TWI223345B - Method and apparatus for cleaning semiconductor wafers and other flat media - Google Patents

Method and apparatus for cleaning semiconductor wafers and other flat media Download PDF

Info

Publication number
TWI223345B
TWI223345B TW091115539A TW91115539A TWI223345B TW I223345 B TWI223345 B TW I223345B TW 091115539 A TW091115539 A TW 091115539A TW 91115539 A TW91115539 A TW 91115539A TW I223345 B TWI223345 B TW I223345B
Authority
TW
Taiwan
Prior art keywords
surfactant
rotor
water
spray
box
Prior art date
Application number
TW091115539A
Other languages
English (en)
Chinese (zh)
Inventor
Daniel P Bexten
James Bryer
Jerry R Norby
Original Assignee
Semitool Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US10/108,278 external-priority patent/US6691718B2/en
Application filed by Semitool Inc filed Critical Semitool Inc
Application granted granted Critical
Publication of TWI223345B publication Critical patent/TWI223345B/zh

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H10P72/0411—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02—Cleaning by the force of jets or sprays

Landscapes

  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning In General (AREA)
TW091115539A 2001-07-12 2002-07-12 Method and apparatus for cleaning semiconductor wafers and other flat media TWI223345B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US90503001A 2001-07-12 2001-07-12
US10/108,278 US6691718B2 (en) 1999-07-28 2002-03-26 Wafer container cleaning system

Publications (1)

Publication Number Publication Date
TWI223345B true TWI223345B (en) 2004-11-01

Family

ID=26805734

Family Applications (1)

Application Number Title Priority Date Filing Date
TW091115539A TWI223345B (en) 2001-07-12 2002-07-12 Method and apparatus for cleaning semiconductor wafers and other flat media

Country Status (4)

Country Link
EP (1) EP1404463A4 (https=)
JP (1) JP2004535071A (https=)
TW (1) TWI223345B (https=)
WO (1) WO2003006183A2 (https=)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110808219A (zh) * 2019-11-01 2020-02-18 江苏亚电科技有限公司 一种晶圆存放盒清洗装置及清洗方法
CN116037592A (zh) * 2022-12-27 2023-05-02 无锡亚电智能装备有限公司 晶圆盒晶圆篮清洗设备

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101886414B1 (ko) * 2016-09-27 2018-08-09 주식회사 유닉 웨이퍼 용기 클리닝 장치 및 시스템
CN108565235B (zh) * 2018-05-31 2024-03-01 亚智系统科技(苏州)有限公司 用于扇出型晶圆级芯片的表面处理、封装系统及操作方法
CN112638557B (zh) * 2018-07-06 2023-02-03 谢尔贝克半导体技术有限公司 用于喷洒测量设备的系统和方法
CN108940996A (zh) * 2018-07-27 2018-12-07 深圳市凯尔迪光电科技有限公司 高精密集成电路离心清洗设备
CN111081594B (zh) * 2019-09-25 2022-09-30 北京时代民芯科技有限公司 一种jlcc图像传感器电路封装前的清洗工装及方法
CN112191588B (zh) * 2020-09-18 2021-12-21 程瑶 太阳能发电板生产过程配用清洁机及清洗方法
KR102587371B1 (ko) * 2020-12-21 2023-10-12 주식회사 뉴파워 프라즈마 리프팅 커버 도어를 포함하는 글라스 세정 챔버, 이를 포함하는 글라스 화학 강화 설비, 및 초박형 글라스의 화학 강화 방법
CN115338173B (zh) * 2022-08-31 2023-09-26 浙江中科智谷光电科技有限公司 一种液晶模组加工用清洗设备以及控制方法
CN117206242B (zh) * 2023-10-03 2024-08-13 上海芯畀科技有限公司 半自动离心式晶圆传送盒清洗机
CN117644074A (zh) * 2024-01-30 2024-03-05 深圳市龙图光罩股份有限公司 掩模版清洗方法、装置、终端设备以及存储介质

