EP1404463A4 - Method and apparatus for cleaning semiconductor wafers and other flat media - Google Patents
Method and apparatus for cleaning semiconductor wafers and other flat mediaInfo
- Publication number
- EP1404463A4 EP1404463A4 EP02749953A EP02749953A EP1404463A4 EP 1404463 A4 EP1404463 A4 EP 1404463A4 EP 02749953 A EP02749953 A EP 02749953A EP 02749953 A EP02749953 A EP 02749953A EP 1404463 A4 EP1404463 A4 EP 1404463A4
- Authority
- EP
- European Patent Office
- Prior art keywords
- semiconductor wafers
- cleaning semiconductor
- flat media
- media
- flat
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US108278 | 1998-07-01 | ||
US90503001A | 2001-07-12 | 2001-07-12 | |
US905030 | 2001-07-12 | ||
US10/108,278 US6691718B2 (en) | 1999-07-28 | 2002-03-26 | Wafer container cleaning system |
PCT/US2002/021997 WO2003006183A2 (en) | 2001-07-12 | 2002-07-09 | Method and apparatus for cleaning semiconductor wafers and other flat media |
Publications (2)
Publication Number | Publication Date |
---|---|
EP1404463A2 EP1404463A2 (en) | 2004-04-07 |
EP1404463A4 true EP1404463A4 (en) | 2004-10-06 |
Family
ID=26805734
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP02749953A Withdrawn EP1404463A4 (en) | 2001-07-12 | 2002-07-09 | Method and apparatus for cleaning semiconductor wafers and other flat media |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP1404463A4 (en) |
JP (1) | JP2004535071A (en) |
TW (1) | TWI223345B (en) |
WO (1) | WO2003006183A2 (en) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101886414B1 (en) * | 2016-09-27 | 2018-08-09 | 주식회사 유닉 | Apparatus and system for cleaning wafer container |
CN108565235B (en) * | 2018-05-31 | 2024-03-01 | 亚智系统科技(苏州)有限公司 | Surface treatment and packaging system for fan-out type wafer-level chip and operation method |
SG11202100082XA (en) | 2018-07-06 | 2021-02-25 | Oem Group Llc | Systems and methods for a spray measurement apparatus |
CN108940996A (en) * | 2018-07-27 | 2018-12-07 | 深圳市凯尔迪光电科技有限公司 | High-accuracy integrated circuit eccentric cleaning equipment |
CN111081594B (en) * | 2019-09-25 | 2022-09-30 | 北京时代民芯科技有限公司 | Cleaning tool and method for JLCC image sensor circuit before packaging |
CN110808219B (en) * | 2019-11-01 | 2021-05-14 | 江苏亚电科技有限公司 | Wafer storage box cleaning device and cleaning method |
CN112191588B (en) * | 2020-09-18 | 2021-12-21 | 程瑶 | Cleaning machine and cleaning method matched with solar power generation panel in production process |
KR102587371B1 (en) * | 2020-12-21 | 2023-10-12 | 주식회사 뉴파워 프라즈마 | Cleaning chamber including lifting cover door, glass chemical-strengthening apparatus including the same and method for strengthening ultra thin glass |
CN115338173B (en) * | 2022-08-31 | 2023-09-26 | 浙江中科智谷光电科技有限公司 | Cleaning equipment for liquid crystal module processing and control method |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5972127A (en) * | 1992-06-15 | 1999-10-26 | Thompson; Raymon F. | Methods for centrifugally cleaning wafer carriers |
US6412502B1 (en) * | 1999-07-28 | 2002-07-02 | Semitool, Inc. | Wafer container cleaning system |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4437479A (en) * | 1981-12-30 | 1984-03-20 | Atcor | Decontamination apparatus for semiconductor wafer handling equipment |
US4736759A (en) * | 1986-02-21 | 1988-04-12 | Robert A. Coberly | Apparatus for cleaning rinsing and drying substrates |
US5238503A (en) * | 1991-04-09 | 1993-08-24 | International Business Machines Corporation | Device for decontaminating a semiconductor wafer container |
EP0552756A1 (en) * | 1992-01-21 | 1993-07-28 | Shinko Electric Co. Ltd. | Article storage house in a clean room |
US5301700A (en) * | 1992-03-05 | 1994-04-12 | Tokyo Electron Limited | Washing system |
US5520205A (en) * | 1994-07-01 | 1996-05-28 | Texas Instruments Incorporated | Apparatus for wafer cleaning with rotation |
US6096100A (en) * | 1997-12-12 | 2000-08-01 | Texas Instruments Incorporated | Method for processing wafers and cleaning wafer-handling implements |
DE19740352A1 (en) * | 1997-09-13 | 1999-03-18 | Zf Frledrichshafen Aktiengesel | Vehicle power steering valve with centering device |
US6248177B1 (en) * | 1998-01-09 | 2001-06-19 | Fluoroware, Inc. | Method of cleaning a wafer carrier |
-
2002
- 2002-07-09 EP EP02749953A patent/EP1404463A4/en not_active Withdrawn
- 2002-07-09 WO PCT/US2002/021997 patent/WO2003006183A2/en active Application Filing
- 2002-07-09 JP JP2003511982A patent/JP2004535071A/en active Pending
- 2002-07-12 TW TW91115539A patent/TWI223345B/en not_active IP Right Cessation
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5972127A (en) * | 1992-06-15 | 1999-10-26 | Thompson; Raymon F. | Methods for centrifugally cleaning wafer carriers |
EP1191575A2 (en) * | 1992-06-15 | 2002-03-27 | Semitool, Inc. | Centrifugal wafer carrier cleaning apparatus |
US6412502B1 (en) * | 1999-07-28 | 2002-07-02 | Semitool, Inc. | Wafer container cleaning system |
Also Published As
Publication number | Publication date |
---|---|
JP2004535071A (en) | 2004-11-18 |
WO2003006183A2 (en) | 2003-01-23 |
WO2003006183A3 (en) | 2003-02-27 |
EP1404463A2 (en) | 2004-04-07 |
TWI223345B (en) | 2004-11-01 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
17P | Request for examination filed |
Effective date: 20040114 |
|
AK | Designated contracting states |
Kind code of ref document: A2 Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR IE IT LI LU MC NL PT |
|
AX | Request for extension of the european patent |
Extension state: AL LT LV MK RO SI |
|
RBV | Designated contracting states (corrected) |
Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR IE IT LI LU MC NL PT SE SK TR |
|
A4 | Supplementary search report drawn up and despatched |
Effective date: 20040825 |
|
17Q | First examination report despatched |
Effective date: 20090623 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN |
|
18D | Application deemed to be withdrawn |
Effective date: 20110201 |