SG94750A1 - Exposure method and exposure apparatus, and device manufacturing method - Google Patents
Exposure method and exposure apparatus, and device manufacturing methodInfo
- Publication number
- SG94750A1 SG94750A1 SG200100542A SG200100542A SG94750A1 SG 94750 A1 SG94750 A1 SG 94750A1 SG 200100542 A SG200100542 A SG 200100542A SG 200100542 A SG200100542 A SG 200100542A SG 94750 A1 SG94750 A1 SG 94750A1
- Authority
- SG
- Singapore
- Prior art keywords
- exposure
- device manufacturing
- exposure apparatus
- exposure method
- manufacturing
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
- G03F7/70725—Stages control
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
- G03F7/70525—Controlling normal operating mode, e.g. matching different apparatus, remote control or prediction of failure
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000028258 | 2000-02-04 | ||
JP2001021000A JP2001291662A (ja) | 2000-02-04 | 2001-01-30 | 露光方法及び露光装置、並びにデバイス製造方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
SG94750A1 true SG94750A1 (en) | 2003-03-18 |
Family
ID=26584919
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG200100542A SG94750A1 (en) | 2000-02-04 | 2001-02-02 | Exposure method and exposure apparatus, and device manufacturing method |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP2001291662A (ja) |
KR (1) | KR20010078323A (ja) |
SG (1) | SG94750A1 (ja) |
TW (1) | TW527636B (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4548735B2 (ja) * | 2006-11-14 | 2010-09-22 | 東京エレクトロン株式会社 | 基板処理システム |
US9529275B2 (en) | 2007-02-21 | 2016-12-27 | Taiwan Semiconductor Manufacturing Company, Ltd. | Lithography scanner throughput |
JP6066592B2 (ja) * | 2012-06-12 | 2017-01-25 | キヤノン株式会社 | 露光装置及びデバイス製造方法 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000284492A (ja) * | 1999-03-30 | 2000-10-13 | Seiko Epson Corp | 露光装置、露光方法及びプログラムを記録した記憶媒体 |
JP2000286181A (ja) * | 1999-03-30 | 2000-10-13 | Seiko Epson Corp | 露光装置 |
JP2000340493A (ja) * | 1999-05-31 | 2000-12-08 | Nikon Corp | 露光方法、露光システムおよびデバイス製造方法 |
-
2001
- 2001-01-30 JP JP2001021000A patent/JP2001291662A/ja active Pending
- 2001-02-02 SG SG200100542A patent/SG94750A1/en unknown
- 2001-02-02 TW TW090102123A patent/TW527636B/zh not_active IP Right Cessation
- 2001-02-03 KR KR1020010005239A patent/KR20010078323A/ko not_active Application Discontinuation
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000284492A (ja) * | 1999-03-30 | 2000-10-13 | Seiko Epson Corp | 露光装置、露光方法及びプログラムを記録した記憶媒体 |
JP2000286181A (ja) * | 1999-03-30 | 2000-10-13 | Seiko Epson Corp | 露光装置 |
JP2000340493A (ja) * | 1999-05-31 | 2000-12-08 | Nikon Corp | 露光方法、露光システムおよびデバイス製造方法 |
Also Published As
Publication number | Publication date |
---|---|
KR20010078323A (ko) | 2001-08-20 |
TW527636B (en) | 2003-04-11 |
JP2001291662A (ja) | 2001-10-19 |
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