CN116037592A - Wafer basket cleaning equipment for wafer box - Google Patents
Wafer basket cleaning equipment for wafer box Download PDFInfo
- Publication number
- CN116037592A CN116037592A CN202211688793.1A CN202211688793A CN116037592A CN 116037592 A CN116037592 A CN 116037592A CN 202211688793 A CN202211688793 A CN 202211688793A CN 116037592 A CN116037592 A CN 116037592A
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- CN
- China
- Prior art keywords
- wafer
- frame
- sealing disc
- fixed
- accommodating frame
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004140 cleaning Methods 0.000 title claims abstract description 41
- 239000007921 spray Substances 0.000 claims abstract description 20
- 238000007789 sealing Methods 0.000 claims description 52
- 238000005192 partition Methods 0.000 claims description 5
- 238000004891 communication Methods 0.000 claims description 4
- 238000005086 pumping Methods 0.000 claims description 3
- 235000012431 wafers Nutrition 0.000 description 64
- 238000009434 installation Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B9/00—Cleaning hollow articles by methods or apparatus specially adapted thereto
- B08B9/08—Cleaning containers, e.g. tanks
- B08B9/0861—Cleaning crates, boxes or the like
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B9/00—Cleaning hollow articles by methods or apparatus specially adapted thereto
- B08B9/08—Cleaning containers, e.g. tanks
- B08B9/20—Cleaning containers, e.g. tanks by using apparatus into or on to which containers, e.g. bottles, jars, cans are brought
- B08B9/28—Cleaning containers, e.g. tanks by using apparatus into or on to which containers, e.g. bottles, jars, cans are brought the apparatus cleaning by splash, spray, or jet application, with or without soaking
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
The utility model relates to a wafer box wafer basket cleaning equipment, rotatory support frame can make hold the frame and take place the revolution, conveniently holds the frame with corresponding opening part that holds the frame and rotate corresponding interior barrel, holds the frame itself simultaneously and also can the rotation, holds the frame and fixes when the opening outwards, can conveniently get wafer basket and wafer box from holding the frame and put, when fixing to the opening inwards, just can wash the operation. Meanwhile, the motor only drives the intermediate shaft to rotate so as to drive the vertical spray pipe to rotate, the vertical spray pipe rotates to cover all the accommodating frames, and meanwhile, the rotating parts are few, and the structure is simpler.
Description
Technical Field
The application belongs to the technical field of wafer production equipment, and particularly relates to wafer basket cleaning equipment for a wafer box.
Background
In the process of transporting wafers, it is necessary to insert wafers one by one into a wafer basket, and then protect the wafer basket in a wafer cassette. In order to protect the wafers from being polluted in the transportation process, the wafer box and the wafer basket are required to be cleaned together so as to clean out impurities such as dust and the like.
Chinese patent document CN210575861U discloses a wafer basket cleaning mechanism, in which a cleaning tube is fixed, and a turret rotates to clean a wafer basket, resulting in a large motor and a complicated mechanism required to implement the cleaning process of the wafer basket.
Disclosure of Invention
The invention aims to solve the technical problems that: in order to solve the defects in the prior art, the wafer basket cleaning equipment for the wafer box is simple in structure and lower in cost.
The technical scheme adopted for solving the technical problems is as follows:
a wafer cassette wafer basket cleaning apparatus comprising:
an outer frame;
the inner cylinder body is cylindrical and arranged in the outer frame, and the front end of the inner cylinder body is provided with an opening;
the rotary accommodating frame comprises an intermediate shaft, a rotary supporting frame, an accommodating frame and a vertical spray pipe, wherein the rotary supporting frame is arranged on the intermediate shaft in a free rotation mode, the accommodating frame is used for fixing a wafer basket and a wafer box, the vertical spray pipe is arranged on the rotary supporting frame, the accommodating frame comprises two side plates, a plurality of partition plates and a vertical rod, the two side plates are arranged in parallel, the partition plates and the side plates together form a plurality of fixing spaces in the height direction, the fixing spaces are used for fixing the wafer basket and the wafer box, the vertical rod is arranged between the two side plates so that the accommodating frame forms an opening on one side, a clamping block is further arranged on the vertical rod to clamp the wafer basket, a limiting assembly is further arranged at the bottom of the accommodating frame so that the accommodating frame is fixed in a state that the opening faces outwards or the opening faces inwards, an installation block is arranged on the intermediate shaft, and the vertical spray pipe is arranged in the installation block, and a channel is arranged in the middle of the installation block and is connected with the vertical spray pipe;
the cleaning pump is used for pumping the cleaning pump into the vertical spray pipe;
and the motor is used for driving the intermediate shaft to rotate so as to drive the vertical spray pipe to rotate.