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4437479A (en) * 1981-12-30 1984-03-20 Atcor Decontamination apparatus for semiconductor wafer handling equipment
US4736759A (en) * 1986-02-21 1988-04-12 Robert A. Coberly Apparatus for cleaning rinsing and drying substrates
US5238503A (en) * 1991-04-09 1993-08-24 International Business Machines Corporation Device for decontaminating a semiconductor wafer container
EP0552756A1 (en) * 1992-01-21 1993-07-28 Shinko Electric Co. Ltd. Article storage house in a clean room
US5301700A (en) * 1992-03-05 1994-04-12 Tokyo Electron Limited Washing system
US5224503A (en) * 1992-06-15 1993-07-06 Semitool, Inc. Centrifugal wafer carrier cleaning apparatus
US5520205A (en) * 1994-07-01 1996-05-28 Texas Instruments Incorporated Apparatus for wafer cleaning with rotation
US6096100A (en) * 1997-12-12 2000-08-01 Texas Instruments Incorporated Method for processing wafers and cleaning wafer-handling implements
DE19740352A1 (de) * 1997-09-13 1999-03-18 Zf Frledrichshafen Aktiengesel Verfahren zum Montieren eines Lenkventils mit einer Zentriereinheit
US6248177B1 (en) * 1998-01-09 2001-06-19 Fluoroware, Inc. Method of cleaning a wafer carrier
US6412502B1 (en) * 1999-07-28 2002-07-02 Semitool, Inc. Wafer container cleaning system

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110808219A (zh) * 2019-11-01 2020-02-18 江苏亚电科技有限公司 一种晶圆存放盒清洗装置及清洗方法
CN116037592A (zh) * 2022-12-27 2023-05-02 无锡亚电智能装备有限公司 晶圆盒晶圆篮清洗设备

Also Published As

Publication number Publication date
EP1404463A2 (en) 2004-04-07
WO2003006183A2 (en) 2003-01-23
EP1404463A4 (en) 2004-10-06
JP2004535071A (ja) 2004-11-18
WO2003006183A3 (en) 2003-02-27

Similar Documents

Publication Publication Date Title
TWI223345B (en) Method and apparatus for cleaning semiconductor wafers and other flat media
KR100654698B1 (ko) 기판의 처리방법 및 그 장치
US6904920B2 (en) Method and apparatus for cleaning containers
CN100366332C (zh) 高压处理装置和高压处理方法
KR100895030B1 (ko) 기판 처리 장치 및 이에 구비된 노즐의 세정 방법
CN101211811B (zh) 基材支撑单元以及使用它的基材处理设备和方法
US20120064727A1 (en) Substrate treatment equipment and method of treating substrate using the same
JP2008034779A (ja) 基板処理方法および基板処理装置
CN101409211A (zh) 基材处理设备以及清洁该基材处理设备的方法
CN101097837A (zh) 基板处理方法以及基板处理装置
US6866723B2 (en) Wet cleaning process and wet cleaning equipment
KR20190035249A (ko) 액상 연마제 교반장치 및 교반장치의 청소방법
JP2002170805A (ja) ウエハー洗浄装置
WO2002027767A2 (en) Fluid delivery ring and methods for making and implementing the same
JPH11160666A (ja) 基板処理装置
US20070032910A1 (en) Apparatus for dispensing precise volumes of fluid
JP3359874B2 (ja) 洗浄装置のノズル構造及び洗浄方法
CN208465784U (zh) 药液和超临界流体的混合装置
CN219805084U (zh) 一种食品包装袋用洗袋机
KR100661391B1 (ko) 표준 웨이퍼 제조용 파티클 증착장치
KR100219414B1 (ko) 반도체 제조장비용 세정장치
JP3243875U (ja) クイックコネクタ洗浄機
KR20080011792A (ko) 반도체 기판 세정 장치 및 방법
KR19990085473A (ko) 세정 설비 및 세정액 공급 방법
JP2003338480A (ja) スピン処理装置

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees