TW387129B - Semiconductor devices - Google Patents

Semiconductor devices Download PDF

Info

Publication number
TW387129B
TW387129B TW087107903A TW87107903A TW387129B TW 387129 B TW387129 B TW 387129B TW 087107903 A TW087107903 A TW 087107903A TW 87107903 A TW87107903 A TW 87107903A TW 387129 B TW387129 B TW 387129B
Authority
TW
Taiwan
Prior art keywords
delay control
wiring
control unit
semiconductor device
cross
Prior art date
Application number
TW087107903A
Other languages
English (en)
Chinese (zh)
Inventor
Atsushi Miyanishi
Akira Yamazaki
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Application granted granted Critical
Publication of TW387129B publication Critical patent/TW387129B/zh

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • H01L27/10Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a repetitive configuration
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/0203Particular design considerations for integrated circuits
    • H01L27/0207Geometrical layout of the components, e.g. computer aided design; custom LSI, semi-custom LSI, standard cell technique
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F30/00Computer-aided design [CAD]
    • G06F30/30Circuit design
    • G06F30/39Circuit design at the physical level
    • G06F30/392Floor-planning or layout, e.g. partitioning or placement
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F30/00Computer-aided design [CAD]
    • G06F30/30Circuit design
    • G06F30/39Circuit design at the physical level
    • G06F30/394Routing
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B12/00Dynamic random access memory [DRAM] devices
    • H10B12/50Peripheral circuit region structures
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C2207/00Indexing scheme relating to arrangements for writing information into, or reading information out from, a digital store
    • G11C2207/10Aspects relating to interfaces of memory device to external buses
    • G11C2207/104Embedded memory devices, e.g. memories with a processing device on the same die or ASIC memory designs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B12/00Dynamic random access memory [DRAM] devices
    • H10B12/01Manufacture or treatment
    • H10B12/09Manufacture or treatment with simultaneous manufacture of the peripheral circuit region and memory cells

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Theoretical Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Evolutionary Computation (AREA)
  • Geometry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Architecture (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Design And Manufacture Of Integrated Circuits (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Semiconductor Memories (AREA)
  • Dram (AREA)
TW087107903A 1998-01-19 1998-05-21 Semiconductor devices TW387129B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP00783098A JP4229998B2 (ja) 1998-01-19 1998-01-19 半導体装置および半導体装置の製造方法

Publications (1)

Publication Number Publication Date
TW387129B true TW387129B (en) 2000-04-11

Family

ID=11676524

Family Applications (1)

Application Number Title Priority Date Filing Date
TW087107903A TW387129B (en) 1998-01-19 1998-05-21 Semiconductor devices

Country Status (5)

Country Link
US (1) US6269280B1 (ja)
JP (1) JP4229998B2 (ja)
KR (1) KR100303675B1 (ja)
DE (1) DE19842245A1 (ja)
TW (1) TW387129B (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI781017B (zh) * 2021-12-17 2022-10-11 力晶積成電子製造股份有限公司 測試系統以及其測試電路

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6360133B1 (en) * 1999-06-17 2002-03-19 Advanced Micro Devices, Inc. Method and apparatus for automatic routing for reentrant process
US7466180B2 (en) * 2000-12-12 2008-12-16 Intel Corporation Clock network
KR100396530B1 (ko) * 2001-09-29 2003-09-02 기가트론 주식회사 혼성신호 집적회로 설계를 위한 실리콘 기판 결합잡음모델링 및 분석 방법
US7292046B2 (en) * 2003-09-03 2007-11-06 Infineon Technologies Ag Simulated module load
US7102914B2 (en) * 2004-02-27 2006-09-05 International Business Machines Corporation Gate controlled floating well vertical MOSFET
US7448012B1 (en) 2004-04-21 2008-11-04 Qi-De Qian Methods and system for improving integrated circuit layout
US7784015B2 (en) * 2005-07-05 2010-08-24 Texas Instruments Incorporated Method for generating a mask layout and constructing an integrated circuit
JP4320340B2 (ja) * 2006-12-15 2009-08-26 川崎マイクロエレクトロニクス株式会社 半導体集積回路の設計方法、および、半導体集積回路

