TW416890B - Semiconductor wafer polishing apparatus with a variable polishing wafer carrier - Google Patents

Semiconductor wafer polishing apparatus with a variable polishing wafer carrier Download PDF

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Publication number
TW416890B
TW416890B TW088117500A TW88117500A TW416890B TW 416890 B TW416890 B TW 416890B TW 088117500 A TW088117500 A TW 088117500A TW 88117500 A TW88117500 A TW 88117500A TW 416890 B TW416890 B TW 416890B
Authority
TW
Taiwan
Prior art keywords
wafer
carrier
film
cavity
carrier film
Prior art date
Application number
TW088117500A
Other languages
English (en)
Chinese (zh)
Inventor
Fred E Mitchel
John A Adams
Thomas Frederick A Bibby
Original Assignee
Speedfam Ipec Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Speedfam Ipec Corp filed Critical Speedfam Ipec Corp
Application granted granted Critical
Publication of TW416890B publication Critical patent/TW416890B/zh

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/27—Work carriers
    • B24B37/30—Work carriers for single side lapping of plane surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/27—Work carriers
    • B24B37/30—Work carriers for single side lapping of plane surfaces
    • B24B37/32—Retaining rings

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
TW088117500A 1998-10-09 1999-10-11 Semiconductor wafer polishing apparatus with a variable polishing wafer carrier TW416890B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US09/169,333 US6056632A (en) 1997-02-13 1998-10-09 Semiconductor wafer polishing apparatus with a variable polishing force wafer carrier head

Publications (1)

Publication Number Publication Date
TW416890B true TW416890B (en) 2001-01-01

Family

ID=22615234

Family Applications (1)

Application Number Title Priority Date Filing Date
TW088117500A TW416890B (en) 1998-10-09 1999-10-11 Semiconductor wafer polishing apparatus with a variable polishing wafer carrier

Country Status (6)

Country Link
US (1) US6056632A (ja)
EP (1) EP1133378A2 (ja)
JP (1) JP2002527894A (ja)
KR (1) KR100385373B1 (ja)
TW (1) TW416890B (ja)
WO (1) WO2000021715A2 (ja)

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Also Published As

Publication number Publication date
KR20020018641A (ko) 2002-03-08
WO2000021715A3 (en) 2000-07-06
KR100385373B1 (ko) 2003-05-27
US6056632A (en) 2000-05-02
EP1133378A2 (en) 2001-09-19
WO2000021715A2 (en) 2000-04-20
JP2002527894A (ja) 2002-08-27

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