JP1731671S - - Google Patents

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Publication number
JP1731671S
JP1731671S JP2022005265F JP2022005265F JP1731671S JP 1731671 S JP1731671 S JP 1731671S JP 2022005265 F JP2022005265 F JP 2022005265F JP 2022005265 F JP2022005265 F JP 2022005265F JP 1731671 S JP1731671 S JP 1731671S
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2022005265F
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Japanese (ja)
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Publication date
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Priority to JP2022005265F priority Critical patent/JP1731671S/ja
Priority to TW111303580F priority patent/TWD231014S/zh
Priority to US29/849,023 priority patent/USD1070797S1/en
Application granted granted Critical
Publication of JP1731671S publication Critical patent/JP1731671S/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2022005265F 2022-03-15 2022-03-15 Active JP1731671S (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2022005265F JP1731671S (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 2022-03-15 2022-03-15
TW111303580F TWD231014S (zh) 2022-03-15 2022-07-20 基板處理裝置用爐之部分
US29/849,023 USD1070797S1 (en) 2022-03-15 2022-08-08 Furnace for substrate processing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2022005265F JP1731671S (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 2022-03-15 2022-03-15

Publications (1)

Publication Number Publication Date
JP1731671S true JP1731671S (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 2022-12-08

Family

ID=84322296

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022005265F Active JP1731671S (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 2022-03-15 2022-03-15

Country Status (3)

Country Link
US (1) USD1070797S1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP (1) JP1731671S (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
TW (1) TWD231014S (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP1713190S (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 2021-10-01 2022-04-21

Family Cites Families (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD406113S (en) * 1997-01-31 1999-02-23 Tokyo Electron Limited Processing tube for use in a semiconductor wafer heat processing apparatus
NL1005963C2 (nl) * 1997-05-02 1998-11-09 Asm Int Verticale oven voor het behandelen van halfgeleidersubstraten.
TWD127410S1 (zh) * 2007-04-20 2009-02-11 東京威力科創股份有限公司 半導體製造用製程管
TWD143034S1 (zh) * 2008-03-28 2011-10-01 東京威力科創股份有限公司 半導體製造用處理管
USD610559S1 (en) * 2008-05-30 2010-02-23 Hitachi Kokusai Electric, Inc. Reaction tube
USD725053S1 (en) * 2011-11-18 2015-03-24 Tokyo Electron Limited Outer tube for process tube for manufacturing semiconductor wafers
USD720309S1 (en) * 2011-11-18 2014-12-30 Tokyo Electron Limited Inner tube for process tube for manufacturing semiconductor wafers
USD739832S1 (en) * 2013-06-28 2015-09-29 Hitachi Kokusai Electric Inc. Reaction tube
TWD167985S (zh) * 2013-06-28 2015-05-21 日立國際電氣股份有限公司 反應管之部分
TWD167986S (zh) * 2013-06-28 2015-05-21 日立國際電氣股份有限公司 反應管之部分
TWD168774S (zh) * 2013-06-28 2015-07-01 日立國際電氣股份有限公司 反應管之部分
TWD167987S (zh) * 2013-06-28 2015-05-21 日立國際電氣股份有限公司 反應管之部分
JP1535455S (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 2015-02-25 2015-10-19
JP1546512S (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 2015-09-04 2016-03-22
JP1548462S (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 2015-09-04 2016-04-25
JP1546345S (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 2015-09-04 2016-03-22
JP1568553S (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 2016-02-12 2017-02-06
JP1568552S (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 2016-02-12 2017-02-06
JP1563524S (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 2016-03-30 2016-11-21
JP1582475S (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 2016-10-14 2017-07-31
JP1605462S (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 2017-08-10 2021-05-31
JP1605461S (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 2017-08-10 2021-05-31
JP1605982S (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 2017-12-27 2021-05-31
JP1611565S (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 2018-02-27 2018-08-20
JP1620676S (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 2018-02-27 2018-12-17
JP1644260S (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 2019-03-20 2019-10-28
JP1682719S (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 2020-06-15 2021-04-05
JP7317912B2 (ja) * 2021-09-21 2023-07-31 株式会社Kokusai Electric 炉口部構造、基板処理装置、および半導体装置の製造方法
JP1731672S (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 2022-03-15 2022-12-08

Also Published As

Publication number Publication date
TWD231014S (zh) 2024-05-01
USD1070797S1 (en) 2025-04-15

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