TW425494B - Method for decontaminating microlithography projection lighting devices - Google Patents
Method for decontaminating microlithography projection lighting devices Download PDFInfo
- Publication number
- TW425494B TW425494B TW088111039A TW88111039A TW425494B TW 425494 B TW425494 B TW 425494B TW 088111039 A TW088111039 A TW 088111039A TW 88111039 A TW88111039 A TW 88111039A TW 425494 B TW425494 B TW 425494B
- Authority
- TW
- Taiwan
- Prior art keywords
- patent application
- scope
- item
- gas
- light source
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
- B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
- B08B7/0057—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like by ultraviolet radiation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/7005—Production of exposure light, i.e. light sources by multiple sources, e.g. light-emitting diodes [LED] or light source arrays
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
- G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
- G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19830438A DE19830438A1 (de) | 1998-07-08 | 1998-07-08 | Verfahren zur Dekontamination von Mikrolithographie-Projektionsbelichtungsanlagen |
Publications (1)
Publication Number | Publication Date |
---|---|
TW425494B true TW425494B (en) | 2001-03-11 |
Family
ID=7873297
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW088111039A TW425494B (en) | 1998-07-08 | 1999-06-30 | Method for decontaminating microlithography projection lighting devices |
Country Status (7)
Country | Link |
---|---|
US (1) | US6936825B2 (und) |
EP (1) | EP1095315A1 (und) |
JP (1) | JP2002520839A (und) |
KR (1) | KR100659698B1 (und) |
DE (1) | DE19830438A1 (und) |
TW (1) | TW425494B (und) |
WO (1) | WO2000003304A1 (und) |
Families Citing this family (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19830438A1 (de) | 1998-07-08 | 2000-01-13 | Zeiss Carl Fa | Verfahren zur Dekontamination von Mikrolithographie-Projektionsbelichtungsanlagen |
EP1252553A1 (en) * | 2000-11-07 | 2002-10-30 | ASML US, Inc. | Refractive index regulation for maintaining optical imaging performance |
DE10061248B4 (de) * | 2000-12-09 | 2004-02-26 | Carl Zeiss | Verfahren und Vorrichtung zur In-situ-Dekontamination eines EUV-Lithographiegerätes |
JP3619157B2 (ja) * | 2001-02-13 | 2005-02-09 | キヤノン株式会社 | 光学素子、該光学素子を有する露光装置、洗浄装置及び光学素子の洗浄方法 |
DE10109031A1 (de) * | 2001-02-24 | 2002-09-05 | Zeiss Carl | Optisches Strahlführungssystem und Verfahren zur Kontaminationsverhinderung optischer Komponenten hiervon |
DE10211611A1 (de) * | 2002-03-12 | 2003-09-25 | Zeiss Carl Smt Ag | Verfahren und Vorrichtung zur Dekontamination optischer Oberflächen |
SG139554A1 (en) * | 2002-12-20 | 2008-02-29 | Asml Netherlands Bv | Lithographic apparatus, device manufacturing method, and device manufactured thereby |
JP2005190904A (ja) * | 2003-12-26 | 2005-07-14 | Ushio Inc | 極端紫外光源 |
US7265366B2 (en) * | 2004-03-31 | 2007-09-04 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7136142B2 (en) * | 2004-05-25 | 2006-11-14 | Asml Netherlands B.V. | Lithographic apparatus having a gas flushing device |
KR101252312B1 (ko) | 2004-12-23 | 2013-04-08 | 칼 짜이스 에스엠테 게엠베하 | 적어도 하나의 교체 가능한 광학 요소를 포함하는 대물렌즈모듈 |
DE102005031792A1 (de) * | 2005-07-07 | 2007-01-11 | Carl Zeiss Smt Ag | Verfahren zur Entfernung von Kontamination von optischen Elementen, insbesondere von Oberflächen optischer Elemente sowie ein optisches System oder Teilsystem hierfür |
DE102006049924A1 (de) * | 2006-10-19 | 2008-04-30 | Carl Zeiss Smt Ag | System zur Reinigung einer Oberfläche eines Bauteils |
