TWI223345B - Method and apparatus for cleaning semiconductor wafers and other flat media - Google Patents

Abstract

A machine for cleaning containers such as flat media carriers or boxes has inside and outside arrays of nozzles arranged to spray a cleaning solution onto containers supported on a spinning rotor in a chamber. The cleaning solution, a mixture of water and a detergent or surfactant is prepared by drawing out surfactant directly from a surfactant bulk storage vessel by means of a metering pump. The flow rate of the water is measured by a flow meter and in combination with the metering pump, a proper amount of surfactant is injected into the water line to produce a mixture with a desired surfactant concentration for removing contaminants. Box holder assemblies on the rotor include upper and lower hooks for securing boxes to the rotor. A box door holder assembly is also provided on the rotor. The box door holder assembly preferably has a plurality of box door holding positions. Each box door holding position advantageously has a door guide and door hooks for holding a door. The box door holder assembly allows both the boxes and their doors to be cleaned with the centrifugal cleaner, avoiding the need for separate cleaning of the doors. In one configuration, the rotor is provided an even number of box holder assemblies symmetrically spaced about the rotor and an even number of door holder assemblies symmetrically spaced about the rotor.

Description

V. Description of the Invention The present invention relates to a cleaning device for cleaning and drying a carrier and a container used to carry and process wafers, tomb boards, lifts, and other flat media. Background Xi or Batah semiconductor wafers, substrates, photomasks, flat displays, flat discs and similar flat media require ultra-low pollution levels, and even 'J's / defectives can cause defects. For this reason, in these All or almost all types of flat media need to maintain a high level of cleanliness, which is known. The circle refers to any form of flat media, but the flat media described below can be referred to as `` wafers '' Some, like a traditional batch process for wafers, for example, in the manufacture of semiconductor wafers used in electrical appliances, televisions and other electrical products, Shi Xijing β will go through multiple batch processes Steps such as oxidation, lithography, diffusion, chemical phase deposition, metallization, and metallization. Throughout the production process, batch / human-type handles will occur. Such batch-type processes are almost only used Carrier or container to carry the wafers that need to be processed. Crystal Institute. The round carrier, box, cassette, wafer boat or container carries a group of W = one. In some steps in the manufacturing process, the wafer must be cleaned. Round carriers, because these things have slits (_), grooves (apertures) and meeting cards': internal corners of dyes, so it is very difficult to clean them. If the wafer needs to meet the ultra-low pollution level It will increase its difficulty even more. Therefore, cleaning the wafer carrier is still a difficult, time-consuming, and relatively amply method. The adhesive-backed label 'fingerprint, dust, metal particles, photoresist and I__ _ 5-This paper is suitable for the country * standard (CNS) M specification (plus> <297 public love) 1223345 A7 _____B7 V. Description of the invention (\ ~~-:-Organic chemicals will also contaminate the wafer carrier A variety of machines have been manufactured and used for cleaning wafer carriers. In these machines, when a cleaning solution is sprayed on the carrier, the carrier is fixed on a rotor and rotated in a chamber. Rotational movement reduces the process time. And help dry the vehicle. In some applications, Cleaners or surfactants are mixed in with deionized water. The surfactants used in this method act as wetting agents that help remove loose particles, and the detergents react chemically with contaminants to Removal of pollutants. Surfactants are usually used only once and then discharged as waste water. If the cleaning agent is concentrated, it can be recycled. Surfactants or cleaning agents are usually packed in containers or tanks. Provide the flow of surfactant or detergent to produce the required concentration level, so it is difficult to control the flow of surfactant or detergent into the vehicle. In the past, the surfactant was extracted from a large number of storage containers, and included To a temporary storage tank where it is diluted to a desired concentration, and then a venturi is used to drain the diluted surfactant solution out of the temporary storage tank, and into a water stream mixed with or aspirated with water, the water and The surfactant mixture is then directed to a cleaning manifold ready to be injected into a water carrier. It is therefore an object of the present invention to provide an improved machine and carrier for cleaning flat media. Ease of loading and unloading vehicles and boxes and their doors, entering and exiting the rotor, and maintaining the balance of the rotor under various conditions remain engineering challenges. Therefore, the object of the present invention also provides an improved rotor. The invention relates to cleaning a flat medium including a rotatable rotor fixed in a room -6-