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0658937B2 (ja) 1984-03-07 1994-08-03 株式会社東芝 半導体集積回路
JPH04246857A (ja) 1991-02-01 1992-09-02 Nec Ic Microcomput Syst Ltd 半導体集積回路装置
JP3154524B2 (ja) 1991-08-14 2001-04-09 株式会社日立製作所 半導体装置の設計方法
JPH0669339A (ja) 1992-08-18 1994-03-11 Hitachi Ltd 半導体装置
JPH08212185A (ja) 1995-01-31 1996-08-20 Mitsubishi Electric Corp マイクロコンピュータ
JP3498462B2 (ja) * 1995-12-22 2004-02-16 ヤマハ株式会社 集積回路のクロック配線設計法
JPH09246391A (ja) * 1996-03-06 1997-09-19 Sharp Corp 配線設計方法および配線設計装置
US5841296A (en) * 1997-01-21 1998-11-24 Xilinx, Inc. Programmable delay element
JPH10283777A (ja) 1997-04-04 1998-10-23 Mitsubishi Electric Corp Sdramコアと論理回路を単一チップ上に混載した半導体集積回路装置およびsdramコアのテスト方法
US5930182A (en) * 1997-08-22 1999-07-27 Micron Technology, Inc. Adjustable delay circuit for setting the speed grade of a semiconductor device
US5889726A (en) * 1997-11-17 1999-03-30 Micron Electronics, Inc. Apparatus for providing additional latency for synchronously accessed memory
JPH11153650A (ja) * 1997-11-20 1999-06-08 Mitsubishi Electric Corp 半導体集積回路装置
US6044024A (en) * 1998-01-14 2000-03-28 International Business Machines Corporation Interactive method for self-adjusted access on embedded DRAM memory macros

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI781017B (zh) * 2021-12-17 2022-10-11 力晶積成電子製造股份有限公司 測試系統以及其測試電路

Also Published As

Publication number Publication date
JPH11204652A (ja) 1999-07-30
US6269280B1 (en) 2001-07-31
KR19990066724A (ko) 1999-08-16
DE19842245A1 (de) 1999-07-22
KR100303675B1 (ko) 2001-09-24
JP4229998B2 (ja) 2009-02-25

Similar Documents

Publication Publication Date Title
US8332794B2 (en) Circuits and methods for programmable transistor array
US7739627B2 (en) System and method of maximizing integrated circuit manufacturing yield with context-dependent yield cells
TW387129B (en) Semiconductor devices
CN101794774B (zh) 半导体集成电路
Zhao et al. Low-power clock tree design for pre-bond testing of 3-D stacked ICs
KR20010088859A (ko) 집적 회로 및 집적 회로 전력 및 접지 라우팅 방법
US7902879B2 (en) Field programmable gate array utilizing dedicated memory stacks in a vertical layer format
KR20080087714A (ko) 3차원 집적회로 설계 방법 및 장치
Jiang et al. Modeling TSV open defects in 3D-stacked DRAM
CN110136758A (zh) 写入辅助
Kabir et al. Holistic Chiplet–Package Co-Optimization for Agile Custom 2.5-D Design
US20200211625A1 (en) Apparatuses and methods for sense line architectures for semiconductor memories
JP5297468B2 (ja) 半導体集積回路の設計方法およびソフトウエア
US6512708B1 (en) Placement and routing for wafer scale memory
JPH10229129A (ja) 半導体集積回路のチップレイアウト及びその検証方法
US5341383A (en) Circuit arrangement suitable for testing cells arranged in rows and columns, semiconductor integrated circuit device having the same, and method for arranging circuit blocks on chip
US5694328A (en) Method for designing a large scale integrated (LSI) layout
JP4170600B2 (ja) 半導体集積回路及びその設計方法
Facchini et al. An RDL-configurable 3D memory tier to replace on-chip SRAM
CN100552456C (zh) 具有多层弹性的微机电探针卡
TW512396B (en) Functional macro and its design method, and semiconductor device design method
JP2008244504A (ja) 半導体装置
US20220165706A1 (en) Semiconductor structure of cell array
US20020075028A1 (en) Design circuit pattern for test of semiconductor circuit
JP3115743B2 (ja) Lsi自動レイアウト方法

Legal Events

Date Code Title Description
GD4A Issue of patent certificate for granted invention patent
MM4A Annulment or lapse of patent due to non-payment of fees