Preferably, the wafer basket cleaning device for the wafer box comprises a U-shaped elastic piece fixed on a rotary supporting frame, a lug arranged on a rotating shaft, and a holding frame fixed at a corresponding position by matching the lug with the U-shaped elastic piece when the rotating shaft rotates,
preferably, the wafer basket cleaning device for the wafer box of the invention comprises a rotary supporting frame, a rotating mechanism and a cleaning mechanism, wherein the rotary supporting frame comprises two discs positioned at the top and the bottom and a connecting rod for connecting the two discs.
Preferably, in the wafer basket cleaning device for the wafer box, an air inlet is formed in the bottom of the rotary support frame and is communicated with the communication channel in the mounting block through the hollow channel of the intermediate shaft, and the air inlet is connected with the cleaning pump through a pipeline.
Preferably, in the wafer box wafer basket cleaning device of the present invention, the number of fixing spaces on each containing frame is 3, wherein the upper and lower positions are used for fixing the wafer basket, and the middle is used for fixing the wafer box.
Preferably, in the wafer cassette wafer basket cleaning apparatus of the present invention, the motor and the cleaning pump are both disposed at a lower portion of the outer frame.
Preferably, in the wafer basket cleaning device for the wafer box, a first moving sealing disc and a second moving sealing disc are arranged at the top of the intermediate shaft, a first fixed sealing disc and a second fixed sealing disc are fixed on the inner cylinder body, a first sealing ring is arranged on the first moving sealing disc, a second sealing ring is arranged on the second fixed sealing disc, the first sealing ring seals a gap between the first moving sealing disc and the first fixed sealing disc, and the second sealing ring seals a gap between the second moving sealing disc and the second fixed sealing disc.
Preferably, in the wafer box wafer basket cleaning device of the present invention, the first fixed sealing disc is provided with a sealing bump to be matched with the first sealing ring.
The beneficial effects of the invention are as follows:
according to the wafer basket cleaning equipment for the wafer box, the rotary supporting frame can enable the accommodating frame to revolve, so that the corresponding accommodating frame can be conveniently rotated to the opening of the corresponding inner cylinder body, meanwhile, the accommodating frame can also rotate, when the accommodating frame is fixed to the opening outwards, the wafer basket and the wafer box can be conveniently taken out from the accommodating frame, and when the accommodating frame is fixed to the opening inwards, cleaning operation can be carried out. Meanwhile, the motor only drives the intermediate shaft to rotate so as to drive the vertical spray pipe to rotate, the vertical spray pipe rotates to cover all the accommodating frames, and meanwhile, the rotating parts are few, and the structure is simpler.
Drawings
The technical scheme of the application is further described below with reference to the accompanying drawings and examples.
FIG. 1 is a schematic view of a wafer cassette and wafer basket cleaning apparatus according to an embodiment of the present application;
FIG. 2 is a schematic view of the structure of a rotary containment drum of an embodiment of the present application;
fig. 3 and 4 are schematic structural views of a containing rack according to an embodiment of the present application;
FIG. 5 is an enlarged view of a spacing assembly of an embodiment of the present application;
FIG. 6 is a schematic view of a structure of a rotating support frame according to an embodiment of the present application;
FIG. 7 is a cross-sectional view of a wafer cassette wafer basket cleaning apparatus according to an embodiment of the present application; the reference numerals in the figures are:
1. an outer frame;
2. an inner cylinder;
3. rotating the accommodating frame;
4. a cleaning pump;
5. a motor;
31. rotating the support frame;
32. a containing frame;
33. a limit component;
35. an intermediate shaft;
36. a vertical nozzle;
311. a disc;
312. a connecting rod;
321. a side plate;
322. a partition plate;
323. vertical rod
324. A clamping block;
325. a rotating shaft;
331. a shape spring plate;
332. a bump;
341. a mounting block;
342. an air inlet;
351. a hollow passage;
3411. a channel.
Detailed Description
It should be noted that, in the case of no conflict, the embodiments and features in the embodiments may be combined with each other.