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Related to the device of the mass carrier, the nozzle in the chamber is configured to spray the cleaning mixed liquid of water and detergent or surfactant on the carrier carried by the rotor, and the cleaning and mixing liquid system uses a metering pump from the surfactant block. The storage bucket is directly drawn out and prepared. The flow rate of water is measured using a flow meter combined with a metering pump, and an appropriate amount of surfactant is injected into the water pipe to produce the required surfactant concentration to remove contaminants. Of a mixture. In a second aspect of the present invention, a surfactant or a detergent solution is injected into a water pipe or an inline mixing control valve to ensure that water and surfactant are injected into a water carrier. All can be mixed before. In a second aspect of the present invention, a water carrier with multiple cleaning manifolds is provided to spray the carrier, a flow meter is provided in the water inlet of each manifold, and individual metering pumps are provided to adjust the surface activity An agent is injected into each water pipe to ensure that an appropriate amount of surfactant is injected into the water pipe to produce a mixture having the desired surfactant concentration. In a fourth aspect, a system for cleaning a carrier for holding a wafer includes a box cleaner having a rotor in a surrounding wall, and a box holding assembly on the rotor includes an upper hook and a lower hook to fix the box to On the rotor. The box door holding assembly preferably has a plurality of box door holding positions. Each box door holding position preferably has a door guide and a door hook to hold the door. The box door holding assembly allows the box and the box to be cleaned with a centrifugal cleaner. Door and avoid the need for individual cleaning of the box door. In a fifth aspect, a rotor provided with an even number of pairs of rotors symmetrically spaced from the rotor and a pair of doors with symmetrically spaced rotors is provided with the rotors to prevent the rotor from being subjected to an imbalance. In the sixth aspect, 'the spray manifold has a straight spray nozzle and an angled paper size applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 1223345 A7 ____B7 ^ V. Description of the invention (5 ~~' Fig. 11 is a front left side view of a preferred structure of the pump and control valve system of Fig. 10. Fig. 12 is a right rear side view of the structure of Fig. 11. Fig. 13 is an exemplary top view showing the direction of the spray manifold and nozzles. Fig. 14 is a perspective view of another rotor having a cleaning system as shown in Fig. 1. Fig. 15 is a top view of the rotor shown in Fig. 14. Fig. 16 is a door clamp of the rotor of Figs. 14 and 15 The upper right of the perspective view of the module. Figure 17 is the right side of the top view. Figure 18 is an exploded perspective view of the upper compartment of the door clamping assembly of Figure 17. Figure 19 is a perspective view of the chassis of the compartment of Figure 18. Figure 20 is a perspective view of the enclosure, rotor, and spray manifold of the system shown in Figure 1. Figures 21-26 are the spray patterns, nozzle directions, and container / rotor movement in the system as shown in Figure 20 Figure 27 is a perspective view of the angle spray nozzle used in the system shown in Figure 20. Fig. 28 is an enlarged sectional view of the nozzle shown in Fig. 27. Fig. 29 is a perspective view of a section of a left or right spraying manifold. Fig. 30 is a perspective view of a section of an upper or lower spraying manifold. A preferred embodiment Evaluation is now back in the diagram. Figures 1 and 2 demonstrate a carrier cleaning machine 10 with a frame 12 and a protective plate 14 forming a surrounding wall, on the front surface and rear of the machine 10-9-This paper size applies Chinese National Standard (CNS) A4 specification (210X 297 mm) 1223345 A7 B7 V. Description of invention (6) The front door 16A and rear door 16 are provided on the surface, and the machine 10 is generally installed in a clean room for semiconductor manufacturing. Air filtration The enclosure wall 18 is located above the front door 16A and contains a filter to filter the clean atmosphere. The discharge pipe 26 extends outward from the top and rear right corners of the machine 10 and is usually connected to the equipment or building's discharge pipeline. Refer to Figure 3 6 and 9, a cylindrical chamber 24 is supported in the frame 12, and the chamber 24 has a cylindrical side wall 25, and the rounded side wall 25 is sealed at the top and bottom with an upper plate 36 and a bottom plate 38. The upper plate 36 has a central opening 37, Allows the air passing through the chamber 24 to flow into the filter box 1 8 Pass down the chamber 24. After the chamber 24, the right side of the discharge booster 50 and the discharge pipe 26 are connected, and the air is removed from the chamber 24. The discharge opening 39 below the chamber 24 and in the discharge booster 50 discharges the liquid 5, 9 and 13, the outer cleaning manifolds 28 (R1-R4) are above the cylindrical side wall 25 of the chamber, each having 12 spray manifolds located outside the chamber 24. The outer cleaning manifold 28 may Located on the outside of the cylindrical side wall 25, as shown in Figures 4-6 and 10, or as long as the cleaning spray nozzle 30 is appropriately arranged on the outer cleaning manifold 28 to spray the workpiece, that is, the wafer carrier, or Above the inner surface of the cylindrical side wall 25. The inner cleaning manifold 29 is located near the center of the chamber 24, and each of the inner cleaning manifolds (R5-R8) has a plurality of cleaning spray nozzles 30 spraying outwardly onto the workpiece (that is, the wafer carrier, container or cover). Similarly, the outer drying manifolds 64 (D5-D8) each have a plurality of drying spray nozzles 66, and the drying spray nozzles 66 are distributed at intervals on the periphery of the chamber 24 on the cylindrical side wall 25, and the inner drying manifolds 65 (D1-D4) Each also has a plurality of -10 in the room 24-This paper size applies to China National Standard (CNS) A4 (210 X 297 mm)

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Line 1223345 A7 B7 V. Description of the invention The preferred directions of the drying nozzle sprinkler nozzle 66 near the heart, the drying manifold (D1-D8) and the cleaning manifold (R1-R8) are shown in Figure π.

Referring to FIG. 10 for the time being, the outer drying manifold 64 is connected to a compressed gas supply source 120, such as air or nitrogen, through a control pipe 63a through a distribution manifold 61 and then a liquid pipe 63. . Similarly, the inner drying manifold 65 is connected to the compressed gas supply source 13 0 'via a control valve 6 7 a via a piping manifold 68 and then a liquid line 67. The outer cleaning manifold 2 8 is connected to the control valve 170 and the deionized (DI) water supply source 110 through a piping manifold 141 and then a liquid pipe 14. The inner cleaning manifold 29 is connected to the control valve ι80 and the deionized (DI) water supply source 110 through a piping manifold 151 and then a liquid line 150. The compressed gas line is also connected to the spray manifold to purge through the control valves 170 and 180. The booster pump 46 adds DI water from an external source 11 of the cleaning manifold 28 and 29. Water pressure. The control valves 170, 180 are preferably mixed to ensure that the surfactant is completely mixed with the DI water.

Referring to FIGS. 3-6 and 10-12, the surfactant tank or bottle 35 is connected to the surfactant metering pumps 48 and 49 via the liquid pipe 190, and the surfactant metering pump 48 is connected to the surfactant metering pump 48 via the liquid pipe 192. The mixing control valve is connected, pump 48 draws the surfactant from the tank or bottle 35 and pumps it into the control valve 170 mixed with DI water to inject into the external cleaning manifold 28 through the liquid pipe 14 . The surfactant metering pump 49 is connected to the control valve 180 via a liquid line 194. Pump 49 extracts the surfactant from the tank or bottle 35 and pumps it into the control valve 180 mixed with DI water to pass through the liquid pipe. Path 50 is injected into the outer cleaning manifold 29. -11-This paper size is in accordance with Chinese National Standard (CNS) A4 specification (210 X 297 public love) 1223345 A7 B7 V. Description of the invention (8) The discharge opening 39 at the bottom of the chamber 24 leads to the diverter 90, and the diverter 90 is connected Drain opening 39 and recovery tank 42 or equipment wastewater discharge 92. On the surfactant side, the return line 142 from the liquid line 192 near the mixing control valve 170 provides the priming of the surfactant back to the tank 35 (under the control of the control valve 145). Bottom); circuit line 152 from liquid line 194 close to mixing control valve 180 provides injection of surfactant back to tank 35 (under control of control valve 155). On the DI water side, a recirculation line 147 from the liquid line 115 near the mixing control valve 170 provides for the recovery of DI water; and a recovery line from the liquid line 117 near the mixing control valve 180 157 also provides recovery of DI water. Even when the tool is idle, the recovery lines 147 and 157 provide a flow of water through the tool to avoid breeding bacteria in the line or valve. Referring again to FIG. 9, an air heater 58 is installed at the air inlet booster 56 behind the air filter box 18 and at the center of the inlet opening connected to the top of the chamber 24, and a blanket is provided around the top of the chamber 24 (blanket ) The heater 55, the computer / controller 112 is connected to and controls each of the pumps, valves, heaters, and flow sensors. 6-9, a rotatable rotor 70 is supported in the chamber 24 on the base 104. The rotor has an upper ring 72 and a bottom ring 74 connected to the frame 75, and extends radially outward from the upper ring 72 and the bottom ring 74. And the ladder 76 is supported on the fulcrum above the upper and lower supports 82. Each ladder 76 has a plurality of surrounding walls 78 as shown in FIG. 9 to hold the container or carrier 85, or the container cover 87, and the structure of the ladder 76. The design with the surrounding wall 78 on the ladder 76 is suitable for special sizes and forms of vehicles, containers and covers to be cleaned. Rotor shafts in the center column 100 and center column 100 -12-This paper size applies to China National Standard (CNS) A4 (210 X 297 mm)

