TW348368B - Coating pattern formation - Google Patents

Coating pattern formation

Info

Publication number
TW348368B
TW348368B TW086101812A TW86101812A TW348368B TW 348368 B TW348368 B TW 348368B TW 086101812 A TW086101812 A TW 086101812A TW 86101812 A TW86101812 A TW 86101812A TW 348368 B TW348368 B TW 348368B
Authority
TW
Taiwan
Prior art keywords
photosensitive
coating
resistor
pattern formation
coating pattern
Prior art date
Application number
TW086101812A
Other languages
English (en)
Inventor
Lan Wall Christopher
Landells Clive
Original Assignee
Electra Technology Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Electra Technology Ltd filed Critical Electra Technology Ltd
Application granted granted Critical
Publication of TW348368B publication Critical patent/TW348368B/zh

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/094Multilayer resist systems, e.g. planarising layers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01CRESISTORS
    • H01C17/00Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/06Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
    • H01C17/065Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thick film techniques, e.g. serigraphy
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01CRESISTORS
    • H01C17/00Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/06Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
    • H01C17/065Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thick film techniques, e.g. serigraphy
    • H01C17/06506Precursor compositions therefor, e.g. pastes, inks, glass frits
    • H01C17/06573Precursor compositions therefor, e.g. pastes, inks, glass frits characterised by the permanent binder
    • H01C17/06586Precursor compositions therefor, e.g. pastes, inks, glass frits characterised by the permanent binder composed of organic material
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/02Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/02Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
    • H05K3/061Etching masks
    • H05K3/064Photoresists
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/09Use of materials for the conductive, e.g. metallic pattern
    • H05K1/092Dispersed materials, e.g. conductive pastes or inks
    • H05K1/095Dispersed materials, e.g. conductive pastes or inks for polymer thick films, i.e. having a permanent organic polymeric binder
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/14Related to the order of processing steps
    • H05K2203/1476Same or similar kind of process performed in phases, e.g. coarse patterning followed by fine patterning

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)
TW086101812A 1996-02-13 1997-02-13 Coating pattern formation TW348368B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GBGB9603050.7A GB9603050D0 (en) 1996-02-13 1996-02-13 Coating pattern formation

Publications (1)

Publication Number Publication Date
TW348368B true TW348368B (en) 1998-12-21

Family

ID=10788708

Family Applications (1)

Application Number Title Priority Date Filing Date
TW086101812A TW348368B (en) 1996-02-13 1997-02-13 Coating pattern formation

Country Status (5)

Country Link
AU (1) AU1801997A (zh)
GB (2) GB9603050D0 (zh)
ID (1) ID19890A (zh)
TW (1) TW348368B (zh)
WO (1) WO1997030571A1 (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19822033A1 (de) * 1998-05-15 1999-11-18 Bsh Bosch Siemens Hausgeraete Dickschichtsubstanz und Verfahren zum Herstellen einer Struktur aus einer Dickschichtsubstanz
US7038571B2 (en) * 2003-05-30 2006-05-02 Motorola, Inc. Polymer thick film resistor, layout cell, and method

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4119480A (en) * 1976-05-13 1978-10-10 Tokyo Shibaura Electric Co., Ltd. Method of manufacturing thick-film circuit devices
FR2574570A1 (fr) * 1984-12-07 1986-06-13 Thomson Csf Procede de photolithographie d'une couche epaisse de pate deposee sur un substrat
FR2602912B1 (fr) * 1986-08-14 1988-12-09 Thomson Csf Procede de realisation de circuits microelectriques

Also Published As

Publication number Publication date
GB9603662D0 (en) 1996-04-17
GB9603050D0 (en) 1996-04-10
ID19890A (id) 1998-08-20
WO1997030571A1 (en) 1997-08-21
AU1801997A (en) 1997-09-02

Similar Documents

Publication Publication Date Title
MY108761A (en) Photoenhanced diffusion patterning for organic polymer films
JPS5569265A (en) Pattern-forming method
MY140694A (en) Pattern forming method and treating agent therefor
EP0215532A3 (en) An electron emissive mask for an electron beam image projector, its manufacture, and the manufacture of a solid state device using such a mask
KR970003459A (ko) 반도체 소자의 비아홀의 형성방법
TW348368B (en) Coating pattern formation
KR910006782A (ko) 반도체장치의 제조방법
KR970003412A (ko) 반도체 소자의 미세패턴 형성방법
KR960001894A (ko) 레지스트 패턴의 형성방법과 그 방법에 쓰이는 산성 수용성 재료 조성물
JPH02262319A (ja) パターン形成方法
JPH02144989A (ja) プリント回路板の処理方法
KR100269616B1 (ko) 레지스트패턴형성방법
KR920003811B1 (ko) 레지스트의 이중 도포에 의한 이중 노광방법
RU96107191A (ru) Способ фотолитографии
KR200198431Y1 (ko) 반도체웨이퍼노광장치
KR910001460A (ko) 포토레지스트의 측벽 프로파일 개선 방법
KR970003523A (ko) 반도체 소자의 콘택홀 형성방법
KR950027922A (ko) 반도체 제조용 마스크 제조방법
JPH08203821A (ja) パターン形成方法
KR900007055A (ko) 이미지 리버스 포토레지스트를 이용한 2중포토처리방법
KR970067458A (ko) 칼라 브라운관용 패널에 블랙 매트릭스(Black Matrix) 도포막을 형성하는 방법
KR950024261A (ko) 림(Rim)형 위상반전마시크 및 그 제조방법
KR900017174A (ko) 반도체의 미세패턴 형성방법
JPH04180615A (ja) 半導体装置の製造方法
KR950004397A (ko) 반도체 제조용 크롬 마스크의 결함 제거방법