In the description of the present application, it should be understood that the terms "center," "longitudinal," "transverse," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, merely to facilitate description of the present application and simplify the description, and do not indicate or imply that the devices or elements referred to must have a specific orientation, be configured and operated in a specific orientation, and therefore should not be construed as limiting the scope of protection of the present application. Furthermore, the terms "first," "second," and the like, are used for descriptive purposes only and are not to be construed as indicating or implying a relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defining "a first", "a second", etc. may explicitly or implicitly include one or more such feature. In the description of the invention, unless otherwise indicated, the meaning of "a plurality" is two or more.
In the description of the present application, it should be noted that, unless explicitly specified and limited otherwise, the terms "mounted," "connected," and "connected" are to be construed broadly, and may be either fixedly connected, detachably connected, or integrally connected, for example; can be mechanically or electrically connected; can be directly connected or indirectly connected through an intermediate medium, and can be communication between two elements. The specific meaning of the terms in this application can be understood by those of ordinary skill in the art in a specific context.
The technical solutions of the present application will be described in detail below with reference to the accompanying drawings in combination with embodiments.
Examples
The present embodiment provides a wafer basket cleaning apparatus for a wafer cassette, as shown in fig. 1, including:
an outer frame 1;
the inner cylinder body 2 is cylindrical and is arranged in the outer frame 1, and the front end of the inner cylinder body is provided with an opening;
the rotary accommodating frame 3 comprises an intermediate shaft 35, a rotary supporting frame 31 which is freely rotatably arranged on the intermediate shaft 35, an accommodating frame 32 (which is connected with the rotary supporting frame 31 through a rotating shaft 325) which is used for fixing the wafer basket and the wafer box and is arranged on the rotary supporting frame 31, and a vertical spray pipe 36, wherein the accommodating frame 32 comprises two side plates 321 which are arranged in parallel, a plurality of baffle plates 322 and a vertical rod 323, the baffle plates 322 and the side plates 321 form a plurality of fixed spaces together in the height direction of the accommodating frame 32, the vertical rod 323 is arranged between the two side plates 321 so that the accommodating frame 32 forms an opening at one side (the opening is used for placing the wafer box and the wafer basket), a clamping block 324 is further arranged on the vertical rod 323 so as to clamp the wafer basket, a limiting component 33 is further arranged at the bottom of the accommodating frame 32 so that the accommodating frame 32 is fixed at the opening outwards or at the opening inwards, as shown in fig. 5, the limiting component 33 comprises a U-shaped elastic sheet 331 which is fixed on the rotary supporting frame 31, a projection 332 which is arranged on the rotating shaft 325, when the rotating shaft 325 rotates, the projection 332 is matched with the U-shaped elastic sheet 325, so that the projection 332 is arranged on the rotating shaft 325 and the U-shaped elastic sheet 32 are arranged on the rotating shaft, the corresponding to the vertical elastic sheet 32 is arranged on the rotating shaft 325, and the vertical spray pipe 36 is arranged at the position of the corresponding position of the vertical shaft 341, and the vertical spray pipe 341 is arranged on the middle part and is provided with the vertical channel 341, and the vertical spray pipe 36;
a wash pump 4 for pumping the wash pump into the vertical spout 36;
and the motor 5 is used for driving the intermediate shaft 35 to rotate so as to drive the vertical spray pipe 36 to rotate.
The wafer basket cleaning device for the wafer box of the embodiment, the rotating support frame 31 can enable the accommodating frame 32 to revolve (manually rotate, manually rotate up and down the wafer box and the wafer basket), so that the corresponding accommodating frame 32 can be conveniently rotated to the opening of the corresponding inner cylinder body 2, meanwhile, the accommodating frame 32 can also rotate, when the accommodating frame 32 is fixed to the opening outwards, the wafer basket and the wafer box can be conveniently taken and placed from the accommodating frame 32, and when the accommodating frame 32 is fixed to the opening inwards, cleaning operation can be performed. Meanwhile, the motor 5 only drives the intermediate shaft 35 to rotate so as to drive the vertical spray pipe 36 to rotate (without driving the rotary supporting frame 31 to rotate), and the vertical spray pipe 36 rotates to cover all the accommodating frames 32, so that the rotary component is few, and the structure is simpler.
Further, the rotating support frame 31, as shown in fig. 6, includes two disks 311 at the top and bottom, and a link 312 (3) connecting the two disks 311.