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Line 1223345 A7 B7 V. Description of the invention (9) 106 The entire rotor 70 is rotatably supported above the rotor drive motor 102 to rotate the rotor 70 ', the rotor 70, the center pillar 100, and the rotor shaft 1Q6. The detailed design features are It is well known as described in US Patent No. 5,224,503; another method is to construct a tool with a non-rotating ladder. In use, the machine 10 is usually installed in a silicon wafer or other flat medium manufacturing equipment. When the wafer is moved to various process steps, it will contaminate the carrier 85, and the wafer must be placed on the carrier. Clean before medium. Open the door 16 or 16A of the machine 10, rotate the rotor 70 until the ladder 76 is aligned with the door, and then the ladder 76 will rotate 180 degrees, and the empty surrounding wall 78 can be received through the door 16. Load the carrier 85 into the surrounding wall 78 and rotate the ladder to its original position so that the surrounding wall 78 faces the inside of the room 24. It is preferable to provide a ladder 76 with a latch or detent to lock the ladder Into the closed or operating position with the surrounding wall 78 facing the inside of the chamber 24, then the next ladder 76 is aligned with the door, and the rotor 70 is controlled (by hand or via the rotor drive motor 102 control) to load Ladder, loading will continue until all ladders 76 are filled. As shown in FIG. 6, the equipment board 40 on the machine 10 has connections to the deionized water and gas inlets, that is, nitrogen or air entering the machine 10, and connections to the tear discharge 92, and has meters and valves To measure and control liquid / gas flow. The surfactant tank 35 is provided with a cleaning agent or a surfactant, such as VahrOnDp 94001 (high pH value), which is _ a better surface activity to remove green ^ and the word "surface activity" used in this application Agent refers to surfactant or detergent. The controller 112 sends DI water and surfactant to the mixing control valves 170 and 180 through the appropriate control of the valve and pump to produce

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1223345 A7 B7 10) V. Description of the invention Create the required DI water / surfactant mixture and inject this mixture into each of the cleaning manifolds 28, 29. The DI water boosting pump 46 raises the water pressure 'in the supply pipe 114 to send the DI water to the mixing control valve 17o and the mixing control valve 18o. A flow meter 116 'is provided in the liquid line upstream of the external cleaning mixing control valve 170 to measure the water flow rate supplied to these valves; similarly, a flow rate is provided in the liquid line upstream of the internal cleaning mixing control valve 180 Calculate the flow of DI water supplied to these valves. The system is initially calibrated by using controls from the flow meter 116 and metering pump 48 to set a reasonably accurate surfactant concentration for the DI water / surfactant mixture injected into the external cleaning manifold 28; as such, Controls from the flow meter 118 and metering pump 49 are used to calibrate the system to set a reasonably accurate surfactant concentration for the DI water / surfactant mixture injected into the inner cleaning manifold 29. The solution of each manifold is preferably 1: 1, 000 and has a surfactant balanced with DI water, but has its own flow control / metering ', and the level of the surfactant concentration can be set individually. Metering pumps 48 and 49 are preferably pumps with positive displacements such as film pumps. The flow rate of this film pump can be adjusted to adjust the pump stroke (the amount of each stroke can be set) and / or pump. Pump speed (stroke per minute), the pump is preferably set at a relatively high speed, so that the surfactant can be transmitted to the system in the form of less pulses / intermittent. The system operator can adjust the surfactant / DI water concentration by adjusting the pump stroke (the amount per stroke can be set) and / or the pump speed (stroke per minute). Although this metering pump M, 49 -14-1223345 A7 can be operated by a preset pump rate, the description of the invention (11) "surface activity / DI 7jc; Chen degree The system can also use electricity and this electronic control system uses electronically controlled inputs from the flow rate 116, 118 and the pumping rate of the metering pump. A low liquid level detector 35a is also available in the surfactant bucket 35 In order to issue a warning when the liquid level in the bucket is too low and needs to be replaced, the detector W can be a liquid detector in the bucket, or a capacitor controller located outside the bucket, or other appropriate devices. When the surface reaches a specific (low) level, the detector can decide when to replace the surfactant, or some types of detector can provide a signal corresponding to the surfactant level. For example, inserting in the barrel 35 The tray 35b (see FIG. H) may include a load unit (support) that supports the surfactant bucket 35, and the load unit that provides the liquid level determines the weight of the bucket 35 when the weight of the bucket changes. The control unit 112 controls the rotor drive motor 10, making the rotor 70 at a low speed of 50 Rotate in one direction and spray DI water / surfactant onto the carrier 85 on the rotating rotor through the control of pumps 46, 48, 49 and valves 170, 180. After a sufficient time, such as 3-10 minutes When the surfactant / valley solution is continuously sprayed, the rotor 70 reverses its rotation direction to improve the spraying coverage. The cleaning manifold 29 located inside the rotor 70 is sprayed radially outward from the center of the chamber 24; it is located on the side wall 25 of the cylinder The outside cleaning manifold 28 sprays radially inward toward the center of the chamber 24; the two spraying actions combined with the two-way rotation of the rotor 70 can provide virtually complete coverage of all surfaces of the container 85. After the application of the surfactant solution is completed As shown in Figure 10, use the gas or nitrogen flowing through the inspection valves 143, 153 and the control valves no, 180 to -15-This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) 1223345 A7 B7 V. Description of the invention (12) Cleaning the manifold. In the surfactant cleaning cycle, a diverter valve 90 is set to direct the liquid to the equipment waste liquid discharge 92. Generally, when the machine 10 starts the cleaning cycle Time The diverter valve 90 maintains its position to connect the waste liquid opening 39 and the equipment waste liquid discharge 92. DI water is sprayed from all the cleaning manifolds (R1-R8) onto the carrier 85, and the rotor 70 rotates in the first direction And then reverse and rotate in the opposite direction at 1-50 rpm, preferably 6 rpm. Then turn on the heater 58, and the rotor is accelerated to about 300 rpm, so that the water droplets on the container 85 fly off the container centrifugally, And the container is dried. The coating heater 55 located on the outside of the top of the chamber 24 is continuously turned on to keep the top of the chamber 24 warm, and the DI washing water flows out of the waste liquid discharge 92. The diverter valve 90 can be turned to a position if desired, such as in a water circulation mode where DI water (without surfactant) is circulated through the chamber. When the machine 10 is used to clean various containers, for different containers and pollutants, such as surfactants, cleaning water and air / gas spraying time and rotation speed and sequence, operation of heaters, surfactants Specific cleaning parameters such as concentration to achieve the best results will be apparent to those skilled in the art. Surfactants are generally non-combustible or non-explosive and do not pose certain environmental hazards when combined with solvents. On the other hand, surfactants are very expensive and can be used with DI water / surfactant mixtures with metering pump Provide accurate and consistent surfactant concentration, so this system can save surfactant. Now returning to the design shown in FIGS. 14 and 15, the rotor assembly 236 has an even number of cassette holding assemblies 250 a, 250 b, 250 c, and 250 d symmetrically disposed on the rotor frame 244; similarly, it is also symmetrical on the rotor frame 244. Ground configuration even number -16-This paper size is in accordance with Chinese National Standard (CNS) A4 (210 X 297 mm) 1223345 A7 B7 V. Description of the invention (13) Door holding assemblies 26〇a and 260b. Each of the box clamping assemblies 250a-250d has the same design and is located at a position opposite to the other box clamping assembly in a radial direction; more specifically, the box clamping assembly 250a is located on a radial direction opposite to the box clamping assembly 250c, And the box holding component 250b is located on the box holding component 250d which is radially opposite to the box holding component 250d. Similarly, since the door holding assemblies 260a and 260b are arranged radially opposite to each other, the rotor assembly 236 has a box holder and a door holder assembly arranged in a symmetrical and rotationally balanced structure. The box holder assemblies 250a-250d and the door holder assemblies 260a and 260b are attached to the rotor frame 244 and form a rotor assembly 236. The rotor frame 244 includes an upper ring plate 246 and a bottom ring attached to the core structure 245 The plates 248, cassette holder assemblies 250a-250d are preferably rigidly attached to the top and bottom of the ring plates 246 and 248 via screws 275. Referring to FIG. 16 ′, each door holding assembly 260 a and 2 60 b has an upper plate 272, a bottom plate 276, a middle plate 274, side plates 278, 280 and arms 292 attached to the side plates. Each door holding assembly 260 is preferably extended through The screws 275 on the upper plate 272 and the bottom plate 276 of the door clamping assembly are rigidly attached to the ring plate 246 and the bottom ring plate 248 on the rotor frame 244. Each door holding assembly 260a and 260b has an upper surrounding wall 306 and a lower surrounding wall 308, which are usually separated by an intermediate plate 274. Still referring to FIG. 16, each surrounding wall 306 and 308 has two door holding positions. The surrounding wall 306 holds the doors 325a and 325b, while the surrounding walls hold the doors 325c and 325d. The door holding positions are preferably mirrored to each other. Referring also to FIGS. 18 and 19, each of the surrounding walls 306 and 308 has a bottom surface or tray 335, a pair of left hooks 322, a pair of right hooks 324, and an upper plate 34. Figure 18 shows -17. Standard (CNS) A4 (210X 297 mm) 1223345

