutrition 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 238000000197 pyrolysis Methods 0.000 description 1
- 230000003134 recirculating effect Effects 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 230000007017 scission Effects 0.000 description 1
- SUKJFIGYRHOWBL-UHFFFAOYSA-N sodium hypochlorite Chemical compound [Na+].Cl[O-] SUKJFIGYRHOWBL-UHFFFAOYSA-N 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
- C23G5/02—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents
- C23G5/028—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents containing halogenated hydrocarbons
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K15/00—Anti-oxidant compositions; Compositions inhibiting chemical change
- C09K15/04—Anti-oxidant compositions; Compositions inhibiting chemical change containing organic compounds
- C09K15/20—Anti-oxidant compositions; Compositions inhibiting chemical change containing organic compounds containing nitrogen and oxygen
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F11/00—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent
- C23F11/08—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids
- C23F11/10—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids using organic inhibitors
- C23F11/14—Nitrogen-containing compounds
- C23F11/149—Heterocyclic compounds containing nitrogen as hetero atom
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Preventing Corrosion Or Incrustation Of Metals (AREA)
- Pyridine Compounds (AREA)
- Agricultural Chemicals And Associated Chemicals (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/291,154 US6103144A (en) | 1999-04-12 | 1999-04-12 | Halogen resistant copper corrosion inhibitors |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TWI225109B true TWI225109B (en) | 2004-12-11 |
Family
ID=23119094
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW089106747A TWI225109B (en) | 1999-04-12 | 2000-04-11 | Halogen resistant copper corrosion inhibitors |
Country Status (20)
| Country | Link |
|---|---|
| US (2) | US6103144A (https=) |
| EP (1) | EP1190112B1 (https=) |
| JP (1) | JP2002541333A (https=) |
| KR (1) | KR100693259B1 (https=) |
| CN (1) | CN1238561C (https=) |
| AT (1) | ATE252166T1 (https=) |
| AU (1) | AU769757B2 (https=) |
| BR (1) | BR0009705A (https=) |
| CA (1) | CA2365993C (https=) |
| CZ (1) | CZ20013679A3 (https=) |
| DE (1) | DE60005954T2 (https=) |
| HK (1) | HK1046539B (https=) |
| HU (1) | HUP0200533A3 (https=) |
| MY (1) | MY123897A (https=) |
| NO (1) | NO20014940D0 (https=) |
| NZ (1) | NZ514273A (https=) |
| PL (1) | PL350547A1 (https=) |
| TW (1) | TWI225109B (https=) |
| WO (1) | WO2000061836A1 (https=) |
| ZA (1) | ZA200109313B (https=) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6432320B1 (en) | 1998-11-02 | 2002-08-13 | Patrick Bonsignore | Refrigerant and heat transfer fluid additive |
| US7106167B2 (en) * | 2002-06-28 | 2006-09-12 | Heetronix | Stable high temperature sensor system with tungsten on AlN |
| US7708939B2 (en) * | 2007-04-24 | 2010-05-04 | Water Conservation Technology International, Inc. | Cooling water corrosion inhibition method |
| US20100163469A1 (en) * | 2008-12-26 | 2010-07-01 | Zhaoyang Wan | Control system for monitoring localized corrosion in an industrial water system |