US8817226B2 (en) * | 2007-02-15 | 2014-08-26 | Asml Holding N.V. | Systems and methods for insitu lens cleaning using ozone in immersion lithography |
JP2008277585A (ja) * | 2007-04-27 | 2008-11-13 | Canon Inc | 露光装置の洗浄装置及び露光装置 |
DE102008041628A1 (de) * | 2007-09-14 | 2009-03-19 | Carl Zeiss Smt Ag | Verfahren zur Reinigung von Vakuumkammern und Vakuumkammer |
DE102007051459A1 (de) * | 2007-10-27 | 2009-05-14 | Asml Netherlands B.V. | Reinigung eines optischen Systems mittels Strahlungsenergie |
DE102011079451A1 (de) | 2011-07-20 | 2012-08-09 | Carl Zeiss Smt Gmbh | Optische Anordnung und Verfahren zur Verringerung von oxidischen Verunreinigungen |
US8888295B2 (en) * | 2012-07-02 | 2014-11-18 | Disney Enterprises, Inc. | Reflective surface tensioning and cleaning system for pepper's ghost illusion |
CZ201474A3 (cs) * | 2014-01-30 | 2015-04-29 | Masarykova Univerzita | Způsob snížení nebo odstranění organické a anorganické kontaminace vakuového systému zobrazovacích a analytických zařízení a zařízení k jeho provádění |
KR101698022B1 (ko) * | 2015-03-13 | 2017-02-01 | 한국표준과학연구원 | 무색수차 광소자-회전형 타원계측기 및 이를 이용한 시편의 뮬러-행렬 측정 방법 |
US9625732B1 (en) | 2016-01-26 | 2017-04-18 | Disney Enterprises, Inc. | Reflective surface tensioning system for Pepper's ghost illusion |
DE102016125695A1 (de) * | 2016-12-23 | 2018-01-25 | Asml Netherlands B.V. | Verfahren zum Betrieb eines EUV – Lithographiesystems zur Vermeidung des chemischen Angriffs von Komponenten des EUV – Lithographiesystems durch Wasserstoff |
DE102019213914A1 (de) * | 2019-09-12 | 2021-03-18 | Carl Zeiss Smt Gmbh | Vorrichtung zur Reinigung einer Oberfläche im Inneren eines optischen Systems |
Family Cites Families (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52110053A (en) * | 1976-02-23 | 1977-09-14 | Nath Guenther | Uv illuminator |
US4028135A (en) * | 1976-04-22 | 1977-06-07 | The United States Of America As Represented By The Secretary Of The Army | Method of cleaning surfaces by irradiation with ultraviolet light |
US4337437A (en) * | 1979-03-26 | 1982-06-29 | Hunter Robert O | High energy laser |
DE3145278C2 (de) * | 1981-11-14 | 1985-02-14 | Schott-Zwiesel-Glaswerke Ag, 8372 Zwiesel | Verfahren zum berührungslosen Abtragen von Material von der Oberfläche eines Glasgegenstandes und Vorrichtung zur Durchführung des Verfahrens |
US4820899A (en) * | 1987-03-03 | 1989-04-11 | Nikon Corporation | Laser beam working system |
DE3721940A1 (de) * | 1987-07-02 | 1989-01-12 | Ibm Deutschland | Entfernen von partikeln von oberflaechen fester koerper durch laserbeschuss |
JPH01265513A (ja) * | 1988-04-15 | 1989-10-23 | Nec Corp | 縮小投影露光装置 |
US5024968A (en) | 1988-07-08 | 1991-06-18 | Engelsberg Audrey C | Removal of surface contaminants by irradiation from a high-energy source |
US5821175A (en) * | 1988-07-08 | 1998-10-13 | Cauldron Limited Partnership | Removal of surface contaminants by irradiation using various methods to achieve desired inert gas flow over treated surface |
JP3278896B2 (ja) * | 1992-03-31 | 2002-04-30 | キヤノン株式会社 | 照明装置及びそれを用いた投影露光装置 |
US5430303A (en) * | 1992-07-01 | 1995-07-04 | Nikon Corporation | Exposure apparatus |
US6017397A (en) * | 1993-03-05 | 2000-01-25 | Hyundai Eletronics America | Automated washing method |
US5814156A (en) * | 1993-09-08 | 1998-09-29 | Uvtech Systems Inc. | Photoreactive surface cleaning |
WO1997035234A1 (en) * | 1996-03-15 | 1997-09-25 | Philips Electronics N.V. | Alignment device and lithographic apparatus provided with such a device |