The detailed parts of the surrounding walls. Figure 19 shows the details of the bottom tray 335. Door rails 336 and 337 are provided in the exhibition tray 335 to receive the bottom edge of the door and the diameter relative to the axis of rotation AA of the rotor. The door rails 337 are arranged in the direction, and the door rails 336 and 337 each have rear slopes 338 and 339 at their radial inward or rear ends, and each of the hooks 322 and 324 has a leg 325 and a leg 327 attached to the leg. The hooks 322 and 324 are preferably mirror images of each other, and the legs μ extend around (that is, generally tangent to the direction of the rotor path of rotation), and the feet 327 extend inwardly toward the rotor's axis of rotation AA, and The door is clamped in the door holder so that the door is almost aligned or parallel to the radius R of the rotor. The plane of the flat side of the door plate p is preferably as shown in FIG. Within degrees. In use, in order to load the door into the door holding assembly 26, the surrounding earth door 16 is opened (as shown in FIG. 1), and the rotor is pointed or rotated until the door holding assembly 260a or 260b is moved to the alignment wall. At the door 16, the doors 325a-d are then loaded into the door holding assemblies 26a or 26b by hand. When a door (such as door 325a) is loaded into a compartment, the bottom of the door 325a can fit into the door rail 336, which can help laterally support the door (that is, make the door resistant to side-to-side movement). Insert the door (such as door 325a) vertically into the compartment opening and pass through the door rail 336 and the side hook 322, and load it into the door clamping assembly. Then move the door laterally to the position on the door rail 336, and the bottom of the door and Guide the door downwardly and radially outwards to engage the slope 338 in the door rail 336, and the radially outer edge of the door also contacts the side hook 322. Once in the door rail 336, move the door radially outward until The door is engaged with the side hook 322. Then use Junzi to fixedly place and hold the door 325a to rotate the rotor plus centrifugation. -18- This paper size applies to China National Standard (CNS) A4 (210 X 297 mm)

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The force resists the movement, and the same item is too 17 thousand to load other doors. The center guide 344 on the bottom tray 335 can be temporarily closed., ... ¥ Help guide the inner or rear end of the door into the door rail 'and use the long-lasting item sequence opposite to the above steps to hold the assembly from the door 260 Unloading door 325 〇 When loading to the Η clamping position 'the door is in a vertical position, that is, the side of the door' 彖 faces the rotor I axis ΑΑ, and the other opposite edge of the door faces the rotor radially '(using a hook Chorus). The plane or surface of the door is perpendicular to the moving path of the rotor, and in the same compartment, the plane of one facade faces the plane of the adjacent facade, and the door is flush with the side of the compartment or compartment. The center area is empty to allow space for loading and unloading. The door clamping assembly is narrower than the box clamping assembly and occupies a smaller section of the rotor assembly. Using the sequence described above, door holding assemblies 260a, 260b having doors 325a-d are typically loaded with two doors in the upper compartment 306 and two doors in the lower compartment 308. The two door holding assemblies 260a, 260b each have four doors, for a total of eight doors. The rotor assembly 236 has four cassette holding assemblies 25a-d, each of which holds two cartridges, for a total of eight cassettes. In this way, eight boxes and eight doors can be cleaned in a single cycle of the cleaning system, and the rotor assembly 236 is balanced because the loading is symmetrical to the coin axis AA. Since the above-mentioned rotor has four box clamping assemblies and two door clamping assemblies, and each of the door clamping assemblies has two compartments (upper and lower), other components and structures can also be used. Referring to FIG. 20, a specific embodiment of an improved centrifugal box cleaner 400 is used. -19- The paper rule jumps into the time (CNS) field ^ (21.χ297 / 疋

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1223345 A7 B7 V. Description of the invention (16) * In the Xibu cleaning manifolds 402, 404, 406, 408, and 410, the liquid is sprayed radially inward on or in the box and container 85, and the internal liquid is sprayed on the manifold 412 Spray the liquid radially outward on the back surface of the box. As shown in FIG. 20, the inner liquid spraying manifold 412 is located in the radial direction of the rotating rotor 403, and the outer spraying manifolds 402, 404, 406, 408, and 410 are located in the surrounding wall 401, or outside the surrounding wall 401, There is a nozzle on the manifold and extending through the surrounding wall opening. The inner and outer liquid spraying manifolds may also be provided in the box cleaner 400 to spray a gas such as clean dry air in a drying cycle, and individual inner and / or outer gas spraying manifolds may also be provided. 21 and 22, the first external liquid spraying manifold 402 preferably has a plurality of evenly spaced spraying nozzles 430 and 432. The nozzles 430 are linear spraying nozzles, and spray directly onto the rotation axis and center C of the rotor 36, and spraying in a straight line. The nozzle 430 can spray a cone pattern and surround a cone nozzle with a solid angle of 10-60 degrees or 15-45 degrees, preferably 30 degrees. Another option is a linear spray nozzle 430 to provide a flater spray. Patterned fan nozzle. In order to obtain better results when cleaning the box, the nozzle 432 included in the first manifold 402 may also be an angled spray nozzle. It is preferable that the first manifold 402 has two or four angled spray nozzles. 432, and separated by at least one, preferably several, linear spray nozzles 430. Referring to Fig. 22, an angled nozzle 432 may be arranged on the first outer liquid spraying manifold 402, and sprayed at an angle Θ approaching the FOUP box or container, or in an angle of rotation A with the rotor. The straight spraying manifold 430 on the first manifold 402 sprays directly toward the center C of the rotor assembly, and the straight spraying on the first manifold 402 is -20-This paper size applies to China National Standard (CNS) A4 (210X 297mm) (Centimeter)

