TW367595B - Lateral bipolar field effect mode hybrid transistor and method for the same - Google Patents

Lateral bipolar field effect mode hybrid transistor and method for the same

Info

Publication number
TW367595B
TW367595B TW086117777A TW86117777A TW367595B TW 367595 B TW367595 B TW 367595B TW 086117777 A TW086117777 A TW 086117777A TW 86117777 A TW86117777 A TW 86117777A TW 367595 B TW367595 B TW 367595B
Authority
TW
Taiwan
Prior art keywords
semiconductor device
collector region
lateral bipolar
same
field effect
Prior art date
Application number
TW086117777A
Other languages
English (en)
Inventor
Anders Shederberg
Original Assignee
Infineon Technologies Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Infineon Technologies Ag filed Critical Infineon Technologies Ag
Application granted granted Critical
Publication of TW367595B publication Critical patent/TW367595B/zh

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • H01L27/06Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
    • H01L27/07Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration the components having an active region in common
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • H01L27/06Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
    • H01L27/07Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration the components having an active region in common
    • H01L27/0705Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration the components having an active region in common comprising components of the field effect type
    • H01L27/0711Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration the components having an active region in common comprising components of the field effect type in combination with bipolar transistors and diodes, or capacitors, or resistors
    • H01L27/0722Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration the components having an active region in common comprising components of the field effect type in combination with bipolar transistors and diodes, or capacitors, or resistors in combination with lateral bipolar transistors and diodes, or capacitors, or resistors

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Bipolar Transistors (AREA)
  • Insulated Gate Type Field-Effect Transistor (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Junction Field-Effect Transistors (AREA)
TW086117777A 1996-11-13 1997-11-26 Lateral bipolar field effect mode hybrid transistor and method for the same TW367595B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SE9604142A SE512661C2 (sv) 1996-11-13 1996-11-13 Lateral bipolär hybridtransistor med fälteffektmod och förfarande vid densamma

Publications (1)

Publication Number Publication Date
TW367595B true TW367595B (en) 1999-08-21

Family

ID=20404585

Family Applications (1)

Application Number Title Priority Date Filing Date
TW086117777A TW367595B (en) 1996-11-13 1997-11-26 Lateral bipolar field effect mode hybrid transistor and method for the same

Country Status (10)

Country Link
US (1) US6015982A (zh)
EP (1) EP0946983A1 (zh)
JP (1) JP2001504275A (zh)
KR (1) KR100526076B1 (zh)
CN (1) CN1146047C (zh)
AU (1) AU5076298A (zh)
CA (1) CA2271313A1 (zh)
SE (1) SE512661C2 (zh)
TW (1) TW367595B (zh)
WO (1) WO1998021753A1 (zh)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003045882A (ja) * 2001-07-27 2003-02-14 Nec Corp 半導体装置及びその設計方法
JP4591827B2 (ja) * 2005-05-24 2010-12-01 エルピーダメモリ株式会社 リセスチャネル構造を有するセルトランジスタを含む半導体装置およびその製造方法
US7700977B2 (en) * 2007-06-21 2010-04-20 Intersil Americas Inc. Integrated circuit with a subsurface diode
US20100117153A1 (en) * 2008-11-07 2010-05-13 Honeywell International Inc. High voltage soi cmos device and method of manufacture
CN102403321A (zh) * 2011-09-30 2012-04-04 上海新傲科技股份有限公司 半导体装置及制备方法
GB201604796D0 (en) 2015-11-10 2016-05-04 Analog Devices Global A combined isolator and power switch
US9653455B1 (en) * 2015-11-10 2017-05-16 Analog Devices Global FET—bipolar transistor combination
US9698594B2 (en) 2015-11-10 2017-07-04 Analog Devices Global Overvoltage protection device, and a galvanic isolator in combination with an overvoltage protection device
US9935628B2 (en) 2015-11-10 2018-04-03 Analog Devices Global FET—bipolar transistor combination, and a switch comprising such a FET—bipolar transistor combination

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4139781A (en) * 1974-08-13 1979-02-13 Honeywell Inc. Logic gate circuits
CA1131801A (en) * 1978-01-18 1982-09-14 Johannes A. Appels Semiconductor device
US4705759B1 (en) * 1978-10-13 1995-02-14 Int Rectifier Corp High power mosfet with low on-resistance and high breakdown voltage
JPS5553462A (en) * 1978-10-13 1980-04-18 Int Rectifier Corp Mosfet element
NL186665C (nl) * 1980-03-10 1992-01-16 Philips Nv Halfgeleiderinrichting.
US4982262A (en) * 1985-01-15 1991-01-01 At&T Bell Laboratories Inverted groove isolation technique for merging dielectrically isolated semiconductor devices
US4823173A (en) * 1986-01-07 1989-04-18 Harris Corporation High voltage lateral MOS structure with depleted top gate region
US5264719A (en) * 1986-01-07 1993-11-23 Harris Corporation High voltage lateral semiconductor device
EP0251682A3 (en) * 1986-06-25 1989-12-06 Hewlett-Packard Company Integrated bipolar-mos device
US4857772A (en) * 1987-04-27 1989-08-15 Fairchild Semiconductor Corporation BIPMOS decoder circuit
JPH0812910B2 (ja) * 1988-09-05 1996-02-07 日本電気株式会社 化合物半導体装置およびその製造方法
US5359220A (en) * 1992-12-22 1994-10-25 Hughes Aircraft Company Hybrid bipolar/field-effect power transistor in group III-V material system
SE500814C2 (sv) * 1993-01-25 1994-09-12 Ericsson Telefon Ab L M Halvledaranordning i ett tunt aktivt skikt med hög genombrottsspänning

Also Published As

Publication number Publication date
WO1998021753A1 (en) 1998-05-22
SE9604142D0 (sv) 1996-11-13
CN1146047C (zh) 2004-04-14
SE9604142L (sv) 1998-05-14
AU5076298A (en) 1998-06-03
EP0946983A1 (en) 1999-10-06
KR100526076B1 (ko) 2005-11-03
CA2271313A1 (en) 1998-05-22
JP2001504275A (ja) 2001-03-27
US6015982A (en) 2000-01-18
CN1242874A (zh) 2000-01-26
SE512661C2 (sv) 2000-04-17
KR20000053182A (ko) 2000-08-25

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