TW529043B - Transparent conductive film - Google Patents

Transparent conductive film Download PDF

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Publication number
TW529043B
TW529043B TW090109074A TW90109074A TW529043B TW 529043 B TW529043 B TW 529043B TW 090109074 A TW090109074 A TW 090109074A TW 90109074 A TW90109074 A TW 90109074A TW 529043 B TW529043 B TW 529043B
Authority
TW
Taiwan
Prior art keywords
film
transparent conductive
patent application
conductive film
resistivity
Prior art date
Application number
TW090109074A
Other languages
English (en)
Chinese (zh)
Inventor
Hiromi Nakazawa
Kentaro Uchiumi
Yuichi Nagasaki
Satoshi Kurosawa
Original Assignee
Geomatec Co Ltd
Tosoh Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Geomatec Co Ltd, Tosoh Corp filed Critical Geomatec Co Ltd
Application granted granted Critical
Publication of TW529043B publication Critical patent/TW529043B/zh

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/033—Pointing devices displaced or positioned by the user, e.g. mice, trackballs, pens or joysticks; Accessories therefor
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B13/00—Apparatus or processes specially adapted for manufacturing conductors or cables
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B5/00—Non-insulated conductors or conductive bodies characterised by their form
    • H01B5/14—Non-insulated conductors or conductive bodies characterised by their form comprising conductive layers or films on insulating-supports

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Theoretical Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Human Computer Interaction (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)
  • Non-Insulated Conductors (AREA)
  • Position Input By Displaying (AREA)
  • Manufacturing Of Electric Cables (AREA)
TW090109074A 2000-04-24 2001-04-16 Transparent conductive film TW529043B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000122664A JP2001307553A (ja) 2000-04-24 2000-04-24 透明導電膜およびその製造方法並びにその用途

Publications (1)

Publication Number Publication Date
TW529043B true TW529043B (en) 2003-04-21

Family

ID=18633114

Family Applications (1)

Application Number Title Priority Date Filing Date
TW090109074A TW529043B (en) 2000-04-24 2001-04-16 Transparent conductive film

Country Status (3)

Country Link
JP (1) JP2001307553A (ja)
KR (1) KR100764616B1 (ja)
TW (1) TW529043B (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI552169B (zh) * 2012-01-12 2016-10-01 Geomatec Co Ltd A transparent conductive film, a substrate having a transparent conductive film, a IPS liquid crystal cell, an electrostatic capacitive touch panel, and a substrate having a transparent conductive film

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002042582A (ja) * 2000-07-25 2002-02-08 Nippon Sheet Glass Co Ltd 透明導電膜付き基板の製造方法、及び該製造方法により製造された透明導電膜付き基板、並びに該基板を用いたタッチパネル
JP4137936B2 (ja) 2005-11-16 2008-08-20 昭和電工株式会社 窒化ガリウム系化合物半導体発光素子
CN114008237A (zh) * 2019-06-28 2022-02-01 株式会社爱发科 溅射靶及溅射靶的制造方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62202415A (ja) * 1984-12-06 1987-09-07 三井金属鉱業株式会社 酸化インジウム系透明導電膜の製造法
JPH0465023A (ja) * 1990-07-03 1992-03-02 Tonen Corp 透明導電性フイルムおよびその製造方法
US5407602A (en) * 1993-10-27 1995-04-18 At&T Corp. Transparent conductors comprising gallium-indium-oxide
US6351068B2 (en) * 1995-12-20 2002-02-26 Mitsui Chemicals, Inc. Transparent conductive laminate and electroluminescence light-emitting element using same
TW364275B (en) * 1996-03-12 1999-07-11 Idemitsu Kosan Co Organic electroluminescent element and organic electroluminescent display device
JP3855307B2 (ja) * 1996-05-24 2006-12-06 東洋紡績株式会社 透明導電性フィルムおよびその製造法
JP3507623B2 (ja) * 1996-06-27 2004-03-15 シャープ株式会社 透明導電膜の製造方法及びそれを用いた薄膜太陽電池
JPH10330916A (ja) * 1997-06-03 1998-12-15 Mitsubishi Chem Corp 導電性積層体
JPH1161398A (ja) * 1997-08-12 1999-03-05 Tdk Corp 電極の製造方法および電極
JPH1167460A (ja) * 1997-08-12 1999-03-09 Tdk Corp 有機ｅｌ素子およびその製造方法
JP3542475B2 (ja) * 1997-11-28 2004-07-14 キヤノン株式会社 膜の製造法
JP3515688B2 (ja) * 1998-05-15 2004-04-05 株式会社神戸製鋼所 低電気抵抗透明導電膜
JP3780100B2 (ja) * 1998-05-15 2006-05-31 株式会社神戸製鋼所 加工性に優れた透明導電膜
JP3887494B2 (ja) * 1998-07-13 2007-02-28 株式会社リコー 薄膜形成装置及び薄膜形成方法
JP2000040591A (ja) * 1998-07-21 2000-02-08 Sony Corp 有機電界発光素子

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI552169B (zh) * 2012-01-12 2016-10-01 Geomatec Co Ltd A transparent conductive film, a substrate having a transparent conductive film, a IPS liquid crystal cell, an electrostatic capacitive touch panel, and a substrate having a transparent conductive film

Also Published As

Publication number Publication date
KR100764616B1 (ko) 2007-10-08
JP2001307553A (ja) 2001-11-02
KR20010098806A (ko) 2001-11-08

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