TWD231014S - Part of the furnace for substrate processing equipment - Google Patents

Part of the furnace for substrate processing equipment Download PDF

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Publication number
TWD231014S
TWD231014S TW111303580F TW111303580F TWD231014S TW D231014 S TWD231014 S TW D231014S TW 111303580 F TW111303580 F TW 111303580F TW 111303580 F TW111303580 F TW 111303580F TW D231014 S TWD231014 S TW D231014S
Authority
TW
Taiwan
Prior art keywords
furnace
substrate processing
processing equipment
substrate
article
Prior art date
Application number
TW111303580F
Other languages
Chinese (zh)
Inventor
立野秀人
山口天和
木本大幾
Original Assignee
日商國際電氣股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商國際電氣股份有限公司 filed Critical 日商國際電氣股份有限公司
Publication of TWD231014S publication Critical patent/TWD231014S/en

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Description

基板處理裝置用爐之部分Part of the furnace for substrate processing equipment

本設計的物品是基板處理裝置用爐，為一種使用在對於基板進行熱處理的基板處理裝置的爐。The article of this design is a furnace for a substrate processing device, which is a furnace used in a substrate processing device for performing heat treatment on a substrate.

本物品，係在本體的正面側及背面側形成有開縫，用來避開設於所收容的處理容器上的氣體供給部和氣體排出部。The article has slits formed on the front side and the back side of the main body to avoid the gas supply part and the gas exhaust part provided on the processing container to be accommodated.

圖式中所揭露之虛線部分，為本案不主張設計之部分。The dotted line part in the diagram is not the design advocated by this case.

TW111303580F 2022-03-15 2022-07-20 Part of the furnace for substrate processing equipment TWD231014S (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2022-005265 2022-01-17

Publications (1)

Publication Number Publication Date
TWD231014S true TWD231014S (en) 2024-05-01

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Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWD213081S (en) 2020-06-15 2021-08-01 日商東京威力科創股份有限公司 Reaction tube for semiconductor manufacturing equipment (1)

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWD213081S (en) 2020-06-15 2021-08-01 日商東京威力科創股份有限公司 Reaction tube for semiconductor manufacturing equipment (1)

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