TW371722B - Method for fabricating MIM non linear element, MIM non-linear element and the liquid crystal display - Google Patents

Method for fabricating MIM non linear element, MIM non-linear element and the liquid crystal display

Info

Publication number
TW371722B
TW371722B TW085104547A TW85104547A TW371722B TW 371722 B TW371722 B TW 371722B TW 085104547 A TW085104547 A TW 085104547A TW 85104547 A TW85104547 A TW 85104547A TW 371722 B TW371722 B TW 371722B
Authority
TW
Taiwan
Prior art keywords
linear element
mim
fabricating
mim non
lamina
Prior art date
Application number
TW085104547A
Other languages
English (en)
Inventor
Yasushi Takano
Takumi Seki
Yasuhiro Yoshimizu
Takashi Inoue
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Application granted granted Critical
Publication of TW371722B publication Critical patent/TW371722B/zh

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/1365—Active matrix addressed cells in which the switching element is a two-electrode device

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Liquid Crystal (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
TW085104547A 1995-03-31 1996-04-16 Method for fabricating MIM non linear element, MIM non-linear element and the liquid crystal display TW371722B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10037195 1995-03-31

Publications (1)

Publication Number Publication Date
TW371722B true TW371722B (en) 1999-10-11

Family

ID=14272191

Family Applications (1)

Application Number Title Priority Date Filing Date
TW085104547A TW371722B (en) 1995-03-31 1996-04-16 Method for fabricating MIM non linear element, MIM non-linear element and the liquid crystal display

Country Status (8)

Country Link
US (1) US5867234A (zh)
EP (1) EP0763861B1 (zh)
JP (1) JP3719265B2 (zh)
KR (1) KR100255437B1 (zh)
CN (1) CN1217429C (zh)
DE (1) DE69633160T2 (zh)
TW (1) TW371722B (zh)
WO (1) WO1996030953A1 (zh)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002372725A (ja) 2001-04-04 2002-12-26 Seiko Epson Corp 非線形素子の製造方法、電気光学装置の製造方法、電気光学装置、および電子機器
US6285419B1 (en) 1995-03-31 2001-09-04 Seiko Epson Corporation Two-terminal metal/insulating material/metal (MIM) device, method for manufacturing the same and liquid crystal display panel
US6563555B1 (en) 1995-03-31 2003-05-13 Seiko Epson Corporation Methods of manufacturing a two-terminal nonlinear device
JPH10247754A (ja) * 1997-01-06 1998-09-14 Seiko Epson Corp ２端子型非線形素子およびその製造方法、ならびに液晶表示パネル
KR100458122B1 (ko) * 2001-08-28 2004-11-20 전자부품연구원 액정 표시장치의 연성 ｍｉｍ 소자 제조방법
JP2004317785A (ja) 2003-04-16 2004-11-11 Seiko Epson Corp 電気光学装置の駆動方法、電気光学装置および電子機器
KR100578976B1 (ko) 2004-10-15 2006-05-12 삼성에스디아이 주식회사 접착력이 우수한 다층 박막 및 이의 제조방법
JP2006172159A (ja) * 2004-12-16 2006-06-29 Seiko Epson Corp 電子デバイス製造システム、電子デバイスの製造方法、電子デバイス、並びに電気光学装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3034155B2 (ja) * 1993-02-03 2000-04-17 シャープ株式会社 ２端子非線形素子
JPS56150188A (en) * 1980-04-18 1981-11-20 Hitachi Ltd Preparation of metal oxide film
JPH0716033B2 (ja) * 1985-12-24 1995-02-22 セイコーエプソン株式会社 非線形抵抗素子の製造方法
JP2579468B2 (ja) * 1986-08-20 1997-02-05 セイコーエプソン株式会社 非線形素子の製造方法
JPS6463929A (en) * 1987-09-04 1989-03-09 Toshiba Corp Matrix array substrate
JPH02301727A (ja) * 1989-05-16 1990-12-13 Seiko Epson Corp 液晶表示装置
JP3328962B2 (ja) * 1992-08-28 2002-09-30 セイコーエプソン株式会社 液晶表示パネルの製造方法

Also Published As

Publication number Publication date
JP3719265B2 (ja) 2005-11-24
DE69633160T2 (de) 2005-08-18
EP0763861B1 (en) 2004-08-18
CN1149932A (zh) 1997-05-14
CN1217429C (zh) 2005-08-31
EP0763861A1 (en) 1997-03-19
EP0763861A4 (en) 1998-06-17
KR970703620A (ko) 1997-07-03
KR100255437B1 (ko) 2000-05-01
WO1996030953A1 (fr) 1996-10-03
US5867234A (en) 1999-02-02
DE69633160D1 (de) 2004-09-23

Similar Documents

Publication Publication Date Title
US7247568B2 (en) Method for manufacturing a transparent element with invisible electrodes
TW371722B (en) Method for fabricating MIM non linear element, MIM non-linear element and the liquid crystal display
EP0977078A3 (en) A method of manufacturing a liquid crystal display apparatus
ATE186991T1 (de) Filter mit dünnfilm-beschichtigung und herstellungsverfahren
JPS5616112A (en) Liquid crystal display unit
EP1160618A3 (en) Liquid-crystal device and method of making the same
JPH043121A (ja) 液晶表示装置およびその製造方法
EP0381927A3 (en) Bidirectional non-linear resistor, active matrix liquid-crystal panel using the same, and method for its production
EP0716167A3 (en) Single crystal quartz thin film and preparation thereof
JPS56167125A (en) Liquid crystal display element and its manufacture
TW373105B (en) 2-terminal nonlinear shape component and its fabricating method
EP1130072A4 (en) CHEMICALLY ADSORBABLE SUBSTANCES FOR THE FORMATION OF THIN LAYERS AND PROCESS FOR PRODUCING THE SAME
JPS56146119A (en) Liquid crystal display element
KR970007430A (ko) 액정 표시 장치의 공통 전극 기판 및 그 제조 방법
JPH05158052A (ja) 液晶表示素子
UA18962A (uk) Спосіб атестації діелектричhої плівки
JPH03167522A (ja) 透明パネルヒーターを有する液晶素子
JPS6139321A (ja) 酸化スズ導電膜の作製方法
JPS6415717A (en) Cell for liquid crystal display
JPS59146954A (ja) シ−スル−マスク
JPS58123516A (ja) 液晶パネルの製造方法
JPH0462050B2 (zh)
JPH0462518A (ja) 絶縁性遮光膜パターン及びその形成方法
JPS5744123A (en) Liquid-crystal display device
JPS54102998A (en) Display unit and its manufacture

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees