TW376561B - Electrostatic chuck having a thermal transfer regulator pad - Google Patents
Electrostatic chuck having a thermal transfer regulator padInfo
- Publication number
- TW376561B TW376561B TW087108104A TW87108104A TW376561B TW 376561 B TW376561 B TW 376561B TW 087108104 A TW087108104 A TW 087108104A TW 87108104 A TW87108104 A TW 87108104A TW 376561 B TW376561 B TW 376561B
- Authority
- TW
- Taiwan
- Prior art keywords
- substrate
- electrostatic chuck
- electrostatic
- base
- process chamber
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
- H01L21/6833—Details of electrostatic chucks
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T279/00—Chucks or sockets
- Y10T279/23—Chucks or sockets with magnetic or electrostatic means
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Jigs For Machine Tools (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/883,994 US5978202A (en) | 1997-06-27 | 1997-06-27 | Electrostatic chuck having a thermal transfer regulator pad |
Publications (1)
Publication Number | Publication Date |
---|---|
TW376561B true TW376561B (en) | 1999-12-11 |
Family
ID=25383751
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW087108104A TW376561B (en) | 1997-06-27 | 1998-05-25 | Electrostatic chuck having a thermal transfer regulator pad |
Country Status (5)
Country | Link |
---|---|
US (1) | US5978202A (zh) |
EP (1) | EP0887853A3 (zh) |
JP (1) | JPH1187481A (zh) |
KR (1) | KR19990007363A (zh) |
TW (1) | TW376561B (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI616925B (zh) * | 2013-12-30 | 2018-03-01 | Plasma processing device, electrostatic chuck and electrostatic chuck manufacturing method |
Families Citing this family (47)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6166897A (en) * | 1997-01-22 | 2000-12-26 | Tomoegawa Paper Co., Ltd. | Static chuck apparatus and its manufacture |
US6482747B1 (en) * | 1997-12-26 | 2002-11-19 | Hitachi, Ltd. | Plasma treatment method and plasma treatment apparatus |
US6228173B1 (en) * | 1998-10-12 | 2001-05-08 | Tokyo Electron Limited | Single-substrate-heat-treating apparatus for semiconductor process system |
US6490146B2 (en) | 1999-05-07 | 2002-12-03 | Applied Materials Inc. | Electrostatic chuck bonded to base with a bond layer and method |
US6462928B1 (en) | 1999-05-07 | 2002-10-08 | Applied Materials, Inc. | Electrostatic chuck having improved electrical connector and method |
US6310755B1 (en) | 1999-05-07 | 2001-10-30 | Applied Materials, Inc. | Electrostatic chuck having gas cavity and method |
US6363882B1 (en) * | 1999-12-30 | 2002-04-02 | Lam Research Corporation | Lower electrode design for higher uniformity |
US6967177B1 (en) * | 2000-09-27 | 2005-11-22 | Lsi Logic Corporation | Temperature control system |
JP2002313890A (ja) * | 2001-04-11 | 2002-10-25 | Sumitomo Electric Ind Ltd | 被加熱物搭載用ヒータ部材およびそれを用いた基板処理装置 |
EP1391140B1 (en) * | 2001-04-30 | 2012-10-10 | Lam Research Corporation | Method and apparatus for controlling the spatial temperature distribution across the surface of a workpiece support |
US20050211385A1 (en) * | 2001-04-30 | 2005-09-29 | Lam Research Corporation, A Delaware Corporation | Method and apparatus for controlling spatial temperature distribution |
US6538872B1 (en) | 2001-11-05 | 2003-03-25 | Applied Materials, Inc. | Electrostatic chuck having heater and method |
US7846254B2 (en) * | 2003-05-16 | 2010-12-07 | Applied Materials, Inc. | Heat transfer assembly |
CN100365795C (zh) * | 2003-06-17 | 2008-01-30 | 创意科技股份有限公司 | 双极型静电卡盘 |
CN100433286C (zh) * | 2003-07-08 | 2008-11-12 | 株式会社未来视野 | 基片载置台用静电吸盘及其电极以及处理系统 |
US7697260B2 (en) * | 2004-03-31 | 2010-04-13 | Applied Materials, Inc. | Detachable electrostatic chuck |
US8038796B2 (en) | 2004-12-30 | 2011-10-18 | Lam Research Corporation | Apparatus for spatial and temporal control of temperature on a substrate |
JP4482472B2 (ja) * | 2005-03-24 | 2010-06-16 | 日本碍子株式会社 | 静電チャック及びその製造方法 |
JP2007088411A (ja) * | 2005-06-28 | 2007-04-05 | Hitachi High-Technologies Corp | 静電吸着装置およびウエハ処理装置ならびにプラズマ処理方法 |
US7525787B2 (en) * | 2005-09-30 | 2009-04-28 | Lam Research Corporation | Electrostatic chuck assembly with dielectric material and/or cavity having varying thickness, profile and/or shape, method of use and apparatus incorporating same |
KR100716785B1 (ko) * | 2005-12-13 | 2007-05-14 | 삼성전기주식회사 | 반도체 식각 장치의 웨이퍼 클램핑 구조 |
US8226769B2 (en) | 2006-04-27 | 2012-07-24 | Applied Materials, Inc. | Substrate support with electrostatic chuck having dual temperature zones |
US9275887B2 (en) | 2006-07-20 | 2016-03-01 | Applied Materials, Inc. | Substrate processing with rapid temperature gradient control |
US8741098B2 (en) * | 2006-08-10 | 2014-06-03 | Tokyo Electron Limited | Table for use in plasma processing system and plasma processing system |
JP5233092B2 (ja) * | 2006-08-10 | 2013-07-10 | 東京エレクトロン株式会社 | プラズマ処理装置用の載置台及びプラズマ処理装置 |
US20080073032A1 (en) * | 2006-08-10 | 2008-03-27 | Akira Koshiishi | Stage for plasma processing apparatus, and plasma processing apparatus |
KR101042782B1 (ko) * | 2006-09-19 | 2011-06-20 | 가부시키가이샤 크리에이티브 테크놀러지 | 정전 척의 급전구조 및 그 제조방법 및 정전 척 급전구조의 재생방법 |
US7723648B2 (en) * | 2006-09-25 | 2010-05-25 | Tokyo Electron Limited | Temperature controlled substrate holder with non-uniform insulation layer for a substrate processing system |
US7838800B2 (en) * | 2006-09-25 | 2010-11-23 | Tokyo Electron Limited | Temperature controlled substrate holder having erosion resistant insulating layer for a substrate processing system |
US7589950B2 (en) * | 2006-10-13 | 2009-09-15 | Applied Materials, Inc. | Detachable electrostatic chuck having sealing assembly |
US7598150B2 (en) * | 2006-11-20 | 2009-10-06 | Applied Materials, Inc. | Compensation techniques for substrate heating processes |
JP4695606B2 (ja) * | 2007-01-09 | 2011-06-08 | 東京エレクトロン株式会社 | 被処理基板の載置装置におけるフォーカスリングの熱伝導改善方法 |
US8449679B2 (en) | 2008-08-15 | 2013-05-28 | Lam Research Corporation | Temperature controlled hot edge ring assembly |
KR101663844B1 (ko) * | 2008-09-26 | 2016-10-07 | 램 리써치 코포레이션 | 정전 척에 대해 사용하기 위한 클로킹가능 디바이스 |
JP5996340B2 (ja) * | 2012-09-07 | 2016-09-21 | 東京エレクトロン株式会社 | プラズマエッチング装置 |
JP6413646B2 (ja) * | 2014-10-31 | 2018-10-31 | 住友大阪セメント株式会社 | 静電チャック装置 |
US9845533B2 (en) | 2014-11-11 | 2017-12-19 | Applied Materials, Inc. | Substrate carrier system utilizing electrostatic chucking to accommodate substrate size heterogeneity |
JP6393161B2 (ja) * | 2014-11-21 | 2018-09-19 | 東京エレクトロン株式会社 | 成膜装置 |
JP6254516B2 (ja) * | 2014-12-19 | 2017-12-27 | 東京エレクトロン株式会社 | 基板処理装置及び基板処理方法 |
KR102465285B1 (ko) * | 2015-06-29 | 2022-11-09 | 베리안 세미콘덕터 이큅먼트 어소시에이츠, 인크. | 기판을 홀딩하기 위한 장치 |
JP6526219B2 (ja) * | 2015-09-29 | 2019-06-05 | 京セラ株式会社 | 試料保持具 |