| IN2013CH06133A (https=) | 2013-12-27 | 2015-07-03 | Dow Global Technologies Llc | |
| IN2013CH06132A (https=) | 2013-12-27 | 2015-07-03 | Dow Global Technologies Llc | |
| CN104805446A (zh) * | 2015-03-26 | 2015-07-29 | 威海翔宇环保科技股份有限公司 | 一种用于循环水的耐卤素铜缓蚀剂及其制备方法 |
| AU2016267611B2 (en) | 2015-05-28 | 2021-12-09 | Ecolab Usa Inc. | Water-soluble pyrazole derivatives as corrosion inhibitors |
| EP3314038B1 (en) | 2015-05-28 | 2021-12-29 | Ecolab Usa Inc. | Purine-based corrosion inhibitors |
| CA2987248C (en) | 2015-05-28 | 2023-09-26 | Ecolab Usa Inc. | Novel corrosion inhibitors |
| JP6898255B2 (ja) | 2015-05-28 | 2021-07-07 | エコラボ ユーエスエー インコーポレイティド | ２−置換イミダゾール及びベンズイミダゾール腐食抑制剤 |
| JP7026672B2 (ja) * | 2016-07-29 | 2022-02-28 | エコラブ ユーエスエイ インク | 腐食軽減のためのベンゾトリアゾールおよびトリルトリアゾール誘導体 |
| KR102650589B1 (ko) * | 2018-01-03 | 2024-03-21 | 에코랍 유에스에이 인코퍼레이티드 | 물에서의 금속 부식을 감소시키기 위한 공정 및 방법 |
| EP4397631A3 (en) | 2018-03-08 | 2024-12-04 | BL TECHNOLOGIES, Inc. | Methods to reduce n-heterocycles |
| CN117737727A (zh) * | 2023-11-20 | 2024-03-22 | 上海电力大学 | 一种通过电化学介导的原子转移自由基聚合在铜表面原位引发制备三唑缓蚀聚合膜的方法 |
Family Cites Families (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| IT586326A (https=) * | 1957-01-10 | |||
| FR1538431A (fr) * | 1965-03-11 | 1968-09-06 | Dow Chemical Co | Composition de nettoyage à sec non corrosive |
| DE1948794A1 (de) * | 1969-09-26 | 1971-04-01 | Rhein Chemie Rheinau Gmbh | 4,5,6,7-Tetrahydrobenzotriazole,Verfahren zu ihrer Herstellung und ihre Verwendung als Korrosionsinhibitoren |
| JPS498779B1 (https=) * | 1970-04-08 | 1974-02-28 | ||
| GB1347008A (en) * | 1970-11-13 | 1974-02-13 | Ciba Geigy Uk Ltd | Detergent compositions |
| US4107060A (en) * | 1975-06-17 | 1978-08-15 | Mobil Oil Corporation | Lubricant compositions containing biocidal, antirust additives |
| JPS5318432A (en) * | 1976-08-03 | 1978-02-20 | Nippon Musical Instruments Mfg | Degreasing and cleaning solution |
| SU698982A1 (ru) * | 1977-01-03 | 1979-11-25 | Ордена Ленина Институт Элементоорганических Соединений Ан Ссср | Способ разделени изомеров -бензил-1,2,3-триазола или изомеров -метил-(аллил)-или(бензил)бензотриазолов |
| US4184991A (en) * | 1978-03-13 | 1980-01-22 | Zimmite Corporation | Corrosion inhibiting composition for ferrous metals and method of treating with same |
| US4642221A (en) * | 1983-07-05 | 1987-02-10 | Atlantic Richfield Company | Method and composition for inhibiting corrosion in aqueous heat transfer systems |
| US4744950A (en) * | 1984-06-26 | 1988-05-17 | Betz Laboratories, Inc. | Method of inhibiting the corrosion of copper in aqueous mediums |
| NZ233492A (en) * | 1989-05-08 | 1992-08-26 | Calgon Corp | Corrosion inhibitors containing alkylbenzotriazoles |
| JPH0465184A (ja) * | 1990-07-05 | 1992-03-02 | Kansai Paint Co Ltd | 電着前処理方法 |
| US5217686A (en) * | 1990-09-24 | 1993-06-08 | Calgon Corporation | Alkoxybenzotriazole compositions and the use thereof as copper and copper alloy corrosion inhibitors |
| US5141675A (en) * | 1990-10-15 | 1992-08-25 | Calgon Corporation | Novel polyphosphate/azole compositions and the use thereof as copper and copper alloy corrosion inhibitors |
| JP2550436B2 (ja) * | 1990-10-23 | 1996-11-06 | 株式会社ジャパンエナジー | 銅の変色防止液 |
| US5403672A (en) * | 1992-08-17 | 1995-04-04 | Hitachi Chemical Co., Ltd. | Metal foil for printed wiring board and production thereof |