US5955242A (en) * | 1996-09-23 | 1999-09-21 | International Business Machines Corporation | High sensitivity, photo-active polymer and developers for high resolution resist applications |
JPH10223512A (ja) * | 1997-02-10 | 1998-08-21 | Nikon Corp | 電子ビーム投影露光装置 |
JPH11167004A (ja) * | 1997-12-04 | 1999-06-22 | Nikon Corp | 露光装置用投影光学系の光洗浄方法、露光装置、露光方法 |
US6268904B1 (en) * | 1997-04-23 | 2001-07-31 | Nikon Corporation | Optical exposure apparatus and photo-cleaning method |
US5938860A (en) * | 1997-08-28 | 1999-08-17 | Micron Technology, Inc. | Reticle cleaning without damaging pellicle |
DE19830438A1 (de) | 1998-07-08 | 2000-01-13 | Zeiss Carl Fa | Verfahren zur Dekontamination von Mikrolithographie-Projektionsbelichtungsanlagen |
JP2000091192A (ja) * | 1998-09-09 | 2000-03-31 | Nikon Corp | 露光装置 |
US6762412B1 (en) * | 1999-05-10 | 2004-07-13 | Nikon Corporation | Optical apparatus, exposure apparatus using the same, and gas introduction method |
US6571057B2 (en) * | 2000-03-27 | 2003-05-27 | Nikon Corporation | Optical instrument, gas replacement method and cleaning method of optical instrument, exposure apparatus, exposure method and manufacturing method for devices |
-
1998
- 1998-07-08 DE DE19830438A patent/DE19830438A1/de not_active Ceased
-
1999
- 1999-06-17 EP EP99929261A patent/EP1095315A1/de not_active Withdrawn
- 1999-06-17 JP JP2000559483A patent/JP2002520839A/ja active Pending
- 1999-06-17 WO PCT/EP1999/004210 patent/WO2000003304A1/de active IP Right Grant
- 1999-06-17 KR KR1020017000119A patent/KR100659698B1/ko not_active IP Right Cessation
- 1999-06-30 TW TW088111039A patent/TW425494B/zh not_active IP Right Cessation
-
2001
- 2001-01-03 US US09/754,841 patent/US6936825B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
WO2000003304A1 (de) | 2000-01-20 |
KR100659698B1 (ko) | 2006-12-21 |
US20010026402A1 (en) | 2001-10-04 |
US6936825B2 (en) | 2005-08-30 |
DE19830438A1 (de) | 2000-01-13 |
JP2002520839A (ja) | 2002-07-09 |
KR20010053391A (ko) | 2001-06-25 |
EP1095315A1 (de) | 2001-05-02 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TW425494B (en) | Method for decontaminating microlithography projection lighting devices | |
US7315346B2 (en) | Lithographic apparatus and device manufacturing method | |
JP3696163B2 (ja) | リソグラフィ投影装置、素子製造方法、およびそれによって製造される素子 | |
JP4825510B2 (ja) | リソグラフィ装置 | |
JP4335868B2 (ja) | リソグラフィ装置、照明系及びデブリ捕捉システム | |
JP4194831B2 (ja) | デバイス製造方法 | |
KR20110055610A (ko) | 방사선 소스, 리소그래피 장치 및 디바이스 제조방법 | |
EP1717638A3 (en) | Extreme UV radiation exposure apparatus and extreme UV radiation source | |
JP2002270501A (ja) | リソグラフィー装置、デバイス製造方法、および、それによって製造されたデバイス | |
JP2002015970A (ja) | 露光方法及び露光装置 | |
US6796664B2 (en) | Method and device for decontaminating optical surfaces | |
JP3940378B2 (ja) | 半導体露光装置の自己洗浄方法と自己洗浄用透過板 | |
TWI398900B (zh) | 用於產生輻射之方法及源、器件製造方法及微影系統 | |
JPH1165094A (ja) | 収納ケース、露光装置及びデバイス製造装置 | |
KR20100102682A (ko) | 극자외 방사선 소스 및 극자외 방사선을 생성하는 방법 | |
JP2001068400A (ja) | 吸光物質検出方法、並びに露光方法及び装置 | |
JP3619157B2 (ja) | 光学素子、該光学素子を有する露光装置、洗浄装置及び光学素子の洗浄方法 | |
JP4617143B2 (ja) | 露光装置及び自己洗浄方法 | |
KR100998679B1 (ko) | 아크 램프의 일부분을 차폐하는 커버 | |
US9535210B2 (en) | Optical hollow waveguide assembly | |
JP2006245254A (ja) | 露光装置、露光方法、および微細パターンを有するデバイスの製造方法 | |
JP2009081360A (ja) | 光インプリント用の光照射ユニット | |
JP2007173344A (ja) | 洗浄方法及び装置、露光装置、並びに、デバイス製造方法 | |
JP2005184017A (ja) | リトグラフ装置およびデバイス製造方法 | |
JP2004245905A (ja) | マスク作成装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
GD4A | Issue of patent certificate for granted invention patent | ||
MM4A | Annulment or lapse of patent due to non-payment of fees |