US11069553B2 (en) * | 2016-07-07 | 2021-07-20 | Lam Research Corporation | Electrostatic chuck with features for preventing electrical arcing and light-up and improving process uniformity |
US10910195B2 (en) | 2017-01-05 | 2021-02-02 | Lam Research Corporation | Substrate support with improved process uniformity |
JP6703645B2 (ja) * | 2018-05-28 | 2020-06-03 | 日本特殊陶業株式会社 | 保持装置、および、保持装置の製造方法 |
JP7386624B2 (ja) * | 2019-06-14 | 2023-11-27 | 日本特殊陶業株式会社 | 保持装置および保持装置の製造方法 |
KR102420344B1 (ko) * | 2019-11-04 | 2022-07-14 | 세메스 주식회사 | 스핀척 |
JP7515310B2 (ja) * | 2020-06-10 | 2024-07-12 | 東京エレクトロン株式会社 | 載置台、基板処理装置及び基板処理方法 |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2106325A (en) * | 1981-09-14 | 1983-04-07 | Philips Electronic Associated | Electrostatic chuck |
JPS59124140A (ja) * | 1982-12-29 | 1984-07-18 | Fujitsu Ltd | 静電吸着装置 |
JPS6131636U (ja) * | 1984-07-31 | 1986-02-26 | 株式会社 徳田製作所 | 静電チヤツク |
US4609037A (en) * | 1985-10-09 | 1986-09-02 | Tencor Instruments | Apparatus for heating and cooling articles |
JPS6372877A (ja) * | 1986-09-12 | 1988-04-02 | Tokuda Seisakusho Ltd | 真空処理装置 |
JPH01152639A (ja) * | 1987-12-10 | 1989-06-15 | Canon Inc | 吸着保持装置 |
JP2665242B2 (ja) * | 1988-09-19 | 1997-10-22 | 東陶機器株式会社 | 静電チャック |
US5059770A (en) * | 1989-09-19 | 1991-10-22 | Watkins-Johnson Company | Multi-zone planar heater assembly and method of operation |
US5155652A (en) * | 1991-05-02 | 1992-10-13 | International Business Machines Corporation | Temperature cycling ceramic electrostatic chuck |
DE69231299T2 (de) * | 1991-11-07 | 2001-01-18 | Varian Semiconductor Equipment Associates Inc., Gloucester | Verfahren zur Herstellung einer elektrostatischen Halteplatte |
KR100260587B1 (ko) * | 1993-06-01 | 2000-08-01 | 히가시 데쓰로 | 정전척 및 그의 제조방법 |
JPH07153825A (ja) * | 1993-11-29 | 1995-06-16 | Toto Ltd | 静電チャック及びこの静電チャックを用いた被吸着体の処理方法 |
US5535090A (en) * | 1994-03-03 | 1996-07-09 | Sherman; Arthur | Electrostatic chuck |
US5581874A (en) * | 1994-03-28 | 1996-12-10 | Tokyo Electron Limited | Method of forming a bonding portion |
US5671116A (en) * | 1995-03-10 | 1997-09-23 | Lam Research Corporation | Multilayered electrostatic chuck and method of manufacture thereof |
US5730803A (en) * | 1996-02-23 | 1998-03-24 | Applied Materials, Inc. | Apparatus and method for transferring heat from a hot electrostatic chuck to an underlying cold body |
US5740016A (en) * | 1996-03-29 | 1998-04-14 | Lam Research Corporation | Solid state temperature controlled substrate holder |
-
1997
- 1997-06-27 US US08/883,994 patent/US5978202A/en not_active Expired - Fee Related
-
1998
- 1998-05-25 TW TW087108104A patent/TW376561B/zh active
- 1998-06-05 EP EP98304459A patent/EP0887853A3/en not_active Withdrawn
- 1998-06-26 KR KR1019980024277A patent/KR19990007363A/ko not_active Application Discontinuation
- 1998-06-29 JP JP10182701A patent/JPH1187481A/ja not_active Withdrawn
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI616925B (zh) * | 2013-12-30 | 2018-03-01 | Plasma processing device, electrostatic chuck and electrostatic chuck manufacturing method |
Also Published As
Publication number | Publication date |
---|---|
JPH1187481A (ja) | 1999-03-30 |
US5978202A (en) | 1999-11-02 |
EP0887853A3 (en) | 2000-03-15 |
EP0887853A2 (en) | 1998-12-30 |
KR19990007363A (ko) | 1999-01-25 |
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