Further, the bottom of the rotary support frame 31 is provided with an air inlet 342 and communicates with a communication passage 3411 in the mounting block 341 through a hollow passage 351 of the intermediate shaft 35, and the air inlet 342 is connected with the wash pump 4 through a pipe.
Further, as shown in fig. 3, the number of fixing spaces on each accommodating frame 32 is 3, wherein the upper and lower positions are used for fixing the wafer basket, and the middle is used for fixing the wafer cassette.
Further, a motor 5 and a cleaning pump 4 are both provided at the lower portion of the outer frame 1.
Further, a first moving sealing disc 72 and a second moving sealing disc 75 are arranged at the top of the intermediate shaft 35, a first fixed sealing disc 71 and a second fixed sealing disc 76 are fixed on the inner cylinder 2, a first sealing ring 73 is arranged on the first moving sealing disc 72, a second sealing ring 77 is arranged on the second fixed sealing disc 76, the first sealing ring 73 seals a gap between the first moving sealing disc 72 and the first fixed sealing disc 71, and the second sealing ring 77 seals a gap between the second moving sealing disc 75 and the second fixed sealing disc 76.
Further, a sealing protrusion 74 is provided on the first fixed sealing plate 71 to be engaged with the first sealing ring 73.
The intermediate shaft 35 has bearings at the top and bottom. By the above-mentioned sealing structure, the cleaning liquid is not easy to enter the bearings at the top and bottom of the intermediate shaft 35.
With the above-described preferred embodiments according to the present application as a teaching, the related workers can make various changes and modifications without departing from the scope of the technical idea of the present application. The technical scope of the present application is not limited to the contents of the specification, and must be determined according to the scope of claims.
Claims (8)
1. A wafer cassette wafer basket cleaning apparatus comprising:
an outer frame (1);
the inner cylinder body (2) is cylindrical and is arranged in the outer frame (1), and the front end of the inner cylinder body is provided with an opening;
the wafer basket and wafer box rotating and accommodating device comprises a rotating and accommodating frame (3) and an accommodating frame (32) and a vertical spray pipe (36), wherein the rotating and accommodating frame (31) is arranged on the middle shaft (35) in a free rotation mode, the accommodating frame (32) is used for fixing the wafer basket and the wafer box and comprises two side plates (321), a plurality of partition plates (322) and a vertical rod (323) which are arranged in parallel, the partition plates (322) and the side plates (321) form a plurality of fixing spaces in the height direction together with the accommodating frame (32), the fixing spaces are used for fixing the wafer basket and the wafer box, the vertical rod (323) is arranged between the two side plates (321) so that the accommodating frame (32) forms an opening on one side, a limiting assembly (33) is further arranged on the bottom of the accommodating frame (32) so that the accommodating frame (32) is fixed in a state that the opening faces outwards or faces inwards, a mounting block (341) is arranged on the middle shaft (35), and the vertical spray pipe (341) is provided with a clamping block (324) which is arranged on the middle channel (341);
a wash pump (4) for pumping the wash pump into the vertical lance (36);
and the motor (5) is used for driving the intermediate shaft (35) to rotate so as to drive the vertical spray pipe (36) to rotate.
2. The wafer cassette basket cleaning apparatus of claim 1, wherein the limiting assembly (33) includes a U-shaped spring piece (331) fixed on the rotating support frame (31), and a protrusion (332) disposed on the rotating shaft (325), and when the rotating shaft (325) rotates, the protrusion (332) cooperates with the U-shaped spring piece (331) to fix the accommodating frame (32) in a corresponding position.
3. The wafer cassette wafer basket cleaning apparatus of claim 1, wherein the rotating support (31) comprises two disks (311) at the top and bottom and a link (312) connecting the two disks (311).
4. The wafer cassette wafer basket cleaning apparatus according to claim 1, wherein the bottom of the rotary support frame (31) is provided with an air inlet (342) and communicates with a communication channel (3411) in the mounting block (341) through a hollow channel (351) of the intermediate shaft (35), the air inlet (342) being connected with the cleaning pump (4) through a pipe.
5. The cassette basket cleaning apparatus of claim 1 wherein there are 3 holding spaces on each receiving rack (32), two positions above and below for holding cassettes, and a middle for holding cassettes.