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1223345 A7 B7 V. Description of the invention (18) In order to avoid interference with adjacent spray nozzles, the downward spray angle 432 on the second outer spray manifold 404 and the upward angle on the fourth outer spray manifold 408 The spray nozzles are preferably spaced a sufficient distance from the next lower and upper straight spray nozzles 430 to avoid comprehensive conflicting patterns. In this way, the distance between the linear spray nozzles 430 and the angled spray nozzles 432 on the second and fourth outer spray manifolds 404 and 408 is preferably not equal; on the contrary, the first outer spray manifold 402 The distance from the angled spray nozzle 432 on the third outer spray manifold 406 preferably approaches. The upper and lower angles of the angled spray nozzles 432 on the fourth outer spray manifold 408 and the second outer spray manifold 404 need not be equal, or need to be equal to the first outer spray manifold 402 and the third outer spray manifold. The angle Θ of the angled spray nozzle 432 on 406 is equal. The angle can vary with different applications, but preferably all angles (right of manifold 402, below manifold 404, left of manifold 406 and above manifold 408) are between 10 to 80 degrees, 20 to 70 degrees 30 to 50 degrees, and more preferably 40 to 50 degrees. In the exemplary embodiment, all angled spray nozzles are designed to spray at an angle of Θ of 45 degrees. Manifolds 402, 404, 406, and 408 are preferably equally spaced at 90-degree intervals on the periphery of the side wall of the chamber, and it is preferred that the manifolds 402, 404, 406, and 408 each have an angled spray nozzle. There is at least one linear spray manifold 410, preferably as shown in FIG. 22, with only linear spray nozzles 430. The inner spray nozzles 412 preferably all have only linear spray nozzles 430 mainly for cleaning the back surface of the box; however, the inner spray manifold 412 may also have an angled spray nozzle 432 similar to the outer spray manifold. In the exemplary embodiment, there are a total of eight external spraying manifolds 402, 404, and -22-This paper size is applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 1223345 A7 B7 V. Description of the invention (19 ) 406, 408 and four outer straight spraying manifolds 410, preferably eight inner liquid spraying manifolds, as shown in FIG. 22, can be aligned with the outer spraying manifolds, or can be offset or vertically The staggering can also be an angular offset, so that the spray from the inner liquid spray manifold 412 is aligned with a point between the two outer spray manifolds. If necessary, the vertical positions of the nozzles 430 and 432 on the outer spray manifold can be offset or staggered to provide a wider range of spray coverage. As shown in Figs. 27 and 28, the angled spray manifold 432 includes a guide surface 434 extending through the nozzle outlet 436 to create a cone-shaped spray pattern at an angle of Θ toward the end of the axis of the nozzle body 438. When installed, the shaft N substantially intersects the center of rotation of the rotor C, and the guide surface 434 may extend the spray pattern at an angle Θ with respect to the shaft N. Figure 21-26 shows the operation of the box cleaner 400 rotating in the A direction when the rotor is loaded with a box, supplying cleaning fluid to all the manifolds 402, 404, 406, 408, 410, and 412, so that it is best to All spray nozzles 430 and 432 on the tube spray liquid. In FIG. 21, the jet flow from the linear spray nozzle of the manifold 410 reaches and cleans one side of the box and the inner surface of the back. When the rotor moves the box to the position as shown in FIG. The linear spray nozzle 430 is preferably sprayed into and inside the box in a pattern and structure similar to the linear spray pattern of the manifold 410 in FIG. 21. However, the angled spray nozzle 432 on the manifold 402 sprays at an angle of Θ, which can more directly spray and clean the tail outer surface 452 and the front inner corner 454 and the inner side wall 456. Returning to FIG. 23, when the box 52 is rotated into the range of the manifold 404, the linear spray nozzle 430 on the manifold 404 sprays into the box in a manner similar to the linear nozzle 430 on the manifolds 410 and 402. on. However, -23 of the manifold 404-This paper size applies to the Chinese National Standard (CNS) A4 (210 X 297 mm) 1223345 A7 B7 V. Description of the invention (20) Angled spray nozzle 432 sprays at an angle Therefore, the upper surface 450 of the box can be better cleaned. Returning to FIG. 24, by the rotation of the mule, the box moves into the range of the manifold 406, and the linear spray nozzle 430 of the manifold 406 sprays with respect to the linear spray nozzles on the manifolds 412, 402, and 404 as described above. To or in the box, the angled spray nozzle 432 on the manifold 406 sprays at an angle of -Θ to better cover and clean the front outer side wall and the rear inner corner of the box. Referring to FIG. 25, when the box 52 moves into the range of the manifold 408, the linear spray nozzle 430 on the manifold 408 sprays into and above the box as described above, and the angled spray manifold 432 on the manifold 408 Sprayed up, so the lower surface of the box is better cleaned. The rotor usually rotates at a speed of 200-500 rpm. Generally speaking, after the rotation in the direction A, the direction of rotation is reversed. In this way, the relationship between the front / tail of the angled nozzles on the manifolds 402 and 406 is also Will reverse. For more efficient manufacturing, the manifolds 402-410 can be the same, and then the nozzles 420 and 432 are installed in the left, right, up or down direction as described above. Of course, only a single manifold design and two Nozzles are designed to make all the manifolds 402, 404, 406, 408, and 410. In this example, the manifold 404 has a nozzle 432 that sprays downwards, and the manifold 408 has a nozzle 432 that sprays upwards and can close the nozzle hole with the plug 460 to avoid interference with the upward or downward angled spray patterns. Adjacent straight spray pattern. The linear spray nozzle 430 is preferably sprayed at a three-dimensional cone angle of 15-45 degrees, and preferably 30 degrees. All external spray manifolds preferably have more linear spray nozzles than angled spray nozzles. Provide box and rotor itself-24-This paper size applies to China National Standard (CNS) A4 specification (210X297 mm)