| US5411677A (en) * | 1993-04-26 | 1995-05-02 | The Penn State Research Foundation | Method and composition for preventing copper corrosion |
| JP2550436Y2 (ja) * | 1995-02-08 | 1997-10-15 | 富士重工業株式会社 | エンジンの冷却装置 |
| MY129257A (en) * | 1995-03-21 | 2007-03-30 | Betz Laboratories | Methods of inhibiting corrosion using halo-benzotriazoles |
| US5773627A (en) * | 1995-03-21 | 1998-06-30 | Betzdearborn Inc. | Methods of inhibiting corrosion using halo-benzotriazoles |
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1999
- 1999-04-12 US US09/291,154 patent/US6103144A/en not_active Expired - Lifetime
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2000
- 2000-04-10 AT AT00923213T patent/ATE252166T1/de not_active IP Right Cessation
- 2000-04-10 WO PCT/US2000/009545 patent/WO2000061836A1/en not_active Ceased
- 2000-04-10 PL PL00350547A patent/PL350547A1/xx unknown
- 2000-04-10 CA CA002365993A patent/CA2365993C/en not_active Expired - Fee Related
- 2000-04-10 HU HU0200533A patent/HUP0200533A3/hu unknown
- 2000-04-10 CZ CZ20013679A patent/CZ20013679A3/cs unknown
- 2000-04-10 JP JP2000610881A patent/JP2002541333A/ja active Pending
- 2000-04-10 KR KR1020017012945A patent/KR100693259B1/ko not_active Expired - Fee Related
- 2000-04-10 HK HK02107932.4A patent/HK1046539B/zh not_active IP Right Cessation
- 2000-04-10 DE DE60005954T patent/DE60005954T2/de not_active Expired - Lifetime
- 2000-04-10 AU AU43377/00A patent/AU769757B2/en not_active Ceased
- 2000-04-10 CN CNB008061807A patent/CN1238561C/zh not_active Expired - Fee Related
- 2000-04-10 NZ NZ514273A patent/NZ514273A/en unknown
- 2000-04-10 BR BR0009705-5A patent/BR0009705A/pt not_active Application Discontinuation
- 2000-04-10 EP EP00923213A patent/EP1190112B1/en not_active Expired - Lifetime
- 2000-04-11 MY MYPI20001527A patent/MY123897A/en unknown
- 2000-04-11 TW TW089106747A patent/TWI225109B/zh not_active IP Right Cessation
- 2000-05-05 US US09/565,397 patent/US6464901B1/en not_active Expired - Fee Related
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- 2001-10-10 NO NO20014940A patent/NO20014940D0/no not_active Application Discontinuation
- 2001-11-12 ZA ZA200109313A patent/ZA200109313B/xx unknown
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| Publication number | Publication date |
|---|---|
| PL350547A1 (en) | 2002-12-16 |
| HUP0200533A2 (en) | 2002-06-29 |
| MY123897A (en) | 2006-06-30 |
| AU4337700A (en) | 2000-11-14 |
| US6464901B1 (en) | 2002-10-15 |
| EP1190112A1 (en) | 2002-03-27 |
| KR20010111505A (ko) | 2001-12-19 |
| CA2365993A1 (en) | 2000-10-19 |
| DE60005954D1 (de) | 2003-11-20 |
| CN1347465A (zh) | 2002-05-01 |
| NZ514273A (en) | 2003-10-31 |
| HK1046539B (zh) | 2006-08-25 |
| US6103144A (en) | 2000-08-15 |
| BR0009705A (pt) | 2002-01-08 |
| CN1238561C (zh) | 2006-01-25 |
| HK1046539A1 (en) | 2003-01-17 |
| HUP0200533A3 (en) | 2003-08-28 |
| WO2000061836A1 (en) | 2000-10-19 |
| ATE252166T1 (de) | 2003-11-15 |
| NO20014940L (no) | 2001-10-10 |
| CZ20013679A3 (cs) | 2002-07-17 |
| DE60005954T2 (de) | 2004-07-29 |
| CA2365993C (en) | 2007-07-10 |
| JP2002541333A (ja) | 2002-12-03 |
| AU769757B2 (en) | 2004-02-05 |
| ZA200109313B (en) | 2003-02-12 |
| KR100693259B1 (ko) | 2007-03-13 |
| NO20014940D0 (no) | 2001-10-10 |
| EP1190112B1 (en) | 2003-10-15 |
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