6. Wafer cassette wafer basket cleaning apparatus according to claim 1, characterized in that a motor (5) and a cleaning pump (4) are both provided in the lower part of the outer frame (1).
7. Wafer cassette wafer basket cleaning apparatus according to claim 1, characterized in that the top of the intermediate shaft (35) is provided with a first moving sealing disc (72) and a second moving sealing disc (75), a first fixed sealing disc (71) and a second fixed sealing disc (76) fixed on the inner cylinder (2), a first sealing ring (73) is provided on the first moving sealing disc (72), a second sealing ring (77) is provided on the second fixed sealing disc (76), the first sealing ring (73) seals a gap between the first moving sealing disc (72) and the first fixed sealing disc (71), and the second sealing ring (77) seals a gap between the second moving sealing disc (75) and the second fixed sealing disc (76).
8. The wafer cassette wafer basket cleaning apparatus of claim 7, wherein the first stationary sealing plate (71) is provided with sealing bumps (74) to mate with the first sealing ring (73).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202211688793.1A CN116037592A (en) | 2022-12-27 | 2022-12-27 | Wafer basket cleaning equipment for wafer box |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202211688793.1A CN116037592A (en) | 2022-12-27 | 2022-12-27 | Wafer basket cleaning equipment for wafer box |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN116037592A true CN116037592A (en) | 2023-05-02 |
Family
ID=86112527
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202211688793.1A Pending CN116037592A (en) | 2022-12-27 | 2022-12-27 | Wafer basket cleaning equipment for wafer box |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN116037592A (en) |
Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20010047812A1 (en) * | 1998-07-10 | 2001-12-06 | Charles James Bryer | Cleaning apparatus |
| TWI223345B (en) * | 2001-07-12 | 2004-11-01 | Semitool Inc | Method and apparatus for cleaning semiconductor wafers and other flat media |
| CN101761649A (en) * | 2008-12-15 | 2010-06-30 | 张家港市欣达机械制造有限公司 | Sealing device in blender mixer |
| CN101940459A (en) * | 2010-09-08 | 2011-01-12 | 陆绍章 | Rotating brush dish-washing ultraviolet light sterilizer |
| US20110284038A1 (en) * | 2010-05-18 | 2011-11-24 | Deviceeng Co., Ltd. | Wafer Container Cleaning Device |
| CN103615543A (en) * | 2013-11-14 | 2014-03-05 | 孙家鼎 | Labyrinth-type shaft seal disc |
| CN110808219A (en) * | 2019-11-01 | 2020-02-18 | 江苏亚电科技有限公司 | Wafer storage box cleaning device and cleaning method |
| CN210541309U (en) * | 2019-05-09 | 2020-05-19 | 东莞优乐家智能家电有限公司 | Dust suction device with standing function |
| CN219292309U (en) * | 2022-12-27 | 2023-07-04 | 无锡亚电智能装备有限公司 | Wafer basket cleaning mechanism |
-
2022
- 2022-12-27 CN CN202211688793.1A patent/CN116037592A/en active Pending
Patent Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20010047812A1 (en) * | 1998-07-10 | 2001-12-06 | Charles James Bryer | Cleaning apparatus |
| TWI223345B (en) * | 2001-07-12 | 2004-11-01 | Semitool Inc | Method and apparatus for cleaning semiconductor wafers and other flat media |
| CN101761649A (en) * | 2008-12-15 | 2010-06-30 | 张家港市欣达机械制造有限公司 | Sealing device in blender mixer |
| US20110284038A1 (en) * | 2010-05-18 | 2011-11-24 | Deviceeng Co., Ltd. | Wafer Container Cleaning Device |
| CN101940459A (en) * | 2010-09-08 | 2011-01-12 | 陆绍章 | Rotating brush dish-washing ultraviolet light sterilizer |
| CN103615543A (en) * | 2013-11-14 | 2014-03-05 | 孙家鼎 | Labyrinth-type shaft seal disc |
| CN210541309U (en) * | 2019-05-09 | 2020-05-19 | 东莞优乐家智能家电有限公司 | Dust suction device with standing function |
| CN110808219A (en) * | 2019-11-01 | 2020-02-18 | 江苏亚电科技有限公司 | Wafer storage box cleaning device and cleaning method |
| CN219292309U (en) * | 2022-12-27 | 2023-07-04 | 无锡亚电智能装备有限公司 | Wafer basket cleaning mechanism |
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