Hold

1223345

^ Clear the nozzle on the -manifold to make the material angled, such as a ladder with two box positions. =: It is better to have two, three or four angled nozzles on the s 402-408. For ladders with more box positions, it is better to have more angled nozzles. Therefore: the use of a nozzle having a nozzle in the direction of moving away from the direction of rotation, or upward or downward, and the central axis of the negative 4 ° T can achieve improved cleaning. When it is narrow, it can be the same: it is also 'straight mouth sprinkler mouth nozzle attached to the second political pipe at an angle or offset, or the poor is itself angled, and the nozzle is poured out at an angle' to achieve The advantages mentioned above. An angled spray pattern can also be used in a box cleaner with a rotor holding = FOUP door. The manifolds 402-408 must not have at least one angled spray nozzle spraying in the direction of the magazine, and at least one Angled spray nozzle (on the same manifold) spraying in the -θ direction. -25-This paper size applies to China National Standard (CNS) Α4 size (210X297 mm)

Claims (1)

Sixth, the scope of patent application L-a kind of pollutant removal from a flat medium carrier: π / go, including the following steps to load the carrier on a flat surface; in the cleaning machine, turn the rotation Rotor; spray a water / surfactant pipeline onto the carrier by the following steps: daggers inject water into the inlet pipeline through an inlet, measure the water flow entering the inlet pipeline, use a Flow metering pump pumps the meter tank into the inlet pipeline. [Health μ directly mixes the surfactant and water from a storage to obtain a mixture. Surfactant / water setup: The flow meter measures the flow of the pump. Rate 'to achieve the surfactant concentration required for the surface / water mixture. 2. If the method of the patent scope is requested, the method further includes the following steps: Interrupting the pumping of the surfactant; spraying water only on the carrier to wash the carrier. 3. If the method of the second scope of the patent application, The method further comprises the steps of: interrupting the injection of water into the inlet pipeline, spraying the carrier with dry air, and drying the carrier 1. 4. The method according to item 3 of the scope of patent application, wherein the drying and air Selected from the group of compressed air. 5. If the method of the scope of patent application 丨, the water contains deionized water. -26-This paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm) 1223345 6 · Example: The method of item i of the patent scope 'also includes the step of rotating the rotor at l-50 rpm when spraying the mixture towards the vehicle. 7. The method of the patent scope of the patent application also includes the use of: metering Fanpu's adjustment operation adjusts the flow rate of the surfactant to be pumped into the inlet pipeline. 8. For example, the application for the item i in item S of the patent &amp; wherein the surfactant and water are injected into the inlet pipeline under the control of the K Kunhe control valve. 9 · A clean and flat medium carrier The device includes: a rotor fixed in a chamber and rotatable; a first inner nozzle array and a first outer nozzle array configured to spray a liquid onto a medium on the rotor; a first A control valve connected to the first inner nozzle array through a first liquid pipeline; a first water inlet pipeline to provide water to the first control valve; a first flow meter to pass through the first water An inlet pipeline measures water flow; a second control valve is connected to the first outer nozzle array using a second liquid pipeline; a second water inlet pipeline is to provide water to the second control valve; a second flow rate Measure the water flow through the second water inlet pipeline; a surfactant storage tank; a first surfactant injection pipeline connecting the surfactant storage tank to the first control valve; One surfactant injection The first metering help in the pipeline-27-This paper size is applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 public 1223345 ABCD) 6. The scope of application for patents is to directly surface the surface from the surfactant storage tank The active agent is pumped to the first control valve at a controllable extraction rate; a second surfactant injection pipeline connecting the surfactant storage tank and the second control valve; A second metering pump in the pipeline draws the surfactant directly from the surfactant storage tank to the second control pump at a controllable extraction rate; one with the first and the second water inlet Pressurized water source connected by pipeline. 10. If the device in the scope of patent application item 9 also includes a cover surrounding the chamber. 11. If the device in the scope of patent application item 9 also includes a device connected to the water source. Boost the pump to provide a required inlet water pressure to the first and the second water inlet pipelines. 12. The device according to item 9 of the patent application scope, wherein the first and the second metering pumps The flow rate can be individually controlled To provide a desired surfactant concentration in each of the first and second liquid lines. 13. The device of claim 9 in the scope of patent application, further comprising a device connected to the first control valve. A surfactant return line between the first surfactant injection pipeline and the surfactant storage tank to provide the surfactant with a return path back to the surfactant storage tank. The device of item 9 further includes a recovery path connected between the first water inlet and the water source close to the first control valve to provide a return water source for water. 15. The device of item 9 in the scope of patent application, wherein The first control valve contains -28-this paper size is applicable to Chinese National Standard (CNS) A4 specification (210 X 297 mm) 1223345 A8 B8 C8 ___________ D8 VI. Patent application scope'— ~ one ~ one-one hybrid control Valve to mix the water with the surfactant. 16. · A device for cleaning a medium carrier, comprising: a rotor fixed in a chamber and rotatable; a plurality of medium carriers insertable in a chamber on the rotor; a nozzle disposed in one of the chambers An array to spray a liquid onto the medium carrier on the rotor; an external nozzle array arranged in the chamber to spray a liquid onto the medium carrier on the rotor; a control valve, And a first liquid pipeline connected to the inner nozzle array; a first water inlet pipeline to supply water to the first control valve; a second control valve and a second liquid pipeline; Connected with the outer nozzle array; a second water inlet pipeline to provide water to the second control valve; a surfactant storage tank; a first surfactant injection pipeline connected between the surfactant storage tank and The first control valve; a first metering pump in the first surfactant injection pipeline, pumping the surfactant from the surfactant storage tank to the A control valve Surfactant injection pipeline, connecting the surfactant tank and the second control valve; S #-'-丁 里 背 浦 in the second surfactant injection pipeline, from the surfactant The storage tank controls the surfactant to a controllable -29-this paper size applies Chinese National Standard (CNS) A4 specification (210 X 297 mm) 1223345 AB c D 6. The pumping rate of the patented range system is pumped to the second control valve; a water source is connected to the first and the second control pump, and a device for controlling the pumping rate of each of the first and second metering pumps to A desired surfactant concentration is generated in the surfactant / water mixture provided in the first and the second liquid lines to each of the inner and outer nozzle arrays. 17. The device according to item 16 of the scope of patent application, further comprising: a first flow meter configured in the first water inlet pipe to measure a flow rate of water to be provided to the first control valve; a configuration A second flow meter at the second water inlet pipe is used to measure a flow rate of water to be provided to the second control valve. 18. The device according to claim 16 in which the first control valve includes a mixing control valve to mix the surfactant and the water. 19. The device according to item 16 of the scope of patent application, further comprising a surfactant return pipe connected between the first surfactant injection pipe close to the first control valve and the surfactant storage tank. The surfactant provides a return path to the surfactant storage tank. 20. If the device under the scope of patent application No. 16 further includes a recovery line connected between the first water inlet pipe close to the first control valve and the water source to provide water to the water source for recovery path. 21. The device according to item 16 of the scope of patent application, further comprising: a first-manifold manifold arranged on the first liquid pipeline; a plurality of inner nozzle manifolds connected to the first pipe manifold, each inside The nozzle manifold has a plurality of inner nozzles connected to it, wherein the first allocation is -30-the paper size is suitable for gg home standard (CNS) A4 specification (21Gχ Norwegian public love): --------- ^ 1223345 A8 B8 C8 ______D8 VI. Patent application tube manifold sends the surfactant / water mixture to the inner nozzle manifold; a second piping manifold arranged in the second liquid pipeline; a plurality of and remote A piping manifold is connected to the outer nozzle manifold, each of the outer nozzle manifolds has a plurality of outer nozzles connected to it, wherein the second piping manifold sends a surfactant / water mixture to the outer nozzle manifold. 22. The device of claim 16 in which the first metering pump includes a positive displacement film pump, and wherein the device that controls the extraction rate of the first metering pump includes a device that adjusts the extraction speed. 23. The device as claimed in claim 21, wherein the device for controlling the extraction rate of the first metering system further includes a device for adjusting the stroke length of the pump. 24 · —A system for cleaning a box for holding and holding a flat dielectric substrate, each box having a door, including: a rotor; first and second box holding assemblies symmetrically located on opposite sides of the rotor, each of which The box clamping assembly has at least one box clamping position; the first and second box door central holding assemblies symmetrically located on opposite sides of the rotor; each of the box door clamping assemblies has at least one box holding position. 25. The system of item 24 in the scope of the patent application of claim 4, wherein the first box door clamping assembly includes a first pair of hooks on a first side of the box door clamping assembly, and the box door clamping assembly A second side has a second pair of hooks. 26. The system of claim 25, wherein each of the hooks includes a leg and a foot attached to the leg. 27. If the system of the scope of patent application is No. 26, where the legs of each pair of hooks are facing -31 · This paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm) ': --- — 1223345 Extend towards each other. 28. For example, in the patent application No. 27, the feet of each pair of hooks extend radially inwardly toward an axis of rotation toward the rotor. 29. The system of claim 24, wherein the first box door holding assembly has first and second box door holding positions spaced apart to hold the box door in a vertical position. 30. If the system of the scope of patent application No. 24, wherein the first and second box door holding components i is less than one, a central position guide is also included on the bottom surface of one of the box door components. 31. The system according to item 24 of the patent application, wherein the first box door holding component holds a door with an upper edge and a lower edge aligned with the radius of the rotor. 32. The system of claim 24, wherein each of the box holding assemblies includes two positions for holding the box. 33. The system of claim 24, wherein each of the box door holding assemblies includes four positions for holding the box door. 34. The system of claim 24, wherein each box door position includes an upper door hook, a lower door hook, and a bottom seam to receive the bottom edge of a box door. 35. The system of claim 34, wherein the seam includes a ramp at one end thereof. 36. The system of claim 24, wherein the box door clamping assembly includes a left side plate and a right side plate, a middle plate and a bottom plate attached to a top plate to form an upper compartment and a lower compartment. Each of the compartments has a plurality of upper and lower door hooks and a plurality of bottom seams. -32-This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) Ir 37. The system according to item 36 of the patent application, wherein an upper left and a lower left hook are attached to the left side plate. And an upper right and a lower right door hook are attached to the right side of the door 38. The system of item 36 of the patent application, wherein when placed in a salty seam, on a vertical plane parallel to the _radius of the rotor Configuration of a box door 0 39. The system according to item 37 of the patent application park, wherein the movement of the box door is restricted by centrifugal force holding the door &apos; s outer edge with at least one hook. 40. If the system of the scope of application for patent No. 24, further comprises a surrounding wall, and the rotor is rotatably fixed in the surrounding wall, and a plurality of spray nozzles are arranged in the surrounding wall to spray a rotor toward the rotor. liquid. 41. A system for holding a box with a flat base substrate and the door of the box, including: a rotor; a box door holding assembly on the rotor, and the box door holding assembly comprising: An upper left hook and a lower left hook, and an upper right hook and a lower right fish which are horizontally spaced from the upper left hook and the lower left hook; each of the hooks has a leg extending toward a central area of the box door clamping assembly Each hook has a foot attached to the leg and extending inwardly toward the axis of rotation of the rotor. 42 · —A system for cleaning a box for holding a flat dielectric substrate, each box having a door, including: i a rafter; -33-This paper size is applicable to China National Standard (CNS) A4 (210X297 mm) 1223345 six A8 B8 C8 D8, patent application scope first and second box holding device symmetrically placed on opposite sides of the rotor to hold the box; and first first placed symmetrically on opposite sides of the rotor And a second box door holding device 'to hold the box door. 43. A cleaning system for cleaning a box for moving and storing semiconductor wafers, comprising: a surrounding wall; a rotatable rotor supported in the surrounding wall, and the rotor having a box position to hold the box A plurality of spray manifolds configured to spray a cleaning or washing liquid toward the rotor, and at least one of the spray manifolds has a plurality of linear spray nozzles' and also has at least one angled spray nozzle. 44. The method of claim 1 in which at least some of the water mixture is sprayed at an angle Θ relative to the rotating rotor. 