TWD231014S - 基板處理裝置用爐之部分 - Google Patents

基板處理裝置用爐之部分 Download PDF

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Publication number
TWD231014S
TWD231014S TW111303580F TW111303580F TWD231014S TW D231014 S TWD231014 S TW D231014S TW 111303580 F TW111303580 F TW 111303580F TW 111303580 F TW111303580 F TW 111303580F TW D231014 S TWD231014 S TW D231014S
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TW
Taiwan
Prior art keywords
furnace
substrate processing
article
design
processing equipment
Prior art date
Application number
TW111303580F
Other languages
English (en)
Chinese (zh)
Inventor
立野秀人
山口天和
木本大幾
Original Assignee
日商國際電氣股份有限公司 (日本)
日商國際電氣股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 日商國際電氣股份有限公司 (日本), 日商國際電氣股份有限公司 filed Critical 日商國際電氣股份有限公司 (日本)
Publication of TWD231014S publication Critical patent/TWD231014S/zh

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TW111303580F 2022-03-15 2022-07-20 基板處理裝置用爐之部分 TWD231014S (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2022-005265 2022-01-17
JP2022005265F JP1731671S (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 2022-03-15 2022-03-15

Publications (1)

Publication Number Publication Date
TWD231014S true TWD231014S (zh) 2024-05-01

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TW111303580F TWD231014S (zh) 2022-03-15 2022-07-20 基板處理裝置用爐之部分

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US (1) USD1070797S1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP (1) JP1731671S (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
TW (1) TWD231014S (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP1713190S (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 2021-10-01 2022-04-21

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWD213081S (zh) 2020-06-15 2021-08-01 日商東京威力科創股份有限公司 半導體製造裝置用反應管（一）

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NL1005963C2 (nl) * 1997-05-02 1998-11-09 Asm Int Verticale oven voor het behandelen van halfgeleidersubstraten.
TWD127410S1 (zh) * 2007-04-20 2009-02-11 東京威力科創股份有限公司 半導體製造用製程管
TWD143034S1 (zh) * 2008-03-28 2011-10-01 東京威力科創股份有限公司 半導體製造用處理管
USD610559S1 (en) * 2008-05-30 2010-02-23 Hitachi Kokusai Electric, Inc. Reaction tube
USD725053S1 (en) * 2011-11-18 2015-03-24 Tokyo Electron Limited Outer tube for process tube for manufacturing semiconductor wafers
USD720309S1 (en) * 2011-11-18 2014-12-30 Tokyo Electron Limited Inner tube for process tube for manufacturing semiconductor wafers
USD739832S1 (en) * 2013-06-28 2015-09-29 Hitachi Kokusai Electric Inc. Reaction tube
TWD167985S (zh) * 2013-06-28 2015-05-21 日立國際電氣股份有限公司 反應管之部分
TWD167986S (zh) * 2013-06-28 2015-05-21 日立國際電氣股份有限公司 反應管之部分
TWD168774S (zh) * 2013-06-28 2015-07-01 日立國際電氣股份有限公司 反應管之部分
TWD167987S (zh) * 2013-06-28 2015-05-21 日立國際電氣股份有限公司 反應管之部分
JP1535455S (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 2015-02-25 2015-10-19
JP1546512S (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 2015-09-04 2016-03-22
JP1548462S (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 2015-09-04 2016-04-25
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JP1605462S (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 2017-08-10 2021-05-31
JP1605461S (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 2017-08-10 2021-05-31
JP1605982S (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 2017-12-27 2021-05-31
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JP1620676S (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 2018-02-27 2018-12-17
JP1644260S (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 2019-03-20 2019-10-28
JP7317912B2 (ja) * 2021-09-21 2023-07-31 株式会社Kokusai Electric 炉口部構造、基板処理装置、および半導体装置の製造方法
JP1731672S (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 2022-03-15 2022-12-08

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWD213081S (zh) 2020-06-15 2021-08-01 日商東京威力科創股份有限公司 半導體製造裝置用反應管（一）

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Publication number Publication date
JP1731671S (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 2022-12-08
USD1070797S1 (en) 2025-04-15

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