EP1291132A3 - Semiconductor wafer polishing apparatus and polishing method - Google Patents
Semiconductor wafer polishing apparatus and polishing method Download PDFInfo
- Publication number
- EP1291132A3 EP1291132A3 EP02019759A EP02019759A EP1291132A3 EP 1291132 A3 EP1291132 A3 EP 1291132A3 EP 02019759 A EP02019759 A EP 02019759A EP 02019759 A EP02019759 A EP 02019759A EP 1291132 A3 EP1291132 A3 EP 1291132A3
- Authority
- EP
- European Patent Office
- Prior art keywords
- semiconductor wafer
- polishing
- polishing apparatus
- polishing method
- wafer polishing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B9/00—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor
- B24B9/02—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground
- B24B9/06—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain
- B24B9/065—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain of thin, brittle parts, e.g. semiconductors, wafers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B41/00—Component parts such as frames, beds, carriages, headstocks
- B24B41/005—Feeding or manipulating devices specially adapted to grinding machines
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001269640 | 2001-09-06 | ||
JP2001269640A JP2003077872A (en) | 2001-09-06 | 2001-09-06 | Semiconductor wafer polishing equipment and polishing method |
Publications (2)
Publication Number | Publication Date |
---|---|
EP1291132A2 EP1291132A2 (en) | 2003-03-12 |
EP1291132A3 true EP1291132A3 (en) | 2004-03-31 |
Family
ID=19095422
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP02019759A Pending EP1291132A3 (en) | 2001-09-06 | 2002-09-04 | Semiconductor wafer polishing apparatus and polishing method |
Country Status (3)
Country | Link |
---|---|
EP (1) | EP1291132A3 (en) |
JP (1) | JP2003077872A (en) |
TW (1) | TWI241229B (en) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2006112532A1 (en) * | 2005-04-19 | 2006-10-26 | Ebara Corporation | Substrate processing apparatus |
JP4849482B2 (en) * | 2008-05-02 | 2012-01-11 | スピードファム株式会社 | Underwater aligner for semiconductor wafers with notches |
FR2995136B1 (en) | 2012-09-04 | 2015-06-26 | Soitec Silicon On Insulator | PSEUDO-SUBSTRATE WITH IMPROVED EFFICIENCY OF USE OF MONOCRYSTALLINE MATERIAL |
JP6589807B2 (en) * | 2016-10-13 | 2019-10-16 | 株式会社Sumco | Silicon wafer polishing method, silicon wafer manufacturing method, and silicon wafer |
CN109605207A (en) * | 2018-12-27 | 2019-04-12 | 西安奕斯伟硅片技术有限公司 | Wafer processing method and device |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5769695A (en) * | 1994-11-28 | 1998-06-23 | Tokyo Seimitsu Co., Ltd. | Chamfer grinding system for wafer |
JP2000124172A (en) * | 1998-10-19 | 2000-04-28 | Tokyo Seimitsu Co Ltd | Processing of wafer and device thereof |
EP1004400A1 (en) * | 1998-11-27 | 2000-05-31 | SpeedFam- IPEC Co., Ltd. | Method for polishing a notch of a wafer |
EP1120191A2 (en) * | 2000-01-28 | 2001-08-01 | TSK America, Inc. | Wafer processing machine |
-
2001
- 2001-09-06 JP JP2001269640A patent/JP2003077872A/en active Pending
-
2002
- 2002-08-21 TW TW91118855A patent/TWI241229B/en not_active IP Right Cessation
- 2002-09-04 EP EP02019759A patent/EP1291132A3/en active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5769695A (en) * | 1994-11-28 | 1998-06-23 | Tokyo Seimitsu Co., Ltd. | Chamfer grinding system for wafer |
JP2000124172A (en) * | 1998-10-19 | 2000-04-28 | Tokyo Seimitsu Co Ltd | Processing of wafer and device thereof |
EP1004400A1 (en) * | 1998-11-27 | 2000-05-31 | SpeedFam- IPEC Co., Ltd. | Method for polishing a notch of a wafer |
EP1120191A2 (en) * | 2000-01-28 | 2001-08-01 | TSK America, Inc. | Wafer processing machine |
Non-Patent Citations (1)
Title |
---|
PATENT ABSTRACTS OF JAPAN vol. 2000, no. 07 29 September 2000 (2000-09-29) * |
Also Published As
Publication number | Publication date |
---|---|
EP1291132A2 (en) | 2003-03-12 |
JP2003077872A (en) | 2003-03-14 |
TWI241229B (en) | 2005-10-11 |
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Legal Events
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AX | Request for extension of the european patent |
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PUAL | Search report despatched |
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RIC1 | Information provided on ipc code assigned before grant |
Ipc: 7B 24B 9/06 B Ipc: 7B 24B 41/00 A |
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17P | Request for examination filed |
Effective date: 20040430 |
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17Q | First examination report despatched |
Effective date: 20040628 |
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AKX | Designation fees paid |
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STAA | Information on the status of an ep patent application or granted ep patent |
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