EP1404463A4 - Method and apparatus for cleaning semiconductor wafers and other flat media - Google Patents

Method and apparatus for cleaning semiconductor wafers and other flat media

Info

Publication number
EP1404463A4
EP1404463A4 EP02749953A EP02749953A EP1404463A4 EP 1404463 A4 EP1404463 A4 EP 1404463A4 EP 02749953 A EP02749953 A EP 02749953A EP 02749953 A EP02749953 A EP 02749953A EP 1404463 A4 EP1404463 A4 EP 1404463A4
Authority
EP
European Patent Office
Prior art keywords
semiconductor wafers
cleaning semiconductor
flat media
media
flat
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP02749953A
Other languages
German (de)
English (en)
French (fr)
Other versions
EP1404463A2 (en
Inventor
Daniel P Bexten
James Bryer
Jerry R Norby
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Semitool Inc
Original Assignee
Semitool Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US10/108,278 external-priority patent/US6691718B2/en
Application filed by Semitool Inc filed Critical Semitool Inc
Publication of EP1404463A2 publication Critical patent/EP1404463A2/en
Publication of EP1404463A4 publication Critical patent/EP1404463A4/en
Withdrawn legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H10P72/0411—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02—Cleaning by the force of jets or sprays
EP02749953A 2001-07-12 2002-07-09 Method and apparatus for cleaning semiconductor wafers and other flat media Withdrawn EP1404463A4 (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US108278 1998-07-01
US90503001A 2001-07-12 2001-07-12
US905030 2001-07-12
US10/108,278 US6691718B2 (en) 1999-07-28 2002-03-26 Wafer container cleaning system
PCT/US2002/021997 WO2003006183A2 (en) 2001-07-12 2002-07-09 Method and apparatus for cleaning semiconductor wafers and other flat media

Publications (2)

Publication Number Publication Date
EP1404463A2 EP1404463A2 (en) 2004-04-07
EP1404463A4 true EP1404463A4 (en) 2004-10-06

Family

ID=26805734

Family Applications (1)

Application Number Title Priority Date Filing Date
EP02749953A Withdrawn EP1404463A4 (en) 2001-07-12 2002-07-09 Method and apparatus for cleaning semiconductor wafers and other flat media

Country Status (4)

Country Link
EP (1) EP1404463A4 (https=)
JP (1) JP2004535071A (https=)
TW (1) TWI223345B (https=)
WO (1) WO2003006183A2 (https=)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101886414B1 (ko) * 2016-09-27 2018-08-09 주식회사 유닉 웨이퍼 용기 클리닝 장치 및 시스템
CN108565235B (zh) * 2018-05-31 2024-03-01 亚智系统科技(苏州)有限公司 用于扇出型晶圆级芯片的表面处理、封装系统及操作方法
CN112638557B (zh) * 2018-07-06 2023-02-03 谢尔贝克半导体技术有限公司 用于喷洒测量设备的系统和方法
CN108940996A (zh) * 2018-07-27 2018-12-07 深圳市凯尔迪光电科技有限公司 高精密集成电路离心清洗设备
CN111081594B (zh) * 2019-09-25 2022-09-30 北京时代民芯科技有限公司 一种jlcc图像传感器电路封装前的清洗工装及方法
CN110808219B (zh) * 2019-11-01 2021-05-14 江苏亚电科技有限公司 一种晶圆存放盒清洗装置及清洗方法
CN112191588B (zh) * 2020-09-18 2021-12-21 程瑶 太阳能发电板生产过程配用清洁机及清洗方法
KR102587371B1 (ko) * 2020-12-21 2023-10-12 주식회사 뉴파워 프라즈마 리프팅 커버 도어를 포함하는 글라스 세정 챔버, 이를 포함하는 글라스 화학 강화 설비, 및 초박형 글라스의 화학 강화 방법
CN115338173B (zh) * 2022-08-31 2023-09-26 浙江中科智谷光电科技有限公司 一种液晶模组加工用清洗设备以及控制方法
CN116037592A (zh) * 2022-12-27 2023-05-02 无锡亚电智能装备有限公司 晶圆盒晶圆篮清洗设备
CN117206242B (zh) * 2023-10-03 2024-08-13 上海芯畀科技有限公司 半自动离心式晶圆传送盒清洗机
CN117644074A (zh) * 2024-01-30 2024-03-05 深圳市龙图光罩股份有限公司 掩模版清洗方法、装置、终端设备以及存储介质

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5972127A (en) * 1992-06-15 1999-10-26 Thompson; Raymon F. Methods for centrifugally cleaning wafer carriers
US6412502B1 (en) * 1999-07-28 2002-07-02 Semitool, Inc. Wafer container cleaning system

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4437479A (en) * 1981-12-30 1984-03-20 Atcor Decontamination apparatus for semiconductor wafer handling equipment
US4736759A (en) * 1986-02-21 1988-04-12 Robert A. Coberly Apparatus for cleaning rinsing and drying substrates
US5238503A (en) * 1991-04-09 1993-08-24 International Business Machines Corporation Device for decontaminating a semiconductor wafer container
EP0552756A1 (en) * 1992-01-21 1993-07-28 Shinko Electric Co. Ltd. Article storage house in a clean room
US5301700A (en) * 1992-03-05 1994-04-12 Tokyo Electron Limited Washing system
US5520205A (en) * 1994-07-01 1996-05-28 Texas Instruments Incorporated Apparatus for wafer cleaning with rotation
US6096100A (en) * 1997-12-12 2000-08-01 Texas Instruments Incorporated Method for processing wafers and cleaning wafer-handling implements
DE19740352A1 (de) * 1997-09-13 1999-03-18 Zf Frledrichshafen Aktiengesel Verfahren zum Montieren eines Lenkventils mit einer Zentriereinheit
US6248177B1 (en) * 1998-01-09 2001-06-19 Fluoroware, Inc. Method of cleaning a wafer carrier

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5972127A (en) * 1992-06-15 1999-10-26 Thompson; Raymon F. Methods for centrifugally cleaning wafer carriers
EP1191575A2 (en) * 1992-06-15 2002-03-27 Semitool, Inc. Centrifugal wafer carrier cleaning apparatus
US6412502B1 (en) * 1999-07-28 2002-07-02 Semitool, Inc. Wafer container cleaning system

Also Published As

Publication number Publication date
EP1404463A2 (en) 2004-04-07
WO2003006183A2 (en) 2003-01-23
TWI223345B (en) 2004-11-01
JP2004535071A (ja) 2004-11-18
WO2003006183A3 (en) 2003-02-27

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Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR IE IT LI LU MC NL PT SE SK TR

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