45. The device of claim 9 in which at least one of the nozzles in the first outer array faces at an angle relative to the other nozzles in the first outer array. / 46. If the system of the scope of patent application No. 40, at least one of the sprinkler nozzles is an angled sprinkler nozzle. / -34-This paper size is applicable to Chinese National Standard (CNS) M specifications (210X297 mm) --------- Ur 丨 various 丨 丨 丨 U ^ \ V Case No. 091115539 Category (Filled by this Bureau) &gt; A4 C4 \ Chinese manual replacement page (January 1992) fg Patent Specification 1223345 Chinese method and device for cleaning semiconductor wafers and other flat media requires the title of English METHOD AND APPARATUS FOR CLEANING SEMICONDUCTOR WAFERS AND OTHER FLAT MEDIA Name Nationality-, Invention + Creator Residence, Residence 1¾ 1. Daniel P. BEXTON DANIEL P. BEXTEN 2. James Bryer 3. Jerry R. Norby JERRY R. NORBY 1. -3. United States USA 1. United States f. 2369 Walt Snow Road, Kalispell, Montana? ^ XrS5TEFISH STAGE ROAD, KALISPELL, MONTANA 59901, USA RESERVE DRIVE, 655 West Leemon Avenue, Kalispell , KALISPELL, MONTANA 3. No. 24 West Ivy Green Road, Calisbell, Montana, United States 棼 WE ^ pR £ EN &lt; ^ σΐ ^ ΑΝΑ Name (Name) Nationality American Merchant Sammitor Company SEMITOOL, INC. United States US A. III. Applicant's Residence and Residence (Office) Representative Name 655 WEST RESERVE DRIVE, KALISPELL, MONTANA 59901, USA 655 WEST RESERVE DRIVE, Kalispell, Montana, USA Limen WILLIAM A. FREEMAN National Standard (CNS) A4 Specification (210 X 297 mm) :, v 1223345 No. 091115539 Patent Application Chinese Specification Replacement Page (July 1992) Γ Spraying nozzle, straight line "The nozzle provides direct spray to the rotor's nozzles into each child's nozzle, while angled spray nozzles are oriented toward and / or away from the direction of rotation, and are preferably located on the surface of the box before and / or at the end of the spray , Corners and appearance, which improves cleaning. The selling sprayer can also have an angle spray nozzle with an upward angle and / or a downward angle. Hereafter, the other and further objects, inventive features, and advantages will be clearer, and the existing and sub-combined features of the present invention will be described below. Schematic diagrams In Figure π, the same reference numbers are used for the same elements in several figures. FIG. 1 is a front view, a top view and a right view of a perspective view of the cleaning device. Fig. 2 is a perspective view of the rear of the cleaning device, above, and to the left. Order Figure 3 is the front, top and right side perspective views of the device after the cover is removed in Figures 1 and 2. Figure 4 shows the rear, top and left sides of the side view. Fig. 5 is a rear view, a top view, and a left view of the side view with various components removed for the purpose of explanation. Figures 6 are the front, top, and right side views of some of the main components of the device shown in Figures 1 to 5. Figure 7 is a side view with the rotor removed from the chamber. FIG. 8 is a plan view thereof. Figure 9 is a cross-sectional side view illustrating air movement through the device. Fig. 10 (Fig. 10A and Fig. 10B) is a schematic view showing liquid flow and internal connection in the machine of the present invention. -8- This paper size applies to China National Standard (CNS) Α4 size (210 X 297 mm) A7 B7 1223345 Patent Application No. 091115539 Replacement page of Chinese manual (July 1992) 5. Description of the invention (17 ~~ &quot; &quot; Line spray nozzle 430 can clean the surface of various boxes with existing spraying technology. However, As shown in FIG. 16, an angled spray nozzle 432 is disposed on the first spray manifold 402, which is better for cleaning the inner angle of the box. If necessary, all nozzles on the first spray manifold 402 It can be an angled spray nozzle 432, and can be sprayed in the direction at an angle θ as shown in Fig. 22. Another method is that all nozzles are angled spray nozzles 432, but can have different spray angles. However The first manifold 402 preferably has two or four angled spray nozzles 432 sprayed at an angle and other nozzles that are linear spray nozzles 43. Therefore, the first manifold 402 preferably has two or four spray nozzles. There are angled nozzle spray nozzles 432, and five or seven linear spray nozzles 43 °, and all nozzles are preferably equally spaced. Of course, other numbers and structures can be used. See Figure 2 ^ 22, Zaiwei Above or in the wall, the second outer mouth sprinkles 40% is preferably oriented at about 90 degrees toward the first manifold 402, and the second manifold 400 is provided with a spray nozzle 430, and is preferably approximately perpendicular to the first manifold 402, The nozzle of the spray nozzle sprays out; the second manifold 400 also has a line ^ ^ y — preferably, two soils are sprayed toward the center C and sprayed radially inward, but below: ： (and The angled nozzle 432 of the angle between the rotor or the cartridge cleaner 400) to the second outer liquid nozzle spray manifold 406 is preferably designed to be a mirror image of the first spray nozzle 402, that is, the first liquid nozzle There is a linear spray nozzle spraying toward the center C nozzle, and it also has an angle spray that is opposite to the direction of rotation A with the two-way universal clamp = the fourth outer liquid spray manifold 408 has a spray angle 430 toward the center c Angled spraying with at least one (preferably two to four) and spring angle Θ angle (toward the top of * box cleaner 400) ^ mouth 'spray-21-This paper is suitable for A4 size ( 210 X 297 ^ 17 ^ -— 1223345 A7 B7 Patent Application No. 091115539 Chinese Specification Replacement Page (July 1992) V. Description of Invention (22 Symbol description 10 Cleaning machine 12, 75 Frame 14 Protective plate 16 Rear door 16A Front door 18 Filter enclosure 24 Room 25 Cylindrical side wall 26 Drain pipe 28, 402, 404, 406, 408, 410 29 Inner cleaning manifold 30 Cleaning spray manifold Tube 35 Surfactant tank or bottle 35a Liquid level detector 35b Tray 36, 272, 340 Upper plate 37 Center opening 38, 276 Bottom plate 39 Drain opening 40 Equipment plate 42 Recovery tank 46 Boost pump outside cleaning manifold 26- This paper size applies to Chinese National Standard (CNS) A4 specification (210X 297 mm) 1223345 Patent No. 091115539 Patent Replacement Monk Chinese Manual Replacement Page (July 1992) A7 d: _ B7 1 f Explanation (23) 48, 49 metering pump 50 ^ 76 ladder 52 box 55 covered heater 56 air inlet booster 58 heater 61, 68, 141, 151 piping manifold 63, 67, 115, 117, 140, 150, 190, 192, 194 Liquid lines 63a, 67a, 145, 155, 170, 180 Control valves 64 Outer drying manifold 65 Inner drying manifold 66 Drying spray manifold 70 Rotor 72 Upper ring 74 Bottom ring 78 Compartment 82 Ladder support 85 Container or carrier 87 Lid of container 90 Diverter valve 92 Waste water discharge 100 Center column 102 Motor 104 Base-27-This paper size is in accordance with Chinese National Standard (CNS) A4 (210 x 297 mm) ) 1223345 No. 091115539 Patent Application Chinese Specification Replacement Page (July 1992) A7 B7 銕 24 V. Description of the invention (106 Rotor shaft 110 Deionized water source 112 Computer / controller 114 Supply line 116, 118 Flow meter 120 Supply Source 130 Compressed gas supply source 142, 152 Return line 143, 153 Check valve 147, 157 Recovery line 236 Rotor assembly 244 Rotor frame 245 Core structure 246, 248 Bottom ring plate 250a-250d Box holding assembly 260, 260a, 260b Door holding assembly 274 Center plate 275 Bolt 278, 280 Side plate 292 Arm 306 Upper compartment 308 Lower compartment 322 Left hook 324 Right hook -28- This paper size applies to China National Standard (CNS) A4 (210 X 297 male) 1223345 Replacement Page of Chinese Specification for Patent Application No. 091115539 (July 1992) V. Description of the invention (25 325 legs 325a-325d door 327 foot 335 bottom surface or tray 336, 337 door gap 338, 339 rear slope 344 center rail 400 centrifugal box cleaner 401 surrounding wall 403 rotating rotor 412 spray nozzle inside 430 straight Spray nozzle 432 Angled spray nozzle 434 Guide surface 436 Nozzle outlet 438 Nozzle body 450 Upper surface 452 Outer surface 454 Inner angle 456 Inner side wall 460 Bolt-29- This paper size applies to China National Standard (CNS) A4 specification (210 X (297 mm) Pretend