TW527636B - Exposure method, exposure apparatus and manufacturing method of device - Google Patents

Exposure method, exposure apparatus and manufacturing method of device Download PDF

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Publication number
TW527636B
TW527636B TW090102123A TW90102123A TW527636B TW 527636 B TW527636 B TW 527636B TW 090102123 A TW090102123 A TW 090102123A TW 90102123 A TW90102123 A TW 90102123A TW 527636 B TW527636 B TW 527636B
Authority
TW
Taiwan
Prior art keywords
exposure
aforementioned
substrate
patent application
pattern
Prior art date
Application number
TW090102123A
Other languages
English (en)
Chinese (zh)
Inventor
Hiroo Okuno
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Application granted granted Critical
Publication of TW527636B publication Critical patent/TW527636B/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70525—Controlling normal operating mode, e.g. matching different apparatus, remote control or prediction of failure

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW090102123A 2000-02-04 2001-02-02 Exposure method, exposure apparatus and manufacturing method of device TW527636B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2000028258 2000-02-04
JP2001021000A JP2001291662A (ja) 2000-02-04 2001-01-30 露光方法及び露光装置、並びにデバイス製造方法

Publications (1)

Publication Number Publication Date
TW527636B true TW527636B (en) 2003-04-11

Family

ID=26584919

Family Applications (1)

Application Number Title Priority Date Filing Date
TW090102123A TW527636B (en) 2000-02-04 2001-02-02 Exposure method, exposure apparatus and manufacturing method of device

Country Status (4)

Country Link
JP (1) JP2001291662A (ja)
KR (1) KR20010078323A (ja)
SG (1) SG94750A1 (ja)
TW (1) TW527636B (ja)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4548735B2 (ja) * 2006-11-14 2010-09-22 東京エレクトロン株式会社 基板処理システム
US9529275B2 (en) 2007-02-21 2016-12-27 Taiwan Semiconductor Manufacturing Company, Ltd. Lithography scanner throughput
JP6066592B2 (ja) * 2012-06-12 2017-01-25 キヤノン株式会社 露光装置及びデバイス製造方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000286181A (ja) * 1999-03-30 2000-10-13 Seiko Epson Corp 露光装置
JP2000284492A (ja) * 1999-03-30 2000-10-13 Seiko Epson Corp 露光装置、露光方法及びプログラムを記録した記憶媒体
JP2000340493A (ja) * 1999-05-31 2000-12-08 Nikon Corp 露光方法、露光システムおよびデバイス製造方法

Also Published As

Publication number Publication date
JP2001291662A (ja) 2001-10-19
KR20010078323A (ko) 2001-08-20
SG94750A1 (en) 2003-03-18

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GD4A Issue of patent certificate for granted invention patent
MM4A Annulment or lapse of patent due to non-payment of fees