SG94750A1 - Exposure method and exposure apparatus, and device manufacturing method - Google Patents

Exposure method and exposure apparatus, and device manufacturing method

Info

Publication number
SG94750A1
SG94750A1 SG200100542A SG200100542A SG94750A1 SG 94750 A1 SG94750 A1 SG 94750A1 SG 200100542 A SG200100542 A SG 200100542A SG 200100542 A SG200100542 A SG 200100542A SG 94750 A1 SG94750 A1 SG 94750A1
Authority
SG
Singapore
Prior art keywords
exposure
device manufacturing
exposure apparatus
exposure method
manufacturing
Prior art date
Application number
SG200100542A
Other languages
English (en)
Inventor
Okuno Hiroki
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of SG94750A1 publication Critical patent/SG94750A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70525—Controlling normal operating mode, e.g. matching different apparatus, remote control or prediction of failure

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
SG200100542A 2000-02-04 2001-02-02 Exposure method and exposure apparatus, and device manufacturing method SG94750A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2000028258 2000-02-04
JP2001021000A JP2001291662A (ja) 2000-02-04 2001-01-30 露光方法及び露光装置、並びにデバイス製造方法

Publications (1)

Publication Number Publication Date
SG94750A1 true SG94750A1 (en) 2003-03-18

Family

ID=26584919

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200100542A SG94750A1 (en) 2000-02-04 2001-02-02 Exposure method and exposure apparatus, and device manufacturing method

Country Status (4)

Country Link
JP (1) JP2001291662A (ja)
KR (1) KR20010078323A (ja)
SG (1) SG94750A1 (ja)
TW (1) TW527636B (ja)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4548735B2 (ja) * 2006-11-14 2010-09-22 東京エレクトロン株式会社 基板処理システム
US9529275B2 (en) 2007-02-21 2016-12-27 Taiwan Semiconductor Manufacturing Company, Ltd. Lithography scanner throughput
JP6066592B2 (ja) * 2012-06-12 2017-01-25 キヤノン株式会社 露光装置及びデバイス製造方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000284492A (ja) * 1999-03-30 2000-10-13 Seiko Epson Corp 露光装置、露光方法及びプログラムを記録した記憶媒体
JP2000286181A (ja) * 1999-03-30 2000-10-13 Seiko Epson Corp 露光装置
JP2000340493A (ja) * 1999-05-31 2000-12-08 Nikon Corp 露光方法、露光システムおよびデバイス製造方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000284492A (ja) * 1999-03-30 2000-10-13 Seiko Epson Corp 露光装置、露光方法及びプログラムを記録した記憶媒体
JP2000286181A (ja) * 1999-03-30 2000-10-13 Seiko Epson Corp 露光装置
JP2000340493A (ja) * 1999-05-31 2000-12-08 Nikon Corp 露光方法、露光システムおよびデバイス製造方法

Also Published As

Publication number Publication date
KR20010078323A (ko) 2001-08-20
TW527636B (en) 2003-04-11
JP2001291662A (ja) 2001-10-19

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